JPS6310143B2 - - Google Patents
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- JPS6310143B2 JPS6310143B2 JP1339586A JP1339586A JPS6310143B2 JP S6310143 B2 JPS6310143 B2 JP S6310143B2 JP 1339586 A JP1339586 A JP 1339586A JP 1339586 A JP1339586 A JP 1339586A JP S6310143 B2 JPS6310143 B2 JP S6310143B2
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- acid
- alkali metal
- methoxybenzyl
- formula
- oxyphenyl
- Prior art date
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- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Description
【発明の詳細な説明】
本発明は下式各反応によりオキシフエニルマロ
ン酸半エステル(4)を製造する方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing oxyphenyl malonic acid half ester (4) by the following reactions.
[反応経路]
(なお、本明細書中、Xはp−メトキシベンジル
またはテトラヒドロピラニル基、
R1はp−メトキシベンジル基、
R2はアルキル基、
Zはアルカリ金属
をそれぞれ示す)
[発明の要約]
すなわち、この発明は一般式:
で表わされるオキシフエニル酢酸化合物をヘキサ
アルキルジシラザンのアルカリ金属塩などでアル
カリ金属化したのち、二酸化炭素を作用させて一
般式:
で表わされるオキシフエニルマロン酸塩(2)とし、
これに酸を作用させて一般式:
で表わされる新規なオキシフエニルマロン酸半エ
ステル(3)を製造する方法に関する。[reaction path] (In this specification, X represents a p-methoxybenzyl or tetrahydropyranyl group, R1 represents a p-methoxybenzyl group, R2 represents an alkyl group, and Z represents an alkali metal.) [Summary of the Invention] That is, This invention has the general formula: The oxyphenylacetic acid compound represented by is alkali metalized with an alkali metal salt of hexaalkyldisilazane, etc., and then treated with carbon dioxide to form the general formula: Oxyphenylmalonate (2) represented by
The general formula obtained by applying acid to this is: This invention relates to a method for producing a novel oxyphenyl malonic acid half ester (3) represented by:
また、この発明は、一般式:
で表わされるオキシフエニル酢酸化合物(1)にヘキ
サ低級アルキルジシラザンのアルカリ金属塩を作
用させてα位水素1個をアルカリ金属置換してア
ルカリ金属化する任意工程も含む。 Moreover, this invention also provides the general formula: It also includes an optional step of reacting the oxyphenylacetic acid compound (1) represented by the formula with an alkali metal salt of hexa-lower alkyldisilazane to replace one hydrogen at the α-position with an alkali metal.
すなわち、化合物(1)をこの任意工程でアルカリ
金属化し、これに二酸化炭素を作用させてオキシ
フエニルマロン酸塩(2)とし、酸を作用させてオキ
シフエニルマロン酸半エステル(3)を製造する連続
工程も本発明に含まれる。 That is, compound (1) is converted to an alkali metal in this optional step, reacted with carbon dioxide to form oxyphenyl malonate (2), and reacted with acid to form oxyphenyl malonic acid half ester (3). Continuous manufacturing steps are also included in the invention.
[各工程の説明]
この発明の製造方法はオキシフエニル酢酸化合
物(1)のヘキサアルキルジシラザンのアルカリ金属
塩を作用させてアルカリ金属化する任意の第一工
程、化合物(1)のアルカリ金属化物:
に二酸化炭素を導入してオキシフエニルマロン酸
塩(2)を製造する第二工程および塩(2)に酸を作用さ
せてオキシフエニルマロン酸半エステル(3)を製造
する第三工程よりなる。[Description of each step] The production method of the present invention includes an optional first step of converting the oxyphenylacetic acid compound (1) to an alkali metal by reacting with an alkali metal salt of hexaalkyldisilazane, an alkali metal compound of the compound (1): From the second step of producing oxyphenyl malonic acid salt (2) by introducing carbon dioxide into the salt (2) and the third step of producing oxyphenyl malonic acid half ester (3) by reacting the salt (2) with an acid. Become.
この全工程は同一容器内中で連続して行なえる
ため経済的に操作できる。 This entire process can be carried out continuously in the same container, making it economical to operate.
