JPS6289311A - Magnetically soft thin film - Google Patents

Magnetically soft thin film

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Publication number
JPS6289311A
JPS6289311A JP23046785A JP23046785A JPS6289311A JP S6289311 A JPS6289311 A JP S6289311A JP 23046785 A JP23046785 A JP 23046785A JP 23046785 A JP23046785 A JP 23046785A JP S6289311 A JPS6289311 A JP S6289311A
Authority
JP
Japan
Prior art keywords
thin film
magnetic
magnetic thin
nitrogen
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP23046785A
Other languages
Japanese (ja)
Other versions
JPH0744106B2 (en
Inventor
Kazuhiko Hayashi
和彦 林
Masatoshi Hayakawa
正俊 早川
Osamu Ishikawa
理 石川
Yoshitaka Ochiai
落合 祥隆
Hideki Matsuda
秀樹 松田
Hiroshi Iwasaki
洋 岩崎
Koichi Aso
阿蘇 興一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
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Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP60230467A priority Critical patent/JPH0744106B2/en
Publication of JPS6289311A publication Critical patent/JPS6289311A/en
Publication of JPH0744106B2 publication Critical patent/JPH0744106B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PURPOSE:To obtain the titled soft magnetic thin film having a high permeability, an excellent corrosion-resisting property, an excellent abrasion-resisting property of high degree of hardness and thermal stability without lowering the density of saturated magnetic flux and also without increasing magnetic coercive force by a method wherein nitrogen N is added to the magnetic thin film having Fe, Al and Ge as the main components, and the composition of component of the magnetic thin film is specified. CONSTITUTION:The composition of the titled soft magnetic thin film is indicated by the formula of FeaAlbGecNx (provided that the compositional ratio of a, b, c and x is indicated by atom%), each compositional range is 55<=a<=84, 1<=b<=31, 1<=c<=31, and 0.1<=x<=30, and excellent serviceability is given to the soft magnetic thin film of the composition of a+b+c+x=100. Pertaining to the compositional ratio N, it becomes invalid or the characteristics of the magnetic thin film are deteriorated in the compositional range other than the above-mentioned range. It is desirable that the magnetically soft thin film is manufactured by performing a vapor deposition method, an ion implanting method and the like. Also, as the method wherein nitrogen N is introduced into the magnetic thin film, there are the method in which vapor deposition and the like is performed in the atmosphere containing nitrogen gas and the method in which nitrogen N is introduced into the magnetic thin film using the compound, consisting of nitrogen N and at least a kind of element selected from the above-mentioned material, and the alloy of the remaining component as the source of evaporation.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は例えば薄膜磁気ヘッドに用いて好適な軟磁性薄
膜に係わる。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a soft magnetic thin film suitable for use in, for example, a thin film magnetic head.

〔発明の概要〕[Summary of the invention]

本発明は、窒素含介のFe−An−Ge糸の軟磁性薄膜
であり、その組成の特定により保磁ノ月1Cが小さく透
磁率μが篩く特に耐蝕性及び硬度にすぐれた軟磁性薄膜
を得るものである。
The present invention is a soft magnetic thin film made of nitrogen-containing Fe-An-Ge yarn, which has a small coercive force 1C and a sieve magnetic permeability μ due to its specific composition, and has particularly excellent corrosion resistance and hardness. This is what you get.

〔従来の技術〕[Conventional technology]

各種磁気記録再生装置において、面密度記録化、高周波
数化の要求が高まり、これに対応して高い飽和磁化、高
い保磁力の磁気記録媒体が用いられる。この種の磁気記
録媒体としては、Fe、 Co、 Ni等の強磁性金属
の粉末を用いたいわゆるメタルテープや、強磁性金属材
料をベースフィルム上に被着して成るいわゆる蒸着テー
プなどが用いられるに至っている。
In various magnetic recording and reproducing devices, demands for areal density recording and higher frequency are increasing, and in response to this, magnetic recording media with high saturation magnetization and high coercive force are used. As this type of magnetic recording medium, so-called metal tapes made of powder of ferromagnetic metals such as Fe, Co, and Ni, and so-called vapor-deposited tapes made of ferromagnetic metal materials deposited on a base film are used. It has reached this point.

