JPS63243131A - Method for manufacturing conductive materials - Google Patents
Method for manufacturing conductive materialsInfo
- Publication number
- JPS63243131A JPS63243131A JP7811187A JP7811187A JPS63243131A JP S63243131 A JPS63243131 A JP S63243131A JP 7811187 A JP7811187 A JP 7811187A JP 7811187 A JP7811187 A JP 7811187A JP S63243131 A JPS63243131 A JP S63243131A
- Authority
- JP
- Japan
- Prior art keywords
- group
- compound
- aniline
- salt
- general formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims description 22
- 238000004519 manufacturing process Methods 0.000 title claims description 18
- 239000004020 conductor Substances 0.000 title claims description 11
- -1 aniline compound Chemical class 0.000 claims description 82
- 150000001875 compounds Chemical class 0.000 claims description 35
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 claims description 33
- 238000006243 chemical reaction Methods 0.000 claims description 18
- 239000007800 oxidant agent Substances 0.000 claims description 15
- 150000003839 salts Chemical class 0.000 claims description 13
- 229920000642 polymer Polymers 0.000 claims description 10
- 239000000126 substance Substances 0.000 claims description 10
- 125000003118 aryl group Chemical group 0.000 claims description 6
- 239000007795 chemical reaction product Substances 0.000 claims description 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 6
- 125000000217 alkyl group Chemical group 0.000 claims description 5
- 125000003277 amino group Chemical group 0.000 claims description 3
- 150000001450 anions Chemical class 0.000 claims description 3
- 229910052731 fluorine Inorganic materials 0.000 claims description 3
- 239000007788 liquid Substances 0.000 claims description 3
- 229910052783 alkali metal Inorganic materials 0.000 claims description 2
- 150000001340 alkali metals Chemical class 0.000 claims description 2
- 125000003342 alkenyl group Chemical group 0.000 claims description 2
- 125000003545 alkoxy group Chemical group 0.000 claims description 2
- 125000003282 alkyl amino group Chemical group 0.000 claims description 2
- 125000005210 alkyl ammonium group Chemical group 0.000 claims description 2
- 125000005336 allyloxy group Chemical group 0.000 claims description 2
- 125000001769 aryl amino group Chemical group 0.000 claims description 2
- 239000011737 fluorine Substances 0.000 claims description 2
- 229910017053 inorganic salt Inorganic materials 0.000 claims description 2
- 229910052751 metal Inorganic materials 0.000 claims description 2
- 239000002184 metal Substances 0.000 claims description 2
- VLTRZXGMWDSKGL-UHFFFAOYSA-M perchlorate Chemical group [O-]Cl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-M 0.000 claims description 2
- 125000001424 substituent group Chemical group 0.000 claims description 2
- 125000001153 fluoro group Chemical group F* 0.000 claims 1
- 239000010949 copper Substances 0.000 description 11
- 239000003960 organic solvent Substances 0.000 description 11
- 239000002904 solvent Substances 0.000 description 11
- 229920000128 polypyrrole Polymers 0.000 description 10
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 9
- 238000006116 polymerization reaction Methods 0.000 description 9
- 230000001590 oxidative effect Effects 0.000 description 7
- 229920000767 polyaniline Polymers 0.000 description 7
- 239000000463 material Substances 0.000 description 6
- 150000001448 anilines Chemical class 0.000 description 5
- 229910052802 copper Inorganic materials 0.000 description 5
- 238000005406 washing Methods 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 125000001624 naphthyl group Chemical group 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 description 3
- 229920001940 conductive polymer Polymers 0.000 description 3
- MLIREBYILWEBDM-UHFFFAOYSA-N cyanoacetic acid Chemical compound OC(=O)CC#N MLIREBYILWEBDM-UHFFFAOYSA-N 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- LHOWRPZTCLUDOI-UHFFFAOYSA-K iron(3+);triperchlorate Chemical compound [Fe+3].[O-]Cl(=O)(=O)=O.[O-]Cl(=O)(=O)=O.[O-]Cl(=O)(=O)=O LHOWRPZTCLUDOI-UHFFFAOYSA-K 0.000 description 3
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 125000003944 tolyl group Chemical group 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- OJGMBLNIHDZDGS-UHFFFAOYSA-N N-Ethylaniline Chemical compound CCNC1=CC=CC=C1 OJGMBLNIHDZDGS-UHFFFAOYSA-N 0.000 description 2
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000012295 chemical reaction liquid Substances 0.000 description 2
- 239000002178 crystalline material Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000002019 doping agent Substances 0.000 description 2
- 238000000921 elemental analysis Methods 0.000 description 2
- 238000004880 explosion Methods 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- 229910001547 lithium hexafluoroantimonate(V) Inorganic materials 0.000 description 2
- NSBIQPJIWUJBBX-UHFFFAOYSA-N n-methoxyaniline Chemical compound CONC1=CC=CC=C1 NSBIQPJIWUJBBX-UHFFFAOYSA-N 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 150000002978 peroxides Chemical class 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- BGZVBIAMRYGGSS-UHFFFAOYSA-N 1,1,2-triphenylhydrazine Chemical compound C=1C=CC=CC=1NN(C=1C=CC=CC=1)C1=CC=CC=C1 BGZVBIAMRYGGSS-UHFFFAOYSA-N 0.000 description 1
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- YBQZXXMEJHZYMB-UHFFFAOYSA-N 1,2-diphenylhydrazine Chemical compound C=1C=CC=CC=1NNC1=CC=CC=C1 YBQZXXMEJHZYMB-UHFFFAOYSA-N 0.000 description 1
- GUUUPLGXSAZRQX-UHFFFAOYSA-N 1-ethyl-1-(2-ethylphenyl)hydrazine Chemical compound CCN(N)C1=CC=CC=C1CC GUUUPLGXSAZRQX-UHFFFAOYSA-N 0.000 description 1
- CLONBSZEFUWYRR-UHFFFAOYSA-N 1-methyl-1,2-diphenylhydrazine Chemical compound C=1C=CC=CC=1N(C)NC1=CC=CC=C1 CLONBSZEFUWYRR-UHFFFAOYSA-N 0.000 description 1
- JDEFPFLTCXIVDH-UHFFFAOYSA-N 2-cyanopropanoic acid Chemical compound N#CC(C)C(O)=O JDEFPFLTCXIVDH-UHFFFAOYSA-N 0.000 description 1
- CHZCERSEMVWNHL-UHFFFAOYSA-N 2-hydroxybenzonitrile Chemical compound OC1=CC=CC=C1C#N CHZCERSEMVWNHL-UHFFFAOYSA-N 0.000 description 1
