JPS6328896A - 軸受合金の電着方法および装置 - Google Patents

軸受合金の電着方法および装置

Info

Publication number: JPS6328896A
Authority: JP; Japan
Prior art keywords: bearing; anode; alloy; plated; plating
Prior art date: 1986-07-19
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Pending

Application number

JP62177387A

Other languages

English (en)

Japanese (ja)

Inventor

デビツド・レイモンド・イーサム

ジヨン・ケイス・デニス

ミツチエル・ターナー

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

AE PLC

Original Assignee

AE PLC

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1986-07-19

Filing date

1987-07-17

Publication date

1988-02-06

1987-07-17 Application filed by AE PLC filed Critical AE PLC

1988-02-06 Publication of JPS6328896A publication Critical patent/JPS6328896A/ja

Status Pending legal-status Critical Current

Links

238000000034 method Methods 0.000 title claims abstract description 33
239000001996 bearing alloy Substances 0.000 title claims abstract description 8
238000004070 electrodeposition Methods 0.000 title claims abstract description 7
238000007747 plating Methods 0.000 claims abstract description 39
229910045601 alloy Inorganic materials 0.000 claims abstract description 18
239000000956 alloy Substances 0.000 claims abstract description 18
238000004140 cleaning Methods 0.000 claims abstract description 10
ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims abstract description 9
229910017052 cobalt Inorganic materials 0.000 claims abstract 2
239000010941 cobalt Substances 0.000 claims abstract 2
GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims abstract 2
239000000243 solution Substances 0.000 claims description 15
229910000838 Al alloy Inorganic materials 0.000 claims description 8
239000011148 porous material Substances 0.000 claims description 6
239000008151 electrolyte solution Substances 0.000 claims description 2
239000002657 fibrous material Substances 0.000 claims description 2
230000013011 mating Effects 0.000 claims 2
238000000151 deposition Methods 0.000 abstract 2
230000008021 deposition Effects 0.000 abstract 2
239000010410 layer Substances 0.000 description 36
PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 12
NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 description 10
229910052718 tin Inorganic materials 0.000 description 8
238000005260 corrosion Methods 0.000 description 7
230000007797 corrosion Effects 0.000 description 7
230000000694 effects Effects 0.000 description 5
239000011229 interlayer Substances 0.000 description 5
229910052759 nickel Inorganic materials 0.000 description 5
238000012360 testing method Methods 0.000 description 5
230000002378 acidificating effect Effects 0.000 description 4
229910052802 copper Inorganic materials 0.000 description 4
239000010949 copper Substances 0.000 description 4
QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
239000004744 fabric Substances 0.000 description 3
229910052751 metal Inorganic materials 0.000 description 3
239000002184 metal Substances 0.000 description 3
229910052594 sapphire Inorganic materials 0.000 description 3
239000010980 sapphire Substances 0.000 description 3
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
229910052782 aluminium Inorganic materials 0.000 description 2
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical group [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
239000010953 base metal Substances 0.000 description 2
239000003792 electrolyte Substances 0.000 description 2
150000002739 metals Chemical class 0.000 description 2
BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
229910020174 Pb-In Inorganic materials 0.000 description 1
229910001128 Sn alloy Inorganic materials 0.000 description 1
229910000831 Steel Inorganic materials 0.000 description 1
XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
JHPGITINDRVJFA-UHFFFAOYSA-I aluminum;zinc;pentachloride Chemical compound [Al+3].[Cl-].[Cl-].[Cl-].[Cl-].[Cl-].[Zn+2] JHPGITINDRVJFA-UHFFFAOYSA-I 0.000 description 1
229910052793 cadmium Inorganic materials 0.000 description 1
229940044175 cobalt sulfate Drugs 0.000 description 1
229910000361 cobalt sulfate Inorganic materials 0.000 description 1
WDHWFGNRFMPTQS-UHFFFAOYSA-N cobalt tin Chemical compound [Co].[Sn] WDHWFGNRFMPTQS-UHFFFAOYSA-N 0.000 description 1
KTVIXTQDYHMGHF-UHFFFAOYSA-L cobalt(2+) sulfate Chemical compound [Co+2].[O-]S([O-])(=O)=O KTVIXTQDYHMGHF-UHFFFAOYSA-L 0.000 description 1
230000000052 comparative effect Effects 0.000 description 1
230000032798 delamination Effects 0.000 description 1
238000009792 diffusion process Methods 0.000 description 1
238000009713 electroplating Methods 0.000 description 1
238000009661 fatigue test Methods 0.000 description 1
229910052745 lead Inorganic materials 0.000 description 1
230000007774 longterm Effects 0.000 description 1
239000000463 material Substances 0.000 description 1
239000011159 matrix material Substances 0.000 description 1
239000000203 mixture Substances 0.000 description 1
230000000149 penetrating effect Effects 0.000 description 1
229910052697 platinum Inorganic materials 0.000 description 1
239000002244 precipitate Substances 0.000 description 1
238000002203 pretreatment Methods 0.000 description 1
238000005057 refrigeration Methods 0.000 description 1
230000008439 repair process Effects 0.000 description 1
238000004904 shortening Methods 0.000 description 1
229910052708 sodium Inorganic materials 0.000 description 1
239000011734 sodium Substances 0.000 description 1
RCIVOBGSMSSVTR-UHFFFAOYSA-L stannous sulfate Chemical compound [SnH2+2].[O-]S([O-])(=O)=O RCIVOBGSMSSVTR-UHFFFAOYSA-L 0.000 description 1
239000010959 steel Substances 0.000 description 1
239000000758 substrate Substances 0.000 description 1
229910000375 tin(II) sulfate Inorganic materials 0.000 description 1
238000005406 washing Methods 0.000 description 1
239000002351 wastewater Substances 0.000 description 1
229910052725 zinc Inorganic materials 0.000 description 1
239000011701 zinc Substances 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/04—Electroplating with moving electrodes
- C25D5/06—Brush or pad plating
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/10—Bearings

