JPS6328201Y2 - - Google Patents
Info
- Publication number
- JPS6328201Y2 JPS6328201Y2 JP10920982U JP10920982U JPS6328201Y2 JP S6328201 Y2 JPS6328201 Y2 JP S6328201Y2 JP 10920982 U JP10920982 U JP 10920982U JP 10920982 U JP10920982 U JP 10920982U JP S6328201 Y2 JPS6328201 Y2 JP S6328201Y2
- Authority
- JP
- Japan
- Prior art keywords
- protrusion
- groove
- substrate
- base body
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 17
- 239000000463 material Substances 0.000 claims description 14
- 108091008695 photoreceptors Proteins 0.000 claims description 10
- 230000008020 evaporation Effects 0.000 claims 1
- 238000001704 evaporation Methods 0.000 claims 1
- 238000007740 vapor deposition Methods 0.000 description 12
- 238000000151 deposition Methods 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 210000000078 claw Anatomy 0.000 description 2
- 230000005294 ferromagnetic effect Effects 0.000 description 2
- 230000005291 magnetic effect Effects 0.000 description 2
- 101100269850 Caenorhabditis elegans mask-1 gene Proteins 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000003302 ferromagnetic material Substances 0.000 description 1
- 230000008595 infiltration Effects 0.000 description 1
- 238000001764 infiltration Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Landscapes
- Discharging, Photosensitive Material Shape In Electrophotography (AREA)
- Printing Plates And Materials Therefor (AREA)
- Physical Vapour Deposition (AREA)
Description
【考案の詳細な説明】
本考案は、電子写真用感光層を蒸着にて形成す
る際に蒸着膜の被着を避けるべき円筒状感光体端
部の溝を覆う選択蒸着用マスクに関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a mask for selective vapor deposition that covers grooves at the end of a cylindrical photoreceptor where deposition of a vapor-deposited film should be avoided when forming an electrophotographic photosensitive layer by vapor deposition.
電子写真用感光体は、通常円筒状の導電性基体
を回転支持軸の上に嵌め、所定の温度に保つてそ
の上にセレン材料のような光導電材料を蒸着によ
り感光層を設けて製作される。しかし感光体の端
部のように複写機などに組込む際他の機構部品と
接触する部分に蒸着部質が付着すると、運転時に
接触により蒸着物質が剥離し感光層表面に付着し
て画像欠陥の原因となるのでこのような部分をマ
スクで覆つて蒸着する。第1図はその状態を示
し、感光体基体1の端部にその外径に等しい内径
を有する断面L形のマスク2がその端部21が基
体1の端面に当たるまで嵌め込まれる。しかしこ
のようなマスクには第2図のような環状溝3を有
する基体1に用いるときは問題が生ずる。このよ
うな溝3は、例えば紙分離用の爪の入る部分とし
て設けられ、この溝の内面に蒸着物質が付着する
と爪によつてはがされて屑になるので、溝3とマ
スク2の間の空間には光導電材料の蒸気が入り込
まないようにしなければならない。しかし特に溝
3の端まで基体1の上に感光層を設けたい場合、
マスクと基体1との間隙から蒸気の入るのを防ぐ
のは困難である。またこの溝3の長い場合にはマ
スクの着脱が難しく、基体3の端面がマスクによ
り損傷を受ける危険が大きい。すなわち、マスク
性を重視する場合には基体を同一材料のマスクを
用いることが望ましいがこの場合はマスクの着脱
性が著しく困難で、なおかつ基体に損傷を与えや
すく実用に耐え得ない。逆にマスクの着脱性を向
上させ基体の損傷を低減するには基体1の材料、
例えばアルミニウムより熱膨脹係数の大きい材料
からなるマスクを用いることも考えられるが、こ
の場合はマスク性が著しく低下し、またそのよう
な大きな熱膨脹係数を持つ適当な材料は見出し難
い。 Electrophotographic photoreceptors are usually manufactured by fitting a cylindrical conductive substrate onto a rotating support shaft, maintaining it at a predetermined temperature, and depositing a photoconductive layer on top of it by vapor-depositing a photoconductive material such as selenium material. Ru. However, if the vapor deposited material adheres to the end of the photoreceptor, which comes into contact with other mechanical parts when installed in a copying machine, etc., the vapor deposited material may peel off due to contact during operation and adhere to the surface of the photosensitive layer, causing image defects. To avoid this, cover such areas with a mask before vapor deposition. FIG. 1 shows this state, in which a mask 2 having an L-shaped cross section and an inner diameter equal to the outer diameter of the photoreceptor base 1 is fitted into the end of the photoreceptor base 1 until its end 21 contacts the end surface of the base 1. However, problems arise with such a mask when it is used on a substrate 1 having an annular groove 3 as shown in FIG. Such a groove 3 is provided, for example, as a part where a claw for paper separation is inserted, and if the vapor deposition substance adheres to the inner surface of this groove, it will be peeled off by the claw and become waste, so there is no space between the groove 3 and the mask 2. The space must be kept free of photoconductive material vapor. However, especially when it is desired to provide a photosensitive layer on the substrate 1 up to the edge of the groove 3,
It is difficult to prevent vapor from entering through the gap between the mask and the substrate 1. Further, if the groove 3 is long, it is difficult to attach and detach the mask, and there is a high risk that the end face of the base body 3 will be damaged by the mask. That is, when maskability is important, it is desirable to use a mask whose base material is the same material, but in this case, it is extremely difficult to attach and detach the mask, and the base is easily damaged, making it impractical. On the other hand, in order to improve the ease of putting on and taking off the mask and reduce damage to the base, the material of the base 1,
For example, it is conceivable to use a mask made of a material with a larger coefficient of thermal expansion than aluminum, but in this case, the maskability is significantly reduced, and it is difficult to find a suitable material with such a large coefficient of thermal expansion.
