JPS6344785A - Semiconductor laser array - Google Patents
Semiconductor laser arrayInfo
- Publication number
- JPS6344785A JPS6344785A JP18820286A JP18820286A JPS6344785A JP S6344785 A JPS6344785 A JP S6344785A JP 18820286 A JP18820286 A JP 18820286A JP 18820286 A JP18820286 A JP 18820286A JP S6344785 A JPS6344785 A JP S6344785A
- Authority
- JP
- Japan
- Prior art keywords
- array
- substrate
- semiconductor laser
- groove
- clad layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
- H01S5/4025—Array arrangements, e.g. constituted by discrete laser diodes or laser bar
- H01S5/4031—Edge-emitting structures
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
Abstract
Description
【発明の詳細な説明】
(イ)産業上の利用分野
この発明はたとえば光通信や光デイスクプレーヤなどの
光情報処理機器に用いられる単一モードで発振して高出
力が得られる半導体レーザアレー装置に関、するもので
ある。DETAILED DESCRIPTION OF THE INVENTION (a) Field of Industrial Application This invention is applicable to semiconductor laser array devices that can oscillate in a single mode and obtain high output, for example, used in optical communications and optical information processing equipment such as optical disk players. Seki, that's what I do.
(ロ)従来の技術
一般に、高出力を得るために、半導体レーザを複数本集
積した半導体レーザアレー装置が知られている。そして
その構成としては、たとえば一つの半導体レーザが、平
坦なn形G a A s基板上に、n形GaAffAs
クラッド層、CaAs活性暦活性形GユAQAsクラッ
ド暦およびp形GaAsキャップ層を順次形成した後、
キャップ層の左右両側全部とクラッド層の左右両側一部
をエツチングによって除去し、このクラッド層の左右両
側表面にSiO*絶縁層を形成してなる構造を有するリ
ッジ導波路型レーザ素子を一つの基板上に3個集積して
形成したものである。(b) Prior Art Generally, semiconductor laser array devices are known in which a plurality of semiconductor lasers are integrated in order to obtain high output. As for its structure, for example, one semiconductor laser is made of n-type GaAffAs on a flat n-type GaAs substrate.
After sequentially forming a cladding layer, a CaAs active type GyuAQAs cladding layer, and a p-type GaAs cap layer,
A ridge waveguide laser element having a structure in which all of the left and right sides of the cap layer and a portion of the left and right sides of the cladding layer are removed by etching, and SiO* insulating layers are formed on both left and right surfaces of the cladding layer, is fabricated on one substrate. It is formed by stacking three pieces on top.
(ハ)発明が解決しようとする問題点
しかしながら、上記の構造においては、単一〇°位相同
期モードでの発振が得られておらず、したがって高出力
化が達成されていない。この原因は、高次の180°位
相同期モードが低い閾値利得で発振しているためである
。っまり0°位相同期モードと180°位相同期モード
との利得差は極めて小さいため、両モードが混在した発
振をするか、むしろリッジ間で利得が小さいため180
°位相同期モードの発振の方が主となるものである。(c) Problems to be Solved by the Invention However, in the above structure, oscillation in a single 0° phase locking mode has not been achieved, and therefore high output has not been achieved. This is because the high-order 180° phase locking mode oscillates with a low threshold gain. The gain difference between the exactly 0° phase locking mode and the 180° phase locking mode is extremely small, so either the two modes oscillate mixedly, or rather, the gain between the ridges is small and the 180° phase locking mode is extremely small.
The oscillation in the phase-locked mode is the main one.
この発明は上記の事情に鑑みてなされたもので、180
°位相同期モードを抑制して、弔−〇゛位相同期モード
で発振する半導体レーザアレー装置を提供しようするも
のである。This invention was made in view of the above circumstances, and 180
It is an object of the present invention to provide a semiconductor laser array device that suppresses the phase-locked mode and oscillates in the phase-locked mode.
