JPS6362804B2 - - Google Patents
Info
- Publication number
- JPS6362804B2 JPS6362804B2 JP23105083A JP23105083A JPS6362804B2 JP S6362804 B2 JPS6362804 B2 JP S6362804B2 JP 23105083 A JP23105083 A JP 23105083A JP 23105083 A JP23105083 A JP 23105083A JP S6362804 B2 JPS6362804 B2 JP S6362804B2
- Authority
- JP
- Japan
- Prior art keywords
- magnetic pole
- protrusion
- head
- magnetic
- end surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000010408 film Substances 0.000 claims description 20
- 239000010409 thin film Substances 0.000 claims description 20
- 238000004519 manufacturing process Methods 0.000 claims description 16
- 239000000758 substrate Substances 0.000 claims description 16
- 239000004020 conductor Substances 0.000 claims description 13
- 230000001681 protective effect Effects 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 6
- 238000010586 diagram Methods 0.000 description 8
- 230000005415 magnetization Effects 0.000 description 6
- 230000005284 excitation Effects 0.000 description 3
- 230000004907 flux Effects 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 229910000889 permalloy Inorganic materials 0.000 description 2
- 230000035699 permeability Effects 0.000 description 2
- 239000003513 alkali Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012777 electrically insulating material Substances 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/1278—Structure or manufacture of heads, e.g. inductive specially adapted for magnetisations perpendicular to the surface of the record carrier
Landscapes
- Magnetic Heads (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
Description
【発明の詳細な説明】
〔発明の属する分野〕
本発明は垂直磁気ヘツド装置およびこの製造方
法の改良に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of the Invention] The present invention relates to an improvement in a perpendicular magnetic head device and a method for manufacturing the same.
従来、磁気デイスク装置などにおいて高密度記
録を実現する手段として種々の構造の垂直磁気ヘ
ツドが開発されている。第１図はその一例として
補助磁極励磁型垂直ヘツドの原理説明図を示した
ものである。これは垂直磁化膜２に高透磁率の面
内磁化層３を裏打ちした記録媒体１を主磁極４と
補助磁極５とではさみこみ、補助磁極５を励磁コ
イル６により励磁することにより主磁極４の下の
垂直磁界７で垂直磁化膜２を磁化させる方式であ
るが、次記のような欠点がある。すなわち(イ)記録
媒体を片面しか使えない。(ロ)ヘツド構造が記録媒
体の上下に分れ、構造が複雑。(ハ)デイスク板の厚
みを大きくできないので、高速性・高信頼性を備
えたハードデイスクには適さない。
Conventionally, perpendicular magnetic heads of various structures have been developed as means for realizing high-density recording in magnetic disk devices and the like. FIG. 1 is a diagram illustrating the principle of an auxiliary magnetic pole excitation type vertical head as an example. This is achieved by sandwiching a recording medium 1 in which a perpendicular magnetization film 2 is lined with a high permeability in-plane magnetization layer 3 between a main magnetic pole 4 and an auxiliary magnetic pole 5, and by exciting the auxiliary magnetic pole 5 with an excitation coil 6. This method magnetizes the perpendicularly magnetized film 2 with the vertical magnetic field 7 below, but it has the following drawbacks. In other words, (a) only one side of the recording medium can be used. (b) The head structure is divided into upper and lower parts of the recording medium, making the structure complicated. (c) Since the thickness of the disk plate cannot be increased, it is not suitable for hard disks with high speed and high reliability.
第２図は垂直ヘツドの第２の従来例を示す原理
説明図でスライダを兼ねた補助磁極１０の端面１
１に薄膜で主磁極１２、導体コイル部１３を形成
することにより第１図のヘツドの上記問題点を解
決した構成となつているが、次に述べるように量
産性に問題がある。第３図イ，ロ，ハはこの垂直
ヘツドの各製造段階を示す図である。第２図に示
したようにヘツドの主磁極１２、コイル１３など
がスライダ１０の端面にもうけられているため、
第３図イに示すように基板２０に磁極部、コイル
部を形成後、基板をスライシングして第３図ロに
示すような少数個段階でスライダ加工を行ない、
次に第３図ハに示すように個々のヘツドに切断す
る必要がある。このように工程数が多く、スライ
ダ加工を少数または個々の単位で行わねばならな
いので、量産性において問題が生じる。 FIG. 2 is a principle explanatory diagram showing a second conventional example of a vertical head.