- TVONJMOVBKMLOM-UHFFFAOYSA-N 2-methylidenebutanenitrile Chemical compound CCC(=C)C#N TVONJMOVBKMLOM-UHFFFAOYSA-N 0.000 description 1
- RLFXJQPKMZNLMP-UHFFFAOYSA-N 2-phenylprop-2-enenitrile Chemical compound N#CC(=C)C1=CC=CC=C1 RLFXJQPKMZNLMP-UHFFFAOYSA-N 0.000 description 1
- COZQDNPLORIALF-UHFFFAOYSA-N 3-hydroxy-2-methylpropanenitrile Chemical compound OCC(C)C#N COZQDNPLORIALF-UHFFFAOYSA-N 0.000 description 1
- WSGYTJNNHPZFKR-UHFFFAOYSA-N 3-hydroxypropanenitrile Chemical compound OCCC#N WSGYTJNNHPZFKR-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- 229910017050 AsF3 Inorganic materials 0.000 description 1
- 241000726103 Atta Species 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- 229910017981 Cu(BF4)2 Inorganic materials 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- 229910007549 Li2SiF6 Inorganic materials 0.000 description 1
- 229910001290 LiPF6 Inorganic materials 0.000 description 1
- 229910012465 LiTi Inorganic materials 0.000 description 1
- GYCMBHHDWRMZGG-UHFFFAOYSA-N Methylacrylonitrile Chemical compound CC(=C)C#N GYCMBHHDWRMZGG-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229920000265 Polyparaphenylene Polymers 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 239000003082 abrasive agent Substances 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- BTGRAWJCKBQKAO-UHFFFAOYSA-N adiponitrile Chemical compound N#CCCCCC#N BTGRAWJCKBQKAO-UHFFFAOYSA-N 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 125000002490 anilino group Chemical group [H]N(*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- JCMGUODNZMETBM-UHFFFAOYSA-N arsenic trifluoride Chemical compound F[As](F)F JCMGUODNZMETBM-UHFFFAOYSA-N 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- KVNRLNFWIYMESJ-UHFFFAOYSA-N butyronitrile Chemical compound CCCC#N KVNRLNFWIYMESJ-UHFFFAOYSA-N 0.000 description 1
- 125000002057 carboxymethyl group Chemical group [H]OC(=O)C([H])([H])[*] 0.000 description 1
- 239000007810 chemical reaction solvent Substances 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 125000004802 cyanophenyl group Chemical group 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 125000001664 diethylamino group Chemical group [H]C([H])([H])C([H])([H])N(*)C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 description 1
- DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical compound C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 125000005448 ethoxyethyl group Chemical group [H]C([H])([H])C([H])([H])OC([H])([H])C([H])([H])* 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 description 1
- 125000004464 hydroxyphenyl group Chemical group 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 1
- LRDFRRGEGBBSRN-UHFFFAOYSA-N isobutyronitrile Chemical compound CC(C)C#N LRDFRRGEGBBSRN-UHFFFAOYSA-N 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 229910001496 lithium tetrafluoroborate Inorganic materials 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 125000004184 methoxymethyl group Chemical group [H]C([H])([H])OC([H])([H])* 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- PDKHNCYLMVRIFV-UHFFFAOYSA-H molybdenum;hexachloride Chemical compound [Cl-].[Cl-].[Cl-].[Cl-].[Cl-].[Cl-].[Mo] PDKHNCYLMVRIFV-UHFFFAOYSA-H 0.000 description 1
- 239000004570 mortar (masonry) Substances 0.000 description 1
- VSHTWPWTCXQLQN-UHFFFAOYSA-N n-butylaniline Chemical compound CCCCNC1=CC=CC=C1 VSHTWPWTCXQLQN-UHFFFAOYSA-N 0.000 description 1
- CDVPTGYCKVXPMN-UHFFFAOYSA-N n-methyl-n-phenoxyaniline Chemical compound C=1C=CC=CC=1N(C)OC1=CC=CC=C1 CDVPTGYCKVXPMN-UHFFFAOYSA-N 0.000 description 1
- GYNAVKULVOETAD-UHFFFAOYSA-N n-phenoxyaniline Chemical compound C=1C=CC=CC=1NOC1=CC=CC=C1 GYNAVKULVOETAD-UHFFFAOYSA-N 0.000 description 1
- FRCFWPVMFJMNDP-UHFFFAOYSA-N n-propan-2-ylaniline Chemical compound CC(C)NC1=CC=CC=C1 FRCFWPVMFJMNDP-UHFFFAOYSA-N 0.000 description 1
- 125000003506 n-propoxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- BGUPWXNCOACHRQ-UHFFFAOYSA-N n-propoxyaniline Chemical compound CCCONC1=CC=CC=C1 BGUPWXNCOACHRQ-UHFFFAOYSA-N 0.000 description 1
- CDZOGLJOFWFVOZ-UHFFFAOYSA-N n-propylaniline Chemical compound CCCNC1=CC=CC=C1 CDZOGLJOFWFVOZ-UHFFFAOYSA-N 0.000 description 1
- YJMNOKOLADGBKA-UHFFFAOYSA-N naphthalene-1-carbonitrile Chemical compound C1=CC=C2C(C#N)=CC=CC2=C1 YJMNOKOLADGBKA-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- RNVCVTLRINQCPJ-UHFFFAOYSA-N o-toluidine Chemical compound CC1=CC=CC=C1N RNVCVTLRINQCPJ-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 229920001197 polyacetylene Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- USHAGKDGDHPEEY-UHFFFAOYSA-L potassium persulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OOS([O-])(=O)=O USHAGKDGDHPEEY-UHFFFAOYSA-L 0.000 description 1
- FVSKHRXBFJPNKK-UHFFFAOYSA-N propionitrile Chemical compound CCC#N FVSKHRXBFJPNKK-UHFFFAOYSA-N 0.000 description 1
- 150000003233 pyrroles Chemical class 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- YBCAZPLXEGKKFM-UHFFFAOYSA-K ruthenium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[Ru+3] YBCAZPLXEGKKFM-UHFFFAOYSA-K 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- YOUIDGQAIILFBW-UHFFFAOYSA-J tetrachlorotungsten Chemical compound Cl[W](Cl)(Cl)Cl YOUIDGQAIILFBW-UHFFFAOYSA-J 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
〈産業上の利用分野〉
本発明は、アニリン系化合物を第二銅化合物と二1−リ
ル系化合物とからなる酸化剤により反応さヒて1qられ
る、アニリン系重合体からなる導電材料の製造方法の改
良に関するものである。[Detailed Description of the Invention] <Industrial Application Field> The present invention provides an aniline polymer which is produced by reacting an aniline compound with an oxidizing agent consisting of a cupric compound and a 21-lyl compound. The present invention relates to an improvement in a method for producing a conductive material comprising:
〈従来の技術〉
主鎖に共役二重結合をもつ高分子、例えばポリアレチレ
ン、ポリパラフェニレン、ポリチェニレン、ポリピロー
ル、ポリパラフェニレンビニレン、ポリアニリンなどは
、五ッツ化砒素。<Prior art> Polymers having a conjugated double bond in the main chain, such as polyalethylene, polyparaphenylene, polythenylene, polypyrrole, polyparaphenylenevinylene, polyaniline, etc., are arsenic pentatide.
