JPS6314403Y2 - - Google Patents
Info
- Publication number
- JPS6314403Y2 JPS6314403Y2 JP17081079U JP17081079U JPS6314403Y2 JP S6314403 Y2 JPS6314403 Y2 JP S6314403Y2 JP 17081079 U JP17081079 U JP 17081079U JP 17081079 U JP17081079 U JP 17081079U JP S6314403 Y2 JPS6314403 Y2 JP S6314403Y2
- Authority
- JP
- Japan
- Prior art keywords
- protrusion
- flapper
- small
- damper
- electromagnet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000006243 chemical reaction Methods 0.000 description 11
- 238000006073 displacement reaction Methods 0.000 description 9
- 230000035939 shock Effects 0.000 description 4
- 238000005452 bending Methods 0.000 description 3
- 239000013013 elastic material Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000003139 buffering effect Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 241000219122 Cucurbita Species 0.000 description 1
- 235000009852 Cucurbita pepo Nutrition 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 230000000452 restraining effect Effects 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
Landscapes
- Electromagnets (AREA)
Description
【考案の詳細な説明】
この考案は作動時の衝撃音を減少させた支点型
電磁石のフラツパ機構に関するものである。[Detailed Description of the Invention] This invention relates to a flapper mechanism of a fulcrum type electromagnet that reduces impact noise during operation.
従来の支点型電磁石のフラツパ機構の衝撃吸収
構造の側面図を第1図、第2図に示す。第1図に
示す構造は支持部材9上に弾性体ダンパ2aを備
えたストツパ3a、電磁石4が固定されており、
支持部材9の立設材上に設けたヒンジ6にフラツ
パ1aが枢着され、フラツパ1aは電磁石4に吸
引されるようになつており、フラツパ1aと支持
部材9間には電磁石4の吸引力に抗する位置にば
ね7が抗設せられている。電磁石4の附勢により
フラツパ1aは吸引さればね7に抗してフラツパ
1aはダンパ2aと衝接するようになつている。
第2図に示す構造は第1図のフラツパ1aを除き
同構造であつて、フラツパ1bに突起5bを形成
し、突起5bとダンパ2bとが接触する接触面積
を小さくした構造である。しかし周知のように、
電磁石のアマチユア吸引力は両者の距離の2乗に
反比例し、印加電圧の2乗に比例することから、
第1図に示す構造では印加電圧が高い場合、衝撃
を吸収しきれず、衝撃音を発生する。 Side views of the shock absorbing structure of the flapper mechanism of a conventional fulcrum type electromagnet are shown in FIGS. 1 and 2. In the structure shown in FIG. 1, a stopper 3a equipped with an elastic damper 2a and an electromagnet 4 are fixed on a support member 9.
The flapper 1a is pivotally attached to a hinge 6 provided on the upright member of the support member 9, and the flapper 1a is attracted to the electromagnet 4, and the attraction force of the electromagnet 4 is applied between the flapper 1a and the support member 9. A spring 7 is provided at a position that resists. The flapper 1a is attracted by the energization of the electromagnet 4, and against the force of the spring 7, the flapper 1a collides with the damper 2a.
The structure shown in FIG. 2 is the same structure as shown in FIG. 1 except for the flapper 1a, and has a protrusion 5b formed on the flapper 1b to reduce the contact area between the protrusion 5b and the damper 2b. However, as is well known,
Since the armature attraction force of an electromagnet is inversely proportional to the square of the distance between the two, and proportional to the square of the applied voltage,
In the structure shown in FIG. 1, when the applied voltage is high, the shock cannot be absorbed completely and an impact sound is generated.
第2図に示す構造では小面積に力が集中し、ダ
ンパ2bに極部的に大きな歪を生ずるために耐久
性に難があつた。第2図に示す構造においてはダ
ンパ2bの厚さを増して衝撃エネルギーの分散吸
収を図ることができるが、印加電圧が変化した場
合、電磁石4の吸引力の変化に対してダンパ2b
を押圧して突起5bの変位が大きく、フラツパ1
bに一定の変位量が得られない。 In the structure shown in FIG. 2, the force is concentrated in a small area and a large strain is generated locally in the damper 2b, resulting in poor durability. In the structure shown in FIG. 2, the thickness of the damper 2b can be increased to disperse and absorb impact energy, but when the applied voltage changes, the damper 2b responds to changes in the attractive force of the electromagnet 4.
, the displacement of the protrusion 5b is large, and the flapper 1
A constant amount of displacement cannot be obtained in b.
