JPS6335497A - Method for making single domain ferroelectric single crystal - Google Patents

Method for making single domain ferroelectric single crystal

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Publication number
JPS6335497A
JPS6335497A JP18047286A JP18047286A JPS6335497A JP S6335497 A JPS6335497 A JP S6335497A JP 18047286 A JP18047286 A JP 18047286A JP 18047286 A JP18047286 A JP 18047286A JP S6335497 A JPS6335497 A JP S6335497A
Authority
JP
Japan
Prior art keywords
single crystal
electric field
temperature
ferroelectric
crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18047286A
Other languages
Japanese (ja)
Inventor
Yasunori Furukawa
保典 古川
Ko Nakajima
中島 皇
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Proterial Ltd
Original Assignee
Hitachi Metals Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Metals Ltd filed Critical Hitachi Metals Ltd
Priority to JP18047286A priority Critical patent/JPS6335497A/en
Publication of JPS6335497A publication Critical patent/JPS6335497A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:When a specific electric field is applied to a single crystal, another electric field lower than the specific value is applied beforehand to effect smooth progress of single domain whereby the cracks in the single crystal is drasticly reduced. CONSTITUTION:A ferroelectric single crystal 4 (LiNbO3) is tightly enclosed through a crystal powder 3 of a specific resistance in a vessel 2 provided with a couple of electrodes 1 top and bottom, heated up near the Curie point and a specific electric field is applied to convert into single domain. At this time, before the temperature of the single crystal 4 reaches near the Curie point, another electric field corresponding to 3-15% of the specific one is applied. After the temperature reaches the Curie point, the electric field applied to the single crystal is gradually increased. Thus, the ferroelectric single crystal is made into single domain with inhibition of cracks.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明はリチウムニオベート(以下LiNb0゜と記す
)またはりチウムタンタレート(以下LiTag、と記
す)等の強誘電体単結晶の単一分域化方法に関するもの
である。
[Detailed Description of the Invention] [Field of Industrial Application] The present invention is directed to the production of a single ferroelectric single crystal such as lithium niobate (hereinafter referred to as LiNb0°) or lithium tantalate (hereinafter referred to as LiTag). It concerns the regionalization method.

(従来の技術) 従来例えばL i N b 03単結晶を2例えば2軸
引上げ後車−分域化するには、第2図のようにして行う
。すなわち上下に電極1を設けた容器2内に所定の電気
抵抗率を有する結晶粉末3を介してLiNbO5単結晶
4を封入し、所定の温度に加熱してリード線5を介して
電源6により所定の電圧を印加する。この場合のL i
 N b O3単結晶の加熱曲線および電圧印加曲線を
、第3図に各々実線および破線で示す。一般的に単結晶
の温度上昇は100″C/時間前後9時刻t0から時刻
t2までの保持温度はキューリー温度Tcより僅かに高
い1150〜1200°C2温度降下は100″C/時
間前後である。そして一定温度に保持を開始する時刻t
0から30分後の1.の時刻において電圧IV/cmを
印加し、更に30分後t2から温度を降下させ+  t
lから15時間後(、で電圧の印加を解除する。以上の
操作によってLiNb0z単結晶の単一分域化が終了す
るのである。
(Prior Art) Conventionally, for example, L i N b 03 single crystal is pulled into two, for example, two-axis, and divided into regions as shown in FIG. That is, a LiNbO5 single crystal 4 is sealed in a container 2 with electrodes 1 provided on the upper and lower sides via a crystal powder 3 having a predetermined electrical resistivity, heated to a predetermined temperature, and heated to a predetermined temperature by a power source 6 via a lead wire 5. Apply a voltage of Li in this case
The heating curve and voltage application curve of the NbO3 single crystal are shown in FIG. 3 by solid lines and broken lines, respectively. Generally, the temperature rise of a single crystal is around 100"C/hour. The holding temperature from time t0 to time t2 is 1150 to 1200.degree. C., which is slightly higher than the Curie temperature Tc. The temperature drop is around 100"C/hour. Then, the time t when the temperature starts to be maintained at a constant temperature
1. 30 minutes after 0. A voltage IV/cm was applied at time t2, and the temperature was further lowered from t2 after 30 minutes at +t
After 15 hours from 1, the voltage application is canceled. By the above operations, the single domain formation of the LiNb0z single crystal is completed.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

上記方法によって単一分域化したLi N b O:1
単結晶には、上記分域化を終了した時点で単結晶のクラ
ンクを生じていることがある。これらのクラ、りは、生
産コストを上昇させるのみならず。
Li N b O: 1 single-domained by the above method
A single crystal may have a single crystal crank when the above-mentioned segmentation is completed. These defects not only increase production costs.