五フッ化アンヂモン、沃素、臭素、三芯化イオウ、n−
ブヂルリチ「クム、ナフタレンナ1〜リウムのようなP
型あるいはN型のドーピング剤で処理すると電気伝導性
が著しく向上し、絶縁体から半導体、ざらに導電体にな
ることが従来より知られている。これらの導電材料、所
謂導電性ポリマーは、粉状2粒状、塊状、フィルム状で
得られ、用、途に応じてそのまま又は成形して使用され
、帯電防止祠料、電磁波遮蔽材料、光電変換素子(電子
−光機能素子)、光メモリ−(ホログラフィックメモリ
〉や各種レンリー等の別面素子2衷示素子(エレクトロ
クロミズム)、スイッチ、各種ハイブリット材料(透明
導電性フィルム等)、各種端末機器あるいは蓄電池など
の広い分野への応用が検討されている。Andimony pentafluoride, iodine, bromine, tricore sulfur, n-
Bujirrichi “Kum, naphthalenna 1~Rium-like P
It has been known that when treated with a type or N type doping agent, the electrical conductivity is significantly improved and the material changes from an insulator to a semiconductor or even a conductor. These conductive materials, so-called conductive polymers, are obtained in the form of powder, grains, blocks, or films, and are used as they are or after being molded depending on the purpose, such as antistatic abrasives, electromagnetic shielding materials, and photoelectric conversion elements. (electronic-optical functional elements), optical memory (holographic memory), two-layer display elements (electrochromism) such as various types of Renly, switches, various hybrid materials (transparent conductive films, etc.), various terminal devices or storage batteries. Applications to a wide range of fields are being considered.
上記の各種の導電性ポリマーのうちポリチェニレン、ポ
リピロールやポリアニリンなどは、ポリアセチレンに較
べて、空気中での安定性が良好で酸化劣化が極めて少な
く、また取扱い易い導電性ポリマーの一つで、この特性
を生かした種々の応用への検討が行なわれている。Among the various conductive polymers mentioned above, polythenylene, polypyrrole, polyaniline, etc. have better stability in air than polyacetylene, have extremely little oxidative deterioration, and are easy to handle conductive polymers. Studies are being carried out on various applications that take advantage of this.
これらポリチェニレン、ポリピロールやポリアニリンな
どの製造方法としては、■電気化学的に酸化重合(電解
重合)する方法、及び■酸化剤を使用して化学的に酸化
重合する方法などが知られている。そして、■の方法で
は、電解重合に用いた陽極上にポリチェニレン、ポリピ
ロール又はポリアニリンがフィルム状に析出し、析出後
に陽極上から剥離することによりフィルム状のポリチェ
ニレン、ポリピロール又はポリアニリンが得られる。ま
た■の方法では、過硫酸カリウムや過la酸アンモニウ
ムなどの過酸化物、硝酸や硫酸おるいはクロム酸などの
酸、塩化第二鉄や塩化ルテニウムや塩化タングステンあ
るいは塩化モリブデンなどのルイス酸のような酸化剤を
使用して、同相、液相あるいは気相で酸化重合を行ない
、粉末状のポリピロールが得られる。また有機溶媒中で
過塩素酸第二鉄を酸化剤に使用して酸化重合を行なって
同様な粉末状のポリピロールを1qることも提案されて
いる(例えばMo1. Cryst、 liq、Cry
st0誌、1985年 vol 118の第149〜1
53頁)。Known methods for producing polythenylene, polypyrrole, polyaniline, etc. include (1) electrochemical oxidative polymerization (electrolytic polymerization), and (2) chemical oxidative polymerization using an oxidizing agent. In the method (2), polythenylene, polypyrrole or polyaniline is deposited in a film form on the anode used for electrolytic polymerization, and after the deposition is peeled off from the anode, polythenylene, polypyrrole or polyaniline is obtained in the form of a film. In addition, in the method (■), peroxides such as potassium persulfate and ammonium perlaate, acids such as nitric acid, sulfuric acid, or chromic acid, and Lewis acids such as ferric chloride, ruthenium chloride, tungsten chloride, or molybdenum chloride are used. Powdered polypyrrole is obtained by carrying out oxidative polymerization in the same phase, liquid phase or gas phase using such an oxidizing agent. It has also been proposed to perform oxidative polymerization in an organic solvent using ferric perchlorate as an oxidizing agent to obtain 1 q of similar powdered polypyrrole (for example, Mo1.Cryst, liq, Cry).
st0 magazine, 1985 vol 118 no. 149-1
page 53).
ところが、上記■の方法では、ポリチェニレン、ポリピ
ロールやポリアニリンが上記のように陽極上にフィルム
状で生成するため、生成物の大きさが電極板の大きさに
規制され、量産性の面で大きな制約をうけるとともに、
電解重合法を用いていることから製造法が煩雑でロス1
〜高でおる等という不都合がある。However, in method (■) above, polythenylene, polypyrrole, and polyaniline are produced in the form of a film on the anode as described above, so the size of the product is regulated by the size of the electrode plate, which is a major constraint in terms of mass production. Along with receiving
Since the electrolytic polymerization method is used, the manufacturing method is complicated and there is 1 loss.
-There are inconveniences such as being expensive.
また■の方法の場合には、■の如き不都合はないものの
、得られるポリチェニレン、ポリピロールヤボリアニリ
ンなどの電気伝導度が小さいため、種々の用途への展開
に制約を受けて応用範囲が狭いという不都合をかかえて
いる。In addition, in the case of method (2), although there are no disadvantages as in (2), the electrical conductivity of the resulting polythenylene, polypyrrole yaborianiline, etc. is low, which limits its application to various uses and has a narrow range of application. I am experiencing some inconvenience.
更に、■の方法において、有機溶媒中で過塩素酸第二鉄
を酸化剤として用いる場合は、有機溶媒中での過塩素酸
第二鉄の溶解度が水溶液中に較べて小さいため、量産性
の面で製造上制約をうけて不利であるとともに、溶解度
の減少分だけ溶媒中における前記ドーピング剤のCt度
が低下するため、生成するポリピロールやポリアニリン
の電気伝導度が小さいという問題がある。Furthermore, in method (2), when ferric perchlorate is used as an oxidizing agent in an organic solvent, the solubility of ferric perchlorate in the organic solvent is lower than that in an aqueous solution, making it difficult to mass-produce. In addition, there is a problem that the electrical conductivity of the polypyrrole or polyaniline produced is low because the Ct degree of the doping agent in the solvent decreases by the decrease in solubility.
加えて、爆発などの危険性の高い行別溶媒を取扱うため
、製造工程において種々の安全対策を施す必要があると
いう不都合もある。In addition, there is the disadvantage that various safety measures must be taken during the manufacturing process because a line-specific solvent with a high risk of explosion is handled.
一方、特開昭60−58430号公報には、ピロール類
を溶液中で導電性塩の存在下に酸素含有酸化剤を用いて
処理するようにした導電性の粉末状ピロール重合物の製
法が提案されている。On the other hand, JP-A No. 60-58430 proposes a method for producing conductive powdery pyrrole polymers in which pyrroles are treated with an oxygen-containing oxidizing agent in the presence of a conductive salt in a solution. has been done.
