JPS631220Y2 - - Google Patents
Info
- Publication number
- JPS631220Y2 JPS631220Y2 JP11216880U JP11216880U JPS631220Y2 JP S631220 Y2 JPS631220 Y2 JP S631220Y2 JP 11216880 U JP11216880 U JP 11216880U JP 11216880 U JP11216880 U JP 11216880U JP S631220 Y2 JPS631220 Y2 JP S631220Y2
- Authority
- JP
- Japan
- Prior art keywords
- light
- incident
- wavelength
- order diffracted
- slits
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000003287 optical effect Effects 0.000 claims description 16
- 230000003595 spectral effect Effects 0.000 claims description 5
- 238000006243 chemical reaction Methods 0.000 claims description 3
- 102100027340 Slit homolog 2 protein Human genes 0.000 description 8
- 101710133576 Slit homolog 2 protein Proteins 0.000 description 8
- 102100025490 Slit homolog 1 protein Human genes 0.000 description 7
- 101710123186 Slit homolog 1 protein Proteins 0.000 description 7
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 7
- 229910052721 tungsten Inorganic materials 0.000 description 7
- 239000010937 tungsten Substances 0.000 description 7
- 238000002798 spectrophotometry method Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 2
- 238000001514 detection method Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000004811 liquid chromatography Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
Landscapes
- Spectrometry And Color Measurement (AREA)
Description
【考案の詳細な説明】
本考案は短時間の分光測定が可能な分光光度計
に関する。[Detailed Description of the Invention] The present invention relates to a spectrophotometer capable of short-time spectroscopic measurements.
液体クロマトグラフイにおける検出装置として
分光分析装置を用いクロマトグラフピークについ
て経時的な分析を行う場合一回の分析動作の時間
は数秒以下であることが要求されるので波長走査
式分光装置のような機械的運動部分を有する装置
では分析困難である。このため機械的運動部分を
持たない分光装置としてフオトダイオードアレー
のような少くとも一次元的な分解能を持つ光電変
換素子上にスペクトル像を形成させて電気的な走
査により分光測定を行うようにした装置が考えら
れる。こゝで分散素子として回折格子を用いる場
合光電変換素子上のスペクトル像は一次回折光、
二次回折光等が一部重なつて来るため分光測定可
能な波長範囲が大へん狭くなる。 When using a spectrometer as a detection device in liquid chromatography to analyze chromatographic peaks over time, the time for one analysis operation is required to be several seconds or less, so a spectrometer such as a wavelength scanning spectrometer is used. Analysis is difficult with devices that have mechanically moving parts. For this reason, a spectroscopic device that does not have mechanically moving parts forms a spectral image on a photoelectric conversion element that has at least one-dimensional resolution, such as a photodiode array, and performs spectroscopic measurements by electrical scanning. A device can be considered. When using a diffraction grating as a dispersive element, the spectral image on the photoelectric conversion element is first-order diffracted light,
Since the second-order diffracted light and the like partially overlap, the wavelength range that can be spectrally measured becomes very narrow.
そこで本考案は上述したフオトダイオードアレ
ーを用いた分光装置で回折格子によるスペクトル
像の一次回折光と二次回折光との重なりを除去し
て広い範囲の分光測定を可能にした分光装置を提
供することを目的としてなされた。 Therefore, the present invention provides a spectroscopic device using the photodiode array described above, which eliminates the overlap between the first-order diffracted light and the second-order diffracted light of the spectral image produced by the diffraction grating, thereby making it possible to perform spectroscopic measurements over a wide range. It was made for the purpose of
まず簡単な例によつて本考案の考え方を説明す
る。第1図でGは平面回折格子でその法線Nに対
し−θの傾きで平行光束を入射させると+θの方
向に正反射光即ち0次回折光が向う。この0次回
折光と入射光との間の方向に回折する光を考え
る。回折光の法線Nとのなす角をφとする。φは
Nの右側を正とする。この回折光の波長λは、
nλ=d(sinθ−sinφ)
dは格子定数、nは回折の次数である。この波長
とφとの関係を図示すると第2図実線のようにな
つている。入射光の入射方向を反対にして法線N
