JPS63209736A - Process for removing arsine and phosphine - Google Patents
Process for removing arsine and phosphineInfo
- Publication number
- JPS63209736A JPS63209736A JP62044864A JP4486487A JPS63209736A JP S63209736 A JPS63209736 A JP S63209736A JP 62044864 A JP62044864 A JP 62044864A JP 4486487 A JP4486487 A JP 4486487A JP S63209736 A JPS63209736 A JP S63209736A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- absorption
- oxidizing
- phosphine
- tower
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 title claims abstract description 22
- RBFQJDQYXXHULB-UHFFFAOYSA-N arsane Chemical compound [AsH3] RBFQJDQYXXHULB-UHFFFAOYSA-N 0.000 title claims abstract description 13
- 229910000073 phosphorus hydride Inorganic materials 0.000 title claims abstract description 12
- 238000000034 method Methods 0.000 title claims description 20
- 238000010521 absorption reaction Methods 0.000 claims abstract description 51
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 claims abstract description 19
- 230000001590 oxidative effect Effects 0.000 claims abstract description 17
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims abstract description 12
- 229910017604 nitric acid Inorganic materials 0.000 claims abstract description 12
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims abstract description 8
- 229910052709 silver Inorganic materials 0.000 claims abstract description 8
- 239000004332 silver Substances 0.000 claims abstract description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 7
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims abstract description 3
- 239000007789 gas Substances 0.000 claims description 52
- 239000000243 solution Substances 0.000 claims description 9
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 8
- 229910001961 silver nitrate Inorganic materials 0.000 claims description 5
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims 1
- 239000007864 aqueous solution Substances 0.000 claims 1
- 238000004090 dissolution Methods 0.000 claims 1
- 239000007788 liquid Substances 0.000 abstract description 25
- 239000002250 absorbent Substances 0.000 abstract description 8
- 230000002745 absorbent Effects 0.000 abstract description 8
- 238000006243 chemical reaction Methods 0.000 abstract description 8
- 239000000463 material Substances 0.000 abstract description 4
- 229910000070 arsenic hydride Inorganic materials 0.000 abstract description 3
- 238000012856 packing Methods 0.000 abstract description 2
- 229910052799 carbon Inorganic materials 0.000 abstract 1
- 238000002474 experimental method Methods 0.000 description 6
- 230000003647 oxidation Effects 0.000 description 5
- 238000007254 oxidation reaction Methods 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 238000001179 sorption measurement Methods 0.000 description 4
- 239000000843 powder Substances 0.000 description 3
- 238000001556 precipitation Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 238000004064 recycling Methods 0.000 description 2
- 101710134784 Agnoprotein Proteins 0.000 description 1
- 108020001077 Anthranilate Phosphoribosyltransferase Proteins 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000003463 adsorbent Substances 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 239000002341 toxic gas Substances 0.000 description 1
- 238000013022 venting Methods 0.000 description 1
Landscapes
- Treating Waste Gases (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、半導体製造工場等にて使用されている特殊材
料ガスの中で最も毒性の高いガスとして知られているア
ルシン（ＡｓＨｓ）及びホスフィン（ＰＨｓ）の除去方
法に関する。Detailed Description of the Invention [Industrial Application Field] The present invention is directed to the use of arsine (AsHs) and phosphine, which are known as the most toxic gases among special material gases used in semiconductor manufacturing factories, etc. (PHs) removal method.
ＡＳＩ（３及びＰｕｓは、従来から半導体の材料ガスと
して使用されており、その使用量は、半導体素子の生産
量の増加及び多様化に従って１年々増加の傾向にある。ASI (3) and Pus have traditionally been used as material gases for semiconductors, and their usage tends to increase year by year as the production volume and diversification of semiconductor devices increases.
