JPS6348558A - Electrophotographic sensitive body - Google Patents
Electrophotographic sensitive bodyInfo
- Publication number
- JPS6348558A JPS6348558A JP19316586A JP19316586A JPS6348558A JP S6348558 A JPS6348558 A JP S6348558A JP 19316586 A JP19316586 A JP 19316586A JP 19316586 A JP19316586 A JP 19316586A JP S6348558 A JPS6348558 A JP S6348558A
- Authority
- JP
- Japan
- Prior art keywords
- alloy
- doped
- selenium
- transfer layer
- selenium alloy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording-members for original recording by exposure, e.g. to light, to heat or to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
- G03G5/082—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic and not being incorporated in a bonding material, e.g. vacuum deposited
- G03G5/08207—Selenium-based
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photoreceptors In Electrophotography (AREA)
Abstract
Description
【発明の詳細な説明】
〔発明の属する技術分野〕
本発明は、セレン系の光導電性材料からなる感光層を有
する電子写真用感光体に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of the Invention] The present invention relates to an electrophotographic photoreceptor having a photosensitive layer made of a selenium-based photoconductive material.
電子写真用感光体に利用されるセレン系の光導電性材料
としては、純セレン(Se)、セレン−テルル(Se−
Te) 合金、セレン−ひ素(Se−、As) 合
金、セレン−テルル−ひ素(Se−Te−As)合金の
各種組成比のもの、さらにこれらに酸素(0)、 ビ
スマス(Bi)。Examples of selenium-based photoconductive materials used in electrophotographic photoreceptors include pure selenium (Se) and selenium-tellurium (Se-
Te) alloys, selenium-arsenic (Se-, As) alloys, selenium-tellurium-arsenic (Se-Te-As) alloys in various composition ratios, and in addition to these, oxygen (0) and bismuth (Bi).
アンチモン(Sb)、 ハロゲンなどを不純物として
ドープしたものがあり、感光体として要求される機能、
特性に応じて、これらの材料のうちの一つからなろ屯−
―で形成された感光層の、啜光体、あるいは、数種類の
材料を積層して形成された感光層の感光体が製品化され
ている。Some products are doped with antimony (Sb), halogen, etc. as impurities, and have the functions required as photoreceptors.
Naroton is made from one of these materials depending on its properties.
Photoreceptors with a photosensitive layer made of - or photoreceptors with a photosensitive layer formed by laminating several types of materials have been commercialized.
このようなセレン系光導電性材料からなる感光層;ま、
通常、真空蒸着法により基体上に成膜形成される。その
際、合金材料を用いる場合に問題となるのは成分元素の
蒸気圧の差異により分留がおきることである。そのため
、合金材料を蒸着して形成された感光層は、その膜厚方
向の成分元素の組成比が均一でなくあるプロファイルを
もつことになり、その結果感光体の光電特性に影響を及
ぼすことになる。例えば、SeはTeよりも蒸気圧がか
なり高く蒸発し易い。従って5e−Te合金を真空中で
蒸発させ基体上に成膜した場合SeとTeの分留がおこ
り、蒸着膜のうち初期に成膜された部分は合金の成分比
よりもSeが多くTe尤べ少ない組成比であり、その後
成膜がすすむにつれてSeが減少してTeが増加し、蒸
着膜の表面ではSeが少なくTeが多い組成比となる。A photosensitive layer made of such a selenium-based photoconductive material;
Usually, a film is formed on a substrate by a vacuum evaporation method. In this case, a problem when using alloy materials is that fractional distillation occurs due to differences in the vapor pressures of the component elements. Therefore, a photosensitive layer formed by vapor-depositing an alloy material has a profile in which the composition ratio of the component elements in the film thickness direction is not uniform, which may affect the photoelectric properties of the photoreceptor. Become. For example, Se has a much higher vapor pressure than Te and is easier to evaporate. Therefore, when a 5e-Te alloy is evaporated in vacuum and formed into a film on a substrate, fractional distillation of Se and Te occurs, and the initially formed portion of the evaporated film contains more Se than the alloy component ratio and a large amount of Te. After that, as the film formation progresses, Se decreases and Te increases, resulting in a composition ratio with less Se and more Te on the surface of the deposited film.
このようにして、Te濃度に着目すると、蒸着膜の基体
側より表面に向かって膜厚方向に低濃度から高濃度へと
変化する濃度プロファイルを有することになる。In this way, when focusing on the Te concentration, the deposited film has a concentration profile that changes from a low concentration to a high concentration in the film thickness direction from the substrate side toward the surface.