単結晶の品質特性を著しく低下させるため、極力減少さ
せなければならない。上記問題点を解決するために3例
えば第4図に示すような方法がある(特開昭58−11
5096号公報参照)。第4図は前記第3図と対応する
図であり、上記単結晶に所定の電圧を印加するに当たり
1時間に対して傾斜を与えるように緩やかに印加する方
法である。すなわち前記第3図に示すような急峻な電圧
印加によるクランク発生を防止する目的でなされたもの
である。しかしながらこの方法によってもなお単結晶の
クラック発生を完全に防止することができないという問
題点がある。
It must be reduced as much as possible because it significantly deteriorates the quality characteristics of the single crystal. In order to solve the above problems, there is a method as shown in Fig. 4 (Japanese Unexamined Patent Publication No. 58-11
(See Publication No. 5096). FIG. 4 is a diagram corresponding to FIG. 3, and shows a method in which a predetermined voltage is applied to the single crystal in a gradual manner so as to give a slope over one hour. That is, this is done for the purpose of preventing the occurrence of cranking due to steep voltage application as shown in FIG. 3 above. However, even with this method, there is still a problem in that it is not possible to completely prevent the occurrence of cracks in the single crystal.

本発明は上記従来の方法に存在する問題点を解消し、ク
ラックの発生を完全に防止し得る強誘電体単結晶の単一
分域化方法を提供することを目的とする。
SUMMARY OF THE INVENTION An object of the present invention is to provide a method for forming a ferroelectric single crystal into a single domain, which eliminates the problems existing in the conventional methods and completely prevents the occurrence of cracks.

〔問題点を解決するための手段〕[Means for solving problems]

上記従来の問題点解決のために1本発明では。 One aspect of the present invention is to solve the above-mentioned conventional problems.

A0強誘電体単結晶の両端若しくは両端近傍に電界印加
のための電極を設け、前記単結晶をキューリー温度近傍
の温度に加熱すると共に、この   一温度において前
記単結晶に所定の電界を印加する工程を含む強誘電体単
結晶の単一分域化方法において。
A step of providing electrodes for applying an electric field at or near both ends of an A0 ferroelectric single crystal, heating the single crystal to a temperature near the Curie temperature, and applying a predetermined electric field to the single crystal at this temperature. In a method for single domainization of ferroelectric single crystals including.

B、前記単結晶が前記キューリー温度近傍の温度に到達
する前に前記所定の電界の3〜15%の電界を印加する
B. Applying an electric field of 3 to 15% of the predetermined electric field before the single crystal reaches a temperature near the Curie temperature.

C0前記単結晶が前記キューリー温度近傍の温度に到達
後単結晶への印加電界を前記所定の電界まで漸増させる
C0 After the single crystal reaches a temperature near the Curie temperature, the electric field applied to the single crystal is gradually increased to the predetermined electric field.

という技術的手段を採用したのである。This technical method was adopted.