Ａｓ１１．ガス及びＰＨ，ガスは、特殊材料ガスの中で
も非常に毒性が強く、極めて微量でも人体に有害である
ことが知られており、いくつかの除害方法も提案されて
いる。しかし、これらの多くは、固体吸着剤を使用し、
化学反応を伴う固相吸着の方法が多く用いられてきた。As11. Gas, PH, and gas are known to be highly toxic among special gases, and even in extremely small amounts are harmful to the human body, and several methods of abatement have been proposed. However, many of these use solid adsorbents,
Solid-phase adsorption methods involving chemical reactions have often been used.
又、従来の除害方法の中には、湿式の吸収法によるもの
でｌｌ！ａＯＨ等のアルカリ液又は酸化剤を使用したも
のもある。Also, some of the conventional methods of abatement include wet absorption methods! Some use an alkaline solution such as aOH or an oxidizing agent.
吸着法による除害は、高除去率が期待できるが、大規襖
の処理にはコスト。A high removal rate can be expected with the adsorption method, but it is expensive to treat large-scale fusuma.
その他の点で不適当な面がある。一方、湿式吸収法は１
本来大量ガスの処理に遡するが、吸収液の寿命及び除去
率の点で問題がある。There are other aspects that are inappropriate. On the other hand, the wet absorption method
This process originally goes back to processing large amounts of gas, but there are problems with the lifespan of the absorbent and the removal rate.
本発明は、かかる現状に鑑み、少量から大量までの処理
ガス量に対応することができるとともに、処理ガス濃度
においても低濃度から高濃度のガスまで処理することが
でき、しかも、吸収側の寿命を大幅に改善したアルシン
及びホスフィンの除去方法を提供することを目的として
いる。In view of the current situation, the present invention is capable of processing gas amounts ranging from small to large amounts, and can process gases ranging from low concentration to high concentration, and has a long lifespan on the absorption side. The purpose of this invention is to provide a method for removing arsine and phosphine that has significantly improved results.
′（問題点を解決するための手段〕
本発明によれば、この目的は、吸収剤として硝酸銀溶液
を使用し、処理反応に際して生成される銀を過酸化水素
、酸素、オゾン、空気等により酸化したうえ硝酸水溶液
へ溶解させることを特徴としたガス中のアルシン及び／
又はホスフィンの湿式吸収法による除去方法を提供する
ことによって達成される。(Means for solving the problem) According to the present invention, this purpose is achieved by using a silver nitrate solution as an absorbent and oxidizing the silver produced during the processing reaction with hydrogen peroxide, oxygen, ozone, air, etc. Arsine and/or gas in a gas characterized by further dissolving it in an aqueous nitric acid solution.
Alternatively, this can be achieved by providing a method for removing phosphine using a wet absorption method.
本発明を実施する装置の概要図を第１図及び第２図に示
す。A schematic diagram of an apparatus implementing the present invention is shown in FIGS. 1 and 2.
第１図において、 ＡｓＨｓガス及び／又はｐＨｓガス
を定量的に供給するガス供給箱１から排出されたガスは
、導管２を通り、吸収塔３へ導かれる。吸収塔３には充
信眉が充１３されていて、この吸収塔３を通過したガス
は、導管４ｊ二より吸収塔５へ・葺かれ乙。吸着塔５：
よ、 Ａｓ１１．ガス及び／又：よＰｌｌ、ガスが吸収
塔３でｒ置去されない場合及び緊急用として設置したも
ので１本発明を実施するための必要条件とはならない。In FIG. 1, gas discharged from a gas supply box 1 that quantitatively supplies AsHs gas and/or pHs gas passes through a conduit 2 and is guided to an absorption tower 3. The absorption tower 3 is filled with a full line of gas, and the gas that has passed through the absorption tower 3 is routed to the absorption tower 5 through a conduit 4j. Adsorption tower 5:
Yo, As11. Gas and/or: If the gas is not removed in the absorption tower 3 and is installed for emergency purposes, it is not a necessary condition for carrying out the invention.