このようなTeの濃度差は蒸着膜が厚くなる程大きくな
り実用上問題となってくる。例えば5e−Te合金蒸着
膜で単一層の盛光層を形成する場合、または、5e−T
e合金蒸着膜をキャリア輸送層とし、その上にキャリア
発生層を設けて感光層とする場合、感光体としての所要
の帯電性能を14%るために所定の組成比の5e−Te
合金を50μm〜60μmの膜厚に真空蒸着を行うが、
このような厚嘆とするために多量の5e−Te合金を長
時間かけて蒸着することになるので、SaとTeの分留
のためTeの濃度が目標渣よりずれて非常に大きくなる
部分が生じ、熱励起キャリ゛アの発生が多くなる。その
ため、特に高温において−3光1本つ帯電位の暗減衰が
増大し、電子写真装否に搭載し使用するとき高;ユ時出
力コ巧象の濃度低下が起こることになる。Such a difference in Te concentration increases as the deposited film becomes thicker, and becomes a practical problem. For example, when forming a single-layer light layer with a 5e-Te alloy vapor deposited film, or
When using an e-alloy vapor deposited film as a carrier transport layer and a carrier generation layer thereon to form a photosensitive layer, 5e-Te of a predetermined composition ratio is used to obtain the required charging performance as a photoreceptor by 14%.
The alloy is vacuum deposited to a film thickness of 50 μm to 60 μm,
In order to achieve this, a large amount of 5e-Te alloy must be deposited over a long period of time, so there is a portion where the Te concentration deviates from the target residue and becomes very large due to fractional distillation of Sa and Te. As a result, more thermally excited carriers are generated. Therefore, especially at high temperatures, the dark attenuation of the -3 light single charge potential increases, and when used in an electrophotographic device, the density of the output power decreases at high temperatures.
しかも、この濃度プロファイルは常に一定と−一らず、
合金材料の製造ロフト、蒸着ロットなどの袈凸条件のば
らつきにより変動し7−制御しきれな″、)という問題
もある。Moreover, this concentration profile is not always constant;
There is also the problem that it fluctuates due to variations in the protrusion conditions such as the manufacturing loft of the alloy material and the deposition lot, making it difficult to fully control.
本発明は、上述の点に鑑みてなされたものであって、高
温においても帯電位の暗減衰の増大しない、特性のぼろ
つきの少ない安定したセレン系の電子写真用感光体を提
供することを目的とする。The present invention has been made in view of the above points, and it is an object of the present invention to provide a stable selenium-based electrophotographic photoreceptor that does not increase the dark decay of charged potential even at high temperatures and has less rough characteristics. shall be.
本発明の目的は、真空蒸着により形成された非晶質セレ
ン合金からなるキャリア輸送層とニヤリア発生層とを備
えた電子写真用感光体に15いて、キャリア輸送層をす
ず(Sr+)をドープされた非晶質でレン台金とするこ
とによって達成される。An object of the present invention is to provide an electrophotographic photoreceptor comprising a carrier transport layer and a grin generation layer formed by vacuum evaporation and made of an amorphous selenium alloy, the carrier transport layer being doped with tin (Sr+). This is achieved by making the base metal amorphous.
以下、本発明の実施例について図面を参照しながら説明
する。Embodiments of the present invention will be described below with reference to the drawings.
第1図は本発明の感光体の一実施例の層構成を示す模式
的断面図である。第1図において、1は例えばアルミニ
ウム合金からなる導電性基板であり、2は5e−Te、
5e−Asまたは5e−Te−AS合金にSnを所
定最ドープしたものを膜厚約60μmに真空蒸着したキ
ャリア輸送層(CTL)であり、3は5e−Te、 5
e−As または5e−Te−As合金を膜厚数μm
に真空蒸着したキャリア発生層(CC,L)である。C
TLとCGLとに用いる合金材料は種々の組合せがある
がその一部を第1表に示す。第1表中TeとAsの前の
数値は合金中のそれぞれの重量り6を示し、Snについ
ては重量ppmを示す。FIG. 1 is a schematic cross-sectional view showing the layer structure of an embodiment of the photoreceptor of the present invention. In FIG. 1, 1 is a conductive substrate made of, for example, an aluminum alloy, 2 is 5e-Te,
This is a carrier transport layer (CTL) in which 5e-As or 5e-Te-AS alloy doped with Sn to a predetermined maximum is vacuum-deposited to a thickness of about 60 μm; 3 is 5e-Te, 5 is
e-As or 5e-Te-As alloy with a film thickness of several μm
This is a carrier generation layer (CC, L) vacuum-deposited on. C
There are various combinations of alloy materials used for TL and CGL, some of which are shown in Table 1. The numerical values before Te and As in Table 1 indicate their respective weights in the alloy, and for Sn, they indicate weight ppm.