・しかしながらこの方法の場合、上記の酸素含有酸化剤
として、パーオキソ酸又はその塩又は過酸化水素といっ
た過酸化物を使用している為、爆発、危険性があり、そ
の貯蔵取扱い反応口)の異常について、十分に注意する
必要があり、工業的に大量生産する場合、取扱い安全上
で極めて大きな欠点をかかえている。・However, in this method, peroxides such as peroxoacid or its salt or hydrogen peroxide are used as the above oxygen-containing oxidizing agent, so there is a risk of explosion and abnormalities in the storage and handling reaction port). It is necessary to be very careful about this, and when mass-producing it industrially, it has extremely large drawbacks in terms of handling safety.
そこで、本発明者は、第二銅化合物とニトリル系化合物
を共存させてなる酸化剤の存在下でこの種の共役系化合
物を重合反応させることによって、上記の不都合ないし
欠点がなく、空気中で安定であることは勿論、反応速度
が大きく且つ製造容易であり、また電気伝導度の大きな
導電材料の製造方法を提案した(特願昭61−2152
96月)。Therefore, the present inventors have discovered that by polymerizing this type of conjugated compound in the presence of an oxidizing agent made of a cupric compound and a nitrile compound, the above-mentioned disadvantages and drawbacks can be avoided, and the method can be used in air. We proposed a method for manufacturing a conductive material that is not only stable but also has a high reaction rate, is easy to manufacture, and has high electrical conductivity (Japanese Patent Application No. 61-2152).
June 9).
〈発明が解決しようとする問題点〉
しかしながら、このようにして得られた共役系化合物の
重合体のうちアニリン系化合物の重合体は、上記のよう
に電気伝導度の大きな導電外車合体であるが、有機溶媒
への溶解性が比較的大きく、また耐溶剤性が悪くて、反
応生成物を精製などすべくニトリル系化合物などからな
る有機溶媒で洗浄処理した後などの歩留りがかなり低く
、工業上人量に生産する時にはロス1〜高の要因となる
といった問題があることがわがつ lこ。<Problems to be Solved by the Invention> However, among the polymers of conjugated compounds obtained in this way, the polymer of aniline compounds is a conductive outer polymer with high electrical conductivity as described above. , has a relatively high solubility in organic solvents and poor solvent resistance, and the yield after washing with organic solvents such as nitrile compounds to purify the reaction product is quite low, making it difficult to use industrially. When producing in large quantities, there are problems that can cause losses of 1 to 100%.
〈問題点を解決するための手段〉
本発明者は上記の問題のないアニリン系重合体の製造方
法を鋭意検討した所、次の手段を用いた場合には所期の
目的を達成できることを知得してこの発明を完成した。<Means for Solving the Problems> The present inventor has intensively studied a method for producing aniline polymers that does not have the above problems, and has found that the intended purpose can be achieved by using the following means. This invention was successfully completed.
すなわち本発明は、アニリン系化合物を、第二銅化合物
とニトリル系化合物とを共存ざぜてなる酸化剤の存在下
に反応させてアニリン系重合体からなる導電月利を製造
する方法において1、前記反応時に塩を共存させること
を要旨とする導電材料の製造方法に存する。That is, the present invention provides a method for producing a conductive material made of an aniline polymer by reacting an aniline compound in the presence of an oxidizing agent formed by coexisting a cupric compound and a nitrile compound. The present invention resides in a method for producing a conductive material, the gist of which is allowing a salt to coexist during the reaction.
本発明で使用する第二銅化合物としては、例えば、
一般式
%式%(1)
(式中、XはC20−1BF4−1
AsF −1PF −1SbF6−1CH3C6H
4SO3−、CF3 SO3−、ZrF6−”’、T
i F6−または5iF6−を表わし、mは1〜2の整
数を表わす。)で示される第二銅化合物が挙げられる。As the cupric compound used in the present invention, for example, the general formula % formula % (1) (wherein, X is C20-1BF4-1 AsF -1PF -1SbF6-1CH3C6H
4SO3-, CF3SO3-, ZrF6-"', T
i F6- or 5iF6-, and m represents an integer of 1 to 2. ) are mentioned.
また本発明で使用するニトリル系化合物としては、例え
ば、
一般式
%式%(2)
(式中、Rは置換基を有してもよいアルキル基、アルケ
ニル基、アリール基を表わし、nは1〜3の整数を表わ
す。)
で示されるニトリル系化合物が挙げられる。Further, the nitrile compound used in the present invention includes, for example, the general formula % formula % (2) (wherein R represents an alkyl group, alkenyl group, or aryl group that may have a substituent, and n is 1 represents an integer of 3 to 3).
本発明の製造方法では、単一または異なる二種類以上の
アニリン系化合物を用い、これと、単一または異なる二
種類以上の第二銅化合物と単−又は異なる二種以上の二
1〜リル系化合物とからなる酸化剤とを反応さけること
ができる。In the production method of the present invention, a single or two or more different aniline compounds are used, a single or different two or more cupric compounds, and a single or two or more different 21-lyl compounds. It is possible to avoid reaction between the compound and the oxidizing agent.
本発明で使用する上記アニリン系化合物としては、例え
ば、一般式
(式中、R1,R2は水素原子、アルギル基、アルコキ
シ基、アリール基、アリロキシ基、アミノ基、アルキル
アミノ基、アリールアミノ基を表わし、R3、R4は水
素原子、アルキル基、アリール基を表わす。)
で示されるアニリン系化合物が挙げられる。The above-mentioned aniline compounds used in the present invention include, for example, the general formula (wherein R1 and R2 are hydrogen atoms, argyl groups, alkoxy groups, aryl groups, allyloxy groups, amino groups, alkylamino groups, and arylamino groups. (where R3 and R4 represent a hydrogen atom, an alkyl group, or an aryl group).
一方、本発明で使用する塩としては、例えば、該酸化剤
を含む反応系に可溶で、且つこの反応系においてイオン
解離し易い有機又は無機の塩又は複塩で、
一般式
%式%(4)
(式中、Mはアルカリ金属又は4級アルキルアンモニウ
ム基であり、Xは過塩素酸イオン、フッ素系金属陰イオ
ン、スルホン酸系陰イオンであり、aは1〜2の整数を
表わす。)で示される塩が挙げられる。On the other hand, the salt used in the present invention is, for example, an organic or inorganic salt or double salt that is soluble in the reaction system containing the oxidizing agent and easily dissociates into ions in this reaction system, and has the general formula % formula % ( 4) (In the formula, M is an alkali metal or a quaternary alkylammonium group, X is a perchlorate ion, a fluorine metal anion, or a sulfonic acid anion, and a represents an integer of 1 to 2. ) are listed.
前記一般式(1)で示される第二銅化合物は、具体的に
は、Cu (Cff104 >2、Cu (BF )
、Cu (PF6 )2、Cu(AsF3)2、C
u(SbF6)2、Cu (CH3C6F(45O
3)2 、Cu(CF3S03)2、CuZrF6
、CuT ! FB 、CLJS ! FBでおり、こ
れらは通常、結晶水をもつ化合物もしくは水溶液として
使用される。Specifically, the cupric compound represented by the general formula (1) is Cu (Cff104 >2, Cu (BF )
, Cu(PF6)2, Cu(AsF3)2, C
u(SbF6)2, Cu(CH3C6F(45O
3)2, Cu(CF3S03)2, CuZrF6
,CuT! FB, CLJS! FB, which are usually used as compounds with water of crystallization or as aqueous solutions.