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Chemical Kinetics & Catalysis (AREA)
Electrochemistry (AREA)
Materials Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Electroplating Methods And Accessories (AREA)
Sliding-Contact Bearings (AREA)
Pressure Welding/Diffusion-Bonding (AREA)
Physical Vapour Deposition (AREA)

JP62177387A 1986-07-19 1987-07-17 軸受合金の電着方法および装置 Pending JPS6328896A (ja)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
GB8617675		1986-07-19
GB868617675A GB8617675D0 (en)	1986-07-19	1986-07-19	Deposition of bearing alloys

Publications (1)

Publication Number	Publication Date
JPS6328896A true JPS6328896A (ja)	1988-02-06

Family

ID=10601361

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP62177387A Pending JPS6328896A (ja)	1986-07-19	1987-07-17	軸受合金の電着方法および装置

Country Status (6)

Country	Link
EP (1)	EP0257670B1 (de)
JP (1)	JPS6328896A (de)
AT (1)	ATE67528T1 (de)
DE (1)	DE3773088D1 (de)
ES (1)	ES2024494B3 (de)
GB (2)	GB8617675D0 (de)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE19500727C1 (de) *	1995-01-12	1996-05-23	Fraunhofer Ges Forschung	Vorrichtung zum Auftragen elektrochemisch abscheidbarer Schichten
JPH08209384A (ja) *	1995-02-02	1996-08-13	Yamaha Motor Co Ltd	表面処理装置
DE19754221A1 (de) *	1997-12-06	1999-06-17	Federal Mogul Wiesbaden Gmbh	Schichtverbundwerkstoff für Gleitlager mit bleifreier Gleitschicht
JP3523197B2 (ja)	1998-02-12	2004-04-26	エーシーエムリサーチ，インコーポレイティド	メッキ設備及び方法
US6565729B2 (en)	1998-03-20	2003-05-20	Semitool, Inc.	Method for electrochemically depositing metal on a semiconductor workpiece
GB2336161B (en)	1998-04-06	2003-03-26	John Michael Lowe	Method of providing conductive tracks on a printed circuit and apparatus for use in carrying out the method
US7136173B2 (en)	1998-07-09	2006-11-14	Acm Research, Inc.	Method and apparatus for end-point detection
US6395152B1 (en)	1998-07-09	2002-05-28	Acm Research, Inc.	Methods and apparatus for electropolishing metal interconnections on semiconductor devices
US6447668B1 (en)	1998-07-09	2002-09-10	Acm Research, Inc.	Methods and apparatus for end-point detection
US6497801B1 (en)	1998-07-10	2002-12-24	Semitool Inc	Electroplating apparatus with segmented anode array
US6248222B1 (en)	1998-09-08	2001-06-19	Acm Research, Inc.	Methods and apparatus for holding and positioning semiconductor workpieces during electropolishing and/or electroplating of the workpieces
US7160421B2 (en)	1999-04-13	2007-01-09	Semitool, Inc.	Turning electrodes used in a reactor for electrochemically processing a microelectronic workpiece