吸着塔５を出たガスは、導管６を通って排気ブロワ−７
によって排気される。又、吸収液はタンク８内に蓄えら
れ、循環ポンプ９にて４管１１に揚液され、吸収塔３の
上部から充虜層上へ散布される。Ａｓ）１３ガス及び／
又はＰＨ，ガスは充填フにて吸収液と接触し、ガス中の
ＡＳＩＩ、ｌ及び／又はＰ）Ｉユの吸収を果たした液は
、導管１０を通過してタンク８に戻る。The gas leaving the adsorption tower 5 passes through a conduit 6 to an exhaust blower 7.
Exhausted by. Further, the absorption liquid is stored in a tank 8, pumped to four pipes 11 by a circulation pump 9, and sprayed from the upper part of the absorption tower 3 onto the packed bed. As) 13 gas and/or
Or PH, the gas comes into contact with the absorption liquid at the filling stage, and the liquid that has absorbed ASII, l and/or P)I in the gas passes through the conduit 10 and returns to the tank 8.
一方、タンク８に訂えられた吸収反応により析出したＡ
ｇを含む吸収液は、ポンプ１４にて導管１５に揚液され
、酸化塔１３の上部へ散布される。酸化塔Ｉ３には、充
場材として活性アルミナ又は活性炭が充項されている。On the other hand, A precipitated by the absorption reaction in tank 8
The absorption liquid containing g is pumped to the conduit 15 by the pump 14 and is sprayed to the upper part of the oxidation tower 13. The oxidation tower I3 is filled with activated alumina or activated carbon as a filling material.
酸化性ガス供給箱１２により供給されたガスは酸化塔１
３へ送られ、吸収液及びＡｉと接触反応し、４管２で上
記ガスと合流し、酸化されたＡｇと吸収液はタンク８に
戻される。The gas supplied by the oxidizing gas supply box 12 is sent to the oxidizing tower 1
The oxidized Ag and the absorbent are returned to the tank 8. The oxidized Ag and the absorbent are returned to the tank 8.
なお、Ｓｌは吸収前ガス濃度検出口、Ｓ２は吸収後ガス
検出口を示す、吸収液は、硝酸銀、震度として１０重量
％以下のものに、硝酸を加えて酸性としたものを使用す
る。Note that S1 indicates a pre-absorption gas concentration detection port, and S2 indicates a post-absorption gas detection port. The absorption liquid used is silver nitrate with a seismic intensity of 10% by weight or less, made acidic by adding nitric acid.
第２図は、第１図における酸化性ガスによる八εの酸化
プロセスを省略したもので２酸化性ガスを使用する代わ
りに！３酸化水素をタンク８に酉えている吸収液へ添加
する。ＡＳｌ１３ガス及び／又はＰＨ，ガスの除去プロ
セスは、第１図と同一である。In Figure 2, the 8ε oxidation process using an oxidizing gas in Figure 1 is omitted, and instead a dioxidizing gas is used! Hydrogen trioxide is added to the absorption liquid in tank 8. The removal process of ASl13 gas and/or PH gas is the same as in FIG.
導管２を通って吸収塔３へ導かれたガスは、吸収塔３の
上部から充場屡上に散布された吸収液と充愼層において
接触し、気相中のＡｓＨｚガス及び／又はＰＩ（。The gas led to the absorption tower 3 through the conduit 2 comes into contact with the absorption liquid sprinkled over the filling layer from the upper part of the absorption tower 3 in the packed layer, and AsHz gas and/or PI ( .
ガスは液相に吸収される。The gas is absorbed into the liquid phase.
ｇＪｆＩ２銀溶液によるＡｓＨｖ及びＰＨ，の除去反応
：よ１次のような式で表される。Removal reaction of AsHv and PH by gJfI2 silver solution: Represented by the following equation.