前記一般式(2)で示されるニトリル系化合物において
、Rはメチル基、エチル基、n−プロピル基、イソプロ
ピル基、n−ブチル基、イソブチル基、5ec−ブチル
基、tert−ブチル基、ビニル基、メチルビニル基、
ジメチルビニル基、エチルビニル基、ジエチルビニル基
、n−プロピルビニル基、n−ブチルビニル基、フェニ
ルビニル基、ナフチルビニル基、ヒドロキシメチル基、
ヒドロキシエチル基、ヒドロキシプロピル塁、ヒドロキ
シエチル基、メ1へキシメチル基、メトキシナチル基、
メトキシプロピル基、工1〜キシメチル基、エトキシエ
チル基、シアンメチル基、シアンエチル基、シアノプロ
ピル基、シアノブチル基、シアンペンチル基、シアノヘ
キシル基、カルボキシメチル
ル基、カルボキシプロピル基、フェニル基、ナフチル基
、トルイル基、ヒドロキシフェニル基、ヒドロキシナフ
チル基、メトキシナフチル基、エトキシフェニル塁、メ
トキシナフチル基、シアノフェニル基、ジシアノフェニ
ル基、シアノトルイル基、ジシアノ1〜ルイル基、シア
ノナフチル基、カルボキシフェニル基、カルボキシトル
イル基などを表わす。このようなニトリル系化合物とし
て、具体的には′、アセ1〜ニトリル、n−プロピオニ
トリル、イソプロピオニトリル、n−ブチロニトリル、
イソブチロニトリル、tert−ブチロニトリル、アク
リロニ1〜リル、メチルアクリロニトリル、エチルアク
リロニトリル、フェニルアクリロニトリル、アセ1〜ン
シアンヒドリン、メヂレンシアンヒドリン、エチレンシ
アンヒドリン、プロピレンシアンヒドリン、メ]〜キシ
アセ1ー二1〜リル、エトキシアセトニ1〜リル、メ1
〜キシプロピオニ1ーリル、マロンジニトリル、アジポ
ニトリル、シアン酢酸、シアノプロピオン酸、シアン醋
酸、ベンゾニ1〜リル、ナフトニトリル、メチルベンゾ
ニ1〜リル、ヒドロキシベンゾニトリル、フタロニ1ー
リル、1〜リシアノベンゼン、メ1〜キシベンゾニトリ
ル、力―
ルポキシベンゾニトリルなどが挙げられる。In the nitrile compound represented by the general formula (2), R is a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a 5ec-butyl group, a tert-butyl group, or a vinyl group. , methylvinyl group,
Dimethyl vinyl group, ethyl vinyl group, diethyl vinyl group, n-propyl vinyl group, n-butyl vinyl group, phenyl vinyl group, naphthyl vinyl group, hydroxymethyl group,
Hydroxyethyl group, hydroxypropyl group, hydroxyethyl group, methoxymethyl group, methoxynatyl group,
Methoxypropyl group, oxymethyl group, ethoxyethyl group, cyanmethyl group, cyanethyl group, cyanopropyl group, cyanobutyl group, cyanopentyl group, cyanohexyl group, carboxymethyl group, carboxypropyl group, phenyl group, naphthyl group group, tolyl group, hydroxyphenyl group, hydroxynaphthyl group, methoxynaphthyl group, ethoxyphenyl group, methoxynaphthyl group, cyanophenyl group, dicyanophenyl group, cyanotolyl group, dicyano-1-ruyl group, cyanonaphthyl group, carboxyphenyl group, Represents a carboxytolyl group, etc. Examples of such nitrile compounds include ', ace-1-nitrile, n-propionitrile, isopropionitrile, n-butyronitrile,
Isobutyronitrile, tert-butyronitrile, acrylonitrile, methylacrylonitrile, ethyl acrylonitrile, phenyl acrylonitrile, ace1-cyanhydrin, medilene cyanohydrin, ethylene cyanohydrin, propylene cyanohydrin, -21~lyl, ethoxyacetoni1~lyl, me1
~xypropionitrile, malondinitrile, adiponitrile, cyanacetic acid, cyanopropionic acid, cyanoacetic acid, benzonitrile, naphthonitrile, methylbenzonilyl, hydroxybenzonitrile, phthalonitrilyl, lycyanobenzene, melilyl ~xybenzonitrile, lypoxybenzonitrile, etc.
上記一般式(3)で示されるアニリン系化合物において
、R1,R2は水素原子、メチル基、エチル基、n−プ
ロピル基、イソプロピル基、n−ブチル基、イソブチル
基、sec−ブチル基、tert−ブチル基、メトキシ
基、工1〜キシ基、n−プロポキシ基、n−11〜キシ
基、フェニル基、トルイル基、ナフチル基、フェノキシ
基、メチルフェノキシ基、ナフトキシ基、アミン基、ジ
メチルアミノ基、ジエチルアミノ基、フェニルアミノ基
、ジフェニルアミノ基、メチルフエニルアミノ基、フェ
ニルナフチルアミノ基を表わし、R,R4は水素原子、
メチル基、エチル基、n−プロピル基、イソプロピル基
、n−ブヂル基、フェニル基、トルイル基、ナフチル基
を表わす。In the aniline compound represented by the above general formula (3), R1 and R2 are hydrogen atoms, methyl groups, ethyl groups, n-propyl groups, isopropyl groups, n-butyl groups, isobutyl groups, sec-butyl groups, tert- Butyl group, methoxy group, 1~xy group, n-propoxy group, n-11~xy group, phenyl group, tolyl group, naphthyl group, phenoxy group, methylphenoxy group, naphthoxy group, amine group, dimethylamino group, represents a diethylamino group, a phenylamino group, a diphenylamino group, a methylphenylamino group, a phenylnaphthylamino group, R and R4 are hydrogen atoms,
It represents a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, a phenyl group, a tolyl group, and a naphthyl group.
このようなアニリン系化合物として、具体的には、アニ
リン、メトキアニリン、エチルアニリン、n−プロピル
アニリン、イソプロピルアニリン、n−ブチルアニリン
、メトキシアニリン、工1ヘギシアニリン、n−プロポ
キシアニリン、フェニルアニリン、1〜ルイルアニリン
、ナフヂルアニリン、フェノキシアニリン、メチルフェ
ノキシアニリン、ナノ1〜キシアニリン、アミンアニリ
ン、ジメヂルアミノアニリン、ジエヂルアミノアニリン
、フェニルアミノアニリン。Specific examples of such aniline compounds include aniline, methoxyaniline, ethylaniline, n-propylaniline, isopropylaniline, n-butylaniline, methoxyaniline, hegycyaniline, n-propoxyaniline, phenylaniline, -ruylaniline, naphdylaminoaniline, phenoxyaniline, methylphenoxyaniline, nano 1 - xyaniline, amineaniline, dimedylaminoaniline, diethylaminoaniline, phenylaminoaniline.