この考案は印加電圧の変化にかゝわらずフラツ
パ吸引位置をほゞ一定にすると共に衝撃音の小さ
い支点型電磁石のフラツパ機構を提供することを
目的とする。 The object of this invention is to provide a flapper mechanism of a fulcrum type electromagnet that keeps the flapper suction position substantially constant regardless of changes in the applied voltage and produces less impact noise.
この考案はフラツパに少なくとも1つの複合突
起あるいは大小二箇の突起を形成し、突起が衝突
するストツパに弾性体ダンパを片持梁状もしくは
両端支持梁状に取り付け該突起と梁と衝接可能に
配することにより、電磁石とフラツパとの距離が
大きく吸引力が小さい時は小さな反力で、該距離
が小さく吸引力が大きい時は大きい面積に力を分
散して衝撃エネルギーを吸収すると共にほゞ一定
位置にアマチユアを制止するものである。 This idea involves forming at least one composite protrusion or two large and small protrusions on the flapper, and attaching an elastic damper in the form of a cantilever beam or a beam supported at both ends to the stopper with which the protrusion collides, so that it can collide with the protrusion and the beam. By doing so, when the distance between the electromagnet and the flapper is large and the attractive force is small, the reaction force is small, and when the distance is small and the attractive force is large, the force is dispersed over a large area and the impact energy is absorbed and remains almost constant. This is to restrain amateurs in position.
以下この考案の実施例を図面に従つて説明す
る。 Examples of this invention will be described below with reference to the drawings.
第3図は側面図、第4図は第3図の正面図であ
る。 3 is a side view, and FIG. 4 is a front view of FIG. 3.
支持部材9にストツパ3c、電磁石4が固定さ
れており、支持部材9上の立設材上に備えるヒン
ジ6にアマチユア1c′が枢着されており、アマチ
ユア1c′と支持部材9間には電磁石4とアマチユ
ア1c′間の吸引力に抗する位置にばね7が張設せ
られている。即ち第3図においてフラツパ1cは
ヒンジ6を中心に時計方向に絶えず附勢されてい
て、図示されないが時計方向の回動を制限するス
トツパ又はばね7の収縮限度位置において第3図
の状態となつている。1cはアマチユア1c′と一
体形成されたフラツパで、先端が球面状の一対の
突起5c,5c′を備えており、突起5c′は突起5
cより高さが低く曲率半径が大きい形状に形成さ
れている。発泡シリコンゴム等の材質の弾性体の
二つのダンパ2c,2c′は、フラツパ1cの変位
量制限面3c′と間隙をおいてより高い位置に夫々
片持梁状に一つのブラケツト8cにて取り付けら
れている。この取付けダンパ2c,2c′を一体に
してその中間をブラケツト8cの溝に嵌入してい
るのであるがこれは他の方法により取付けてもよ
い。小突起5c、大突起5c′はそれぞれダンパ2
c,2c′と衝接する位置に固定されている。小突
起5c、大突起5c′の高さの差は次にのべる動作
を満足するように先端形状、寸法、ダンパ2c,
2c′の材質等と共に決められる。 A stopper 3c and an electromagnet 4 are fixed to the support member 9, an armature 1c' is pivotally attached to a hinge 6 provided on an upright member on the support member 9, and an electromagnet is installed between the armature 1c' and the support member 9. A spring 7 is tensioned at a position that resists the attractive force between the armature 4 and the armature 1c'. That is, in FIG. 3, the flapper 1c is constantly urged clockwise around the hinge 6, and is in the state shown in FIG. 3 at the contraction limit position of the stopper or spring 7, which limits clockwise rotation (not shown). ing. 1c is a flap formed integrally with the armature 1c', and is provided with a pair of protrusions 5c and 5c' each having a spherical tip.
It is formed in a shape that is lower in height and has a larger radius of curvature than c. Two dampers 2c and 2c' made of elastic material such as foamed silicone rubber are each mounted in a cantilevered manner with one bracket 8c at a higher position with a gap from the displacement limit surface 3c' of the flapper 1c. It is being The mounting dampers 2c, 2c' are integrated and the middle part thereof is fitted into the groove of the bracket 8c, but this may be mounted by other methods. The small protrusion 5c and the large protrusion 5c' are each damper 2.
It is fixed at a position where it collides with c and 2c'. The difference in height between the small protrusion 5c and the large protrusion 5c' is determined by the tip shape, dimensions, damper 2c,
It is determined together with the material of 2c'.