US7585398B2 (en)	1999-04-13	2009-09-08	Semitool, Inc.	Chambers, systems, and methods for electrochemically processing microfeature workpieces
TW527444B (en)	1999-04-13	2003-04-11	Semitool Inc	System for electrochemically processing a workpiece
US6916412B2 (en)	1999-04-13	2005-07-12	Semitool, Inc.	Adaptable electrochemical processing chamber
US7264698B2 (en)	1999-04-13	2007-09-04	Semitool, Inc.	Apparatus and methods for electrochemical processing of microelectronic workpieces
US7438788B2 (en)	1999-04-13	2008-10-21	Semitool, Inc.	Apparatus and methods for electrochemical processing of microelectronic workpieces
US7351315B2 (en)	2003-12-05	2008-04-01	Semitool, Inc.	Chambers, systems, and methods for electrochemically processing microfeature workpieces
US7189318B2 (en)	1999-04-13	2007-03-13	Semitool, Inc.	Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece
US7351314B2 (en)	2003-12-05	2008-04-01	Semitool, Inc.	Chambers, systems, and methods for electrochemically processing microfeature workpieces
US7020537B2 (en)	1999-04-13	2006-03-28	Semitool, Inc.	Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece
AU2002343330A1 (en)	2001-08-31	2003-03-10	Semitool, Inc.	Apparatus and methods for electrochemical processing of microelectronic workpieces
GB0216331D0 (en)	2002-07-13	2002-08-21	Dana Corp	Bearings
CN110813657A (zh) *	2019-11-14	2020-02-21	昌河飞机工业（集团）有限责任公司	一种孔类零件用氧化刷涂装置及方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
GB760016A (en) *	1953-09-11	1956-10-31	Glacier Co Ltd	Improvements in or relating to electroplating
GB1186357A (en) *	1966-09-15	1970-04-02	Metadalic Ltd	Methods and Apparatus for Electrolytic Treatment of Continuous Strand Materials
GB1257541A (de) *	1968-04-03	1971-12-22
US3616285A (en) *	1969-12-31	1971-10-26	Sifco Ind Inc	Repair of chromium plated surfaces
US3751343A (en) *	1971-06-14	1973-08-07	A Macula	Brush electroplating metal at increased rates of deposition
GB1551212A (en) *	1976-06-11	1979-08-22	Owen S G Ltd	Selective electro-plating
WO1979000608A1 (en) *	1978-02-09	1979-08-23	Kemwell Ltd	Electrotreating a metal surface
US4399019A (en) *	1981-07-21	1983-08-16	Imperial Clevite Inc.	Ultra-high current density electroplating cell
US4452684A (en) *	1983-03-11	1984-06-05	The Carolinch Company	Apparatus for selective electrolytic plating
DE3312905C2 (de) *	1983-04-11	1986-03-27	Battelle-Institut E.V., 6000 Frankfurt	Vorrichtung zur galvanischen Innenbeschichtung von Hohlteilen
US4610772A (en) *	1985-07-22	1986-09-09	The Carolinch Company	Electrolytic plating apparatus