(第一工程)
この任意工程ではオキシフエニル酢酸化合物(1)
にヘキサアルキルジシラザンのアルカリ金属塩
(1〜3当量、好ましくは1.5〜2当量)を適当な
無水溶媒中で作用させてアルカリ金属化する。(First step) In this optional step, oxyphenylacetic acid compound (1)
is reacted with an alkali metal salt of hexaalkyldisilazane (1 to 3 equivalents, preferably 1.5 to 2 equivalents) in a suitable anhydrous solvent to form an alkali metal.
本反応は無水条件下、窒素気流中、冷却下に行
なうのが好ましい。 This reaction is preferably carried out under anhydrous conditions, in a nitrogen stream, and under cooling.
ヘキサアルキルジシラザンとしては、ヘキサメ
チルジシラザン、ヘキサエチルジシラザン、ヘキ
サプロピルジシラザンなどを用い得る。これらは
米国化学会誌66、1707(1944)に記載の方法によ
り容易に製造できる。 As the hexaalkyldisilazane, hexamethyldisilazane, hexaethyldisilazane, hexapropyldisilazane, etc. can be used. These can be easily produced by the method described in Journal of the American Chemical Society 66 , 1707 (1944).
アルカリ金属塩としては、ナトリウム塩、リチ
ウム塩、カリウム塩などを例示しうる。 Examples of alkali metal salts include sodium salts, lithium salts, and potassium salts.
ヘキサアルキルジシラザンのアルカリ金属塩
は、例えば無水溶媒中、窒素気流下に、ヘキサア
ルキルジシラザンとアルカリ金属アミド(特にナ
トリウムアミド)を反応させることにより容易に
製造できる。 The alkali metal salt of hexaalkyldisilazane can be easily produced, for example, by reacting hexaalkyldisilazane with an alkali metal amide (particularly sodium amide) in an anhydrous solvent under a nitrogen stream.
溶媒としては炭化水素類(ベンゼン、トルエ
ン、キシレン、n−ヘキサンなど)、エーテル類
(ジエチルエーテル、グライム、ジグライム、テ
トラヒドロフランなど)、ジメチルホルムアミド
などを単独または混合物として用いる。トルエ
ン、ジメチルホルムアミド、テトラヒドロフラ
ン、n−ヘキサンなどは好適である。 As the solvent, hydrocarbons (benzene, toluene, xylene, n-hexane, etc.), ethers (diethyl ether, glyme, diglyme, tetrahydrofuran, etc.), dimethylformamide, etc. are used singly or as a mixture. Toluene, dimethylformamide, tetrahydrofuran, n-hexane and the like are suitable.
(第二工程)
第二工程では前記の様な溶媒中、アルカリ金属
化されたオキシフエニル酢酸化合物に二酸化炭素
を作用させてオキシフエニルマロン酸塩(2)を製造
する。(Second Step) In the second step, oxyphenyl malonate (2) is produced by allowing carbon dioxide to act on the alkali metalated oxyphenyl acetic acid compound in the above-mentioned solvent.
反応液中に二酸化炭素を導入するには、直接二
酸化炭素ガスを導入してもよいが、ドライアイス
を用いるのも簡便である。 To introduce carbon dioxide into the reaction solution, carbon dioxide gas may be directly introduced, but it is also convenient to use dry ice.
(第三工程)
第三工程では前工程で得たオキシフエニルマロ
ン酸塩(2)に酸を作用させてオキシフエニルマロン
酸半エステル(3)を製造する。(Third Step) In the third step, the oxyphenyl malonic acid salt (2) obtained in the previous step is reacted with an acid to produce the oxyphenyl malonic acid half ester (3).
酸としては、塩酸、硫酸など、カルボン酸塩の
遊離化に通常用いられる酸を利用しうる。 As the acid, acids commonly used for liberating carboxylic acid salts, such as hydrochloric acid and sulfuric acid, can be used.
[発明の利点]
この発明には原料が入手し易い点、発火の危険
が少ない点、反応温度が比較的高い点、安全な溶
媒を使える点、反応時間が短い点、操作が簡便な
点、収率が高い点など多数の利点がある。[Advantages of the invention] This invention has the following points: raw materials are easily available, there is little risk of ignition, the reaction temperature is relatively high, a safe solvent can be used, the reaction time is short, the operation is simple, It has many advantages including high yield.