(ニ)問題点を解決するための手段
この発明の構成は半導体レーザを複数本同一基板上に集
積して、複数の発光領域を具備する半導体レーザアレー
装置において、
萌記発光領域に対向する前記基板の接合面に、それぞれ
の発光領域の幅寸法を合計した幅寸法より小なる幅寸法
で、かつ、所定の深さ寸法を有する溝部を設けたことを
特徴とする半導体レーザアレー装置である。(d) Means for Solving the Problems The present invention has a configuration in which a plurality of semiconductor lasers are integrated on the same substrate, and in a semiconductor laser array device comprising a plurality of light emitting regions, the substrate faces the light emitting region. A semiconductor laser array device is characterized in that a groove portion having a width smaller than the sum of the widths of the respective light emitting regions and a predetermined depth is provided on the bonding surface of the semiconductor laser array device.
(ホ)作 用
溝部の部分における屈折率が最も大きく、溝部以外の周
辺部で高次モードの吸収を大きくするため、0°位相発
振を安定に得ることができるようになる。(E) Effect The refractive index in the groove portion is the highest and absorption of higher-order modes is increased in the peripheral portion other than the groove portion, so that 0° phase oscillation can be stably obtained.
(へ)実施例
以下この発明の実施例を図面にて詳述するが、この発明
は以下の実施例に限定されるものではない。(F) EXAMPLES Hereinafter, examples of the present invention will be described in detail with reference to the drawings, but the present invention is not limited to the following examples.
第1図に示す半導体レーザアレー装置Iは、3本ストラ
イプ型の半導体レーザアレー装置である。A semiconductor laser array device I shown in FIG. 1 is a three-stripe semiconductor laser array device.
2はp型GaAsの基板で、その上面(接合面)に輻6
μm1深さ1μmの溝部3をストライプ状に形成する。2 is a p-type GaAs substrate with a radius 6 on its top surface (junction surface).
Grooves 3 each having a depth of 1 μm are formed in a stripe shape.
つまり溝部3は半導体レーザアレー装置1の共振器(図
示しない)長手方向に延長されている。そして上記のよ
うに加工した基板2上にp型G a AffA sクラ
ッド層4、GaAQAs活性層5、n型GaA12As
クラッド層らおよび電極形成用Ω型G a A s R
7をそれぞれ液相エピタキシャル法で成長させる。つい
で、基板2に形成した溝部3を中心として、幅2μmS
間隔2μmのリッジ8をリアクティブエツチング法で形
成する。さらに電極形成用n型GaAs層7の上面をの
ぞく表面とp型GaAl2Asクラッド層4表面とに電
流阻止用のSjN膜9を形成し、その上面および電極形
成用n型GaAs層7上面に連続してn型電極lOを形
成する。l】は基板2の下面に設けられるp型電極であ
る。この後通常の何間法によりウェハより分割して個々
の半導体レーザアレー装置Iとする。That is, the groove portion 3 extends in the longitudinal direction of the resonator (not shown) of the semiconductor laser array device 1. Then, on the substrate 2 processed as described above, a p-type GaAffAs cladding layer 4, a GaAQAs active layer 5, an n-type GaA12As
Ω-type GaAsR for cladding layer and electrode formation
7 are grown by liquid phase epitaxial method. Next, a width of 2 μm S is formed around the groove 3 formed in the substrate 2.
Ridges 8 with a spacing of 2 μm are formed by reactive etching. Furthermore, an SjN film 9 for current blocking is formed on the surface of the n-type GaAs layer 7 for electrode formation except for the top surface and the surface of the p-type GaAl2As cladding layer 4, and continues on the top surface and the top surface of the n-type GaAs layer 7 for electrode formation. Then, an n-type electrode IO is formed. 1] is a p-type electrode provided on the lower surface of the substrate 2. Thereafter, the wafer is divided into individual semiconductor laser array devices I using a conventional method.