Ａｓ１ｌ、↓６へｇＮｏ、−６４ｆｉよＨ，４ｓＯ）↓
６Ｈ’、０□ＰＨｘ ”６％ｇＮＯｚ→６Ａｇ”、 Ｈ
ｉＰＯｉ＋６１１マ０゜一方、酸化塔１３において、又
は過酸化水素を添加巳だとき：ま１次○反つが生じる。As1l, ↓6gNo, -64fiyoH, 4sO)↓
6H', 0□PHx "6%gNOz→6Ag", H
On the other hand, in the oxidation tower 13 or when hydrogen peroxide is added: a first reaction occurs.
２％ｇ＋Ｖ２０ｚ−へｇｚ。2%g+V20z-togz.
Ａ１１ｖＯ”２ＨＮ（ｈ→２ＡｇＮＯ，＋Ｈ２０（実施
例１〕
第１図に示す概要図の装置にて酸化性ガスのａ気のない
状態で本発明を実施した結果は、第１表に示す通りであ
る。吸収塔３は、内径１００ｂ＋ｍの円筒状で。A11vO"2HN (h → 2AgNO, +H20 (Example 1) The present invention was carried out in the apparatus shown in the schematic diagram shown in FIG. 1 in the absence of oxidizing gas. The results are as shown in Table 1. The absorption tower 3 has a cylindrical shape with an inner diameter of 100b+m.
充填剤として１５卿φのラノシリングが６００ｍｍ充虜
されている対向接触の湿式充填塔である。吸収液は、
ＡｇＮＣｂ ５％、ＨＮＯｚｌ、５Ｎであった。It is a wet-type packing tower of opposite contact, in which 600 mm of Lanosilling with a diameter of 15 mm is filled as a filler. The absorption liquid is
AgNCb 5%, HNOzl, 5N.
吸収処理される前のガスはＳｌにて採取されたものを、
吸収処理後のガスはＳ２にて採取されたものをそれぞれ
測定した。The gas before absorption treatment was collected at Sl.
The gases collected in S2 after the absorption treatment were measured.
いずれの場合も、実験開始と同時にＡｇの析出が確認さ
れ、大町１終了時には相ｇＨの独１≠粉う′析出してい
た。In both cases, precipitation of Ag was confirmed at the beginning of the experiment, and by the end of Omachi 1, phase gH had been precipitated.
〔実施例２〕
第１図に示す（匡で図の装置にて、析出したＡｇを含む
吸収液と酸化性ガスとを接触させ、又、充′Ｘ刑を併用
した場合の吸収液中のＡｇ濃度及びＡｓ濃度等を測定し
、 Ａｇのリサイクルを確認した。[Example 2] As shown in FIG. Ag concentration, As concentration, etc. were measured, and Ag recycling was confirmed.
処理前のＡｓ）１．、 Ｉ’）１．ガス濃度は１１００
ｐｐに一定させ、吸収液はＡｇＮＣｈ ５％（Ａｇとし
て６．イ（３）μｇ／…Ｉ） １５１．酸化性ガス通気
量は約５／／叫ｎ、要処理ガス量は吸収塔３内通過ガス
ｉｔ２０ｃｍ／ｓｅｃ （９４１７ｍ１ｎ）で実施した
。As before treatment 1. , I')1. Gas concentration is 1100
pp is kept constant, and the absorption liquid contains AgNCh 5% (6.i (3) μg/...I as Ag) 151. The oxidizing gas flow rate was approximately 5/min, and the amount of gas to be treated was 20 cm/sec (9417 m1n) for the gas passing through the absorption tower 3.
第２表
実験開始と同時にＡｇの析出が確認されたが、実験終了
時にはＡｇはほとんど溶解し、 Ａｇ微粉はｒｉ認され
なかった。又、排気中にＮＯｘが２Ｑｐｐｍ程度検出さ
れた。Table 2 Although Ag precipitation was observed at the same time as the start of the experiment, by the end of the experiment most of the Ag had dissolved and no Ag fine powder was observed. Additionally, approximately 2Qppm of NOx was detected in the exhaust gas.