これに伴い、この種の磁気記録媒体に対する磁気ヘット
としては、高い飽和磁束密度と高透磁率のヘッド材料に
よることが要求されると共に、磁気異方性が小さく磁歪
が零であり、また保磁力が小さく、更にヘッド材料とし
てできるだけ、耐摩耗性が高く、耐0!l:性にずくれ
ているなど、磁気特性はもとより、化学的に安定で機械
的特性に1ぐれζいることなどが要求される。
Accordingly, magnetic heads for this type of magnetic recording medium are required to be made of head materials with high saturation magnetic flux density and high magnetic permeability, as well as having small magnetic anisotropy, zero magnetostriction, and coercive force. is small, and has the highest abrasion resistance possible as a head material, with zero resistance! l: It is required to have not only magnetic properties, but also chemical stability and better mechanical properties.

一方、高密度記録化に伴っ”(記録トラック幅、したが
って磁気ヘッドにおける、作動磁気ギヤツブのトラック
幅の狭小化が要求され、この要求に対応し、しかも特に
多トラツク磁気ヘッドにおいて著しく量産性の向」二を
はかることができるものとして非磁性ないしは磁性基板
上に軟磁性薄膜による磁気へソドコアを被着形成する薄
膜技術を用いた薄膜磁気ヘッドの普及がめざましい。こ
の種の軟磁性薄膜としてばPe+ AN + Siを]
已成分とするセンダスト合金@膜が注目を望めている。
On the other hand, with the trend toward higher density recording, there is a need to narrow the recording track width (and thus the track width of the operating magnetic gear in the magnetic head). Thin-film magnetic heads using thin-film technology, in which a magnetic core is formed by depositing a soft magnetic thin film on a non-magnetic or magnetic substrate, are becoming increasingly popular.An example of this type of soft magnetic thin film is Pe+. AN+Si]
Sendust alloy@membrane, which is the next component, is attracting attention.

このセンダスト合金薄膜は、lIIい飽和磁束密度Bs
を有し、比較的高硬度を有するので、上述したメタルテ
ープ等のように1r(1い残留磁束密度を有する磁気記
録媒体に対しても適用すること力<nJ能である。
This Sendust alloy thin film has a high saturation magnetic flux density Bs
Since it has a relatively high hardness, it can be applied even to magnetic recording media having a residual magnetic flux density of 1r (1r), such as the metal tape mentioned above.

しかしながら、このセンダスト合金8欣は比較的高硬度
を有するものの例えばフェライト材等に比し耐摩耗性及
び耐蝕性に劣る。また、このセンダスト合金薄膜は比較
的比抵抗が低いためにこれを磁気ヘッドのコアとして使
用した場合には、いわゆる渦電流1)1による画周波領
域での透磁率の低下が問題となっており、同周波数領域
で充分な再生出力が得られないおそれがあるなどの問題
点がある。
However, although this Sendust alloy 8 has relatively high hardness, it is inferior in wear resistance and corrosion resistance compared to, for example, ferrite materials. In addition, this Sendust alloy thin film has a relatively low resistivity, so when it is used as the core of a magnetic head, a decrease in magnetic permeability in the image frequency region due to so-called eddy currents1) becomes a problem. , there is a problem that sufficient reproduction output may not be obtained in the same frequency range.

これに比し、センダスト合金薄映の代わりに面周波数領
域での透磁率の低トが少なく高い飽和磁束密度Bsをa
する非晶質(アモルファス)磁性合金材料を用いること
が考えられているが、この非晶質磁性合金材料は耐熱性
にケ廿点があり、長時間の加熱や熱ザイクルにより透磁
率が大きく劣化し部仕効率が悪くなる。特に結晶化の1
11能性が大きいので500℃以上の温度を長時間加え
ることはできないものであり、これがため、磁気ヘッド
の製造上程において例えばガラスNi1t着のように5
00℃以上の温度での処理を必要とする工程を採ること
は好ましくないなどの問題点がある。
In contrast, instead of using Sendust alloy thin film, a high saturation magnetic flux density Bs with less low magnetic permeability in the surface frequency region is used.
It has been considered to use an amorphous magnetic alloy material, but this amorphous magnetic alloy material has drawbacks in heat resistance, and its magnetic permeability deteriorates significantly due to long-term heating or thermal cycling. The efficiency of the department will deteriorate. Especially crystallization 1
11) Because of its high potency, it is not possible to apply temperatures of 500°C or higher for long periods of time.For this reason, in the manufacturing process of magnetic heads, for example, 500°C is used, such as glass Ni1t deposition.
There are problems such as that it is not preferable to use a process that requires treatment at a temperature of 00° C. or higher.