次にこの実施例の動作について説明する。電磁
石4に電圧が印加されると、アマチユア1c′は吸
引され一体形成されたフラツパ1cはヒンジ6を
中心に反時計方向に附勢され、ばね7のばね力に
抗してストツパ3cの方向に変位する。変位する
につれ、小突起5cがダンパ2cと接触し、ダン
パ2cを押し曲げ、曲げ応力の反力を受ける(第
5図)。次にダンパ2cと変位量制限面3c′とが
接し、小突起5cはダンパ2cを圧縮し、この反
力を受ける(第6図)。さらに大突起5c′が小突
起5cとの高さの差だけ遅れてダンパ2c′に接触
して同様の力を受け、これらの力とばね7のばね
力との和が電磁石4の吸引力と釣り合つた位置で
フラツパ1cは停止する(第7図)。 Next, the operation of this embodiment will be explained. When a voltage is applied to the electromagnet 4, the armature 1c' is attracted and the integrally formed flapper 1c is urged counterclockwise around the hinge 6, and moves in the direction of the stopper 3c against the spring force of the spring 7. Displace. As it is displaced, the small protrusion 5c comes into contact with the damper 2c, pushes and bends the damper 2c, and receives the reaction force of the bending stress (FIG. 5). Next, the damper 2c and the displacement limiting surface 3c' come into contact, and the small protrusion 5c compresses the damper 2c and receives this reaction force (FIG. 6). Further, the large protrusion 5c' contacts the damper 2c' with a delay of the height difference from the small protrusion 5c and receives a similar force, and the sum of these forces and the spring force of the spring 7 is the attractive force of the electromagnet 4. The flapper 1c stops at the balanced position (Fig. 7).
上記動作の過程において突起とダンパとの接触
面積は、はじめ、球面形状の小突起5cの頂点か
ら球面へと漸次的に増大し、且つ、大突起5c′が
小突起5cとの高さの差だけ遅れて段階的に且つ
漸次的に増大する。従つて第6図に示すような状
態、即ち小突起5cがダンパ2cを押し曲げてダ
ンパ2cを圧縮するまではフラツパ1cの変位量
の変化に比してフラツパ1cに抗するダンパ2c
の梁としての反力、弾性材としての反力の合計の
変化割合は小さく続く大突起5c′のダンパ2c′を
押し曲げ圧縮するときのフラツパ1cの変位量の
変化に対するダンパ2c′の梁ならびに弾性材とし
ての合計反力の変化割合は大きい。これを分けて
見ると小突起5cは衝撃を緩衝する作用が大き
く、大突起5c′は一定位置制止作用が大きい作用
をもつている。即ち電磁石4のアマチユア1c′間
の吸引力の増大よりも高次に抵抗が増大するので
フラツパ1cは次第に減速してほゞ一定位置に停
止する。従つて小突起5cとダンパ2c、大突起
5c′とダンパ2c′の順次的衝接の重なり量は電磁
石4のアマチユア1c′と電磁石4間の距離の2乗
に反比例する吸引力の変化よりも高次に変化する
ように小突起5c、大突起5c′の高さの差、形
状、寸法及びダンパ2c,2c′の材質、寸法並び
にこれらの関係寸法等は選ばれており更に印加電
圧の変化に対してより急速に抵抗力の増大するよ
う大突起5c′を定める必要がある。 In the process of the above operation, the contact area between the protrusion and the damper gradually increases from the apex of the spherical small protrusion 5c to the spherical surface, and the height difference between the large protrusion 5c' and the small protrusion 5c increases. increases step by step and gradually with a delay of . Therefore, until the small protrusion 5c presses and bends the damper 2c and compresses the damper 2c, the damper 2c resists the flapper 1c more than the change in the displacement of the flapper 1c.
The rate of change in the sum of the reaction force as a beam and the reaction force as an elastic material continues to be small, and the beam of the damper 2c' and As an elastic material, the rate of change in the total reaction force is large. If we look at them separately, the small protrusion 5c has a large impact buffering effect, and the large protrusion 5c' has a large function of stopping a certain position. That is, since the resistance increases to a higher degree than the increase in the attractive force between the armatures 1c' of the electromagnet 4, the flapper 1c gradually decelerates and stops at a substantially constant position. Therefore, the amount of overlap between the small protrusion 5c and the damper 2c and the large protrusion 5c' and the damper 2c' is greater than the change in the attractive force, which is inversely proportional to the square of the distance between the armature 1c' of the electromagnet 4 and the electromagnet 4. The height difference, shape, and dimensions of the small protrusion 5c and large protrusion 5c', as well as the materials and dimensions of the dampers 2c and 2c', and their related dimensions, etc., are selected so as to cause a change in the applied voltage. It is necessary to define the large protrusion 5c' so that the resistance force increases more rapidly.