第1表
具体的−よ実施例として、導電性基はとして外1条12
0mm のアルミニウム合金円筒を用い、その表面に第
1表の第2番目の組合せのCTLとCCLを形成した。Table 1: Specific Examples - Conductive groups are listed in Article 1, Article 12.
A 0 mm 2 aluminum alloy cylinder was used, and the second combination of CTL and CCL in Table 1 was formed on its surface.
すなわち5e15.5Te/1000Sn を真空蒸着
してCTLとし、その上にSe/30Te15Asを真
空蒸着してCGLとじ実施例の感光体を作製した。比較
のためにCTLの材ホ4としてSnをドープしないSe
/Te合金である5e15.5Teを用い、その池は前
記実施例に孕じて比較例の、感光体を作製した。That is, 5e15.5Te/1000Sn was vacuum-deposited to form a CTL, and Se/30Te15As was vacuum-deposited thereon to form a CGL-bound photoconductor. For comparison, Se without Sn doping was used as CTL material Ho4.
Using 5e15.5Te, which is a /Te alloy, a photoreceptor was prepared as a comparative example using the same structure as that of the above-mentioned example.
、−れらの感光体についてT e 、13度プロファイ
ルをEP〜1Aで測定した。その結果を、実施例につい
て第2図に、比較例について第3図に示す。第2゜第3
図に2いて縦軸にTeの特性X線の強度を、横軸に基板
との界面を起りとした感光層の位置を示す。横軸には感
光層の界面と表面を矢印で示しである。CTL中のTe
の濃度勾配差はX線強度で第2図の場合3Qcps、
第3図の場合+30cpsであり、CTLにSnをド
ープした実施例の場合には、真空蒸着時SeとTeの分
留が充分抑止されていることが判る。, - T e , 13 degree profiles were measured for these photoreceptors at EP~1A. The results are shown in FIG. 2 for the example and in FIG. 3 for the comparative example. 2nd゜3rd
In FIG. 2, the vertical axis shows the intensity of characteristic X-rays of Te, and the horizontal axis shows the position of the photosensitive layer starting from the interface with the substrate. The horizontal axis indicates the interface and surface of the photosensitive layer with arrows. Te in CTL
The concentration gradient difference in the X-ray intensity is 3Qcps in the case of Figure 2,
In the case of FIG. 3, it is +30 cps, and it can be seen that in the case of the example in which the CTL is doped with Sn, the fractional distillation of Se and Te during vacuum evaporation is sufficiently suppressed.
次に、これらの感光体について、雰囲気温度25℃で帯
電位■1.暗中5秒後の帯電位保持率におよび残留電位
■、を測定し、そのときの値を規孕の100%とし、雰
囲気温度を変えたときのこれら帯電位、帯電位保持率お
よび残留電位の変動率を謂べた。それらの結果を実施例
については第4図に、比較例については第5図に示す。Next, these photoreceptors were subjected to charging potential (1) at an ambient temperature of 25°C. Measure the charged potential retention rate and residual potential after 5 seconds in the dark, take the value at that time as 100% of the original value, and calculate the charged potential, charged potential retention rate, and residual potential when the ambient temperature is changed. It was called the rate of change. The results are shown in FIG. 4 for the example and in FIG. 5 for the comparative example.
第4図の実施例においては、雰囲気温度25℃の場合帯
電位■5 は846 V 、帯電位保持率には92.1
%、残留電位■、は12Vであった。これらの値を10
0%とし雰囲気温、りを50?′まて変化させてこれら
の5性の変動を調べたのであるが、例えば雰囲気温1文
45℃の場合、帯7位、保持率、残留電位はそれぞれ2
5℃のときのイ直の9096.34%、13%の1直に
まで変動したことが第4図に示されている。同嘩にして
、比較例について例えば露囲気、@度が25℃から45
℃に変化したとき、帯?1位、保持率はそれぞれ25℃
のときの!直842 .39. g%かろ88%、17
%のl直に変動し、残留電位は12Vが零(0%)
に!;っなことが第5図より判る。第4図と第、5図を
比較するとき大きく異なるところは帯電位の保持率の温
度変化による変動であり、第4図すなわち実二き倒つ方
がこの変動が大幅に小さくなっている。言いかえれば感
光体の帯電位の暗減衰が高監になってもあまり増大しな
いことになる。これはCTLを形成するセレン合金材料
にSrをドープすることにより得られたものである。In the example shown in FIG. 4, when the ambient temperature is 25°C, the charged potential (5) is 846 V, and the charged potential retention rate is 92.1 V.
