JPS63252437A - Inspection device - Google Patents

Inspection device

Info

Publication number
JPS63252437A
JPS63252437A JP62088162A JP8816287A JPS63252437A JP S63252437 A JPS63252437 A JP S63252437A JP 62088162 A JP62088162 A JP 62088162A JP 8816287 A JP8816287 A JP 8816287A JP S63252437 A JPS63252437 A JP S63252437A
Authority
JP
Japan
Prior art keywords
insulating film
probe needle
electrode
inspection device
contact
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62088162A
Other languages
Japanese (ja)
Other versions
JPH0719812B2 (en
Inventor
Tomoaki Kubota
久保田 智明
Akihiko Kato
加藤 章彦
Masami Akumoto
飽本 正己
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to JP62088162A priority Critical patent/JPH0719812B2/en
Publication of JPS63252437A publication Critical patent/JPS63252437A/en
Publication of JPH0719812B2 publication Critical patent/JPH0719812B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Testing Of Individual Semiconductor Devices (AREA)
  • Measuring Leads Or Probes (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 〔発明の目的〕 (産業上の利用分野) 本発明は、検査装置に関し、特に微細ピッチで多電極を
有する半導体素子の検査に好適な検査装置に関する。
DETAILED DESCRIPTION OF THE INVENTION [Object of the Invention] (Industrial Application Field) The present invention relates to an inspection apparatus, and particularly to an inspection apparatus suitable for inspecting a semiconductor element having multiple electrodes at a fine pitch.

(従来の技術) 一般に、IC9LSI等の半導体素子の電気的特性を検
査する検査装置として、第4図に示すように、半導体素
子1に設けられた電極2に接触するプローブ針3を多数
個備えたものが使用されている。
(Prior Art) In general, a testing device for testing the electrical characteristics of a semiconductor device such as an IC9LSI is equipped with a large number of probe needles 3 that come into contact with electrodes 2 provided on a semiconductor device 1, as shown in FIG. are used.

ところが、IC,LSI等の高集積化に伴って半導体素
子の電極が増加し、かつ微細化されると、これらの電極
に接触させるプローブ針も必然的に微細化密集化する必
要があり、プローブ針の製作調整が難しく、信頼性が低
い等の問題が生じている。
However, as the number of electrodes on semiconductor devices increases and becomes smaller due to the high integration of ICs, LSIs, etc., the probe needles that come into contact with these electrodes must also be miniaturized and densely packed. Problems such as needle manufacturing and adjustment are difficult and reliability is low.

特に、例えば液晶テレビ画面等の基板のように微細ピッ
チで多電極を有するものを検査しようとする場合、従来
のプローブ針を使用する検査装置では対応するのが極め
て・困難である。
In particular, when attempting to inspect a substrate having multiple electrodes at a fine pitch, such as a substrate such as a liquid crystal television screen, it is extremely difficult to do so with a conventional inspection apparatus using a probe needle.

上記の事情を考慮した技術として、例えば特開昭61−
2338号公報、特公昭61−14659号公報等によ
り開示された技術がある。
As a technique that takes the above circumstances into consideration, for example, JP-A-61-
There are techniques disclosed in Japanese Patent Publication No. 2338, Japanese Patent Publication No. 61-14659, etc.

前者は、軟質プラスチック等の弾力性の絶縁フィルムの
表面にアルミニウム、銅等の導電性の金属膜を複数本並
列にパターニング配線したものをプローブ針とする構成
のものであり、また後者は基板の端部にマイクロストリ
ップラインを突出して設け、これをプローブ針として使
用する構成のものである。
The former has a configuration in which the probe needle is made by patterning and wiring multiple conductive metal films such as aluminum or copper in parallel on the surface of an elastic insulating film made of soft plastic, etc. A microstrip line is provided protruding from the end and is used as a probe needle.

(発明が解決しようとする問題点) しかしながら、上述の開示された技術には、次に述べる
ような問題点がある。
(Problems to be Solved by the Invention) However, the above disclosed technology has the following problems.

両者共、電極とプローブ針との相対位置を調整しようと
する際、上記電極とプローブ針の接触状況を目視i察す
るのが極めて困難であり、しかも位置決め用としての目
印が考慮されていないので、位置調整が難しい。
In both cases, when attempting to adjust the relative position between the electrode and the probe needle, it is extremely difficult to visually observe the contact status between the electrode and the probe needle, and furthermore, marks for positioning are not taken into consideration. Difficult to adjust position.