次に他の実施例を第8図に示す。第8図は正面
図で側面の構造は前記実施例と同様であつて第3
図に示す部分と同一部分は同一符号にて示す。フ
ラツパ1dには球状の大突起5d′の先端に球状の
小突起5dが両突起をひようたん状に一体成形し
て設けてある。3dはストツパで、ダンパ2dは
フラツパの変位量制限面3d′と間隙をおいてより
高い位置にブラケツト8dにて両端支持梁状に取
り付けられている。フラツパ1dが電磁石4に吸
引され変位するにつれ、小突起5dがダンパ2d
と接触しダンパ2dを押し曲げ、曲げ応力の反力
を受ける(第9図)。つぎにダンパ2dと変位量
制限面3d′とが接し、小突起5d、大突起5d′は
それぞれダンパ2dを順次に続いて同時に圧縮し
この反力を受ける(第10図)。これらの力とば
ね7のばね力との和と電磁石4の吸引力とが釣り
合つた位置でフラツパ1dは停止する。 Next, another embodiment is shown in FIG. Figure 8 is a front view, and the side structure is the same as that of the third embodiment.
The same parts as those shown in the figures are indicated by the same reference numerals. The flapper 1d is provided with a small spherical projection 5d at the tip of a large spherical projection 5d' by integrally molding both projections into a gourd shape. 3d is a stopper, and the damper 2d is mounted in the form of a support beam at both ends by brackets 8d at a higher position with a gap from the flapper's displacement limit surface 3d'. As the flapper 1d is attracted by the electromagnet 4 and displaced, the small protrusion 5d moves against the damper 2d.
The damper 2d is pushed and bent by contact with the damper 2d, and receives the reaction force of the bending stress (Fig. 9). Next, the damper 2d and the displacement limiting surface 3d' come into contact, and the small protrusion 5d and the large protrusion 5d' sequentially and simultaneously compress the damper 2d, respectively, and receive this reaction force (FIG. 10). The flapper 1d stops at a position where the sum of these forces, the spring force of the spring 7, and the attractive force of the electromagnet 4 are balanced.
この実施例においても、小突起5dは衝撃を緩
衝する作用が大きく、大突起5d′は一定位置制止
作用が大きい作用を呈することは前記実施例と同
じである。 In this embodiment as well, the small protrusion 5d has a large impact buffering effect, and the large protrusion 5d' has a large fixed position restraining effect, as in the previous embodiment.
これらの実施例におけるダンパ2c,2c′,2
dの作用は梁としての曲げに反する反力、弾性体
としての変形に対する抗力を如何なる割合にする
かはダンパ2c,2c′,2dの材質、梁寸法、着
力点、小突起5c,5d、大突起5c′,5d′の寸
法等に依存するものであり、小突起5c,5d、
大突起5c′,5d′の先端形状に限られるものでな
く、例えば他の二次曲線回転面であつてもよい。 Dampers 2c, 2c', 2 in these embodiments
The action of d is the reaction force against bending as a beam, and the proportion of the resistance against deformation as an elastic body depends on the material of the dampers 2c, 2c', 2d, the beam dimensions, the point of application of force, the small protrusions 5c, 5d, and the size. It depends on the dimensions of the protrusions 5c', 5d', etc., and the small protrusions 5c, 5d,
The shapes of the tips of the large protrusions 5c' and 5d' are not limited, and may be other quadratic rotating surfaces, for example.
以上2つの実施例で述べたようにこの考案の支
点型電磁石のフラツパ機構によればフラツパと電
磁石との距離が大きい場合、すなわち電磁石の吸
引力が小さい場合は小突起が小さい反力を受け、
距離が小さい場合、すなわち吸引力が大きい場合
は小突起だけでなく、大突起も接触面積を大にし
て反力を受けて、衝撃を吸収する構造にしたので
(1) 衝撃吸収効果が高く振動、騒音がない。 As described in the above two embodiments, according to the flap mechanism of the fulcrum-type electromagnet of this invention, when the distance between the flap and the electromagnet is large, i.e., when the attractive force of the electromagnet is small, the small protrusion receives a small reaction force,
When the distance is small, i.e., when the suction force is large, not only the small protrusions but also the large protrusions have a large contact area to receive the reaction force and absorb the shock, so (1) there is a high shock absorption effect and no vibration or noise.