%, residual potential ■ was 12V. These values are 10
0% and the ambient temperature is 50? 'We investigated the fluctuations in these five characteristics by varying the temperature. For example, when the ambient temperature is 45°C, band 7, retention rate, and residual potential are each 2.
FIG. 4 shows that the change was 9096.34% of the straightness at 5° C., which was 13% of the straightness. On the same note, regarding the comparative example, for example, in open air, @ degree is from 25℃ to 45℃.
Obi when it changes to ℃? 1st place, retention rate is 25℃ each
When! Direct 842. 39. g% or 88%, 17
%, the residual potential is 0 (0%) at 12V.
To! ; This can be seen from Figure 5. When comparing FIG. 4 with FIGS. 5 and 5, the major difference is the variation in the retention rate of the charged potential due to temperature change, and this variation is significantly smaller in FIG. In other words, the dark attenuation of the charged potential of the photoreceptor does not increase much even if the charge voltage becomes high. This was obtained by doping Sr into the selenium alloy material forming the CTL.
さるに、実5ち例に準じて作製した感光!、tlo本と
比較例に準じて作製した感光体10本につし)で、連続
繰り返し500回の帯電と露光散霧を行ったときの帯電
位の変動を調べた。その結果を第2表に示す。第2表中
、は初期帯電位、、。。は500回目の帯電位1 Δ■
は帯電位の低下惜で■I からVsoo を差し引いた
ものである。Furthermore, the photosensitive material was prepared according to the actual example! , TLO book and 10 photoreceptors prepared according to the comparative example) were subjected to continuous charging and exposure misting 500 times, and the fluctuations in the charged potential were investigated. The results are shown in Table 2. In Table 2, is the initial charging potential. . is the 500th charge potential 1 Δ■
is the value obtained by subtracting Vsoo from ■I to avoid a decrease in charging potential.
第2表
第2表から、実施例群の方が帯電位の低下が少なく特性
が安定して))ることは明らかである。From Table 2, it is clear that the Example group had less decrease in charging potential and more stable characteristics.
CTLへのSnのドープ量は100重ffippm 〜
5000重量ppmの範1が好適である。100重ff
ippm より少ないとSnをドープする効果が生じな
い。また、数千mffippmでSnをドープする効果
は飽和してそれ以上ドープ量を増しても効果は大きくな
らない。The amount of Sn doped into CTL is 100 ffippm ~
Range 1 of 5000 ppm by weight is preferred. 100 heavy ff
If the amount is less than ippm, the effect of doping Sn will not occur. Furthermore, the effect of doping with Sn at several thousand mffippm is saturated, and the effect does not increase even if the amount of doping is further increased.
しかもSnのドープ量が多くなると真空累9に際して蒸
発源に残、査として残る量が増加し除去しにく 4くな
るという開題も生じてくるのでSr+のドープ量は50
00重’1. ppm 以下に抑えることが好まし、7
)、。Moreover, as the amount of Sn doped increases, the amount remaining in the evaporation source during vacuum deposition increases and becomes difficult to remove.Therefore, the amount of Sr+ doped is 50
00 weight'1. It is preferable to suppress it to less than 7 ppm.
),.
本発明によれば、真空籐着により形成された非晶質セレ
ン合金からなるキャリア輸送層とキャリア発生層とを備
えた電子写真用感光体におし)で、キャリア輸送層をす
ず(Sl′l)をドープされた非晶質iレン合金で形成
する。このよう−;干ヤリア輸居層はSnをドープされ
たセレン合金を真空蒸着することにより形成されるが、
Snがドープされていると蒸着時の合金の成分元素の分
留を抑止することができ、形成されたキアリア輸送爾O
嘆7方1勾の成分元素の組成比がほぼ均一となり、その
結果、高温においても帯電位の暗減衰が増大し一;い、
特性のばろつきの少ない安定したセレン系・○電子写真
用感光体が18:)れ、電子写真装百に搭以し使用した
とき、濃5度低下のな、)優れた画質の出力画像を得る
ことができ、連続して出力しても旦れのな、)出力画像
を得ることが可能こなる。According to the present invention, the carrier transport layer is made of tin (Sl' l) is formed of a doped amorphous i-len alloy. In this way, the dry layer is formed by vacuum deposition of a Sn-doped selenium alloy.