このような状況から、さらに良好な軟磁気特性をボず軟
磁性材料の研究が進められ、例えば山本達治・十葉久喜
共杵、「日本金属7°会誌」第14巻13、第2号(1
950年)には、Fe、 Co、 Stを主成分とする
Fe−Co−Si系合金材料が良好な軟磁気特性を示す
ことが報告されている。
Under these circumstances, research into soft magnetic materials with even better soft magnetic properties has progressed, for example, Tatsuharu Yamamoto and Kyouki Toba, "Journal of the Japan Metals 7° Society," Vol. 14, No. 13, No. 2 ( 1
950), it was reported that a Fe-Co-Si alloy material containing Fe, Co, and St as main components exhibits good soft magnetic properties.

しかしながら、このFe−Co−Si系合金材は、極め
て脆弱で実用性に乏しく、そのまま磁気ヘットのコア材
料として用いることには問題がある。
However, this Fe-Co-Si alloy material is extremely brittle and has poor practical use, and there are problems in using it as it is as a core material for a magnetic head.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

本発明は上述した諸問題の改善をはかり、磁気特性、す
なわち飽和磁束密度Bsが大、保磁ノ月1cが小、磁歪
λSが殆ど零、磁気異方性が小さく、しかも機械的特性
、すなわち、高い硬度を有し、耐摩耗性にすぐれ、更に
熱的に安定で耐熱性が商く、また化学安定性に、すなわ
ち耐蝕性にすぐれた軟磁性薄膜を提供するものである。
The present invention aims to improve the above-mentioned problems, and has the magnetic properties, that is, the saturation magnetic flux density Bs is large, the coercive force 1c is small, the magnetostriction λS is almost zero, the magnetic anisotropy is small, and the mechanical properties, namely, The object of the present invention is to provide a soft magnetic thin film that has high hardness, excellent wear resistance, thermal stability and heat resistance, and chemical stability, that is, excellent corrosion resistance.

〔問題点を解決するための手段〕[Means for solving problems]

本発明は、Fe、 Aj2 、 Geを主成分とする磁
性薄膜に窒素Nを添加することにより飽和磁束密度を低
−トすることなく上述した諸問題を改善することができ
ることを見出したごとに基づくものである。
The present invention is based on the discovery that the above-mentioned problems can be improved without lowering the saturation magnetic flux density by adding nitrogen to a magnetic thin film containing Fe, Aj2, and Ge as main components. It is something.

オなわら、本発明ば、Pea AIbGec Nx  
(但し、a、b、c及びXは、夫々の組成比を原子%と
し4表ず)なる組成式でボされ、各組成範囲が、55S
 a S 84 1≦b<31 1≦C≦31 0.1≦x≦30 であり、且つ、a+ b+ C+x=tooとした組成
の軟磁性VIi−股とする。
However, according to the present invention, Pea AIbGec Nx
(However, a, b, c and
a S 84 1≦b<31 1≦C≦31 0.1≦x≦30 and a soft magnetic VIi-crotch with a composition such that a+ b+ C+x=too.

面、上述の組成においてAβの一部をGaで、Geの一
部をSiで置換できる。またFeの一部をCo或いはR
uの少くとも1種で15原子%以十をもって置換するこ
とができる。
In the above composition, a portion of Aβ can be replaced with Ga and a portion of Ge can be replaced with Si. Also, a part of Fe can be replaced with Co or R.
At least one type of u can be substituted in an amount of 15 atomic % or more.

また、上述の組成を有する本発明による転磁性情1模の
膜厚としては、10Å以上1 van以十であることが
好ましく、さらに10Å以上100μm以トであること
がより好ましい。
Further, the film thickness of the magnetic transfer property 1 according to the present invention having the above-mentioned composition is preferably 10 Å or more and 1 van or more, and more preferably 10 Å or more and 100 μm or less.

