JPS63180923U - - Google Patents

Info

Publication number
JPS63180923U
JPS63180923U JP7161287U JP7161287U JPS63180923U JP S63180923 U JPS63180923 U JP S63180923U JP 7161287 U JP7161287 U JP 7161287U JP 7161287 U JP7161287 U JP 7161287U JP S63180923 U JPS63180923 U JP S63180923U
Authority
JP
Japan
Prior art keywords
sample
chamber
vacuum evacuation
vacuum
transferring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7161287U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP7161287U priority Critical patent/JPS63180923U/ja
Publication of JPS63180923U publication Critical patent/JPS63180923U/ja
Pending legal-status Critical Current

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Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案の一実施例の平面図、第2図は
第1図の―線断面図である。 1……描画試料装着治具、2……描画試料固定
枠、3,5〜11……レール、4……回転台、1
2〜15……門扉、16,17……試料移送台、
18,19……真空排気室、20……描画室、2
1,22……描画試料。
FIG. 1 is a plan view of an embodiment of the present invention, and FIG. 2 is a sectional view taken along the line -- in FIG. 1... Drawing sample mounting jig, 2... Drawing sample fixing frame, 3, 5-11... Rail, 4... Rotating table, 1
2-15... Gate, 16, 17... Sample transfer table,
18, 19...Evacuation chamber, 20...Drawing chamber, 2
1, 22... Drawing sample.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 真空排気室に格納された描画試料を描画室内の
試料移送台に搬入出させる機構において、真空排
気室を2室以上設け、かつ真空排気室の容積を描
画試料とほぼ同等の容積とし、交互に真空排気室
への描画試料の移入、真空排気、試料移送台への
搬出、描画完了後の描画試料の他室への移送、同
時に元の排気室には次の描画試料の移入といつた
サイクルで運用される2室以上の真空排気室をも
ち、かつ、移載機構をコンパクト化したことを特
徴とする電子線描画装置。
In a mechanism for transporting a drawn sample stored in a vacuum evacuation chamber to and from a sample transfer table in the drawing chamber, two or more vacuum evacuation chambers are provided, and the volume of the vacuum evacuation chamber is approximately the same as that of the drawn sample, and A cycle of transferring the drawing sample to the vacuum evacuation chamber, evacuation, transporting it to the sample transfer table, transferring the drawing sample to another room after drawing completion, and simultaneously transferring the next drawing sample to the original evacuation chamber. An electron beam lithography system characterized by having two or more vacuum evacuation chambers operated in a vacuum chamber and having a compact transfer mechanism.
JP7161287U 1987-05-15 1987-05-15 Pending JPS63180923U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7161287U JPS63180923U (en) 1987-05-15 1987-05-15

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7161287U JPS63180923U (en) 1987-05-15 1987-05-15

Publications (1)

Publication Number Publication Date
JPS63180923U true JPS63180923U (en) 1988-11-22

Family

ID=30914320

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7161287U Pending JPS63180923U (en) 1987-05-15 1987-05-15

Country Status (1)

Country Link
JP (1) JPS63180923U (en)

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