(2) 電磁石印加電圧が変化してもほゞ一定の変位
量が得られる。(2) A nearly constant amount of displacement can be obtained even if the voltage applied to the electromagnet changes.
(3) 耐久性に優れている。(3) Excellent durability.
等の利点を有し、自動車、家庭電機製品等の電磁
制御部品に用いるときは静粛で耐久性ある製品を
提供するに付効果が大きい。When used in electromagnetic control parts for automobiles, home appliances, etc., it is highly effective in providing quiet and durable products.
第1図、第2図は夫々従来の例の側面図、第3
図はこの考案の実施例の側面図、第4図は第3図
の正面図、第5図乃至第7図は第3図、第4図の
実施例の作用を示す第4図の一部拡大正面図、第
8図は他の実施例の正面図、第9図、第10図は
第8図の実施例の作用を示す一部拡大正面図であ
る。
1a,1b,1c,1d……フラツパ、1c′…
…アマチユア、2a,2b,2c,2c′,2d…
…ダンパ、3a,3b,3c,3d……ストツ
パ、3c′,3d′……変位量制限面、4……電磁
石、5c,5d……小突起、5c′,5d′……大突
起、6……ヒンジ、7……ばね、8c,8d……
ブラケツト、9……支持部材。
Figures 1 and 2 are side views of the conventional example, and Figure 3 is a side view of the conventional example, respectively.
The figure is a side view of the embodiment of this invention, Figure 4 is a front view of Figure 3, and Figures 5 to 7 are a part of Figure 4 showing the operation of the embodiment of Figures 3 and 4. FIG. 8 is a front view of another embodiment, and FIGS. 9 and 10 are partially enlarged front views showing the operation of the embodiment of FIG. 8. 1a, 1b, 1c, 1d...flatspa, 1c'...
...Amateur, 2a, 2b, 2c, 2c', 2d...
...Damper, 3a, 3b, 3c, 3d...Stopper, 3c', 3d'...Displacement limiting surface, 4...Electromagnet, 5c, 5d...Small protrusion, 5c', 5d'...Large protrusion, 6 ...Hinge, 7...Spring, 8c, 8d...
Bracket, 9...Supporting member.
Claims (1)
の面上に高さの大きい小突起と高さの小さい大
突起を備えたフラツパと、小突起、大突起と衝
接する位置に弾性体を材質とする梁状ダンパを
取り付けたストツパとを有してなり、フラツパ
が電磁石に吸引されるにつれ突起とダンパとの
接触面積が漸次的、もしくは段階的に増大する
ことを特徴とする支点型電磁石のフラツパ機
構。 2 大突起と小突起を一体とし、大突起先端に小
突起を形成した実用新案登録請求の範囲第1項
記載の支点型電磁石のフラツパ機構。[Claims for Utility Model Registration] 1. In a fulcrum type electromagnet, a flapper having a small protrusion with a large height and a large protrusion with a small height on the surface in the attracting direction of the flapper, and a position where the small protrusion and the large protrusion collide with each other. and a stopper to which a beam-shaped damper made of an elastic body is attached, and the contact area between the protrusion and the damper increases gradually or stepwise as the flapper is attracted by the electromagnet. A flap mechanism of a fulcrum type electromagnet. 2. A flapper mechanism for a fulcrum type electromagnet as set forth in claim 1 of the utility model registration, in which a large protrusion and a small protrusion are integrated, and a small protrusion is formed at the tip of the large protrusion.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17081079U JPS6314403Y2 (en) | 1979-12-10 | 1979-12-10 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17081079U JPS6314403Y2 (en) | 1979-12-10 | 1979-12-10 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5689211U JPS5689211U (en) | 1981-07-16 |
| JPS6314403Y2 true JPS6314403Y2 (en) | 1988-04-22 |
Family
ID=29681642
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17081079U Expired JPS6314403Y2 (en) | 1979-12-10 | 1979-12-10 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6314403Y2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006351240A (en) * | 2005-06-13 | 2006-12-28 | Anden | Electromagnetic relay |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59123205A (en) * | 1982-12-28 | 1984-07-17 | Hitachi Ltd | Electromagnet |
-
1979
- 1979-12-10 JP JP17081079U patent/JPS6314403Y2/ja not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006351240A (en) * | 2005-06-13 | 2006-12-28 | Anden | Electromagnetic relay |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5689211U (en) | 1981-07-16 |
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