[生成物の用途]
本発明の製法により得られるオキシフエニルマ
ロン酸半エステル(3)は、例えば下式反応により工
業原料であるジエステル化合物(4)、他種エステル
化合物(5)、(6)などを製造するために利用できる。[Uses of the product] The oxyphenyl malonic acid half ester (3) obtained by the production method of the present invention can be used, for example, to produce diester compounds (4), other types of ester compounds (5), (6), which are industrial raw materials, by the following reaction. ), etc.
(式中、R3は5−インダニル基などR1より除去
しにくいエステル基である)
以下、実施例により本発明の態様を説明する。 (In the formula, R3 is an ester group such as a 5-indanyl group that is more difficult to remove than R1 .) Hereinafter, embodiments of the present invention will be explained with reference to Examples.
参考例 1
ヘキサアルキルジシラザンナトリウムの製造
無水トルエン50mlに、ヘキサメチルジシラザン
(以下HMDSと略す)10.5ml(50.36ミリモル)お
よびナトリウムアミド2.5gを加え、窒素気流下
で3時間加熱還流する。冷後、濾過すると、
HMDS−アルカリ金属塩のトルエン溶液(以下、
HMDS−Na溶液と略す)を、淡黄色透明の液体
として得る。Reference Example 1 Production of sodium hexaalkyldisilazane 10.5 ml (50.36 mmol) of hexamethyldisilazane (hereinafter abbreviated as HMDS) and 2.5 g of sodium amide are added to 50 ml of anhydrous toluene, and the mixture is heated under reflux for 3 hours under a nitrogen stream. After cooling, filter it.
HMDS - toluene solution of alkali metal salt (hereinafter referred to as
HMDS-Na solution) is obtained as a pale yellow transparent liquid.
実施例 1
p−(p−メトキシベンジルオキシ)フエニル
マロン酸p−メトキシベンジルエステルの製造
参考例1で得たHMDS−Naのトルエン溶液10
mlに、窒素気流下、氷冷下に、p−(p−メトキ
シベンジルオキシ)フエニル酢酸p−メトキシベ
ンジルエステル1.57g(4ミリモル)を無水トル
エン12mlに溶かした溶液を滴下し、室温で35分撹
拌した後、再び氷冷する。これに大過剰のドライ
アイスを徐々に加え、20分間撹拌し、ついで飽和
炭酸水素ナトリウム水溶液を加え、氷冷下で激し
く撹拌した後、濾過する。沈殿を、トルエン10ml
ずつで3回、更に水15mlずつで3回洗浄後、氷冷
撹拌下に1N−塩酸40mlと酢酸エチル120mlで溶解
する。有機層を分取し、水20mlずつで3回洗う。
また水層は更に酢酸エチル20mlで抽出し、洗浄
後、先の有機層と合わせる。有機層を硫酸ナトリ
ウム20gで乾燥し、減圧下で溶媒を留去すると、
結晶性残渣1.62gを得る。これを、エーテル−石
油エーテル(3:2)15mlから再結晶し、洗浄す
ると、mp128〜130℃の目的化合物1.549g(収率
88.7%)を得る。また、母液からは、mp121〜
123℃の目的化合物0.021g(収率1.20%)を得
る。Example 1 Production of p-(p-methoxybenzyloxy)phenylmalonic acid p-methoxybenzyl ester Toluene solution of HMDS-Na obtained in Reference Example 1 10
A solution of 1.57 g (4 mmol) of p-(p-methoxybenzyloxy)phenyl acetic acid p-methoxybenzyl ester dissolved in 12 ml of anhydrous toluene was added dropwise to the solution of 1.57 g (4 mmol) of p-methoxybenzyl ester (p-(p-methoxybenzyloxy) phenyl acetate) dissolved in 12 ml of anhydrous toluene under a nitrogen atmosphere and ice-cooled, and the solution was stirred at room temperature for 35 minutes. After stirring, cool on ice again. Gradually add a large excess of dry ice to this, stir for 20 minutes, then add a saturated aqueous sodium bicarbonate solution, stir vigorously under ice cooling, and then filter. Add the precipitate to 10 ml of toluene.