に対し+θの傾きで入射させたとき(原理上+θ
でなくてもよい。法線Nに対し−θの反対側であ
ればよい)の回折光の波長と回折角φとの関係は
上述と同様にして図示すれば第2図において点線
で示すように同実線のカーブを左右反転した形に
なる。こゝで入射光の短波長側の限界をλ0とす
る。そうすると−θ方向からの入射光の回折角b
からaの範囲の回折光は一次回折光のみで、二次
回折光が含まれていない。従つて回折角b〜aの
範囲第1図で横線Pの範囲にフオトダイオードア
レーのような一次元的分解能を有する測光素子を
配置すると、このアレー素子は一次回折光の波長
λ0からdsinθを超えた付近までの範囲を測光でき
る。次に光の入射方向を変えて+θの方向から入
射させるとアレー素子Pに入射する光は一次回折
光の波長dsinθ付近からλaの範囲と二次回折光の
λ0乃至λ′(λ′>λ)の範囲の光である。そこで波
長dsinθより短波長の光を入射光側でフイルタで
除去すればアレー素子には一次回折光のみが入射
し、波長dsinθからλaの範囲を測光でき、入射光
を−θと+θの二つに切換えることにより、λ0か
らλaの波長差約2λoの範囲を2操作で分光測光で
き、波長走査を行わずアレー素子上に形成されて
いるスペクトルを一度に測光できるので分光分析
の所要時間が大へん短縮できることになる。こゝ
でaの位置は第2図から判るように+θの位置ま
で持つて行くことができる。第1図で云えばPの
右端を点線のように0次回折光の位置まで延長で
きる。 First, the concept of the present invention will be explained using a simple example. In FIG. 1, G is a flat diffraction grating, and when a parallel light beam is incident at an angle of −θ with respect to the normal N thereof, specularly reflected light, that is, 0th-order diffraction light, is directed in the direction of +θ. Consider light diffracted in a direction between this 0th order diffracted light and the incident light. Let the angle between the diffracted light and the normal N be φ. φ assumes that the right side of N is positive. The wavelength λ of this diffracted light is nλ=d(sinθ−sinφ) where d is a lattice constant and n is the order of diffraction. The relationship between this wavelength and φ is illustrated as a solid line in FIG. 2. Normal N with the direction of incidence of the incident light reversed
When the incident angle is +θ (in principle, +θ
It doesn't have to be. The relationship between the wavelength of the diffracted light and the diffraction angle φ (which only needs to be on the opposite side of −θ with respect to the normal N) can be illustrated in the same way as described above. The shape will be flipped horizontally. Here, let λ 0 be the limit on the short wavelength side of the incident light. Then, the diffraction angle b of the incident light from the -θ direction is
The diffracted light in the range from a to a is only the first-order diffracted light and does not include the second-order diffracted light. Therefore, if a photometric element with a one-dimensional resolution such as a photodiode array is placed in the range of the horizontal line P in the range of diffraction angles b to a in Fig. It is possible to measure light up to the vicinity beyond the limit. Next, when the incident direction of the light is changed and the light is made incident from the +θ direction, the light incident on the array element P ranges from the wavelength of the first-order diffracted light around dsinθ to λa and the wavelength of the second-order diffracted light from λ 0 to λ′ (λ′>λ ) is the range of light. Therefore, if the light with a wavelength shorter than the wavelength dsinθ is removed by a filter on the incident light side, only the first-order diffracted light will be incident on the array element, and the range of wavelengths from dsinθ to λa can be photometered, and the incident light can be divided into -θ and +θ. By switching to , it is possible to perform spectrophotometry in the range of approximately 2λo wavelength difference from λ 0 to λa in two operations, and the spectrum formed on the array element can be measured at once without wavelength scanning, reducing the time required for spectroscopic analysis. This will shorten the time considerably. Here, the position of a can be brought up to the +θ position as seen from FIG. In Fig. 1, the right end of P can be extended to the position of the 0th order diffracted light as shown by the dotted line.