〔作用〕[Effect]

本発明による軟磁性S股は、センダスト合金よりも飽和
磁束密度が向く、またNを含ませたことにより、Nを含
まないPe、−Aβ−Ge系合金に比しで、透磁率が」
二かり、比抵抗が1(tりなり、硬度、したがって耐摩
耗性の向上がはかられた。
The soft magnetic S-crotch according to the present invention has a higher saturation magnetic flux density than the Sendust alloy, and because it contains N, the magnetic permeability is higher than that of Pe, -Aβ-Ge alloys that do not contain N.
As a result, the specific resistance was 1 (t), and the hardness and therefore the wear resistance were improved.

本発明による軟磁性薄膜において、Fe、  Aj!及
びGeの各元素に関する組成比、ずなわちa、b及びC
の値に関しては、−1−記範囲外では、磁士が大きくな
るなど磁気特性の劣化を来し、Nの組成比すなわちXの
値に関しては、これが上記範囲外、つまり、Xが0.1
原子%未満では比抵抗及び硬度など、Nの添加による効
果の発現がみられず、Xが30原子%を超えると、かえ
って透磁率の低−1・を招来し、保磁)月10が向くな
るなどの不都合が生じる。
In the soft magnetic thin film according to the present invention, Fe, Aj! and the composition ratio for each element of Ge, namely a, b and C
Regarding the value of , if it is outside the range indicated in -1-, the magnetic properties will deteriorate such as the magnetization becomes larger, and regarding the composition ratio of N, that is, the value of X, this is outside the above range, that is, if X is 0.1
If X is less than 30 atomic %, the effects of N addition, such as specific resistance and hardness, will not be observed, and if X exceeds 30 atomic %, the magnetic permeability will be low -1. This may cause inconveniences such as

また、」一連の組成においてlieの一部をGoで置換
するときは、更に飽和磁束密度Bsの向上と、耐蝕性の
向」二をはかることができ、l?eの一部をRuで置換
するときも、Ruが非磁性であるにも拘わらず軟磁気特
性を害わずに、またBsの低1・を殆ど招来せずに、よ
り耐蝕性、耐摩耗性の向上をはかることができた。
Furthermore, when a part of lie is replaced with Go in a series of compositions, it is possible to further improve the saturation magnetic flux density Bs and improve corrosion resistance. Even when replacing a part of e with Ru, even though Ru is non-magnetic, it does not impair the soft magnetic properties and hardly causes a low Bs of 1. I was able to improve my sexuality.

し実施例] 本発明による軟磁性薄腺の製造方法とし′Cは、いわゆ
る気相薄膜生成技術に、Lることか好ましい。
Embodiments] In the method for manufacturing a soft magnetic thin gland according to the present invention, 'C' is preferably a so-called vapor phase thin film production technique.

これは、例えば一般の熔解による方法では均一に多量の
窒素を導入することが難しいごとによる。
This is because, for example, it is difficult to uniformly introduce a large amount of nitrogen using a general melting method.

ずl「わち、通電窒素は合金溶融中にスラグとして浮−
hL不純物として合金と分離されてしまうのである。
``In other words, energized nitrogen floats as slag during alloy melting.''
It is separated from the alloy as an hL impurity.

そごで、本発明による軟磁性薄膜は、蒸着法やイオンイ
ンプランテーション法等により作製するのが好ましいも
のである。蒸着の手法としては、例えばフラッシュ蒸着
、ガス中蒸着法、イオンブレーティング、スパッタリン
グ、クラスター・イオンビーム法等が挙げられ、また蒸
着とイオンイングランチージョンを同時に行ってもよい
。また、磁性薄膜に窒素Nを導入する方法としては、+
1.1  窒素ガスを含む雰囲気中で蒸着等を行い、こ
の窒素ガスの濃度によって冑られる磁性層)漠中の窒素
Nの金白−量を調節して導入する方法。
Therefore, the soft magnetic thin film according to the present invention is preferably produced by a vapor deposition method, an ion implantation method, or the like. Examples of vapor deposition methods include flash vapor deposition, in-gas vapor deposition, ion blasting, sputtering, cluster ion beam method, etc. Also, vapor deposition and ion implantation may be performed simultaneously. In addition, as a method of introducing nitrogen N into the magnetic thin film, +
1.1 A method in which vapor deposition or the like is performed in an atmosphere containing nitrogen gas, and the amount of nitrogen N in the magnetic layer is adjusted and introduced into the magnetic layer, which is affected by the concentration of nitrogen gas.