After washing 3 times with 15 ml of water and 3 times with 15 ml of water, dissolve in 40 ml of 1N hydrochloric acid and 120 ml of ethyl acetate while stirring on ice. Separate the organic layer and wash three times with 20 ml of water each.
The aqueous layer is further extracted with 20 ml of ethyl acetate, washed, and combined with the organic layer. The organic layer was dried with 20 g of sodium sulfate, and the solvent was distilled off under reduced pressure.
1.62 g of crystalline residue are obtained. This was recrystallized from 15 ml of ether-petroleum ether (3:2) and washed to give 1.549 g of the target compound (yield: mp 128-130°C).
88.7%). In addition, from the mother liquor, mp121~
Obtain 0.021 g (yield 1.20%) of the target compound at 123°C.
総収量:1.57g(収率89.9%)
IR:νmax(KBr) 3260、1740、1612、1585、
1511、1250、1168cm-1
NMR:δppm(d6−アセトン) 3.78s6H、
4.75s1H、5.05s2H、5.15s2H
実施例 2
p−テトラヒドロピラニルオキシフエニルマロ
ン酸P−メトキシベンジルエステルの製造
p−ヒドロキシフエニル酢酸メチルエステル
3.32g(20ミリモル)およびジヒドロピラン5.5
ml(3.0当量)をトルエン2.5mlに溶かし、p−ト
ルエンスルホン酸・H2O1mgを加え、室温で1.5時
間撹拌する。これに、4.1Nナトリウムメトキシ
ド/メタノール0.3mlとアニスアルコール3.0mlの
トルエン30ml溶液を加え、塩化カルシウム管を取
り付けて、20分間加熱還流する。冷却後、これを
HMDS−Na溶液(2.23モル当量)に10℃で5分
間を要して滴加し、20℃で40分間撹拌する。反応
液を−60℃以下に冷却してドライアイス20gを加
え、同温で10分間、ついで0℃で15分間撹拌し、
水を加え、析出した結晶を濾取し、水40mlついで
トルエン4mlで洗う。濾液を有機層および水層に
分け、有機層を炭酸水素ナトリウム水溶液で振
る。水層を先の水層と合わせてトルエンで洗い、
先の結晶と合わせ、酢酸エチルおよびリン酸を加
えてPH3〜4に調整する。水層を分取し、酢酸エ
チルで洗う。洗液と抽出液を合し、水、ついで飽
和炭酸ナトリウム水溶液で洗浄後、四塩化炭素−
酢酸エチルから結晶化すると目的化合物を得る。Total yield: 1.57g (yield 89.9%) IR: νmax (KBr) 3260, 1740, 1612, 1585,
1511, 1250, 1168 cm -1 NMR: δppm (d 6 -acetone) 3.78s6H,
4.75s1H, 5.05s2H, 5.15s2H Example 2 Production of p-tetrahydropyranyloxyphenylmalonic acid P-methoxybenzyl ester p-hydroxyphenylacetic acid methyl ester
3.32 g (20 mmol) and dihydropyran 5.5
ml (3.0 equivalents) was dissolved in 2.5 ml of toluene, 1 mg of p-toluenesulfonic acid/H 2 O was added, and the mixture was stirred at room temperature for 1.5 hours. To this, add 30 ml of toluene solution of 0.3 ml of 4.1N sodium methoxide/methanol and 3.0 ml of anise alcohol, attach a calcium chloride tube, and heat under reflux for 20 minutes. After cooling, add this
Add dropwise to HMDS-Na solution (2.23 molar equivalents) at 10°C over 5 minutes and stir at 20°C for 40 minutes. The reaction solution was cooled to below -60°C, 20g of dry ice was added, and stirred at the same temperature for 10 minutes, then at 0°C for 15 minutes,
Add water, collect the precipitated crystals by filtration, and wash with 40 ml of water and then 4 ml of toluene. The filtrate is separated into an organic layer and an aqueous layer, and the organic layer is shaken with an aqueous sodium bicarbonate solution. Combine the water layer with the previous water layer and wash with toluene.
Combine with the previous crystals and add ethyl acetate and phosphoric acid to adjust the pH to 3-4. Separate the aqueous layer and wash with ethyl acetate. The washing liquid and the extract were combined, washed with water and then with a saturated aqueous sodium carbonate solution, and then washed with carbon tetrachloride.