本発明は、上述の事情に対処してなされたもので、″電
極とプローブ針との位置合せが確実で容易な検査装置を
提供しようとするものである。
The present invention has been made in response to the above-mentioned circumstances, and aims to provide an inspection device in which alignment of an electrode and a probe needle is reliable and easy.

〔発明の構成〕[Structure of the invention]

(問題点を解決するための手段) すなわち本発明は、被検査体のtti極に、絶縁性フィ
ルムに形成した複数の導電性配線からなるプローブ針を
接触させて検査する検査装置において、上記電極と上記
プローブ針との相対的位置合せを指示するJsraを、
上記絶縁性フィルムに設けたことを特徴とする。
(Means for Solving the Problems) That is, the present invention provides an inspection apparatus for testing by bringing a probe needle made of a plurality of conductive wirings formed on an insulating film into contact with the tti electrode of an object to be inspected. Jsra that instructs the relative positioning of the probe needle and the above probe needle,
It is characterized in that it is provided on the above-mentioned insulating film.

(作 用) 本発明の検査装置では、プローブ針が形成された絶縁性
フィルムに位置合せ用の標識を設けたので、被検査体の
電極とプローブ針との接触状況を目視観察しながら調整
する必要はなく、上記標識を所定位置に合せるだけで上
記電極とプローブ針の相対的位置を設定することができ
る。
(Function) In the inspection device of the present invention, alignment marks are provided on the insulating film on which the probe needles are formed, so the contact status between the electrodes of the object to be inspected and the probe needles can be adjusted while visually observing. There is no need to do so, and the relative positions of the electrode and probe needle can be set simply by aligning the mark to a predetermined position.

(実施例) 以下1本発明の検査装置の実施例を図面を参照して説明
する。
(Example) An example of the inspection apparatus of the present invention will be described below with reference to the drawings.

第1図において1例えばガラスエポキシ基板からなる取
付板11の下面には、パターニング形成された銅泊等か
らなりプローブ針として用いる複数の導電性配線12を
挟むように構成された透視可能な絶縁性フィルム13例
えばF、P、Cが接着剤その他の手段により固着されて
いる。
In FIG. 1, on the lower surface of a mounting plate 11 made of, for example, a glass epoxy board, there is a see-through insulating material made of patterned copper foil or the like and configured to sandwich a plurality of conductive wirings 12 used as probe needles. Films 13 such as F, P, and C are fixed by adhesive or other means.

この絶縁性フィルム13は、取付板11の端部14にお
いて下方向に概直角に折り曲げられ、下方部を円形状に
形成された弾力性のある例えば絶縁性ゴム、丸棒の外周
にゴムのOリングを設けたもの等のバネ材15の外周に
添って取着されている。
This insulating film 13 is bent downward at an approximately right angle at the end 14 of the mounting plate 11, and the lower part is made of elastic material such as insulating rubber, which is formed into a circular shape. It is attached along the outer periphery of a spring material 15, such as one provided with a ring.

そして、この絶縁性フィルム13の端部16を折り曲げ
、固定板17で端部16を取付板11に押圧するように
取付ける。
Then, the end portion 16 of the insulating film 13 is bent, and the end portion 16 is attached to the mounting plate 11 by the fixing plate 17 so as to be pressed.

また、バネ材15に取着された絶縁フィルム13の円形
状の最下位部分、すなわち被検査体である半導体素子1
8上に形成された電極19との接触部20の部分に、例
えば鍵形の形状力標識21を設ける。そして、この標識
21と、半導体基板18上に設けた例えば鍵形の形状の
B ra 22とを正確に重ね合せることにより、プロ
ーブ針として用いる導電性配線12と電極19の位置調
整を行う。
In addition, the circular lowest part of the insulating film 13 attached to the spring material 15, that is, the semiconductor element 1 which is the object to be inspected.
For example, a key-shaped shape force indicator 21 is provided at a contact portion 20 with the electrode 19 formed on the surface of the electrode 8 . Then, by accurately overlapping this marker 21 with, for example, a key-shaped Bra 22 provided on the semiconductor substrate 18, the positions of the conductive wiring 12 used as a probe needle and the electrode 19 are adjusted.