本考案は上述の欠点を除去して基体端部にある
溝を含めたマスク性が完全であり、なおかつ着脱
が容易で基体への損傷を皆無にせしめ電子写真用
感光体の選択蒸着用マスクを提供することを目的
とする。 The present invention eliminates the above-mentioned drawbacks and provides a mask for selective deposition of photoreceptors for electrophotography, which has perfect mask properties including the groove at the end of the substrate, is easy to attach and remove, and causes no damage to the substrate. The purpose is to provide.
この目的はマスクが中心軸を通る平面によつて
2分割された円筒であり、その円筒は一端の内面
側に内径が支持軸の外径に等しい第一の突出部、
他端の内面側に内径が被蒸着基体の溝の底面外径
より大きく基体の外径より小さい第二の突出部を
有し、その中間部分の内径は基体の溝のない部分
の外径より大きく、円筒の第二の突出部側の端面
は内径側に傾く傾斜面をなし、各半円筒体の第一
の突出部の互に対向する面の一方には磁石を、他
方には強磁性体をそれぞれ備え、第一の突出部の
対向面同志を密着させ同時にその内径面を支持軸
の外面に密着させたときに第二の突出部をその内
面が基体の溝内に存在し傾斜面がその溝の基体端
面より遠い側の側面外縁に当持するようにでき、
その場合第一の突出部の第二の突出部側の側面と
基体端面との間および第二の突出部の第一の突出
部側の側面と基体の溝の基体端部側の側面との間
にそれぞれ間隙が残るようにされることによつて
達成される。 This object is a cylinder in which the mask is divided into two by a plane passing through the central axis, and the cylinder has a first protrusion on the inner side of one end whose inner diameter is equal to the outer diameter of the support shaft;
On the inner surface of the other end, there is a second protrusion whose inner diameter is larger than the outer diameter of the bottom surface of the groove of the substrate to be deposited and smaller than the outer diameter of the substrate, and the inner diameter of the intermediate portion is smaller than the outer diameter of the part of the substrate without the groove. The end surface of the cylinder on the side of the second protrusion has an inclined surface inclined toward the inner diameter side, and one side of the mutually opposing surfaces of the first protrusion of each semi-cylindrical body is equipped with a magnet, and the other side is ferromagnetic. When the opposing surfaces of the first protrusion are brought into close contact with each other and the inner surface of the first protrusion is brought into close contact with the outer surface of the support shaft, the inner surface of the second protrusion is located within the groove of the base and forms an inclined surface. can be made to abut against the outer edge of the side surface of the groove on the side farther from the end surface of the base body,
In that case, there is a gap between the side surface of the first protrusion on the second protrusion side and the end surface of the base, and between the side surface of the second protrusion on the first protrusion side and the side surface of the groove on the base body on the base end side. This is achieved by leaving a gap between each.