Crystallization from ethyl acetate gives the desired compound.
第一結晶:5.65g(70.6%)mp115〜118℃
第二結晶:0.80g(10.0%)mp115〜118℃
TLC:Rf=0.68(展開溶媒:n−ヘプタン−酢酸
エチル−酢酸(15:15:1);I2で発色)。First crystal: 5.65g (70.6%) mp115-118℃ Second crystal: 0.80g (10.0%) mp115-118℃ TLC: Rf = 0.68 (Developing solvent: n-heptane-ethyl acetate-acetic acid (15:15: 1); Colored with I2 ).
NMR:δppm(CD3SOCD3) 2.5〜2.0m9H、
3.70s3H、4.70s1H、5.03s2H、5.46brs1H、6.6
−7.3m.
参考例 2
p−(p−メトキシベンジルオキシ)フエニル
マロン酸4−メトキシベンジル5−インダニル
エステルの製造
実施例1で得たp−(p−メトキシベンジルオ
キシ)フエニルマロン酸p−メトキシベンジルエ
ステル1.5g(3.44ミリモル)を塩化メチレン10
mlに懸濁し、窒素気流中、撹拌下に、−15℃でト
リエチルアミン0.48ml(3.44ミリモル)およびオ
キサリルクロリド0.29ml(3.44ミリモル)を加
え、同温で20分、更に0℃で10分間撹拌すると、
対応する酸クロリド溶液を得る。NMR: δppm ( CD3SOCD3 ) 2.5~ 2.0m9H ,
3.70s3H, 4.70s1H, 5.03s2H, 5.46brs1H, 6.6
-7.3m. Reference Example 2 Production of 4-methoxybenzyl 5-indanyl p-(p-methoxybenzyloxy)phenylmalonate ester p-methoxybenzyl p-(p-methoxybenzyloxy)phenylmalonate obtained in Example 1 1.5 g (3.44 mmol) of ester in methylene chloride 10
ml, add 0.48 ml (3.44 mmol) of triethylamine and 0.29 ml (3.44 mmol) of oxalyl chloride at -15°C under stirring in a nitrogen stream, and stir at the same temperature for 20 minutes and then at 0°C for 10 minutes. ,
Obtain the corresponding acid chloride solution.
5−ヒドロキシインダン415mg(3.10ミリモル)
を塩化メチレン10mlに溶かし、窒素気流中、撹拌
下に、0℃でピリジン0.25ml(3.10ミリモル)、
ついで上記酸クロリド溶液を加え、1時間撹拌し
た後、酢酸エチルで抽出する。抽出液を2N−塩
酸、水、5%炭酸水素ナトリウム水溶液および水
で順次洗浄し、硫酸ナトリウムで乾燥した後減圧
下で濃縮する。残渣を10%含水シリカゲルのカラ
ムクロマトグラフイーに付し、ベンゼンで溶出し
た後、n−ヘキサンで洗浄すると、目的化合物
950mg(収率50%)を得る。 5-hydroxyindan 415 mg (3.10 mmol)
was dissolved in 10 ml of methylene chloride, and 0.25 ml (3.10 mmol) of pyridine was dissolved at 0°C under stirring in a nitrogen stream.
Then, the above acid chloride solution was added, stirred for 1 hour, and then extracted with ethyl acetate. The extract is washed successively with 2N hydrochloric acid, water, 5% aqueous sodium bicarbonate solution, and water, dried over sodium sulfate, and concentrated under reduced pressure. The residue was subjected to column chromatography on 10% hydrous silica gel, eluted with benzene, and then washed with n-hexane to obtain the target compound.
Obtain 950 mg (50% yield).
mp106〜107℃。mp106~107℃.