(2)窒素Nと各成分のうちの少なくとも14Mの元素
との化合物と、残りの成分の合金とを蒸発源として使用
し、得られる磁性Wi膜すJに窒素Nを導入する方法、 等が挙げられる。さらに、磁性薄膜を構成するFe。
(2) A method of introducing nitrogen N into the resulting magnetic Wi film using a compound of nitrogen N and at least 14M of each component and an alloy of the remaining components as an evaporation source, etc. Can be mentioned. Furthermore, Fe constituting the magnetic thin film.

IN!、Ge等の各成分ノし素の組成を調節する方法と
しては、 (II  Fe+ i + Geや他の添加剤、置換金
属等を所定の割合となるように秤量し、これらをあらか
しめ例えばi口1周波溶解か等で溶解し゛ζ合合金イン
ゴット形成しておき、この合金インゴットを蒸発源とし
て使用する方法、 (2)各成分の単独元素の蒸発源を用慈し、これら蒸発
源の数で組成を制御する方法、 (3)各成分の単独元素の蒸発源を用意し、これら蒸発
源に加える出力(印加電圧)を制御して蒸発スピードを
コントロールし組成を制御する方法、 (4)合金を蒸発源として蒸着しながら他の元素を打ち
込む方法、 等が挙げられる。
IN! To adjust the composition of each component such as (II Fe+i+Ge, other additives, substitution metals, etc.), weigh out the predetermined proportions, summarize them, and calculate, for example, i A method in which a ζ composite alloy ingot is formed by melting by single-frequency melting or the like, and this alloy ingot is used as an evaporation source. (3) A method of preparing evaporation sources for individual elements of each component and controlling the output (applied voltage) applied to these evaporation sources to control the evaporation speed and composition; (4) Examples include a method of implanting other elements while depositing an alloy as an evaporation source.

実施例1 鉄、アルミニウム、ゲルマニウムの各金属を秤量し、高
周波を容解炉を用いて真空中で溶解し、鋳型に流し込ん
で成形し′ζ直径50龍、IIノさ111mの電極用ク
ーリ゛ソトを作製した。
Example 1 Each metal of iron, aluminum, and germanium was weighed, melted in a vacuum using a high-frequency melting furnace, and poured into a mold to form an electrode coolant with a diameter of 50 m and a diameter of 111 m. Soto was created.

このターゲットを用い、上記のスパッタ条件に従ってブ
レチーマグネ]・ロン型スパックリング装置によるスパ
ッタリングを行った。
Using this target, sputtering was performed using a Brechy Magne Ron type sputtering apparatus according to the sputtering conditions described above.

スパッタ条件 RFパワー         1(IOWターケソト・
基板間距1tilj   30龍基板温度      
  〜20’C(水冷)到達真空度       3 
X ]]0−’″Torrガス圧力       5 
X 10−’ Torr欣  厚          
約 2.8〜3.1  μm上記スパッタ条件に従い、
不活性ガスとして静ガスを用い、このArガスにN2を
ン昆人してスパソタリングを行った。ここで、N2の混
入量を分圧で制御し、このN2の割合を変えながらスパ
ッタリングを行い、結晶化ガラス基板上にNを含むfi
e−^ρ−〇e系合金薄股を形成した。得られたNを含
むFe−A#−Ge系合金s股を550℃で1時間熱処
理した。
Sputtering conditions RF power 1 (IOW
Distance between boards 1tilj 30 Dragon board temperature
~20'C (water cooling) ultimate vacuum level 3
X]]0-'''Torr gas pressure 5
X 10-' Torr thickness
Approximately 2.8 to 3.1 μm According to the above sputtering conditions,
Static gas was used as an inert gas, and N2 was added to the Ar gas to perform spasotering. Here, the amount of N2 mixed in is controlled by partial pressure, and sputtering is performed while changing the ratio of N2, so that fi
A thin section of e-^ρ-〇e alloy was formed. The obtained N-containing Fe-A#-Ge based alloy was heat treated at 550°C for 1 hour.

