JPS636151B2 - - Google Patents
Info
- Publication number
- JPS636151B2 JPS636151B2 JP56111956A JP11195681A JPS636151B2 JP S636151 B2 JPS636151 B2 JP S636151B2 JP 56111956 A JP56111956 A JP 56111956A JP 11195681 A JP11195681 A JP 11195681A JP S636151 B2 JPS636151 B2 JP S636151B2
- Authority
- JP
- Japan
- Prior art keywords
- heater
- glass
- heater substrate
- fused
- semiconductor container
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W95/00—Packaging processes not covered by the other groups of this subclass
Landscapes
- Testing Of Individual Semiconductor Devices (AREA)
Description
【発明の詳細な説明】
本発明は半導体装置、特に円筒状のガラスケー
スと外部リード取り出し用のジユメツト線とを耐
熱抵抗性基板により融着封止してなる半導体装置
の製造装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a semiconductor device, and particularly to an apparatus for manufacturing a semiconductor device in which a cylindrical glass case and a composite wire for taking out external leads are fused and sealed with a heat-resistant and resistive substrate. .
従来、この種の技術を用いたものとして、例え
ばミニ型ガラス封止ダイオードがある。すなわ
ち、円筒状のガラス管の一方がすでにビーズ巻き
されたジユメツト線により融着されたガラスケー
スに、ガラス管内のジユメツト線に半田片を介し
て半導体素子(ダイオード素子)を装着し、その
後、他方の外部リード取り出しの為にビーズ巻き
されたジユメツト線(以下、探針リードと呼ぶ)
とガラスケースの一方を融着気密封止するもので
ある。 Conventionally, as a device using this type of technology, there is, for example, a mini-type glass-sealed diode. That is, one side of a cylindrical glass tube is already fused with a bead-wound diamond wire, and a semiconductor element (diode element) is attached to the diamond wire inside the glass tube via a piece of solder, and then the other side is fused. Bead-wrapped diamond wire for taking out the external lead (hereinafter referred to as the probe lead)
and one side of the glass case are fused and hermetically sealed.
この気密封止方法は、ヒータとして用いる耐熱
抵抗性基板(以下、ヒータと呼ぶ)に複数個の加
工穴を設け、該加工穴に探針リードを配列し、該
探針リードにガラス管をかぶせた状態でガラスケ
ースを配列してヒータに大電流を流し、その発熱
によつてガラスケースと探針リードを加熱融着す
る方法である。尚、ガラスケースはヒータの加工
穴の中にはガラス管の融着部のみが挿入されてお
り、ガラスケースの他方の非融着部は、ガラスケ
ース固定保持の為にヒータと同材質の耐熱抵抗性
基板(以下ガラスガイドと呼ぶ)の加工穴部に挿
入されている。ガラスガイドはヒータとは適当な
すき間をもつて、かつヒータとは電気的に絶縁さ
れている。 This hermetic sealing method involves creating multiple holes in a heat-resistant substrate used as a heater (hereinafter referred to as a heater), arranging probe leads in the holes, and covering the probe leads with a glass tube. In this method, the glass cases are arranged in a state in which the probe leads are heated, and a large current is passed through the heater, and the heat generated heats and fuses the glass cases and the probe lead. In addition, in the glass case, only the fused part of the glass tube is inserted into the machined hole of the heater, and the other non-fused part of the glass case is made of the same heat-resistant material as the heater to keep the glass case fixed. It is inserted into a machined hole in a resistive substrate (hereinafter referred to as a glass guide). The glass guide has an appropriate gap from the heater and is electrically insulated from the heater.