次に、本検査装置の製造方法について説明する。Next, a method of manufacturing this inspection device will be explained.

第2図に示すように、絶縁性フィルム13の一端を取付
板11の下面に固着し、また他端を固定板17に固着す
る。ここで、絶縁性フィルム13は、接触部20となる
部分付近の切り欠き部23の部分には構成しないで、導
電性配線12を露出させておく、そして、絶縁性フィル
ム13のr1寸法は、例えば取付板11の端部14側よ
りも固定板17側を巾広く構成し、接触部20に位置す
る絶縁性フィルム13の外側付近に1例えば鍵形の形状
の標ra21を設けておく。
As shown in FIG. 2, one end of the insulating film 13 is fixed to the lower surface of the mounting plate 11, and the other end is fixed to the fixing plate 17. Here, the insulating film 13 is not formed in the notch part 23 near the part that will become the contact part 20, so that the conductive wiring 12 is exposed, and the r1 dimension of the insulating film 13 is as follows. For example, the fixing plate 17 side of the mounting plate 11 is configured to be wider than the end 14 side, and a marker 21 in the shape of, for example, a key is provided near the outside of the insulating film 13 located at the contact portion 20.

そして、第3図(b)に示すように、端部14付近で絶
縁性フィルム13を下方向に概直角に折り曲げ、バネ材
15の外周に添うように取着する6次に、固定板17部
分で絶縁性フィルム13を折り曲げ、取付板11と固定
板17を抑圧し1例えば取付穴24にボルト(図示せず
)等により固着する。
Then, as shown in FIG. 3(b), the insulating film 13 is bent downward at approximately right angles near the end 14 and attached so as to follow the outer periphery of the spring material 15. Next, the fixing plate 17 The insulating film 13 is bent at a portion, the mounting plate 11 and the fixing plate 17 are suppressed, and the mounting plate 11 and the fixing plate 17 are fixed, for example, to the mounting holes 24 with bolts (not shown) or the like.

ここで1本検査装置を上方向から見ると、第3図(a)
で示すように、絶縁性フィルム13の両側の接触部20
の位置に、鍵形の形状の標識21を目視確認することが
できる。
Here, when looking at one inspection device from above, Figure 3 (a)
As shown, contact portions 20 on both sides of the insulating film 13
A key-shaped mark 21 can be visually confirmed at the position.

したがって、この標fi21と半導体素子18上に設け
た標fi22とが重なり合うように位置を調整すれば、
プローブ針となる導電性配線12の接触部2oと電極1
9との位置決めをすることができる。
Therefore, if the positions are adjusted so that this mark fi21 and the mark fi22 provided on the semiconductor element 18 overlap,
Contact portion 2o of conductive wiring 12 and electrode 1 serving as a probe needle
9 can be positioned.

なお、上記実施例では、標識21として鍵形の形状もの
を使用したものについて説明したが、この標、?g12
1は鍵形に限定されるものではなく、他の標識、例えば
十字、7字、円弧、・・・等、位置決めできるものであ
ればよく、また多数個設けても構わない。更に、絶縁フ
ィルム13は透視可能なものに限定されるものではなく
、上記標識21により位置決めできるのであれば不透明
なものでもよいのは言うまでもない。
Incidentally, in the above embodiment, a key-shaped sign was used as the sign 21, but this sign? g12
1 is not limited to the shape of a key, but may be any other mark such as a cross, a 7-character, an arc, etc., as long as it can be positioned, and a large number of marks may be provided. Furthermore, it goes without saying that the insulating film 13 is not limited to one that can be seen through, but may be opaque as long as it can be positioned using the mark 21 described above.