実施例1において、そのN2ガスの分j+−,を変化さ
せた場合の得られた膜組成と、保磁ノ月ICと]、MI
Izにおける透磁率μIMHzと、耐蝕性を測定した結
果を図面に示す。ごこで耐蝕性の測定は、測定試料を1
規定のNaCl溶液中に9時間浸漬し、表面の発錆状態
を目視観察したもので、◎印は上述のNaCl中に48
時間浸漬した後でも鏡面が保たれたもの、○印は同条件
で表面に曇りが生じ、市水中で48時間後で鏡面であっ
たもの、△印は山水中48時間浸漬で膜面に曇りが生じ
たもの、X印は市水中48時間浸漬で膜面に薄く赤錆が
発生したものをボす。
In Example 1, the film composition obtained when the N2 gas content j+-, and the magnetic coercive IC], MI
The results of measuring the magnetic permeability μIMHz at Iz and the corrosion resistance are shown in the drawing. To measure the corrosion resistance using a
It was immersed in the specified NaCl solution for 9 hours and the state of rust on the surface was visually observed.
Those marked with ○ maintain a mirror surface even after being immersed in water for an hour, those marked with ○ show clouding on the surface under the same conditions, and remain mirror-like after 48 hours in city water, and those marked with △ show that the film surface becomes cloudy after immersed in mountain water for 48 hours. The mark X indicates that a thin layer of red rust has formed on the film surface after immersion in city water for 48 hours.

尚、比較のために同図面の表中にNを含有させないもの
についてもその測定結果を4<シタ。
For comparison, the measurement results for those that do not contain N are shown in the table of the same drawing as 4<sita.

各組成の測定は、Nに関してはインナートガスディフュ
ージョン(熱伝導度)法によってその測定を行ったもの
であり、他についてはEPM^(ElectricPr
obe旧cro Analsis )によった。
The measurement of each composition was carried out using the inner gas diffusion (thermal conductivity) method for N, and for the others using EPM^ (Electric Pr
obe (formerly Cro Analsis).

これら測定結果から明らかなように、本発明によるN含
有の転磁P1薄欣はNを含有しない軟磁性薄膜に比し゛
ζ保磁ノ月1cを高めることなく、透磁率の向上と耐蝕
性の向上がはかられている。
As is clear from these measurement results, the N-containing magnetized P1 thin film according to the present invention improves magnetic permeability and corrosion resistance without increasing coercivity 1c compared to a soft magnetic thin film that does not contain N. Improvements are being made.

以上述べたように、本発明による軟磁性薄膜においては
、その成分として窒素Nを含有していることにより、商
+3磁率及び耐蝕性の同上がはかられるものであるが更
に商硬度が達成されて耐摩耗性の向」−1がはかられる
ものであり、ごのとき飽和磁束密度や保磁力等の磁気特
性の劣化も見られない。そして特に、窒素Nを含有する
ことにより比抵抗が増加し、商周波領域での渦電流損失
が小さくなることがら透磁率の周波数特性が向−ヒして
] OMIIZ以−1−の画周波数領域で使用される磁
気ヘッド等に対して極めて有用となる。
As mentioned above, in the soft magnetic thin film according to the present invention, by containing nitrogen N as a component, it is possible to achieve the same quotient + 3 magnetic coefficient and corrosion resistance, but it is also possible to achieve quotient hardness. The wear resistance is measured to be "-1", and no deterioration in magnetic properties such as saturation magnetic flux density and coercive force is observed. In particular, the inclusion of nitrogen N increases the specific resistance and reduces the eddy current loss in the commercial frequency region, which improves the frequency characteristics of magnetic permeability. It is extremely useful for magnetic heads used in

尚、この磁性薄膜中における窒素Nの果だJ役割につい
ては、その詳細は不明であるが、硬度が著しく向上する
ことからFeの窒化物等の商硬度粒子の生成等も予想さ
れる。
Although the details of the role of nitrogen N in this magnetic thin film are unknown, since the hardness is significantly improved, it is expected that quotient hardness particles such as Fe nitride may be generated.

また、上述の本発明による軟磁性薄膜において、更に耐
蝕性や耐摩耗性そのほか各種特性を改善するために各種
元素を添加剤として加え′ζもよい。
Furthermore, in the soft magnetic thin film according to the present invention described above, various elements may be added as additives in order to further improve corrosion resistance, wear resistance, and other various properties.