この封止方法では、ヒータより発する熱がガラ
スガイド板を伝わつて放熱すると云う欠点があ
る。しかもその放熱はヒータの中心部が大で、周
囲が小さいと云う温度分布の均一性を欠く不都合
が生じていた。このため、ガラスケースと探針リ
ードを一枚のヒータ内で大量に融着封止する場
合、その融着性に於いてヒータの中心部と外周部
ではバラツキが生じると云う品質、歩留り上の欠
点があつた。 This sealing method has the disadvantage that the heat generated by the heater is transmitted through the glass guide plate and radiated. Moreover, the heat dissipation is large at the center of the heater and small at the periphery, resulting in an inconvenience that the temperature distribution lacks uniformity. For this reason, when a large number of glass cases and probe leads are fused and sealed within one heater, the fusion properties vary between the center and the outer periphery of the heater, which is a problem in terms of quality and yield. There were flaws.
本発明の目的は、これらの欠点を除去して高歩
留りで同時に大量に製造可能な融着封止装置を提
供することにある。 An object of the present invention is to eliminate these drawbacks and provide a fusion sealing device that can be manufactured simultaneously in large quantities with high yield.
すなわち、本発明は複数個の加工穴が設けられ
たヒータの周囲部に、温度分布を均一にするため
に窒素ガス等の気体を適量吹き付けながらガラス
ケースとジユメツト線とを加熱融着するようにし
たものである。 That is, the present invention heats and fuses the glass case and the composite wire while blowing an appropriate amount of gas such as nitrogen gas around the heater, which has a plurality of machined holes, in order to make the temperature distribution uniform. This is what I did.
次に、図面を参照して本発明の一実施例を詳細
に説明する。 Next, one embodiment of the present invention will be described in detail with reference to the drawings.
第1図aは本発明の一実施例を示すミニ型ガラ
ス封止ダイオードの封止方法の封止装置への製品
セツトアツプ後の側面図である。ガラス管の一方
がすでにジユメツト線1によつて封着されたガラ
スケース2と探針リード3とがヒータ4にセツト
されている。ガラスケース2は、融着される側が
ヒータ4に他方がガラスガイド5のそれぞれの加
工穴に挿入されている。ガラスガイド5は絶縁ス
ペーサ6を介してヒータ4の上面に適当なすき間
をもつて設置されている。この状態で、封止装置
の電極7にセツトし、ヒータ電極8を介してヒー
タに大電流を流してガラスケース2と探針リード
3を加熱融着する。この際、ヒータ内の放熱によ
る温度のバラツキしいては融着のバラツキを解決
する為に、放熱の少ない部分、すなわち、ヒータ
の周囲部にノズル9より窒素ガスを適量吹き付け
ヒータ内の熱のバランスを改善する。 FIG. 1a is a side view of a mini-type glass-sealed diode encapsulating method showing an embodiment of the present invention after the product is set up in a encapsulation device. A glass case 2 and a probe lead 3, one of which is already sealed with a composite wire 1, are set in a heater 4. The glass case 2 is inserted into the respective machined holes of the heater 4 on the side to be fused and the glass guide 5 on the other side. The glass guide 5 is installed on the upper surface of the heater 4 via an insulating spacer 6 with an appropriate gap. In this state, it is set on the electrode 7 of the sealing device, and a large current is passed through the heater through the heater electrode 8 to thermally fuse the glass case 2 and the probe lead 3. At this time, in order to solve the temperature variations due to heat dissipation within the heater and the dispersion of fusion, an appropriate amount of nitrogen gas is sprayed from the nozzle 9 to the area with little heat dissipation, that is, the area around the heater to balance the heat inside the heater. improve.
第1図bは、第1図aのA−A′間で断面した
ところの上面より見た図である。窒素ガスは矢印
の如くノズル9よりヒータ4に配列された融着封
止されるガラスケース2の周囲の製品四すみに向
つて吹き付けられている。 FIG. 1b is a cross-sectional view taken along line A-A' in FIG. 1a, viewed from above. Nitrogen gas is blown from a nozzle 9 toward the four corners of the product around the glass case 2 arranged on the heater 4 to be fused and sealed, as shown by the arrow.