〔発明の効果〕〔Effect of the invention〕

上述のように1本発明によれば、微細ピッチで多電極を
有する半導体素子を検査する際でも、上記電極とプロー
ブ針との位置合せを容易に確実に行うことができる。
As described above, according to the present invention, even when inspecting a semiconductor device having multiple electrodes at a fine pitch, the electrodes and the probe needle can be easily and reliably aligned.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例の説明用斜視図、第2図(a
)(b)および第3図(a)(b)は、第1図の製造組
立例の説明図、第4図は従来例の説明図である。 1191.取付板、     1z・・導電性配線、1
3・・・絶縁性フィルム、15・・・バネ材、20・・
・接触部、     21・・・標 識。 特許出願人 東京エレクトロン株式会社第3図
FIG. 1 is an explanatory perspective view of one embodiment of the present invention, and FIG.
)(b) and FIGS. 3(a) and 3(b) are explanatory diagrams of the manufacturing and assembly example of FIG. 1, and FIG. 4 is an explanatory diagram of the conventional example. 1191. Mounting plate, 1z... Conductive wiring, 1
3... Insulating film, 15... Spring material, 20...
・Contact part, 21... mark. Patent applicant Tokyo Electron Ltd. Figure 3

Claims (1)

【特許請求の範囲】 被検査体の電極に、絶縁性フィルムに形成した複数の導
電性配線からなるプローブ針を接触させて検査する検査
装置において、 上記電極と上記プローブ針との相対的位置合せを指示す
る標識を、上記絶縁性フィルムに設けたことを特徴とす
る検査装置。
[Scope of Claims] In an inspection device that performs an inspection by bringing a probe needle made of a plurality of conductive wirings formed on an insulating film into contact with an electrode of an object to be inspected, the relative positioning of the electrode and the probe needle is provided. An inspection device characterized in that a mark indicating the above is provided on the insulating film.
JP62088162A 1987-04-09 1987-04-09 Inspection equipment Expired - Fee Related JPH0719812B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62088162A JPH0719812B2 (en) 1987-04-09 1987-04-09 Inspection equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62088162A JPH0719812B2 (en) 1987-04-09 1987-04-09 Inspection equipment

Publications (2)

Publication Number Publication Date
JPS63252437A true JPS63252437A (en) 1988-10-19
JPH0719812B2 JPH0719812B2 (en) 1995-03-06

Family

ID=13935230

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62088162A Expired - Fee Related JPH0719812B2 (en) 1987-04-09 1987-04-09 Inspection equipment

Country Status (1)

Country Link
JP (1) JPH0719812B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4998062A (en) * 1988-10-25 1991-03-05 Tokyo Electron Limited Probe device having micro-strip line structure
US5055780A (en) * 1989-03-09 1991-10-08 Mitsubishi Denki Kabushiki Kaisha Probe plate used for testing a semiconductor device, and a test apparatus therefor
JPH04345046A (en) * 1991-05-03 1992-12-01 Samsung Electron Co Ltd Chip life test apparatus for semiconductor device
JPH0677296A (en) * 1992-05-29 1994-03-18 Eejingu Tesuta Kaihatsu Kyodo Kumiai Measuring electrode for integrated circuit device wafer
JP2009156875A (en) * 2005-04-14 2009-07-16 Korea Advanced Inst Of Science & Technology Probe card and manufacturing method thereof

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3976276B2 (en) 2005-06-10 2007-09-12 日本航空電子工業株式会社 Inspection device
KR101326718B1 (en) * 2012-04-03 2013-11-20 주식회사 마이크로이즈 Contact-type film probe module
KR101350155B1 (en) * 2012-07-31 2014-01-14 주식회사 오킨스전자 Display panel testing socket
KR101369496B1 (en) * 2012-09-14 2014-03-03 주식회사 파워로직스 Aging pcb for oled lighting module
CN117321426A (en) * 2021-05-27 2023-12-29 联合精密科技有限公司 Conductive connectors and sockets

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4998062A (en) * 1988-10-25 1991-03-05 Tokyo Electron Limited Probe device having micro-strip line structure
US5055780A (en) * 1989-03-09 1991-10-08 Mitsubishi Denki Kabushiki Kaisha Probe plate used for testing a semiconductor device, and a test apparatus therefor
JPH04345046A (en) * 1991-05-03 1992-12-01 Samsung Electron Co Ltd Chip life test apparatus for semiconductor device
JPH0677296A (en) * 1992-05-29 1994-03-18 Eejingu Tesuta Kaihatsu Kyodo Kumiai Measuring electrode for integrated circuit device wafer
JP2009156875A (en) * 2005-04-14 2009-07-16 Korea Advanced Inst Of Science & Technology Probe card and manufacturing method thereof

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