或は第1図でフオトダイオードアレーをその中
心を法線N上に置いて設け、−θから入射する光
に対してハイパスフイルタを用いて短波長域の二
次回折光を測光するようにし、+θから入射する
光に対してローパスフイルタを用いて長波長域の
一次回折光を測光するようにしてもよい。即ち第
2図で±aの範囲にわたるフオトダイオードアレ
ーを用い、−θからの入射光の回折光(実線で示
される)からハイパスフイルターでλ′以上の波長
の光を除いておくとλ0からλ′までの範囲が二次回
折光により分光測光され、+θからの入射光に関
してローパスフイルタでλ′以上の波長の光を入射
させると点線で示される一次回折光のみが受光さ
れλ0からdsinθ+λ0の範囲が分光測光される。 Alternatively, as shown in Fig. 1, a photodiode array is placed with its center on the normal line N, and a high-pass filter is used to measure the second-order diffracted light in the short wavelength range for light incident from -θ. Alternatively, a low-pass filter may be used for the light incident from the source to photometer the first-order diffracted light in the long wavelength range. In other words, in Figure 2, if we use a photodiode array covering the range of ±a and use a high-pass filter to remove light with wavelengths longer than λ' from the diffracted light of the incident light from -θ (shown by the solid line), we can obtain from λ0 to The range up to λ' is spectrophotometered using second-order diffracted light, and when light with a wavelength of λ' or more is input through a low-pass filter for the incident light from +θ, only the first-order diffracted light shown by the dotted line is received, and from λ 0 to dsinθ+λ 0 range is spectrophotometrically measured.
以下実施例によつて本考案を説明する。第3図
に本考案の一実施例を示す。3は凹面回折格子で
格子定数は600本/mmであり、Rはローランド円
で直径150mmである。格子3の中心に立てた法線
Nの両側に角度10.37゜距てゝローランド円上に入
射スリツト1,2を配置し、ローランド円上で法
線Nとの交点付近にスリツト1の方に寄せてフオ
トダイオードアレー4を設置する。この場合同ア
レーの必要長は18mmで波長200nmから800nmまで
をカバーできる。5は光源、6は凹面ミラーであ
り、7は試料セルで、光源5の光はミラー6で試
料セルに収束し、試料セル7を透過した光は凹面
ミラー8で平行光束となり、この光束中に光束と
45の傾きでセクターミラー9が配置してあり、セ
クターミラー9に関して互に対称位置に凹面ミラ
ー10,11が配置されミラー8で反射された上
記平行光束はセクターミラー9を透過してミラー
10に入射し或はセクターミラー9で反射されて
ミラー11に入射する。ミラー10,11は入射
光をスリツト1或は2上に収束する。かくしてス
リツト1及び2には時分割的に交互に試料セル7
を透過した光が入射する。スリツト1の前面には
フイルタ12が配置される。このスリツトは
400nmより短波長の光をカツトするローパスフイ
ルタである。フオトダイオードアレー4上にはス
リツト1から入射する光による400nm乃至800nm
の一次回折光と200nm乃至400nmの二次回折光が
入射するようになつている。光源の光は200nmよ
り短波長の光を含まない。こゝでフイルタ12が
あるため実際には200nm乃至400nmの二次回折光
はなく、400nmから800nmの一次回折光だけがフ
オトダイオードアレー4上に投射される。またス
リツト2から入射した光は200nmから400nmまで
の一次回折光だけが入射している。かくしてスリ
ツト1,2に交互に光を入射させることにより、
フオトダイオードアレー4は波長200nmから
800nmまでを分光測光することができる。 The present invention will be explained below with reference to Examples. FIG. 3 shows an embodiment of the present invention. 3 is a concave diffraction grating with a grating constant of 600 lines/mm, and R is a Rowland circle with a diameter of 150 mm. Input slits 1 and 2 are placed on the Rowland circle at an angle of 10.37 degrees on both sides of the normal N set at the center of the grid 3, and the slits 1 and 2 are placed near the intersection with the normal N on the Rowland circle. and install photodiode array 4. In this case, the required length of the array is 18 mm and can cover wavelengths from 200 nm to 800 nm. 5 is a light source, 6 is a concave mirror, 7 is a sample cell, the light from the light source 5 is converged on the sample cell by the mirror 6, the light transmitted through the sample cell 7 becomes a parallel light beam by the concave mirror 8, and in this light beam, with luminous flux
A sector mirror 9 is arranged at an angle of 45, concave mirrors 10 and 11 are arranged symmetrically with respect to the sector mirror 9, and the parallel light beam reflected by the mirror 8 passes through the sector mirror 9 and reaches the mirror 10. The light enters or is reflected by the sector mirror 9 and enters the mirror 11. Mirrors 10 and 11 focus the incident light onto slit 1 or 2. Thus, the sample cells 7 are placed alternately in the slits 1 and 2 in a time-division manner.
The light that has passed through is incident. A filter 12 is arranged in front of the slit 1. This slit is
This is a low-pass filter that cuts out light with wavelengths shorter than 400nm. The photodiode array 4 has a wavelength of 400nm to 800nm due to the light incident from the slit 1.