ジフェニルアミノアニリン、メチルフェニルアミノアニ
リン、フェニルナフチルアミンアニリンなどが挙げられ
る。Examples include diphenylaminoaniline, methylphenylaminoaniline, and phenylnaphthylamineaniline.
上記一般式(4)で示される塩は、具体的には、L i
Cβ04 、L i BF4 、L i As Fe
、LiPF6、LiSbF6、LiSbF6、LiTi
F6、Li2SiF6、
L i 2 B10Cff110. CH3C
6ト’4SO3Li。Specifically, the salt represented by the above general formula (4) is Li
Cβ04, L i BF4, L i As Fe
, LiPF6, LiSbF6, LiSbF6, LiTi
F6, Li2SiF6, L i 2 B10Cff110. CH3C
6to'4SO3Li.
CF3303 Li、NaC,204、N a B F
4 、N a A S F 6 、N a S b
F 6、Na2ZrF6 、Na2T i FB、N
a2 S ! FB 、N a2 B10CJ!10゜
CH3C6H4SO3N a、 CF3 503
N a 、Bu4NCf104 、Bu4NBF4
、Bu4NASF6 、BLJ4 NPF6、Bu4N
SbF6、(BLJ4 N)2 zr FB、(Bu4
N>27i FB、
(BLJ4N>2 S i F(、、
(Bu4N)2B1oCβ1o、
CH3C6ト14 S O3N B u a 、C
F35O°3NBu4、Et4NCβ04、Et N
BF’ 、Et NASF6.Et4NPF6、E
t4NSbF6、
(E t 4 N > 22 r F 6、(Ej4N
>2T!FB、
([j4 N>23! FB、
(E t4 N > 2 B10CJ210゜C1−1
3C6H4SO3NEt4、
CF3303 NEt4などが挙げられる。CF3303 Li, NaC, 204, Na B F
4, N a S F 6, N a S b
F6, Na2ZrF6, Na2T i FB, N
a2 S! FB, N a2 B10CJ! 10゜CH3C6H4SO3N a, CF3 503
N a , Bu4NCf104 , Bu4NBF4
, Bu4NASF6 , BLJ4 NPF6, Bu4N
SbF6, (BLJ4 N)2 zr FB, (Bu4
N>27i FB, (BLJ4N>2 S i F(,, (Bu4N)2B1oCβ1o, CH3C6to14 S O3N Bu a , C
F35O°3NBu4, Et4NCβ04, Et N
BF', Et NASF6. Et4NPF6,E
t4NSbF6, (E t 4 N > 22 r F 6, (Ej4N
>2T! FB, ([j4 N>23! FB, (E t4 N>2 B10CJ210゜C1-1
Examples include 3C6H4SO3NEt4 and CF3303NEt4.
一般式(1)で示される第二銅化合物の使用量は、上記
共役系化合物1モルに対して0.01〜100倍モルで
おり、好ましくは0.1〜50倍モルである。The amount of the cupric compound represented by the general formula (1) to be used is 0.01 to 100 times, preferably 0.1 to 50 times, per mole of the conjugated compound.
また、一般式(2)で示されるニトリル系化合物は第二
銅化合物と共存して使用されるが、その使用方法は例え
ば以下の方法が挙げられる。Further, the nitrile compound represented by the general formula (2) is used together with the cupric compound, and examples of the method for using it include the following method.
1)予め二1〜リル系化合物と第二銅化合物とを共存さ
せてから、アニリン系化合物と作用させる。1) After allowing the 21-lyl compound and the cupric compound to coexist in advance, they are allowed to interact with the aniline compound.
2)アニリン系化合物とニトリル系化合物との共存した
系に、第二銅化合物を作用させる。2) A cupric compound is allowed to act on a system in which an aniline compound and a nitrile compound coexist.
3)アニリン系化合物と第二銅化合物との共存した系に
、ニトリル系化合物を作用さぼる。3) A nitrile compound is applied to a system in which an aniline compound and a cupric compound coexist.
4)アニリン系化合物とニトリル系化合物との共存した
系に、第二銅化合物と二1−リル系化合物との共存した
系を作用させる。4) A system in which a cupric compound and a 21-lyl compound coexist is applied to a system in which an aniline compound and a nitrile compound coexist.
5)第二銅化合物とニトリル系化合物との反応生成物を
予め単離し、それをアニリン系化合物と作用さける。5) Isolate the reaction product of the cupric compound and the nitrile compound in advance and avoid reacting it with the aniline compound.
このようなニトリル系化合物の共存によりアニリン系化
合物と酸化剤との反応が著しく加速され、実質的に殆ん
ど酸化重合反応が進行しない系でも、上記酸化重合反応
が容易に進行するようになる。The coexistence of such a nitrile compound significantly accelerates the reaction between the aniline compound and the oxidizing agent, allowing the oxidative polymerization reaction to proceed easily even in a system where substantially no oxidative polymerization reaction occurs. .
また、一般式(2)で示されるニトリル系化合物の使用
量は第二銅化合物1モルに対して0.01〜10,00
0倍モルであり、好ましくは0.1〜i、ooo倍モル
である。そして、ニトリル系化合物が液状物質の場合は
これを反応溶媒として使用したり、また固体状物質の場
合には任意の溶媒、例えば水、メタノール、エタノール
のようなアルコール系溶媒、テトラヒドロフラン、ジオ
キリ°ン、ベンゼン、トルエン、ジクロルメタン、ジク
ロルエタン、酢酸などの一般の有機溶媒を使用したりす
ることができる。Further, the amount of the nitrile compound represented by general formula (2) used is 0.01 to 10,000 per mole of the cupric compound.
It is 0 times the molar amount, preferably 0.1 to i, ooo times the molar amount. If the nitrile compound is a liquid substance, it can be used as a reaction solvent, or if it is a solid substance, any solvent such as water, alcoholic solvents such as methanol or ethanol, tetrahydrofuran, dioxylin, etc. can be used. , benzene, toluene, dichloromethane, dichloroethane, acetic acid, and other common organic solvents.
また、一般式(4)で示される塩の使用可は上記アニリ
ン系化合物1モルに対して0.01〜100倍モルであ
り、好ましくは0.1〜50倍モルでおる。そして、こ
の塩の使用方法は例えば以下の方法が挙げられる。Further, the salt represented by the general formula (4) can be used in an amount of 0.01 to 100 times, preferably 0.1 to 50 times, per mole of the aniline compound. Examples of methods for using this salt include the following methods.
1)予めニトリル系化合物と共存させ、それを第二銅化
合物又はアニリン系化合物に添加する。1) Coexist with a nitrile compound in advance and add it to the cupric compound or aniline compound.
2)予め第2銅化合物と共存させ、それを二1〜リル系
化合物又はアニリン系化合物に添加する。2) Coexist with a cupric compound in advance and add it to the di-1-lyl compound or aniline compound.
3)予めアニリン系化合物と共存させ、それを二1〜リ
ル系化合物又は第二銅化合物に添加する。3) Coexist with the aniline compound in advance and add it to the 21-lyl compound or the cupric compound.