本発明において、所定の電界の3〜15%の電界を予め
印加するのであるが、前記単結晶に当初から所定の電界
を印加すると強誘電体特有の電界印加によって発生する
歪の量が大きいためクラックを発生するので不都合であ
る。而して強誘電体単結晶は、キューリー温度以上にお
いて強誘電性を消失し、電界の印加により、電極反転若
しくは単一分域化が可能になるのである。しかしながら
上記単一分域化は単結晶の温度がキューリー温度に到達
したとしても、単結晶内で一斉に開始されることはなく
、若干の時間を必要とする。すなわち単結晶内において
単一分域化し易い領域においては、むしろキューリー温
度到達前においても単一分域化が比較的早く進行し、一
方単一分域化が困難な領域においては、キューリー温度
に到達後においても比較的上記分域化の進行が遅いため
であると推察される。更には上記単一分域化し易い領域
の一部は、単結晶の温度がキューリー温度に到達する前
においても、電極反転若しくは単一分域化が可能な状態
となっていると推定できる。従って所定の電界より若干
低い値の電界、好ましくは所定の電界の強さの3〜15
%の強さの電界を印加することにより、上記単一分域化
容易な領域の単一分域化を進行させ得るのである。上記
電界の強さが所定の電界の強さの3%未満では、単結晶
のキューリー温度到達前における前記単一分域化を開始
する作用が不充分である。一方15%を越える強さの電
界を印加することは、単結晶の表面および内部が不均質
であることに起因し1局部的に高電界を印加することと
なり、クランクを発生させるため不都合で゛ある。
In the present invention, an electric field of 3 to 15% of the predetermined electric field is applied in advance; however, if a predetermined electric field is applied to the single crystal from the beginning, the amount of distortion generated by the electric field application peculiar to ferroelectric materials is large. This is inconvenient as it causes cracks. Thus, the ferroelectric single crystal loses its ferroelectricity above the Curie temperature, and by applying an electric field, it becomes possible to invert the electrodes or form a single domain. However, even if the temperature of the single crystal reaches the Curie temperature, the above-mentioned single domainization is not started all at once within the single crystal, and requires some time. In other words, in a region in a single crystal where it is easy to form a single domain, the process progresses relatively quickly even before the Curie temperature is reached, whereas in a region where it is difficult to form a single domain, the process progresses relatively quickly even before the Curie temperature is reached. This is presumed to be because the above-mentioned regionalization progresses relatively slowly even after reaching the target area. Furthermore, it can be estimated that part of the region that is easily formed into a single domain is in a state where electrode inversion or single domain formation is possible even before the temperature of the single crystal reaches the Curie temperature. Therefore, an electric field with a value slightly lower than the predetermined electric field, preferably 3 to 15% of the predetermined electric field strength.
By applying an electric field with a strength of 50%, the region that can be easily formed into a single area can be made into a single area. If the electric field strength is less than 3% of the predetermined electric field strength, the effect of starting the single domain formation before the Curie temperature of the single crystal is reached is insufficient. On the other hand, applying an electric field with a strength exceeding 15% is inconvenient because it applies a high electric field locally due to the non-uniformity of the surface and inside of the single crystal, which causes cranking. be.

〔作用〕 上記のような電界の印加により、単結晶の温度がキュー
リー温度に到達する前においても、単一分域化容易領域
から単一分域化を進行させることができるから、単結晶
内部および表面における歪の発生を防止し、クラックの
発生を回避することができる。また単−分域化処理前の
不均質かつ不安定な単結晶内部に、不本意な局部的高電
界を誘起する不都合を回避する作用がある。
[Effect] By applying the above-mentioned electric field, it is possible to advance single domainization from the single domain-easy region even before the temperature of the single crystal reaches the Curie temperature. It is also possible to prevent the occurrence of distortion on the surface and avoid the occurrence of cracks. It also has the effect of avoiding the disadvantage of inducing an undesired localized high electric field inside the heterogeneous and unstable single crystal before the single-domaining treatment.

〔実施例1〕 第1図は本発明の実施例におけるLiNb0゜単結晶の
加熱曲線および電圧印加曲線を示す図であり、前記第3
図および第4図と同様に、前者を実線で、後者を破線に
て各々示しである。2軸引上げにより直径90n+++
+長さ100mmに育成したLiNbo、単結晶4を第
2図に示すように容器2内に封入し、電気炉(図示せず
)内に装入して。
[Example 1] FIG. 1 is a diagram showing a heating curve and a voltage application curve of LiNb0° single crystal in an example of the present invention.
Similarly to FIG. 4, the former is shown by a solid line, and the latter by a broken line. Diameter 90n+++ by 2-axis pulling
A LiNbo single crystal 4 grown to a length of 100 mm was sealed in a container 2 as shown in FIG. 2, and charged into an electric furnace (not shown).