この様に本発明によれば、同ヒータ内の温度の
高い部分、すなわち放熱の少ない部分に窒素ガス
を適量吹き付けることにより、その部分の温度を
下げて温度の低い部分すなわち放熱の大きい部分
と同等の温度にする事が可能であり、同一ヒータ
内での温度分布の均一性を保つ事が出来る。その
結果、融着のバラツキが低減出来、同一ヒータ内
で同時に大量に融着、封止する事が可能となり、
コスト低減に大きな効果がある。 As described above, according to the present invention, by spraying an appropriate amount of nitrogen gas to a high temperature part of the heater, that is, a part with little heat radiation, the temperature of that part is lowered to be equal to that of a low temperature part, that is, a part with high heat radiation. It is possible to maintain a uniform temperature distribution within the same heater. As a result, the variation in fusion can be reduced, making it possible to fusion and seal a large amount at the same time within the same heater.
This has a great effect on cost reduction.
尚、窒素ガス以外の不活性ガスを用いてよいこ
とは当然である。無論、ガラス封止ダイオードに
限られるものでもない。 It goes without saying that an inert gas other than nitrogen gas may be used. Of course, it is not limited to glass-sealed diodes.
第1図aは本発明の一実施例を示す側面図、第
1図bは第1図aのA−A′の断面上面図
1……ジユメツト線、2……ガラスケース、3
……探針リード、4……ヒータ、5……ガラスガ
イド、6……絶縁スペーサ、7……封止装置の電
極、8……ヒータ電極、9……ノズル。
FIG. 1a is a side view showing one embodiment of the present invention, and FIG. 1b is a cross-sectional top view taken along line A-A' in FIG.
... Probe lead, 4 ... Heater, 5 ... Glass guide, 6 ... Insulating spacer, 7 ... Electrode of sealing device, 8 ... Heater electrode, 9 ... Nozzle.
Claims (1)
基板と、該ヒータ用基板上に絶縁スペーサを介し
て設けられたガラスガイドと、前記第1の加工穴
と対向して前記ガラスガイドに設けられた複数個
の第2の加工穴とを有し、前記ガラスガイドの前
記第2の加工穴に半導体容器の一端を挿入し、前
記ヒータ用基板の前記第1の加工穴に前記半導体
容器の他端と外部リード線とを配列し、前記ヒー
タ用基板に電流を流してその発熱によつて前記半
導体容器の前記他端と前記外部リード線とを加熱
融着する製造装置において、前記ヒータ用基板の
周囲部にガス噴出口を設け、ガスを吹き付けなが
ら前記半導体容器と前記外部リード線とを加熱融
着することを特徴とする半導体装置の製造装置。1. A heater substrate provided with a plurality of first processed holes, a glass guide provided on the heater substrate via an insulating spacer, and a heater substrate provided with a plurality of first processed holes on the glass guide opposite to the first processed holes. one end of the semiconductor container is inserted into the second processed hole of the glass guide, and the semiconductor container is inserted into the first processed hole of the heater substrate. In the manufacturing apparatus, the other end of the semiconductor container and the external lead wire are arranged, and the other end of the semiconductor container and the external lead wire are heated and fused by passing a current through the heater substrate and heat generated by the heater substrate. 1. An apparatus for manufacturing a semiconductor device, characterized in that a gas outlet is provided around a peripheral part of a substrate, and the semiconductor container and the external lead wire are heated and fused while blowing gas.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56111956A JPS5814558A (en) | 1981-07-17 | 1981-07-17 | Manufacturing apparatus for semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56111956A JPS5814558A (en) | 1981-07-17 | 1981-07-17 | Manufacturing apparatus for semiconductor device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5814558A JPS5814558A (en) | 1983-01-27 |
| JPS636151B2 true JPS636151B2 (en) | 1988-02-08 |
Family
ID=14574364
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56111956A Granted JPS5814558A (en) | 1981-07-17 | 1981-07-17 | Manufacturing apparatus for semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5814558A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0781514B2 (en) * | 1988-05-27 | 1995-08-30 | 佐藤工業株式会社 | Tunnel construction method |
-
1981
- 1981-07-17 JP JP56111956A patent/JPS5814558A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5814558A (en) | 1983-01-27 |
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