Although the main magnetic pole 12 and the conductor coil portion 13 are formed using thin films on the head 1, the above-mentioned problems of the head shown in FIG. FIGS. 3A, 3B, and 3C are diagrams showing each manufacturing stage of this vertical head. As shown in FIG. 2, the main magnetic pole 12, coil 13, etc. of the head are provided on the end face of the slider 10.
After forming the magnetic pole portion and the coil portion on the substrate 20 as shown in FIG. 3A, the substrate is sliced to perform slider processing in small number stages as shown in FIG. 3B.
It then needs to be cut into individual heads as shown in FIG. 3C. Since the number of steps is large and the slider processing must be performed in small numbers or in individual units, problems arise in mass productivity.
本発明は上記の問題点を解消するためになされ
たもので、量産性が優れ、かつ構成の単純な垂直
磁気ヘツド装置およびその製造方法を提供するこ
とを目的とする。
The present invention has been made to solve the above-mentioned problems, and it is an object of the present invention to provide a perpendicular magnetic head device that is easy to mass-produce and has a simple configuration, and a method for manufacturing the same.
本発明の第１番目は、基板と、この基板上にも
うけられその端面がヘツド面における磁極間スペ
ースを形成する突起部と、この突起部を介して対
向し前記ヘツド面において磁極端面を形成すると
ともに前記突起部端面以外の部分で互いに結合す
る第１および第２の薄膜磁極部と、前記突起部端
面以外の部分にもうけられ前記第１および第２の
薄膜磁極部の少くともいずれか一方と鎖交する導
体コイル部とを有し、前記磁極端面の幅は前記第
２の薄膜磁極部が前記突起部形状と膜厚で磁極幅
が決まる前記第１の薄膜磁極部よりも大きいこと
を特徴とする垂直磁気ヘツド装置を提供するもの
である。
The first aspect of the present invention is to provide a substrate, a protrusion formed on the substrate and whose end face forms a space between magnetic poles on the head surface, and a protrusion that faces across the protrusion and forms a pole end face on the head surface. and at least one of the first and second thin film magnetic pole portions that are provided on a portion other than the end surface of the projection and that are coupled to each other at a portion other than the end surface of the projection. and interlinking conductor coil portions, and the second thin film magnetic pole portion has a width of the magnetic pole end face that is larger than the first thin film magnetic pole portion, the magnetic pole width of which is determined by the protrusion shape and film thickness. A perpendicular magnetic head device is provided.
本発明の第２番目は、ヘツド面上に薄膜磁気ヘ
ツドをもうける垂直磁気ヘツドの製造方法におい
て、基板上に突起部を形成し、この突起部端面を
含む部分に磁極層を形成し、前記突起部端面以外
の部分で前記磁極層と鎖交するように導体コイル
部を形成し、その上に保護膜層を形成した後前記
突起部端面より下の深さまで表面を除去して前記
ヘツド面を形成するとともに前記ヘツド面上に所
定幅の第１、第２磁極端面と磁極間スペースを形
成するようにしたことを特徴とする垂直磁気ヘツ
ドの製造方法を提供するものである。 The second aspect of the present invention is a method for manufacturing a perpendicular magnetic head in which a thin film magnetic head is provided on a head surface, in which a protrusion is formed on a substrate, a magnetic pole layer is formed in a portion including the end face of the protrusion, and the protrusion is A conductor coil portion is formed so as to interlink with the magnetic pole layer at a portion other than the end surface of the protrusion, and a protective film layer is formed thereon, and then the surface is removed to a depth below the end surface of the protrusion to form the head surface. The present invention provides a method for manufacturing a perpendicular magnetic head, characterized in that a space between the first and second magnetic poles and the magnetic poles of a predetermined width is formed on the head surface.