80”C/時間の割合で加熱する。単結晶の温度が40
°Cに到達した時点において、前記第2図に示す電源6
により1■の電圧を印加する。次に単結晶の温度が11
50°Cの保持温度に到達した時刻t0から20■/時
間の割合で印加電圧を漸次上昇させて2時刻tlから1
5〜20Vの所定電圧に保持する。そしてこの電圧に保
持開始150分後の時刻t2から単結晶の温度を降下さ
せ9時刻L1から12〜15時間後の時刻t3において
電圧の印加を解除し、l、 i N b O3単結晶の
単一分域化処理を終了する。以上のようにして80個の
単一分域化処理を行ったところクランクの発生は2個で
あった。
Heating at a rate of 80"C/hour. When the temperature of the single crystal is 40"C/hour.
When the temperature reaches °C, the power supply 6 shown in FIG.
Apply a voltage of 1. Next, the temperature of the single crystal is 11
From time t0 when the holding temperature of 50°C was reached, the applied voltage was gradually increased at a rate of 20 cm/hour, and from time tl to 1
It is maintained at a predetermined voltage of 5 to 20V. Then, from time t2, 150 minutes after the start of holding this voltage, the temperature of the single crystal is lowered, and at time t3, 12 to 15 hours after 9 time L1, the voltage application is released, and the Ends the single area processing. When 80 single segmentation processes were performed as described above, only two cranks occurred.

〔実施例2〕 実施例1と同様に直径601長さ100mmのし1Ta
03単結晶の2軸方向に第2図に示すような電極lを配
設し、第1図に示すような曲線によって加熱および電圧
印加を行った。すなわち、まずLiTaO3単結晶を8
0°C/時間の割合で加熱し、40°Cに到達した時点
からlO■の電圧を印加する。次に単結晶の温度が75
0°Cの保持温度に到達した時刻t0から200 V/
待時間割合で印加電圧を漸増させて9時刻1.から20
0■の所定電圧に保持する。而してこの電圧に保持開始
300分後の時刻t2から単結晶の温度を降下させ9時
刻t1から12〜15時間後の時刻t3において電圧の
印加を解除し、LiTaO5単結晶の単一分域化処理を
終了する。以上のようにして、55個の単一分域化処理
を行ったところ。
[Example 2] Similar to Example 1, a 1Ta diameter 601 length 100 mm
Electrodes 1 as shown in FIG. 2 were arranged in the biaxial directions of the 03 single crystal, and heating and voltage application were performed according to the curve shown in FIG. That is, first, a LiTaO3 single crystal is
Heating is carried out at a rate of 0°C/hour, and a voltage of 1O■ is applied from the time the temperature reaches 40°C. Next, the temperature of the single crystal is 75
200 V/ from time t0 when the holding temperature of 0°C is reached.
The applied voltage was gradually increased according to the waiting time ratio, and at 9 time 1. From 20
It is held at a predetermined voltage of 0■. Then, from time t2, 300 minutes after the start of holding at this voltage, the temperature of the single crystal is lowered, and at time t3, 12 to 15 hours after time t1, the voltage application is released, and the single crystal domain of the LiTaO5 single crystal is lowered. Terminate the conversion process. 55 single area division processes were performed as described above.

クラックの発生は1個に留まった。Only one crack occurred.

本実施例においては、l、1Nbo:+単結晶およびL
 i T a O3単結晶の例について記述したが。
In this example, l, 1Nbo: + single crystal and L
The example of i T a O3 single crystal has been described.

上記以外の他の強誘電体単結晶についても作用は同様で
ある。また引上軸と単一分域化方向が同一であるものに
限定せず、異なるものについても上記と同様に適用でき
ることは勿論である。更にまた所定の電圧若しくは電界
より低い値の電圧若しくは電界を印加する単結晶の温度
は、単結晶の種類1面方位、形状2寸法等を勘案して定
めるべきであるが、大略キューリー温度Tcの85〜1
50%の範囲で選定するのが好ましい。
The same effect applies to other ferroelectric single crystals other than those mentioned above. Furthermore, the present invention is not limited to those in which the pulling axis and the direction of single segmentation are the same, and it goes without saying that the above can be applied in the same manner as in the case where the pulling axis and the direction of single segmentation are different. Furthermore, the temperature of the single crystal to which a voltage or electric field with a value lower than a predetermined voltage or electric field is applied should be determined by taking into account the type of single crystal, the orientation of one plane, the shape and two dimensions, etc. 85-1
It is preferable to select within a range of 50%.

