JPS6322300B2 - - Google Patents

Info

Publication number
JPS6322300B2
JPS6322300B2 JP56068693A JP6869381A JPS6322300B2 JP S6322300 B2 JPS6322300 B2 JP S6322300B2 JP 56068693 A JP56068693 A JP 56068693A JP 6869381 A JP6869381 A JP 6869381A JP S6322300 B2 JPS6322300 B2 JP S6322300B2
Authority
JP
Japan
Prior art keywords
thin film
photomask
etching
electron beam
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56068693A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57182740A (en
Inventor
Chihiro Tabuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP6869381A priority Critical patent/JPS57182740A/ja
Priority to EP81107702A priority patent/EP0049799B1/fr
Priority to DE8181107702T priority patent/DE3173769D1/de
Priority to US06/318,201 priority patent/US4440841A/en
Publication of JPS57182740A publication Critical patent/JPS57182740A/ja
Publication of JPS6322300B2 publication Critical patent/JPS6322300B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/40—Electrostatic discharge [ESD] related features, e.g. antistatic coatings or a conductive metal layer around the periphery of the mask substrate

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP6869381A 1980-10-09 1981-05-07 Photomask Granted JPS57182740A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP6869381A JPS57182740A (en) 1981-05-07 1981-05-07 Photomask
EP81107702A EP0049799B1 (fr) 1980-10-09 1981-09-28 Photoréserve vierge et photomasque
DE8181107702T DE3173769D1 (en) 1980-10-09 1981-09-28 Photomask blank and photomask
US06/318,201 US4440841A (en) 1981-02-28 1981-11-04 Photomask and photomask blank

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6869381A JPS57182740A (en) 1981-05-07 1981-05-07 Photomask

Publications (2)

Publication Number Publication Date
JPS57182740A JPS57182740A (en) 1982-11-10
JPS6322300B2 true JPS6322300B2 (fr) 1988-05-11

Family

ID=13381089

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6869381A Granted JPS57182740A (en) 1980-10-09 1981-05-07 Photomask

Country Status (1)

Country Link
JP (1) JPS57182740A (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2788649B2 (ja) * 1989-05-30 1998-08-20 ホーヤ株式会社 フォトマスクブランク及びフォトマスク

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS576102B2 (fr) * 1972-06-20 1982-02-03
JPS5352073A (en) * 1976-10-22 1978-05-12 Hoya Denshi Kk Photomask for ic
US4138692A (en) * 1977-09-12 1979-02-06 International Business Machines Corporation Gas encapsulated cooling module
JPS5451831A (en) * 1977-09-30 1979-04-24 Konishiroku Photo Ind Co Ltd Photomask material
JPS57144549A (en) * 1981-02-28 1982-09-07 Dainippon Printing Co Ltd Photomask

Also Published As

Publication number Publication date
JPS57182740A (en) 1982-11-10

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