The first-order diffracted light and the second-order diffracted light of 200 nm to 400 nm are made incident. The light from the light source does not include light with wavelengths shorter than 200 nm. Here, because of the filter 12, there is actually no second-order diffracted light from 200 nm to 400 nm, and only first-order diffracted light from 400 nm to 800 nm is projected onto the photodiode array 4. Furthermore, the light incident from the slit 2 includes only the first-order diffracted light from 200 nm to 400 nm. In this way, by making the light enter the slits 1 and 2 alternately,
Photodiode array 4 starts from wavelength 200nm
Capable of spectrophotometry up to 800nm.
この実施例でフオトダイオードアレー3をスリ
ツト1,2の丁度中間に置き、スリツト1の前面
にハイパスフイルタをスリツト2の前面にローパ
スフイルタを置いてもよい。またフオトダイオー
ドアレーを法線Nに関し非対称に配置する代りに
スリツト1,2を法線Nに関し非対称にし、一方
のスリツトにのみローパスフイルタを用いるよう
にしてもよい。 In this embodiment, the photodiode array 3 may be placed exactly between slits 1 and 2, and a high pass filter may be placed in front of slit 1 and a low pass filter may be placed in front of slit 2. Furthermore, instead of arranging the photodiode array asymmetrically with respect to the normal line N, the slits 1 and 2 may be made asymmetrically with respect to the normal line N, and a low-pass filter may be used only in one of the slits.
第4図は本考案の他の実施例装置を示す。この
実施例は二光束分光測光に本考案を適用した例で
ある。5,5′は光源で二つあるのは一方5がD2
ランプで短波長域の光を出し、5′はタングステ
ンランプで長波長範囲を受持つ。タングステンラ
ンプ5′の前にはローパスフイルタ12′を置いて
D2ランプと波長域が重ならないようにしてある。
13はセクターミラーで両面鏡になつており、
D2ランプ5の光を光路Aに送り、タングステン
ランプ5′の光を光路Bに送るモードとD2ランプ
の光を光路Bに、タングステンランプの光を光路
Aに送るモードとが交互に繰返される。2光束
A,B上で14は試料セル、14′は対照セルで
ある。2光束A,Bはセクターミラー9′によつ
てスリツト1,2に送られる。セクターミラー
9′は13と同期しており、A光路に一方のラン
プ5の光が乗つており、B光路に他方のランプ
5′の光が乗つているセクターミラー13の一モ
ードの間にA光路の光をまずスリツト1に送り次
にB光路の光をスリツト2に送るモード、セクタ
ーミラー13の他の一つのモードにおいてA光路
の光をまずスリツト2にまた次にB光路の光をス
リツト1に送るモードの2モードが交代する。こ
れを図で示すと第5図のようになる。即ちセクタ
ーミラー13の第1モードでD2ランプの光がA
光路にタングステンランプの光がB光路に乗つて
いるとき、(1)セクターミラー9′はまずA光路即
ちD2ランプの短波長域の光をスリツト2に送り、
次に(2)B光路の長波長域のタングステンランプの
光をスリツト1に送る。スリツト2から入つた光
の一次回折光は短波長域であり、次にスリツト1
から入つた光の一次回折光は長波長域になつてい
る。セクターミラー13の第2のモードではまず
(1)′A光路のタングステンランプの光が第1スリ
ツトに入つて長波長域の一次回折光が測定され、
次に(2)′B光路のD2ランプの光が第2スリツトに
入つて短波長域の一次回折光が測定される。この
ようにして試料セル、対照セル夫々に短波長域、
長波長域の透過光が測定される。 FIG. 4 shows another embodiment of the present invention. This embodiment is an example in which the present invention is applied to two-beam spectrophotometry. 5 and 5' are light sources, and one of the two is D 2
The lamp emits light in the short wavelength range, and the tungsten lamp 5' handles light in the long wavelength range. A low-pass filter 12' is placed in front of the tungsten lamp 5'.
The wavelength range is made so that it does not overlap with the D 2 lamp.
13 is a sector mirror, making it a double-sided mirror.