この実施例では、それぞれのりツノ8下方のそれぞれの
りツノ8に対応する発光領域121゜12b、12cの
幅寸法、いいかえればそれぞれのりツノ8の幅寸法の合
計にほぼ等しい幅寸法WLより、溝部3の幅寸法wsが
小さく (W5 < Ww )なっている。したかって
、溝部3により、p型GaAりAsクラッド層4の層厚
が、アレー中央部でアレー周辺部より大きくなり、この
p型GaA(IAsクラッド層4のストライプの等価屈
折率が大きくなる。これとは逆に、周辺部では基板2に
よる吸収のため損失が大きくなっている。In this embodiment, the width of the light emitting areas 121° 12b, 12c below the respective glue horns 8, or in other words, the width WL which is approximately equal to the sum of the widths of the respective glue horns 8, is determined by the width of the groove 3. The width dimension ws of is small (W5 < Ww). Therefore, due to the groove portion 3, the layer thickness of the p-type GaA/As cladding layer 4 becomes larger at the center of the array than at the periphery of the array, and the equivalent refractive index of the stripe of this p-type GaA/IAs cladding layer 4 increases. On the contrary, in the peripheral area, the loss is large due to absorption by the substrate 2.
したがってこの発明の半導体レーザアレー装置は、アレ
ー中央部の電界強度が大きなO°位位相モー1振振有利
な屈折率分布をもっており、アレー各部において同一強
度の180°位相同期モードは抑制される損失分布とな
っている。Therefore, the semiconductor laser array device of the present invention has a refractive index distribution that is advantageous for the 0° phase mode 1 oscillation, with a large electric field strength at the center of the array, and a loss distribution that suppresses the 180° phase synchronization mode with the same intensity in each part of the array. It becomes.
この実施例において、前面共振面に透過膜、裏面共振面
に高反射膜を被覆して、出力300mWまで単一〇゛位
相発振が得られた。In this example, the front resonance surface was coated with a transmission film and the back resonance surface was coated with a high reflection film, and single 〇゛ phase oscillation was obtained up to an output of 300 mW.
この方法は例えば埋め込みガイドやリブガイドなどの他
のリアルガイドレーザにも応用できる。This method can also be applied to other real guide lasers, such as embedded guides and rib guides.
なお上記実施例では、3つのりツノを有する半導体レー
ザアレー装置としたが、リッジの数は所望の出力に対応
して増減すればよい。In the above embodiment, the semiconductor laser array device has three ridges, but the number of ridges may be increased or decreased depending on the desired output.
(ト)発明の効果
この発明によれば、高次の横モードを含む多モード発振
の中から、クラッド層の等価屈折率に分布をもたせるこ
とにより、単一〇゛位相同期モードの発振のみを選択し
、極めて安定に、かつ、高主力でレーザ発振をすること
ができる半導体レーザアレー装置が得られる。(G) Effects of the Invention According to this invention, only a single 〇゛ phase-locked mode oscillation can be detected from among multi-mode oscillations including high-order transverse modes by giving a distribution to the equivalent refractive index of the cladding layer. A semiconductor laser array device can be obtained that can perform laser oscillation extremely stably and with high main power.
第1図はこの発明の実施例縦断面図である。
2・−・・・・基板、 3・・・・・・溝部、12a
、+2b、12c・・・・・・発光領域。
第1図FIG. 1 is a longitudinal sectional view of an embodiment of the present invention. 2...Substrate, 3...Groove, 12a
, +2b, 12c... Light emitting region. Figure 1
Claims (1)
の発光領域を具備する半導体レーザアレー装置において
、 前記発光領域に対向する前記基板の接合面に、それぞれ
の発光領域の幅寸法を合計した幅寸法より小なる幅寸法
で、かつ、所定の深さ寸法を有する溝部を設けたことを
特徴とする半導体レーザアレー装置。[Claims] 1. In a semiconductor laser array device having a plurality of light emitting regions by integrating a plurality of semiconductor lasers on the same substrate, each light emitting region is provided on a bonding surface of the substrate facing the light emitting region. What is claimed is: 1. A semiconductor laser array device comprising a groove portion having a width smaller than the sum of the widths of and a predetermined depth.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18820286A JPS6344785A (en) | 1986-08-11 | 1986-08-11 | Semiconductor laser array |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18820286A JPS6344785A (en) | 1986-08-11 | 1986-08-11 | Semiconductor laser array |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6344785A true JPS6344785A (en) | 1988-02-25 |
Family
ID=16219561
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18820286A Pending JPS6344785A (en) | 1986-08-11 | 1986-08-11 | Semiconductor laser array |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6344785A (en) |
-
1986
- 1986-08-11 JP JP18820286A patent/JPS6344785A/en active Pending
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