〔実施例３］
実施σ１１２と同一の装置にて、 ＡｓＨ３ガス濃度５
０ｐｐｍの亜処理ガスを９４ Ｅ ／ｗｉｎ。[Example 3] AsH3 gas concentration 5 using the same equipment as in the implementation σ112
0 ppm sub-processing gas at 94 E/win.
吸収液はＡｇＮ（ｈ Ｏ、１％（Ａｇとして６４０μｇ
／ｍｌ） １５１． 活性炭を充愼した酸化塔１３に
空気を通気して実施した結果は２次の通りである。The absorption liquid contained AgN (hO, 1% (640 μg as Ag)
/ml) 151. The results obtained by venting air into the oxidation tower 13 filled with activated carbon are as follows.
処理時間 ９０分
処理後のＡｓＨｘＡ度 ＜０．Ｏ５ｐｐｍ吸収液中Ａ
ｇ ６３５μｇ、’ｗｌ （９，５ｇ／＋５
ｆ）吸収液中Ａｓ ９４μｇ／ｍｌ （１
，４１ｇ＋’１５７！１）〔実施例４〕
第２Ｃ；！Ｊに示す概要図の装置にて本発明を実施した
結果は、第３表に示す通りである。吸収塔３は、内径１
００ｍｍの円筒状で、充填剤として１５柵φのラノン°
Ｊングが６００卿充虜されている対向接触の湿式充填塔
である。吸収液は Ａ ｇ ′西５％、 １ＩＮＯ３１
，５Ｎ液１５１ ｃ：Ｈ，ｏ、を０．３％（ｈｔ／Ｖ）
を添加した。Treatment time 90 minutes AsHxA degree after treatment <0. O5ppm A in absorption liquid
g 635μg,'wl (9.5g/+5
f) As in absorption liquid 94μg/ml (1
,41g+'157!1) [Example 4] 2nd C;! The results of implementing the present invention using the apparatus shown in the schematic diagram shown in J are shown in Table 3. The absorption tower 3 has an inner diameter of 1
00mm cylindrical shape, lannon with 15mm diameter as a filler
It is a wet-packed column with opposite contact, which is filled with 600 kg. The absorption liquid is A g 'West 5%, 1INO31
, 5N solution 151 c:H, o, 0.3% (ht/V)
was added.
吸収処理される前のガスはＳｌにて採取されたものを、
吸収処理後のガスはＳ２にて採取されたものをそれぞれ
測定した。The gas before absorption treatment was collected at Sl.
The gases collected in S2 after the absorption treatment were measured.
実験開始と同時にＡｇの析出が確認されたが、実験開始
後約３０分で析出したＡｇ微粉は消失した。又、排気中
にＮＯＸは検出されなかった。Precipitation of Ag was confirmed at the same time as the start of the experiment, but the precipitated Ag fine powder disappeared about 30 minutes after the start of the experiment. Furthermore, no NOX was detected in the exhaust gas.
〔実施例５〕
実施例４と同一の装置にて、ガス１度５０ｐｐｍのＡｓ
Ｈ３を９４１ ／ｍｉｎ、吸収液はＡｇＮＯｓ Ｏ−１
％（Ａｇとしテロ、１０／１ｇ／＋ｎｌ） １５１２
！：）ＩｉＯｚを０．３％（ｗｔ／Ｖ）を添加したも
ので実施した結果は１次の通りである。[Example 5] Using the same equipment as in Example 4, 50 ppm of As was added at one time.
H3 at 941/min, absorption liquid is AgNOs O-1
% (Ag terrorism, 10/1g/+nl) 1512
! :) The results obtained using 0.3% (wt/V) of IiOz are as follows.