NMR:δppm(CDCl3) 2.07m2H、2.80t(6Hz)
4H、3.72s3H、4.75s1H、4.90s2H、5.10s2H
参考例 3
p−ヒドロキシフエニルマロン酸5−インダニ
ルエステルの製造
参考例2で得たp−(p−メトキシベンジルオ
キシ)フエニルマロン酸p−メトキシベンジル5
−インダニルエステル4.41gを無水塩化メチレン
90mlに溶かし、窒素気流中、0℃でアニソール9
mlおよびトリフルオロ酢酸9mlを加え、同温で40
分間撹拌した後、減圧濃縮する。残渣をn−ヘキ
サンから結晶化させ、n−ヘキサンで洗浄すると
目的化合物を定量的に得る。NMR: δppm (CDCl 3 ) 2.07m2H, 2.80t (6Hz)
4H, 3.72s3H, 4.75s1H, 4.90s2H, 5.10s2H Reference Example 3 Production of p-hydroxyphenylmalonic acid 5-indanyl ester p-(p-methoxybenzyloxy)phenylmalonic acid p-methoxy obtained in Reference Example 2 benzyl 5
-4.41 g of indanyl ester in anhydrous methylene chloride
Dissolve in 90 ml of anisole 9 at 0°C in a nitrogen stream.
ml and 9 ml of trifluoroacetic acid and stirred at the same temperature for 40 min.
After stirring for a minute, concentrate under reduced pressure. The residue is crystallized from n-hexane and washed with n-hexane to quantitatively obtain the target compound.
IR:νmax(KBr) 3425、1750、1700cm-1
NMR(CD2OD)δ:2.00m2H、2.80t(6Hz)
4H、4.82s1H、6.63〜7.43(m、7H)IR: νmax (KBr) 3425, 1750, 1700cm -1 NMR (CD 2 OD) δ: 2.00m2H, 2.80t (6Hz)
4H, 4.82s1H, 6.63~7.43 (m, 7H)
Claims (1)
ピラニル基、 R1はp−メトキシベンジル基、 Zはアルカリ金属原子をそれぞれ示す) で表わされるオキシフエニル酢酸化合物に二酸化
炭素を作用させたのち、中和することを特徴とす
る一般式: (式中、XとR1は前記と同意義) で示されるオキシフエニルマロン酸半エステルの
製造方法。 2 一般式: (式中、 Xはp−メトキシベンジルまたはテトラヒドロ
ピラニル基、 R1はp−メトキシベンジル基、 Zはアルカリ金属原子をそれぞれ示す) で表わされるオキシフエニル酢酸化合物を一般
式: (式中、 XとR1は前記と同意義を示す) で表わされるオキシフエニル酢酸化合物にヘキサ
アルキルジシラザンのアルカリ金属塩を作用させ
て製造する特許請求の範囲1の製造方法。[Claims] 1. General formula: (In the formula, X is a p-methoxybenzyl or tetrahydropyranyl group, R1 is a p-methoxybenzyl group, and Z is an alkali metal atom.) General formulas characterized by summing: (In the formula, X and R 1 have the same meanings as above.) A method for producing an oxyphenyl malonic acid half ester. 2 General formula: (In the formula, X represents a p-methoxybenzyl or tetrahydropyranyl group, R1 represents a p-methoxybenzyl group, and Z represents an alkali metal atom.) The oxyphenylacetic acid compound represented by the general formula: The manufacturing method according to claim 1, which is produced by reacting an alkali metal salt of hexaalkyldisilazane with an oxyphenyl acetic acid compound represented by the formula (wherein, X and R 1 have the same meanings as defined above).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1339586A JPS61165351A (en) | 1986-01-23 | 1986-01-23 | Production of oxyphenylmalonic half ester |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1339586A JPS61165351A (en) | 1986-01-23 | 1986-01-23 | Production of oxyphenylmalonic half ester |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61165351A JPS61165351A (en) | 1986-07-26 |
| JPS6310143B2 true JPS6310143B2 (en) | 1988-03-04 |
Family
ID=11831924
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1339586A Granted JPS61165351A (en) | 1986-01-23 | 1986-01-23 | Production of oxyphenylmalonic half ester |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61165351A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102229531B (en) * | 2011-05-09 | 2013-04-17 | 山东睿鹰先锋制药有限公司 | Preparation method of p-hydroxy benzal propane diacid derivative |
| CN112299966A (en) * | 2020-10-22 | 2021-02-02 | 山西海泰电子材料有限公司 | Synthesis method of latamoxef acid side chain |
| CN113372316A (en) * | 2021-07-07 | 2021-09-10 | 山西千岫制药有限公司 | Preparation method of latamoxef 7-site side chain |
-
1986
- 1986-01-23 JP JP1339586A patent/JPS61165351A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61165351A (en) | 1986-07-26 |
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