この添加剤として使用される元素としては、TLZr、
 llf等のNa族冗素、V、  Nb、 Ta等のV
a族元素、Cr、 Mo、 W等のVia族元素、Mn
等の■a族元素、さらに白金族元素として第5周期の白
金族元素、すなわちRh、 Rd、第6周期の白金族元
素、ずなわちOs、 Ir、 Pt等を挙げることがで
きるものであり、これら添加剤の1種または2種以上を
組み合わせて、上記磁性薄膜に対してθ〜10車量%の
範囲で添加し得る。
Elements used as this additive include TLZr,
Na group redundant elements such as llf, V, Nb, V such as Ta
Group a elements, Via group elements such as Cr, Mo, and W, Mn
and the like, and further platinum group elements include 5th period platinum group elements, namely Rh, Rd, and 6th period platinum group elements, namely Os, Ir, Pt, etc. One type or a combination of two or more of these additives may be added to the magnetic thin film in an amount of θ to 10% by weight.

また、成る場合は、窒素Nと共に酸素を含有させること
もできる。
In addition, if present, oxygen can be contained together with nitrogen and N.

〔発明の効果〕〔Effect of the invention〕

一卜述したように本発明による軟磁性薄膜によれば、飽
和磁束密度の低下や、保磁力を高めることなく、商透磁
率を有し、耐蝕性にすぐれ、商硬度の耐摩耗性にず(れ
、更にアモルファス磁性薄膜におけるような熱的に不安
定性のない耐熱性にすぐれた軟磁性薄膜を得ることがで
きるので、例えば面密度記録用の薄膜磁気ヘッドの薄膜
磁気コアとして用いて、その利益は極めて大である。
As mentioned above, the soft magnetic thin film according to the present invention has a high commercial permeability without decreasing the saturation magnetic flux density or increasing the coercive force, has excellent corrosion resistance, and has excellent wear resistance of commercial hardness. (Furthermore, since it is possible to obtain a soft magnetic thin film with excellent heat resistance and no thermal instability like an amorphous magnetic thin film, it can be used as a thin film magnetic core of a thin film magnetic head for areal density recording, for example. The profits are extremely large.

【図面の簡単な説明】[Brief explanation of drawings]

図は軟磁性薄膜の組成と容性11Iの測定結果を示す表
目である。 −′
The figure is a table showing the composition of the soft magnetic thin film and the measurement results of capacitance 11I. −′

Claims (1)

【特許請求の範囲】 Fe_aAl_bGe_cN_x(但し、a、b、c及
びxは、夫々の組成比を原子%として表す)なる組成式
で示され、各組成範囲が、 55≦a≦84 1≦b≦31 1≦c≦31 0.1≦x≦30 であり、且つ、a+b+c+x=100としたことを特
徴とする軟磁性薄膜。
[Claims] It is represented by the composition formula Fe_aAl_bGe_cN_x (where a, b, c, and x represent their respective composition ratios as atomic %), and each composition range is 55≦a≦84 1≦b≦ 31 A soft magnetic thin film characterized in that 1≦c≦31 0.1≦x≦30 and a+b+c+x=100.
JP60230467A 1985-10-16 1985-10-16 Soft magnetic thin film Expired - Fee Related JPH0744106B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60230467A JPH0744106B2 (en) 1985-10-16 1985-10-16 Soft magnetic thin film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60230467A JPH0744106B2 (en) 1985-10-16 1985-10-16 Soft magnetic thin film

Publications (2)

Publication Number Publication Date
JPS6289311A true JPS6289311A (en) 1987-04-23
JPH0744106B2 JPH0744106B2 (en) 1995-05-15

Family

ID=16908285

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60230467A Expired - Fee Related JPH0744106B2 (en) 1985-10-16 1985-10-16 Soft magnetic thin film

Country Status (1)

Country Link
JP (1) JPH0744106B2 (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5827941A (en) * 1981-08-11 1983-02-18 Hitachi Ltd Method for manufacturing amorphous thin film

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5827941A (en) * 1981-08-11 1983-02-18 Hitachi Ltd Method for manufacturing amorphous thin film

Also Published As

Publication number Publication date
JPH0744106B2 (en) 1995-05-15

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