The mode in which the light from the D2 lamp 5 is sent to the optical path A and the light from the tungsten lamp 5' is sent to the optical path B, and the mode in which the light from the D2 lamp is sent to the optical path B and the light from the tungsten lamp to the optical path A are alternately repeated. It will be done. On the two beams A and B, 14 is a sample cell and 14' is a control cell. Two beams A and B are sent to slits 1 and 2 by a sector mirror 9'. The sector mirror 9' is synchronized with the sector mirror 13, and during one mode of the sector mirror 13 where the light from one lamp 5 is on the A optical path and the light from the other lamp 5' is on the B optical path, the A In the mode in which the light on the optical path is first sent to slit 1, and then the light on the B optical path is sent to slit 2, and in the other mode of the sector mirror 13, the light on the A optical path is first sent to slit 2, and then the light on the B optical path is sent to slit 2. The two modes, the one sent to the first one, are alternated. This is illustrated in FIG. 5. That is, in the first mode of the sector mirror 13, the light from the D2 lamp becomes A.
When the light from the tungsten lamp is on the B optical path, (1) the sector mirror 9' first sends the light in the short wavelength range from the A optical path, that is, the D2 lamp, to the slit 2;
Next, (2) the light from the tungsten lamp in the long wavelength region of optical path B is sent to slit 1; The first-order diffracted light of the light entering from slit 2 is in the short wavelength range, and then passes through slit 1.
The first-order diffracted light of the light that enters is in the long wavelength range. In the second mode of sector mirror 13, first
(1) The light from the tungsten lamp in optical path A enters the first slit, and the first-order diffracted light in the long wavelength range is measured.
Next, the light from the D2 lamp in the (2)'B optical path enters the second slit, and the first-order diffracted light in the short wavelength range is measured. In this way, the short wavelength region,
Transmitted light in the long wavelength range is measured.
本考案分光装置は上述したような構成で、一つ
のフオトダイオードアレーを使用するだけで回折
光の次数分離がなされ、波長走査を行わず、スペ
クトル像を同時的(フオトダイオードアレーの走
査時間の範囲で)に測定するので分光測光がきわ
めて短時間で出来る。 The spectrometer of the present invention has the above-mentioned configuration, and can perform order separation of diffracted light by using only one photodiode array, and can perform spectral images simultaneously (within the scanning time range of the photodiode array) without performing wavelength scanning. ), so spectrophotometry can be done in an extremely short time.
第1図は本考案の原理を説明する図、第2図は
回折角と波長の関係を示す図、第3図、第4図は
本考案の夫々異なる実施例装置の平面図、第5図
は第4図に示した実施例におけるセクターミラー
の動作モードを示す図である。
1,2……入射スリツト、3……回折格子、4
……フオトダイオードアレー、5……光源、7…
…試料セル、9……セクターミラー、12……フ
イルタ。
Fig. 1 is a diagram explaining the principle of the present invention, Fig. 2 is a diagram showing the relationship between the diffraction angle and wavelength, Figs. 3 and 4 are plan views of different embodiments of the device of the present invention, and Fig. 5 5 is a diagram showing the operation mode of the sector mirror in the embodiment shown in FIG. 4. FIG. 1, 2...Incidence slit, 3...Diffraction grating, 4
...Photodiode array, 5...Light source, 7...
...Sample cell, 9...Sector mirror, 12...Filter.
Claims (1)
に入射スリツトを設け、スペクトル像面に沿い上
記法線の延長上付近に一次元的分解能を有する光
電変換素子を配置し、上記両スリツトに交互に光
を入射させる光学系と、上記両スリツトのうち少
くとも一方に入射する光束中の短波長或は長波長
側成分を除去する手段を設けた分光装置。 Input slits are provided approximately symmetrically on both sides of the normal line erected at the center of the diffraction grating, and a photoelectric conversion element with one-dimensional resolution is placed near the extension of the normal line along the spectral image plane. A spectroscopic device comprising: an optical system for alternately making light incident on the slits; and means for removing short-wavelength or long-wavelength components of the light beam incident on at least one of the slits.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11216880U JPS631220Y2 (en) | 1980-08-06 | 1980-08-06 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11216880U JPS631220Y2 (en) | 1980-08-06 | 1980-08-06 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5735629U JPS5735629U (en) | 1982-02-25 |
| JPS631220Y2 true JPS631220Y2 (en) | 1988-01-13 |
Family
ID=29473233
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11216880U Expired JPS631220Y2 (en) | 1980-08-06 | 1980-08-06 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS631220Y2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6224076U (en) * | 1985-07-27 | 1987-02-13 |
-
1980
- 1980-08-06 JP JP11216880U patent/JPS631220Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5735629U (en) | 1982-02-25 |
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