JPS6310090B2 - - Google Patents
Info
- Publication number
- JPS6310090B2 JPS6310090B2 JP2046181A JP2046181A JPS6310090B2 JP S6310090 B2 JPS6310090 B2 JP S6310090B2 JP 2046181 A JP2046181 A JP 2046181A JP 2046181 A JP2046181 A JP 2046181A JP S6310090 B2 JPS6310090 B2 JP S6310090B2
- Authority
- JP
- Japan
- Prior art keywords
- silicon oxide
- acid
- oxide film
- silicon
- water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Surface Treatment Of Glass (AREA)
- Silicon Compounds (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2046181A JPS57135713A (en) | 1981-02-14 | 1981-02-14 | Formation of silicon oxide film on surface of inorganic substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2046181A JPS57135713A (en) | 1981-02-14 | 1981-02-14 | Formation of silicon oxide film on surface of inorganic substrate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57135713A JPS57135713A (en) | 1982-08-21 |
| JPS6310090B2 true JPS6310090B2 (de) | 1988-03-03 |
Family
ID=12027713
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2046181A Granted JPS57135713A (en) | 1981-02-14 | 1981-02-14 | Formation of silicon oxide film on surface of inorganic substrate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57135713A (de) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012077210A (ja) * | 2010-10-01 | 2012-04-19 | Kaneka Corp | 積層体の製造方法 |
-
1981
- 1981-02-14 JP JP2046181A patent/JPS57135713A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57135713A (en) | 1982-08-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3970449B2 (ja) | 球状ポリメチルシルセスキオキサン微粒子の製造方法 | |
| JP3073313B2 (ja) | 半導体装置およびその製造方法 | |
| JP3320440B2 (ja) | 被膜形成用塗布液およびその製造方法 | |
| JPH09137121A (ja) | シリカ系被膜形成用塗布液及びその製造方法 | |
| JPS6278150A (ja) | 低温フリツト性きん青石型セラミツク粉末、その製法および該粉末をフリツトせしめることにより製造したセラミツク組成物 | |
| JP3163579B2 (ja) | 被膜形成用塗布液 | |
| JPH0410418A (ja) | 半導体装置 | |
| KR102571430B1 (ko) | 실리콘 기판 식각 용액 및 이를 사용한 반도체 소자의 제조 방법 | |
| JPS6310090B2 (de) | ||
| US2945817A (en) | Silica-silicone aerogels and their preparation | |
| SU674981A1 (ru) | Способ получени коллоиднографитового препарата дл покрытий | |
| JPH06279589A (ja) | 球状シリコーン微粒子の製造方法 | |
| CA1185056A (en) | Method for formation of coating film of silicon oxide | |
| EP0100780B1 (de) | Verfahren zur Bildung eines Siliciumdioxid-Beschichtungsfilms | |
| JP3746308B2 (ja) | 酸化防止被膜形成用塗布液 | |
| JPS5930864A (ja) | 酸化ケイ素系被膜形成用塗布液 | |
| Tsukuma et al. | Liquid phase deposition of a film of silica with an organic functional group | |
| CN1215999C (zh) | 胶态二氧化硅组合物及其生产方法 | |
| JPH04362014A (ja) | チタン酸バリウム薄膜の製造方法 | |
| JP2818785B2 (ja) | 金属基材上へのシリカ被膜の形成法 | |
| JPH04280812A (ja) | 基材上への多孔質シリカ被膜の形成法 | |
| JP3970453B2 (ja) | シリコーン微粒子の製造方法 | |
| CN118955906B (zh) | 一种大规模制备高纯度、高产率全氟烷基poss的方法 | |
| JP2752968B2 (ja) | シリカ系被膜の形成法 | |
| US4835017A (en) | Liquid composition for forming silica-based coating film |