If Sn is doped, fractionation of constituent elements of the alloy during vapor deposition can be suppressed, and the formed chiaria transport
The composition ratio of the component elements in each direction becomes almost uniform, and as a result, the dark decay of the charged potential increases even at high temperatures.
A stable selenium-based electrophotographic photoreceptor with less variation in properties is used, and when used in an electrophotographic device, it produces output images with excellent image quality without a decrease of 5 degrees in density. This makes it possible to obtain output images (which can be output continuously without any problem).
第1図は本発明の感光体O−実宅1′、7jC苫構咬の
模式的凹面図、第2図は大発明の一実施′、ylIの感
光、1の膜厚方向のテルルの濃度プロファイルを示す線
図、第3図は従来例の感光層の膜厚方向のテルルの濃度
プロファイルを示す線図、第4図は零発胡の一実施例の
感光体の特性の温度変動を示す線図、第5図は従来例の
感光体の特性の温度変動を示す線図である。
1 導電性基板、2 キ+ ’Jア輸送層、3 上第
1 図
pmG56055504S4035302520 f
s 10 !; 0第 2 図
μfnc560ss 5045403530 、>
5 20 Is IOS O蔦 2 図
雰囲気1度 °′
第 4 図Fig. 1 is a schematic concave view of the photoconductor O-home 1', 7jC of the present invention, and Fig. 2 is one embodiment of the great invention, photosensitive to ylI, and the concentration of tellurium in the film thickness direction of 1. Figure 3 is a diagram showing the tellurium concentration profile in the film thickness direction of the photosensitive layer of a conventional example, and Figure 4 shows temperature fluctuations in the characteristics of the photoreceptor of an example of Zero-Hatsu. FIG. 5 is a diagram showing temperature fluctuations in the characteristics of a conventional photoreceptor. 1 Conductive substrate, 2 Ki+'JA transport layer, 3 Upper layer
1 Figure pmG56055504S4035302520 f
s10! ;0Figure 2μfnc560ss 5045403530,>
5 20 Is IOS Otsuta 2 Figure Atmosphere 1 degree °' Figure 4
Claims (1)
レン合金からなるキャリア輸送層とキャリア発生層とを
備えてなる電子写真用感光体において、前記キャリア輸
送層がすず(Sn)をドープされた非晶質セレン合金か
らなることを特徴とする電子写真用感光体。 2)特許請求の範囲第1項記載の感光体において、キャ
リア輸送層がすず(Sn)を100重量ppm〜5,0
00重量ppmの範囲内でドープされた非晶質セレン合
金からなることを特徴とする電子写真用感光体。[Scope of Claims] 1) An electrophotographic photoreceptor comprising a carrier transport layer and a carrier generation layer made of an amorphous selenium alloy formed by vacuum deposition on a conductive substrate, wherein the carrier transport layer is An electrophotographic photoreceptor comprising an amorphous selenium alloy doped with tin (Sn). 2) In the photoreceptor according to claim 1, the carrier transport layer contains tin (Sn) in an amount of 100 ppm to 5.0 ppm by weight.
An electrophotographic photoreceptor comprising an amorphous selenium alloy doped within a range of 0.00 ppm by weight.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19316586A JPS6348558A (en) | 1986-08-19 | 1986-08-19 | Electrophotographic sensitive body |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19316586A JPS6348558A (en) | 1986-08-19 | 1986-08-19 | Electrophotographic sensitive body |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6348558A true JPS6348558A (en) | 1988-03-01 |
Family
ID=16303372
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19316586A Pending JPS6348558A (en) | 1986-08-19 | 1986-08-19 | Electrophotographic sensitive body |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6348558A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5085959A (en) * | 1988-08-11 | 1992-02-04 | Fuji Electric Co., Ltd. | Se or se alloy electrophotographic photoreceptor |
-
1986
- 1986-08-19 JP JP19316586A patent/JPS6348558A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5085959A (en) * | 1988-08-11 | 1992-02-04 | Fuji Electric Co., Ltd. | Se or se alloy electrophotographic photoreceptor |
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