JPS63253621A - 溶融シリコン定量滴下方法及びその装置 - Google Patents

溶融シリコン定量滴下方法及びその装置

Info

Publication number
JPS63253621A
JPS63253621A JP62088369A JP8836987A JPS63253621A JP S63253621 A JPS63253621 A JP S63253621A JP 62088369 A JP62088369 A JP 62088369A JP 8836987 A JP8836987 A JP 8836987A JP S63253621 A JPS63253621 A JP S63253621A
Authority
JP
Japan
Prior art keywords
inert gas
silicon
melting cylinder
melting
molten
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62088369A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0261135B2 (2
Inventor
Ichiro Hide
一郎 秀
Takashi Yokoyama
敬志 横山
Masaaki Sasaki
佐々木 政明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoxan Corp
Hoxan Co Ltd
Original Assignee
Hoxan Corp
Hoxan Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoxan Corp, Hoxan Co Ltd filed Critical Hoxan Corp
Priority to JP62088369A priority Critical patent/JPS63253621A/ja
Publication of JPS63253621A publication Critical patent/JPS63253621A/ja
Publication of JPH0261135B2 publication Critical patent/JPH0261135B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Silicon Compounds (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
JP62088369A 1987-04-10 1987-04-10 溶融シリコン定量滴下方法及びその装置 Granted JPS63253621A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62088369A JPS63253621A (ja) 1987-04-10 1987-04-10 溶融シリコン定量滴下方法及びその装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62088369A JPS63253621A (ja) 1987-04-10 1987-04-10 溶融シリコン定量滴下方法及びその装置

Publications (2)

Publication Number Publication Date
JPS63253621A true JPS63253621A (ja) 1988-10-20
JPH0261135B2 JPH0261135B2 (2) 1990-12-19

Family

ID=13940879

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62088369A Granted JPS63253621A (ja) 1987-04-10 1987-04-10 溶融シリコン定量滴下方法及びその装置

Country Status (1)

Country Link
JP (1) JPS63253621A (2)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0945773A (ja) * 1995-07-28 1997-02-14 Nec Corp 金属薄膜の形成方法および形成装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0945773A (ja) * 1995-07-28 1997-02-14 Nec Corp 金属薄膜の形成方法および形成装置

Also Published As

Publication number Publication date
JPH0261135B2 (2) 1990-12-19

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