JPS6287499A - 単結晶CdTeの熱処理方法 - Google Patents
単結晶CdTeの熱処理方法Info
- Publication number
- JPS6287499A JPS6287499A JP22820385A JP22820385A JPS6287499A JP S6287499 A JPS6287499 A JP S6287499A JP 22820385 A JP22820385 A JP 22820385A JP 22820385 A JP22820385 A JP 22820385A JP S6287499 A JPS6287499 A JP S6287499A
- Authority
- JP
- Japan
- Prior art keywords
- single crystal
- heat treatment
- cdte
- vapor
- heat
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22820385A JPS6287499A (ja) | 1985-10-14 | 1985-10-14 | 単結晶CdTeの熱処理方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22820385A JPS6287499A (ja) | 1985-10-14 | 1985-10-14 | 単結晶CdTeの熱処理方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6287499A true JPS6287499A (ja) | 1987-04-21 |
| JPH0455156B2 JPH0455156B2 (es) | 1992-09-02 |
Family
ID=16872811
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22820385A Granted JPS6287499A (ja) | 1985-10-14 | 1985-10-14 | 単結晶CdTeの熱処理方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6287499A (es) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100379902C (zh) * | 2006-08-16 | 2008-04-09 | 中国科学技术大学 | 碲化镉单晶的低温溶剂热生长方法 |
| JP2008100900A (ja) * | 2006-09-07 | 2008-05-01 | Commiss Energ Atom | アニールによるii−iv族の半導体材料中の沈殿物を除去するための方法 |
| JP2017007900A (ja) * | 2015-06-23 | 2017-01-12 | Jx金属株式会社 | CdTe系化合物半導体単結晶及びその製造方法 |
-
1985
- 1985-10-14 JP JP22820385A patent/JPS6287499A/ja active Granted
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100379902C (zh) * | 2006-08-16 | 2008-04-09 | 中国科学技术大学 | 碲化镉单晶的低温溶剂热生长方法 |
| JP2008100900A (ja) * | 2006-09-07 | 2008-05-01 | Commiss Energ Atom | アニールによるii−iv族の半導体材料中の沈殿物を除去するための方法 |
| US8021482B2 (en) * | 2006-09-07 | 2011-09-20 | Commissariat A L'energie Atomique | Method for eliminating the precipitates in a II-IV semiconductor material by annealing |
| JP2017007900A (ja) * | 2015-06-23 | 2017-01-12 | Jx金属株式会社 | CdTe系化合物半導体単結晶及びその製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0455156B2 (es) | 1992-09-02 |
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