反応温度は一50℃〜150°Cであり、好ましくは一
20’C〜100℃である。反応時間は反応温度と関連
するが、通常0.1〜200時間、好ましくは0.5〜
100時間である。The reaction temperature is -50°C to 150°C, preferably -20'C to 100°C. The reaction time is related to the reaction temperature, but is usually 0.1 to 200 hours, preferably 0.5 to 200 hours.
It is 100 hours.
反応生成物は暗褐色〜黒色の粉末状物質であり、上記溶
媒存在下での反応では反応終了後溶媒を通常の方法で除
去した後、本発明においては、液状の二1へリル系化合
物、例えばアセトニトリル、プロピオニ1〜リルなどの
溶媒で反応生成物を数回洗浄精製し、副生じた第一銅化
合物を溶解して除去しておくと、より電導性の高い生成
物を1qることかできるので好ましい。The reaction product is a dark brown to black powdery substance, and in the reaction in the presence of the above-mentioned solvent, after the reaction is completed, the solvent is removed by a conventional method, and in the present invention, a liquid 21-helyl compound, For example, if the reaction product is washed and purified several times with a solvent such as acetonitrile or propionitrile, and the by-produced cuprous compound is dissolved and removed, 1q of products with higher conductivity can be obtained. This is preferable because it can be done.
〈作 用〉
以上の方法を用いることにより、有機溶媒への溶解性が
小さくまた耐溶剤性が良好で製造時の歩預りが高く、更
に製造容易で電気伝導度が大きく、また取扱安全性のよ
いアニリン系車合体を1qることかできる。<Function> By using the above method, it has low solubility in organic solvents, good solvent resistance, high yield during production, easy production, high electrical conductivity, and safe handling. It is possible to make 1q of good aniline-based car combinations.
〈実施例〉
以下に実施例を挙げて本発明の製造方法を具体的に説明
する。<Example> The manufacturing method of the present invention will be specifically explained with reference to Examples below.
実施例1
1λの丸底フラスコにアニリン3.7 (J (0,0
4モル) 、L i BF4y、5g(o、oaモル)
、アセ1〜二1〜リル150muを採り、窒素雰囲気下
で攪拌しながら、この溶液に、空温(15〜20 ’C
)で予め調整した45%Cu(BF4>2水溶液63.
2G (0,12−Eル)とアセトニトリル75mN
との混合液を15分間にわたって滴下した。Example 1 Aniline 3.7 (J (0,0
4 mol), L i BF4y, 5g (o, oa mol)
, Ace1-21-Ril 150 mu was taken and added to this solution at air temperature (15-20'C) while stirring under a nitrogen atmosphere.
) 45% Cu (BF4>2 aqueous solution 63.
2G (0,12-El) and acetonitrile 75mN
A mixed solution was added dropwise over 15 minutes.
滴下と共に発熱が認められ反応液は直ちに黒色に変化し
、反応液中に粉状の固形物が析出し、スラリー状を呈し
た。2時間攪拌を継続した後、空温で一夜放置した。As the mixture was added, heat generation was observed, and the reaction liquid immediately turned black. Powder-like solids were precipitated in the reaction liquid, and the mixture took on the form of a slurry. After continuing stirring for 2 hours, the mixture was left at air temperature overnight.
反応物を炉別すると白色の結晶状物が混入した黒色の粉
末状物質が1qられた。これをアセトニトリル600I
IlfJで4回洗浄を繰返したところ白色結晶状物が除
去され、温度60℃で減圧乾燥すると3,7gの黒色粉
末状物質が得られた。When the reactant was separated in the furnace, 1 q of black powdery material mixed with white crystalline material was obtained. Add this to acetonitrile 600I
After repeated washing with IlfJ four times, the white crystalline material was removed, and after drying under reduced pressure at a temperature of 60° C., 3.7 g of a black powdery material was obtained.
黒色物の元素分析をした所、C51,10%、ト14.
00%、N 9.99%、F 22.35%であり、炭
素を6と仮定するとC6、”5.6 、N1.0、Fl
、64に相当するものを得た。また別途、銅の含有量を
分析した結果、窒素1.0に対して銅o、ooiで必っ
た。これはポリマーに対してCu(BF4)2が反応し
たものであり、殊にそのアニオン部分が付加したもので
あることを示している。Elemental analysis of the black substance revealed that it was C51.10%, 14.
00%, N 9.99%, F 22.35%, and assuming carbon is 6, C6, "5.6, N1.0, Fl
, 64 was obtained. Separately, as a result of analyzing the copper content, it was found that the copper content was 0 and ooi for nitrogen 1.0. This indicates that Cu(BF4)2 reacted with the polymer, and in particular, the anion portion thereof was added.
この黒色物について2端子法による電気伝導度の測定を
行なった結果、9 X 10−2S0−2Sを得、半導
体領域の導電性をもった有機半導体でおることがわかっ
た。As a result of measuring the electrical conductivity of this black substance by a two-terminal method, it was found that 9 x 10-2S0-2S was obtained, and it was found to be an organic semiconductor with conductivity in a semiconductor region.
尚、上記電気伝導度の測定は次のように行なった。まず
上記処理により1qた黒色粉末を乳鉢で充分細かく粉砕
した後、直径1Qmmのディスク状に加圧成形(5トン
/cIl12)シた。次いで、このディスクサンプルを
同一大の2つの銅製の円筒で挟み、上部より1.2Kg
の加吏をかけ、上下の銅製円筒より導線リードをそれぞ
れ取出してデジタルマルチメータ(タグダリケンTR6
851)に接続し、このメータによってディスクサンプ
ルの電気伝導度を測定した。The electrical conductivity was measured as follows. First, 1 q of the black powder obtained by the above treatment was sufficiently finely ground in a mortar, and then pressure-molded (5 tons/cI12) into a disk shape with a diameter of 1 Q mm. Next, this disk sample was sandwiched between two copper cylinders of the same size, and a 1.2 kg load was applied from the top.
, take out the conductor leads from the upper and lower copper cylinders, and use a digital multimeter (Tag Dariken TR6).
851), and the electrical conductivity of the disk sample was measured using this meter.
比較のため、LiBF4を使用しない以外は実施例1と
同様に反応及び洗浄を行なった結果、生成物は有機溶媒
にかなり溶解し、洗浄処理俊の黒色粉末状物質は1.5
gであった。For comparison, the reaction and washing were carried out in the same manner as in Example 1 except that LiBF4 was not used. As a result, the product was considerably dissolved in the organic solvent, and the black powdery substance after washing was 1.5%.
It was g.
以上の結果から、[1BF4を反応系に共存さけること
により、有機溶媒への溶解性が小さく、洗浄処理により
有機溶媒に溶解し難い反応生成物が1qられることか確
認された。From the above results, it was confirmed that by avoiding the coexistence of [1BF4 in the reaction system, 1q of the reaction product, which has low solubility in organic solvents and is difficult to dissolve in organic solvents by washing treatment, can be removed.