処理時間 ９０分
ＡＳｆｆｆ＆のＡｓＨ，濃度 ＜ ０．０５ｐｒｍ吸
収液中Ａｇ ６３０Ｊ１ｇ／ｍｌ （９，４
５ｇ／１５１）吸収液中Ａｓ ９４ｇｇ／
ｍｌ （１，４１ｇ／１５４）〔効果〕
硝酸銀溶液を吸収液とする方法は、従来から実験室レベ
ルでは報告されているが、工業用実用規模で用いられた
例は現状ではない０本発明は、Ｗｍｌ銀溶液を使用して
実用規模の実験をした結果、実施例１に示す通り、除去
性能が非常に優秀であることが確認できた。Processing time: 90 minutes AsH, concentration < 0.05prm Ag in absorption liquid: 630J1g/ml (9,4
5g/151) As in absorption liquid 94gg/
ml (1,41g/154) [Effect] Methods using silver nitrate solution as an absorption liquid have been reported at the laboratory level, but there are currently no examples of it being used on an industrial practical scale. As a result of a practical scale experiment using Wml silver solution, as shown in Example 1, it was confirmed that the removal performance was very excellent.
しかし、硝ｉｌ銀溶液の吸収反応により八ｇが微粉とし
て析出し、吸収液の寿命が非常に短くなり、結果として
ランニング・コストの高い方法となってしまう。However, due to the absorption reaction of the silver nitrate solution, 8g is precipitated as a fine powder, and the life of the absorption liquid is extremely short, resulting in a method with high running costs.
析出したＡｇは、硝酸の濃度を上げることによって溶解
するが、臭い、腐蝕等で難点があり、実用的な硝酸濃度
ではＡｇと硝酸との反応は非常に遅（、又２反応の際に
窒ｉ酸化物が発生する。Precipitated Ag can be dissolved by increasing the concentration of nitric acid, but there are problems with odor, corrosion, etc. At practical nitric acid concentrations, the reaction between Ag and nitric acid is very slow (and the reaction between Ag and nitric acid is very slow during the two reactions). i Oxide is generated.
これに対し１本発明では、酸素、空気等の酸化性ガスを
供給することにより５又は過酸化水素を添加することに
より、４ｇを酸化し、窒素酸化物の放散のない状態でＡ
、を硝酸に速やかに反応させ得ることが確認できた。On the other hand, in the present invention, 4 g is oxidized by adding 5 or hydrogen peroxide by supplying an oxidizing gas such as oxygen or air, and A
It was confirmed that , could be rapidly reacted with nitric acid.
即ち、実施ｇ１１３において、Ａｇがリサイクルしない
とすると。That is, assume that Ag is not recycled in implementation g113.
液中ＡｇＴｏｔａｌ量 ９．６ｇ （０，０
９ｍｏｌ）ＡｇＴｏｔａｌ量と当量のＡｓ１ １．１
３ｇ（０，０１５ｎｏ＋）であり、これをＡｓＨｘガス
量にすると０．３３６１となって、実施例３のＡｓＩＩ
ａガス量０．４２３１を下回る。これは、Ａｇがリサイ
クルしているために、当量以上のＡｓｈｓガス（０，０
８７５）が吸収されていることになる。AgTotal amount in liquid 9.6g (0,0
9 mol) AgTotal amount and equivalent amount of As1 1.1
3g (0,015no+), and when this is converted into AsHx gas amount, it becomes 0.3361, which is AsII of Example 3.
a Gas amount is less than 0.4231. This is because Ag is recycled, so more than the equivalent amount of Ashs gas (0,0
875) has been absorbed.
又、実施例５において、Ａｇがリサイクルしないとする
と。Also, in Example 5, suppose that Ag is not recycled.
液中＾ｇＴｏｔａｌｉｌ ９．６ｇ （０
，０９１１１０１）ＡｇＴｏＬａｌ量と当量のＡ４
１．１３ｇ（０，０１５ｎｏ＋）であり、実際の液中Ａ
ｓ量１．４１ｇは、理論値１．１３ｇを上回り、Ａｇの
リサイクルにより当量以上のＡｓＨｚガスが吸収されて
いることが確認された。In liquid^gTotalil 9.6g (0
,0911101) AgToLal amount and equivalent amount of A4
1.13g (0,015no+), actual A in liquid
The amount of 1.41 g exceeded the theoretical value of 1.13 g, and it was confirmed that more than the equivalent amount of AsHz gas was absorbed by recycling Ag.