以下図を引用して本考案の実施例について説明
する。第3図において、溝3を有するアルミニウ
ムからなる感光体基体1は内径D1で、点線で示
した外径D1の支持軸4の上に嵌めて蒸着が行わ
れる。溝3の底部の直径をD2、軸方向の長さを
L1とする。蒸着マスク2は例えば基体と同一材
質のアルミニウムでつくられ、中心軸5を通る平
面で分割された二つの半円筒体22からなる。半
円筒体22の一方の端(図では左端)には内径が
支持軸の外径D1に等しい内面側への突出部23
が設けられている。反対側の端(図では右端)に
は内径D3が溝3の底部径D2より大きい内面側へ
の突出部24を有する。この突出部24の端面2
5は内径側に傾く傾斜面して形成されている。両
突出部23,24の間の半円筒体22の内径D4
は基体1の外径D5より大きい。突出部23の互
に対向する端面の一方には永久磁石27、他方に
は鉄のような強磁性体28がそれぞれ取り付けら
れている。しかし双方を永久磁石とし、互に逆極
性の磁極を対向させてもよい。この蒸着マスクを
装着する際には二つの半円筒体22を支持軸4に
嵌めた基体1の軸方には直角な方定の双方から基
体1および支持軸4にかぶせる。その場合、磁石
27と強磁性体28とは吸引し合つて両半円筒体
22の突出部23は端面において密着し、同時に
突出部23の内径面は支持軸4の外径面に密着す
る。一方突出部24の内面側を溝3の中に入れ、
軸方にはずらして傾斜面25を溝3の基体中央側
の外縁11に当接させ、適当な手段でその位置に
固定する。この場合突出部23の内側の側面29
と基体1の端面12との間および突出部24の内
側の側面30と溝3の端面12側の側面13との
間に間隙が残るようにすれば、D4>D5,D3>D2
であるためマスク1は基体1および支持軸4に容
易に装着することができる。これにより基体1の
溝3の内部およびそれより端面12の外面とマス
ク2との間に延びる空間は完全に蒸着槽内のふん
囲気より隔絶されるため蒸着物質の蒸気の浸入付
着がなく、清浄な非蒸着面を得ることができる。 Embodiments of the present invention will be described below with reference to the drawings. In FIG. 3, a photoreceptor substrate 1 made of aluminum having a groove 3 has an inner diameter D 1 and is fitted onto a support shaft 4 having an outer diameter D 1 indicated by a dotted line for vapor deposition. The diameter of the bottom of groove 3 is D 2 and the length in the axial direction is
Let it be L 1 . The vapor deposition mask 2 is made of, for example, aluminum, which is the same material as the base, and consists of two semi-cylindrical bodies 22 divided by a plane passing through the central axis 5. At one end (the left end in the figure) of the semi-cylindrical body 22, there is a protrusion 23 toward the inner surface, the inner diameter of which is equal to the outer diameter D1 of the support shaft.
is provided. The opposite end (the right end in the figure) has a protrusion 24 toward the inner surface, the inner diameter D 3 of which is larger than the bottom diameter D 2 of the groove 3 . End surface 2 of this protrusion 24
5 is formed as an inclined surface inclined toward the inner diameter side. Inner diameter D 4 of semi-cylindrical body 22 between both protrusions 23 and 24
is larger than the outer diameter D5 of the base body 1. A permanent magnet 27 is attached to one of the mutually opposing end surfaces of the protrusion 23, and a ferromagnetic material 28 such as iron is attached to the other. However, both may be made of permanent magnets, with magnetic poles of opposite polarity facing each other. When wearing this vapor deposition mask, the two semi-cylindrical bodies 22 are placed over the base body 1 and the support shaft 4 from both directions perpendicular to the axial direction of the base body 1 fitted on the support shaft 4. In that case, the magnet 27 and the ferromagnetic body 28 are attracted to each other, and the protrusions 23 of both semicylindrical bodies 22 are in close contact with each other at their end faces, and at the same time, the inner diameter surface of the protrusion 23 is in close contact with the outer diameter surface of the support shaft 4. On the other hand, put the inner side of the protrusion 24 into the groove 3,
The inclined surface 25 is moved axially and brought into contact with the outer edge 11 of the groove 3 on the center side of the base body, and is fixed in that position by suitable means. In this case, the inner side surface 29 of the protrusion 23
If a gap is left between the end surface 12 of the base body 1 and the inner side surface 30 of the protrusion 24 and the side surface 13 of the groove 3 on the end surface 12 side, D 4 >D 5 , D 3 >D 2
Therefore, the mask 1 can be easily attached to the base body 1 and the support shaft 4. As a result, the inside of the groove 3 of the base 1 and the space extending from the groove 3 between the outer surface of the end face 12 and the mask 2 are completely isolated from the atmosphere in the vapor deposition tank, so there is no infiltration and adhesion of the vapor of the vapor deposition material, and the space is clean. A non-evaporated surface can be obtained.
以上述べたように本考案は蒸着マスクを二つに
分割し、基体の環状溝内に入つて傾斜面によつて
溝の側面の外縁に当接する内面側への突出部を設
け、かつ分割された半部同志を磁力によつて結合
することにより軸方向に直角な方向の双方からマ
スクの材料として基体と同一の材料を用いた場合
でも簡単に装着でき、溝内への蒸気の浸入を完全
に阻止することもして基体の損傷のおそれのない
選択蒸着用マスクとして極めて有効に使用でき
る。 As described above, the present invention divides the vapor deposition mask into two parts, and provides a protrusion toward the inner surface that enters the annular groove of the base and abuts the outer edge of the side surface of the groove by the inclined surface. By connecting the two halves together by magnetic force, they can be easily attached from both directions perpendicular to the axial direction, even if the mask is made of the same material as the base, completely preventing vapor from entering the groove. It can be used extremely effectively as a mask for selective deposition without fear of damaging the substrate.