〔発明の効果〕〔Effect of the invention〕

本発明は以上記述のような構成および作用であるから1
強誘電体単結晶の単一分域化処理において、所定の電界
より低い値の電界を予め印加することにより、単一分域
化を円滑に進行させることができ、単結晶の表面若しく
は内部におけるクラックの発生を大幅に減少させ得ると
いう効果がある。
Since the present invention has the structure and operation as described above, 1
In the process of single-domaining a ferroelectric single crystal, by applying an electric field lower than a predetermined electric field in advance, single-domaining can proceed smoothly. This has the effect of significantly reducing the occurrence of cracks.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の実施例における温度および電圧と時間
との関係を示す図、第2図は強誘電体単結晶の単一分域
化処理状態の説明図、第3図および第4図は各々従来方
法における温度および電圧と時間との関係を示す図であ
る。
Fig. 1 is a diagram showing the relationship between temperature, voltage, and time in an embodiment of the present invention, Fig. 2 is an explanatory diagram of the state of single domain treatment of a ferroelectric single crystal, and Figs. 3 and 4. FIG. 2 is a diagram showing the relationship between temperature, voltage, and time in each conventional method.

Claims (2)

【特許請求の範囲】[Claims] (1)強誘電体単結晶の両端若しくは両端近傍に電界印
加のための電極を設け、前記単結晶をキューリー温度近
傍の温度に加熱すると共に、この温度において前記単結
晶に所定の電界を印加する工程を含む強誘電体単結晶の
単一分域化方法において、前記単結晶が前記キューリー
温度近傍の温度に到達する前に前記所定の電界の3〜1
5%の電界を印加すると共に、前記単結晶が前記キュー
リー温度近傍の温度に到達後単結晶への印加電界を前記
所定の電界まで漸増させることを特徴とする強誘電体単
結晶の単一分域化方法。
(1) Providing electrodes for applying an electric field at or near both ends of a ferroelectric single crystal, heating the single crystal to a temperature near the Curie temperature, and applying a predetermined electric field to the single crystal at this temperature. 3 to 1 of the predetermined electric field before the single crystal reaches a temperature near the Curie temperature.
A single component of a ferroelectric single crystal, characterized in that an electric field of 5% is applied and, after the single crystal reaches a temperature near the Curie temperature, the electric field applied to the single crystal is gradually increased to the predetermined electric field. regionalization method.
(2)強誘電体がリチウムニオベート(LiNbO_3
)またはリチウムタンタレート(LiTaO_3)であ
る特許請求の範囲第1項記載の強誘電体単結晶の単一分
域化方法。
(2) The ferroelectric material is lithium niobate (LiNbO_3
) or lithium tantalate (LiTaO_3), the method for producing a single domain of a ferroelectric single crystal according to claim 1.
JP18047286A 1986-07-31 1986-07-31 Method for making single domain ferroelectric single crystal Pending JPS6335497A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18047286A JPS6335497A (en) 1986-07-31 1986-07-31 Method for making single domain ferroelectric single crystal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18047286A JPS6335497A (en) 1986-07-31 1986-07-31 Method for making single domain ferroelectric single crystal

Publications (1)

Publication Number Publication Date
JPS6335497A true JPS6335497A (en) 1988-02-16

Family

ID=16083815

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18047286A Pending JPS6335497A (en) 1986-07-31 1986-07-31 Method for making single domain ferroelectric single crystal

Country Status (1)

Country Link
JP (1) JPS6335497A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5766340A (en) * 1997-03-28 1998-06-16 Litton Systems, Inc. Method for post-poling mobile ion redistribution in lithium niobate
CN109576791A (en) * 2018-12-07 2019-04-05 河南工程学院 A kind of polarization method of near stoichiometric lithium tantalate wafer

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5766340A (en) * 1997-03-28 1998-06-16 Litton Systems, Inc. Method for post-poling mobile ion redistribution in lithium niobate
EP0867539A3 (en) * 1997-03-28 2000-05-17 Litton Systems, Inc. Method for poling a ferroelectric crystal
CN109576791A (en) * 2018-12-07 2019-04-05 河南工程学院 A kind of polarization method of near stoichiometric lithium tantalate wafer

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