JPS6336034U - - Google Patents

Info

Publication number
JPS6336034U
JPS6336034U JP1986129917U JP12991786U JPS6336034U JP S6336034 U JPS6336034 U JP S6336034U JP 1986129917 U JP1986129917 U JP 1986129917U JP 12991786 U JP12991786 U JP 12991786U JP S6336034 U JPS6336034 U JP S6336034U
Authority
JP
Japan
Prior art keywords
mask
alignment mark
light
substrate
alignment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1986129917U
Other languages
Japanese (ja)
Other versions
JPH0241862Y2 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1986129917U priority Critical patent/JPH0241862Y2/ja
Publication of JPS6336034U publication Critical patent/JPS6336034U/ja
Application granted granted Critical
Publication of JPH0241862Y2 publication Critical patent/JPH0241862Y2/ja
Expired legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は本考案に係るマスク位置合わせ装置の
一実施例を示す構成説明図、第２図はアライメン
トマークの位置関係の説明図、第３図は従来例の
構成説明図である。 １１……ステージ、１２……発光装置、１３…
…基板、１４……フオトレジスト、１５……アラ
イメントマーク、１６……フオトマスク、１７…
…アライメントマーク、１８……受光装置。 FIG. 1 is an explanatory diagram of the configuration of an embodiment of the mask alignment device according to the present invention, FIG. 2 is an explanatory diagram of the positional relationship of alignment marks, and FIG. 3 is an explanatory diagram of the configuration of a conventional example. 11... stage, 12... light emitting device, 13...
...Substrate, 14...Photoresist, 15...Alignment mark, 16...Photomask, 17...
...Alignment mark, 18... Light receiving device.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] フオトレジストが塗布され、かつアライメント
マークが形成された基板と、リング状のアライメ
ントマークがクロム等の金属により形成されたフ
オトマスクとを発光装置及び受光装置を用いて位
置合わせするマスク位置合わせ装置において、発
光装置を基板載置用のステージの上面に配置する
一方、基板のアライメントマークをインク等で色
着された印刷体とし、その透過光をマスク上方の
受光装置で受光してその受光量から位置合わせの
正否を判別するようにしたことを特徴とするマス
ク位置合わせ装置。 In a mask alignment device that uses a light emitting device and a light receiving device to align a substrate coated with a photoresist and on which an alignment mark is formed, and a photomask in which a ring-shaped alignment mark is formed of a metal such as chrome, The light emitting device is placed on the top surface of the stage for mounting the substrate, and the alignment mark on the substrate is printed with ink, etc., and the transmitted light is received by the light receiving device above the mask, and the position is determined from the amount of received light. A mask positioning device characterized in that it determines whether alignment is correct or not.
JP1986129917U 1986-08-26 1986-08-26 Expired JPH0241862Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1986129917U JPH0241862Y2 (en) 1986-08-26 1986-08-26

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1986129917U JPH0241862Y2 (en) 1986-08-26 1986-08-26

Publications (2)

Publication Number Publication Date
JPS6336034U true JPS6336034U (en) 1988-03-08
JPH0241862Y2 JPH0241862Y2 (en) 1990-11-08

Family

ID=31026924

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1986129917U Expired JPH0241862Y2 (en) 1986-08-26 1986-08-26

Country Status (1)

Country Link
JP (1) JPH0241862Y2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010147253A (en) * 2008-12-18 2010-07-01 Nippon Telegr & Teleph Corp <Ntt> Positioning method, photomask and wafer
JP2012242576A (en) * 2011-05-19 2012-12-10 V Technology Co Ltd Photomask and exposure device

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5011668A (en) * 1973-06-01 1975-02-06
JPS52144973A (en) * 1976-05-28 1977-12-02 Hitachi Ltd Positioning method of semiconductor wafers
JPS53109080A (en) * 1977-03-03 1978-09-22 Fujitsu Ltd Positioning device
JPS60110119A (en) * 1983-11-21 1985-06-15 Canon Inc Position matching method

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5011668A (en) * 1973-06-01 1975-02-06
JPS52144973A (en) * 1976-05-28 1977-12-02 Hitachi Ltd Positioning method of semiconductor wafers
JPS53109080A (en) * 1977-03-03 1978-09-22 Fujitsu Ltd Positioning device
JPS60110119A (en) * 1983-11-21 1985-06-15 Canon Inc Position matching method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010147253A (en) * 2008-12-18 2010-07-01 Nippon Telegr & Teleph Corp <Ntt> Positioning method, photomask and wafer
JP2012242576A (en) * 2011-05-19 2012-12-10 V Technology Co Ltd Photomask and exposure device

Also Published As

Publication number Publication date
JPH0241862Y2 (en) 1990-11-08

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