第1図は感光体基体への従来の蒸着マスクの一
例の断面図、第2図は別の断面図、第3図は本考
案の一実施例の断面図である。
1……感光体基体、2……蒸着マスク、3……
基体の環状溝、4……支持軸、23……第一の突
出部、24……第二の突出部、25……傾斜面。
FIG. 1 is a sectional view of an example of a conventional vapor deposition mask applied to a photoreceptor substrate, FIG. 2 is another sectional view, and FIG. 3 is a sectional view of an embodiment of the present invention. 1... Photoreceptor base, 2... Vapor deposition mask, 3...
Annular groove of base, 4... Support shaft, 23... First protrusion, 24... Second protrusion, 25... Inclined surface.
Claims (1)
基体を円柱状回転支持軸の上に嵌め、基体上に光
導電材料の蒸着を行う際に端部の環状溝を含む部
分を覆うものにおいて、中心軸を通る平面によつ
て2分割された円筒であり、該円筒は一端の内面
側に内径が支持軸の外径に等しい第一の突出部、
他端の内面側に内径が基体の環状溝の底面外径よ
りも大きく基体の外径より小さい第二の突出部を
有し、その中間部分の内径は基体の溝のない部分
の外径より大きく、第二の突出部側の前記円筒の
端面は内径側に傾く傾斜面をなし、各前記半円筒
体の第一の突出部の互に対向する面の一方には磁
石、他方には強磁性体をそれぞれ備え、第一の突
出部の対向面同志を密着させると同時にその内径
面を支持軸の外面に密着させたときに前記第二の
突出部をその内面が基体の溝内に位置し前記傾斜
面が該溝の基体端面より遠い側の側面外縁に当接
するようにでき、その場合第一の突出部の第二の
突出部側の側面と基体端面との間および第二突出
部の第一突出部側の側面と基体の溝の基体端面側
の側面との間にそれぞれ間隙が残るようにされる
ことを特徴とする選択蒸着用マスク。 A cylindrical electrophotographic photoreceptor substrate having an annular groove at the end is fitted onto a cylindrical rotating support shaft, and the portion including the annular groove at the end is covered when a photoconductive material is deposited on the substrate. , is a cylinder divided into two by a plane passing through the central axis, and the cylinder has a first protrusion on the inner surface side of one end, the inner diameter of which is equal to the outer diameter of the support shaft;
The inner surface of the other end has a second protrusion whose inner diameter is larger than the outer diameter of the bottom of the annular groove of the base body and smaller than the outer diameter of the base body, and the inner diameter of the intermediate part is smaller than the outer diameter of the part of the base body without the groove. The end surface of the cylinder on the side of the second protrusion has an inclined surface inclined toward the inner diameter side, and one of the mutually opposing surfaces of the first protrusion of each semi-cylindrical body has a magnet on one side and a strong force on the other side. The inner surface of the second protrusion is positioned within the groove of the base when the opposing surfaces of the first protrusion are brought into close contact with each other and the inner surface of the first protrusion is brought into close contact with the outer surface of the support shaft. The inclined surface may be in contact with the outer edge of the side surface of the groove on the side farther from the end surface of the base body, and in that case, between the side surface of the first protrusion part on the side of the second protrusion part and the end face of the base body and the second protrusion part. A mask for selective evaporation, characterized in that a gap is left between the side surface of the first protruding portion of the substrate and the side surface of the substrate groove of the substrate end surface side.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10920982U JPS5912863U (en) | 1982-07-19 | 1982-07-19 | Selective deposition mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10920982U JPS5912863U (en) | 1982-07-19 | 1982-07-19 | Selective deposition mask |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5912863U JPS5912863U (en) | 1984-01-26 |
| JPS6328201Y2 true JPS6328201Y2 (en) | 1988-07-29 |
Family
ID=30254488
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10920982U Granted JPS5912863U (en) | 1982-07-19 | 1982-07-19 | Selective deposition mask |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5912863U (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2017097020A (en) * | 2015-11-18 | 2017-06-01 | 富士電機株式会社 | Electrophotographic photoreceptor, manufacturing method and identification method of the same, and image forming apparatus |
-
1982
- 1982-07-19 JP JP10920982U patent/JPS5912863U/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5912863U (en) | 1984-01-26 |
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