実施例2
アニリンの代りにオルト−トルイジンを4.3g、また
LiBF4の代りにL ! 2 B10CJ! 10を
19.0(]使用した他は実施例1と同様にして実験を
行なった結果、4、Ogの黒色粉末状物質を14だ。Example 2 4.3 g of ortho-toluidine was used instead of aniline, and L! 2 B10CJ! An experiment was carried out in the same manner as in Example 1 except that 10 was used at 19.0 ().
得られた黒色粉末状物質の元素分析から、炭素を7.0
と仮定すると、C7、ト18.5 、Ni、o −Fl
、soに相当するものを得た。Elemental analysis of the black powdery substance obtained revealed that carbon content was 7.0%.
Assuming that, C7, t18.5, Ni, o -Fl
, so was obtained.
また、この黒色物の電気伝導度は1.0×10 ’S
Cm−17” アッタ。Also, the electrical conductivity of this black object is 1.0×10'S
Cm-17” Atta.
実施例3〜12
各種のアニリン系化合物と各種の塩を使用し、これらと
、各種の第二銅化合物とニトリル系化合物との反応を実
施例1と同様に行なった。Examples 3 to 12 Various aniline compounds and various salts were used, and reactions of these with various cupric compounds and nitrile compounds were performed in the same manner as in Example 1.
1qられた暗褐色〜黒色粉末状物質の検討結果を第1表
に示した。Table 1 shows the results of the study on the dark brown to black powdery substance obtained.
尚、二I・リル系化合物以外の溶媒を使用して上記反応
を行なった場合、その使用した溶媒を第1表に併ヒて示
した。Incidentally, when the above reaction was carried out using a solvent other than the diI-lyl compound, the solvent used is also shown in Table 1.
〈発明の効果〉
以上の如く、本発明の製造方法によれば、有機溶媒への
溶解性が小さく、また製造容易で、電気伝尋度が大きく
、更に取扱安全性のよいアニリン系化合物の重合体から
なる導電材料が多種得られ、その実用的価値は極めて大
でおる。<Effects of the Invention> As described above, according to the production method of the present invention, a heavy aniline compound that has low solubility in organic solvents, is easy to produce, has high electrical conductivity, and has good handling safety. A wide variety of conductive materials can be obtained by combining these materials, and their practical value is extremely high.
Claims (1)
合物とを共存させてなる酸化剤の存在下に反応させてア
ニリン系重合体からなる導電材料を製造する方法におい
て、前記反応時に塩を共存させることを特徴とする導電
材料の製造方法。 2、前記第二銅化合物が、 一般式 CuX_m・・・・・・(1) (式中、XはClO_4^−、BF_4^−、AsF_
6^−、PF_6^−、SbF_6^−、CH_3C_
6H_4SO_3^−、CF_3SO_3^−、ZrF
_6^−^−、TiF_6^−^−またはSiF_6^
−^−を表わし、mは1〜2の整数を表わす。) で示される第二銅化合物であることを特徴とする特許請
求の範囲第1項記載の方法。 3、前記ニトリル系化合物が 一般式 R(CN)_n・・・・・・(2) (式中、Rは置換基を有してもよいアルキル基、アルケ
ニル基、アリール基を表わし、 nは1〜3の整数を表わす。) で示されるニトリル系化合物であることを特徴とする特
許請求の範囲第1項記載の方法。 4、前記アニリン系化合物が、 一般式 ▲数式、化学式、表等があります▼・・・・・・(3) (式中、R^1、R^2は水素原子、アルキル基、アル
コキシ基、アリール基、アリロキシ基、アミノ基、アル
キルアミノ基、アリールア ミノ基を表わし、R^3、R^4は水素原子、アルキル
基、アリール基を表わす。) で示されるアニリン系化合物であることを特徴とする特
許請求の範囲第1項記載の方法。 5、前記塩が、該酸化剤を含む反応系に可溶で、かつ、
イオン解離し易い有機又は無機の塩又は複塩で、 一般式 M_aX・・・・・・(4) (式中、Mはアルカリ金属又は4級アルキルアンモニウ
ム基であり、Xは過塩素酸イオ ン、フッ素系金属陰イオン、スルホン酸系 陰イオンであり、aは1〜2の整数を表わ す。) で示される塩であることを特徴とする特許請求の範囲第
1項記載の方法。 6、前記アニリン系化合物と前記酸化剤との反応生成物
を、液状のニトリル系化合物で洗浄処理することを特徴
とする特許請求の範囲第1項記載の方法。[Claims] 1. A method for producing a conductive material made of an aniline polymer by reacting an aniline compound in the presence of an oxidizing agent containing a cupric compound and a nitrile compound, A method for producing a conductive material, characterized in that a salt is allowed to coexist during the reaction. 2. The cupric compound has the general formula CuX_m (1) (wherein, X is ClO_4^-, BF_4^-, AsF_
6^-, PF_6^-, SbF_6^-, CH_3C_
6H_4SO_3^-, CF_3SO_3^-, ZrF
_6^-^-, TiF_6^-^- or SiF_6^
-^-, and m represents an integer of 1 to 2. ) The method according to claim 1, which is a cupric compound represented by: 3. The nitrile compound has the general formula R(CN)_n (2) (wherein R represents an alkyl group, alkenyl group, or aryl group that may have a substituent, and n is The method according to claim 1, wherein the nitrile compound is a nitrile compound represented by: 4. The above aniline compound has the general formula▲Mathematical formula, chemical formula, table, etc.▼・・・・・・(3) (In the formula, R^1 and R^2 are hydrogen atoms, alkyl groups, alkoxy groups, represents an aryl group, an allyloxy group, an amino group, an alkylamino group, or an arylamino group, and R^3 and R^4 represent a hydrogen atom, an alkyl group, or an aryl group). The method according to claim 1. 5. The salt is soluble in the reaction system containing the oxidizing agent, and
An organic or inorganic salt or double salt that is easily ionically dissociated, with the general formula M_aX (4) (wherein M is an alkali metal or a quaternary alkylammonium group, X is a perchlorate ion, The method according to claim 1, wherein the salt is a fluorine metal anion or a sulfonic acid anion, and a represents an integer of 1 to 2. 6. The method according to claim 1, wherein the reaction product of the aniline compound and the oxidizing agent is washed with a liquid nitrile compound.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7811187A JPS63243131A (en) | 1987-03-31 | 1987-03-31 | Method for manufacturing conductive materials |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7811187A JPS63243131A (en) | 1987-03-31 | 1987-03-31 | Method for manufacturing conductive materials |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63243131A true JPS63243131A (en) | 1988-10-11 |
Family
ID=13652774
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7811187A Pending JPS63243131A (en) | 1987-03-31 | 1987-03-31 | Method for manufacturing conductive materials |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63243131A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN119842071A (en) * | 2025-01-06 | 2025-04-18 | 北京大学深圳研究生院 | Conductive polymer material, preparation method and application |
-
1987
- 1987-03-31 JP JP7811187A patent/JPS63243131A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN119842071A (en) * | 2025-01-06 | 2025-04-18 | 北京大学深圳研究生院 | Conductive polymer material, preparation method and application |
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