1986
- 1986-07-19 GB GB868617675A patent/GB8617675D0/en active Pending
1987
- 1987-07-13 ES ES87201324T patent/ES2024494B3/es not_active Expired - Lifetime
- 1987-07-13 AT AT87201324T patent/ATE67528T1/de not_active IP Right Cessation
- 1987-07-13 DE DE8787201324T patent/DE3773088D1/de not_active Expired - Lifetime
- 1987-07-13 EP EP87201324A patent/EP0257670B1/de not_active Expired - Lifetime
- 1987-07-13 GB GB8716477A patent/GB2192642B/en not_active Expired - Fee Related
- 1987-07-17 JP JP62177387A patent/JPS6328896A/ja active Pending

Also Published As

Publication number	Publication date
GB2192642B (en)	1990-12-19
ATE67528T1 (de)	1991-10-15
EP0257670B1 (de)	1991-09-18
EP0257670A1 (de)	1988-03-02
GB8716477D0 (en)	1987-08-19
GB2192642A (en)	1988-01-20
GB8617675D0 (en)	1986-08-28
DE3773088D1 (de)	1991-10-24
ES2024494B3 (es)	1992-03-01

Publication	Publication Date	Title
JPS6328896A (ja)	1988-02-06	軸受合金の電着方法および装置
US4568431A (en)	1986-02-04	Process for producing electroplated and/or treated metal foil
US5843538A (en)	1998-12-01	Method for electroless nickel plating of metal substrates
US4795682A (en)	1989-01-03	Tin-cobalt bearing overlay alloys
JPS61119699A (ja)	1986-06-06	金属または金属合金の箔を製造するシステム並びに方法
US3616285A (en)	1971-10-26	Repair of chromium plated surfaces
JPH08120499A (ja)	1996-05-14	液中集電法によるプリント回路用銅箔表面処理方法
US3389060A (en)	1968-06-18	Method of indium coating metallic articles
US5712049A (en)	1998-01-27	Sliding element and process for producing the same
US4720330A (en)	1988-01-19	Device and method for electroplating a workpiece having axial symmetry
KR960015549B1 (ko)	1996-11-18	알루미늄 위에 철을 직접 도금하는 방법
US5372701A (en)	1994-12-13	Process and apparatus for electroplating
US4532014A (en)	1985-07-30	Laser alignment system
US4061430A (en)	1977-12-06	Socket structure for the ball of a ball point pen refill
EP1088122B1 (de)	2003-04-09	Verfahren und vorrichtung zur elektroplattierung
EP0181430A1 (de)	1986-05-21	Systeme zur Herstellung einer elektroplattierten und/oder bearbeiteten Metallfolie
DE4340073C2 (de)	1995-07-06	Gleitelement und Verfahren zu seiner Herstellung
KR900004284Y1 (ko)	1990-05-17	회전형 고속전기 도금실험장치
JPS5949309B2 (ja)	1984-12-01	スチ−ル部材を電気泳動によりホウロウ処理する方法
JPS6247497A (ja)	1987-03-02	タイヤコ−ド用鋼線のメツキ方法
KR100629363B1 (ko)	2006-09-29	절연 처리된 도금장치
JPH10140387A (ja)	1998-05-26	金属箔電着ドラム
JPS621241Y2 (de)	1987-01-13
JPH07102395A (ja)	1995-04-18	線条体の連続電気めっき方法およびその装置
JPS58107496A (ja)	1983-06-27	水平型電気鍍金設備