第１図及び第２図は１本発明の実施に使用した装置の概
要図である。FIGS. 1 and 2 are schematic diagrams of the apparatus used to carry out the present invention.
Claims (1)
させ、吸収反応にて生成した錫を酸化させた後硝酸水溶
液で溶解して再利用することを特徴とするアルシン及び
／又はホスフィンの除去方法 ２ 吸収反応で生成した銀を過酸化水素を添加した硝酸
水溶液で溶解し、ＮＯ＿ｘの発生を抑制し銀の酸化溶解
を促進させることすることを特徴とした特許請求の範囲
１記載のアルシン及び／又はホスフィンの除去方法 ３ 吸収反応で生成した銀を酸化性ガスで酸化し速やか
に硝酸に溶解させることを特徴とした特許請求の範囲１
記載のアルシン及び／又はホスフィンの除去方法 ４ 吸収反応で生成した銀を、活性アルミナ層又は活性
炭層において酸化性ガスと接触させることにより、酸化
し速やかに硝酸に溶解させることを特徴とした特許請求
の範囲１記載のアルシン及び／又はホスフィンの除去方
法[Claims] 1. Arsine and/or phosphine, which is characterized by absorbing arsine and/or phosphine in a silver nitrate solution, oxidizing tin produced in the absorption reaction, and then reusing it by dissolving it in an aqueous nitric acid solution. Removal method 2 according to claim 1, characterized in that silver produced by absorption reaction is dissolved in a nitric acid aqueous solution to which hydrogen peroxide is added to suppress the generation of NO_x and promote oxidative dissolution of silver. Arsine and/or phosphine removal method 3 Claim 1 characterized in that silver produced by an absorption reaction is oxidized with an oxidizing gas and promptly dissolved in nitric acid.
Method 4 for removing arsine and/or phosphine as described: A patent claim characterized in that silver produced by an absorption reaction is oxidized and promptly dissolved in nitric acid by contacting it with an oxidizing gas in an activated alumina layer or an activated carbon layer. Method for removing arsine and/or phosphine according to scope 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62044864A JPH06102133B2 (en) | 1987-02-27 | 1987-02-27 | Method for removing arsine and phosphine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62044864A JPH06102133B2 (en) | 1987-02-27 | 1987-02-27 | Method for removing arsine and phosphine |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63209736A true JPS63209736A (en) | 1988-08-31 |
| JPH06102133B2 JPH06102133B2 (en) | 1994-12-14 |
Family
ID=12703359
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62044864A Expired - Lifetime JPH06102133B2 (en) | 1987-02-27 | 1987-02-27 | Method for removing arsine and phosphine |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH06102133B2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0568259A1 (en) * | 1992-04-30 | 1993-11-03 | Noranda Inc. | Process for making a silver nitrate solution |
| US5527517A (en) * | 1994-11-23 | 1996-06-18 | Philip Morris Incorporated | Liquid scrubbing of gas-phase contaminants |
| CN103721562A (en) * | 2013-12-13 | 2014-04-16 | 中南大学 | Absorption liquid for purifying arsenic hydride and application method of absorption liquid |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102577331B (en) | 2010-05-28 | 2015-08-05 | 华为技术有限公司 | Virtual 2nd layer and make its extendible mechanism |
-
1987
- 1987-02-27 JP JP62044864A patent/JPH06102133B2/en not_active Expired - Lifetime
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0568259A1 (en) * | 1992-04-30 | 1993-11-03 | Noranda Inc. | Process for making a silver nitrate solution |
| US5527517A (en) * | 1994-11-23 | 1996-06-18 | Philip Morris Incorporated | Liquid scrubbing of gas-phase contaminants |
| CN103721562A (en) * | 2013-12-13 | 2014-04-16 | 中南大学 | Absorption liquid for purifying arsenic hydride and application method of absorption liquid |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH06102133B2 (en) | 1994-12-14 |
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