以下、図面を用いて本発明を詳しく説明する。 Hereinafter, the present invention will be explained in detail using the drawings.
第４図は本発明に係る垂直磁気ヘツド装置の構
成を示す断面図である。図において４０は非磁性
体よりなる基板、４１はこの基板４０上にエツチ
ングなどでもうけられた突起部、４２と４３は、
この突起部４１を介して対向するそれぞれ第１の
薄膜磁極（主磁極）と第２の薄膜磁極（補助磁
極）、４４はこの第１の磁極４２と第２の磁極４
３との間で磁極間スペースを形成する前記突起部
４１の端面、４５はこの第１の薄膜磁極４２に鎖
交するように形成された薄膜の導体コイル部、４
６は前記スライダ基板４０の表面を覆う保護膜、
４７はこの保護膜と、前記端面４４、磁極４３，
４４の表面部分から構成されるヘツド面（本実施
例のように浮動式磁気ヘツドの場合スライダ面と
も呼ぶ）である。 FIG. 4 is a sectional view showing the structure of a perpendicular magnetic head device according to the present invention. In the figure, 40 is a substrate made of a non-magnetic material, 41 is a protrusion formed by etching or the like on this substrate 40, and 42 and 43 are:
A first thin-film magnetic pole (main magnetic pole) and a second thin-film magnetic pole (auxiliary magnetic pole) are opposed to each other via the protrusion 41, and 44 indicates the first magnetic pole 42 and the second magnetic pole 4.
The end face of the protrusion 41 forming an inter-pole space between the first thin film magnetic pole 42 and the thin film conductor coil 45 formed to interlink with the first thin film magnetic pole 42;
6 is a protective film covering the surface of the slider substrate 40;
47 is this protective film, the end face 44, the magnetic pole 43,
This is a head surface (also called a slider surface in the case of a floating magnetic head as in this embodiment) consisting of 44 surface portions.
このような構成の垂直磁気ヘツドの動作を次に
説明する。第４図において記録媒体１は上層が
Co−Crなどの硬磁性垂直磁化膜２、下層がパー
マロイ（Fe−Ni）などの軟磁性面内磁化膜３で
構成され、本ヘツドのヘツド面４７と対向して、
矢印Ａの方向に回転している。データ記録の際に
は励磁コイル４５に所定の電流を流して磁極４
２，４３を励磁する。端面４４付近の磁束４８は
図に示すように、幅の狭い主磁極４２の真下の部
分には強い垂直方向の磁界が発生し、垂直磁化膜
２は磁界方向に磁化してデータが記録される。幅
の広い補助磁極４３の真下では磁束４８が拡がつ
て磁界が弱まるので垂直磁化膜２は磁化されるに
はいたらない。データ再生の際には、垂直磁化膜
２の磁化反転部が主磁極４２を通過するときの磁
極内部の磁束変化によつて生じる導体コイル４５
両端の誘起電圧を再生信号として用いる。 The operation of the perpendicular magnetic head having such a configuration will now be described. In Fig. 4, the upper layer of recording medium 1 is
The head is composed of a hard magnetic perpendicular magnetization film 2 made of Co-Cr or the like, and a soft magnetic in-plane magnetization film 3 made of permalloy (Fe-Ni) as the lower layer, facing the head surface 47 of the present head.
It is rotating in the direction of arrow A. When recording data, a predetermined current is passed through the excitation coil 45 to maintain the magnetic pole 4.
2,43 is excited. As shown in the figure, the magnetic flux 48 near the end face 44 generates a strong vertical magnetic field directly below the narrow main magnetic pole 42, and the perpendicular magnetization film 2 is magnetized in the direction of the magnetic field, thereby recording data. . Directly below the wide auxiliary magnetic pole 43, the magnetic flux 48 spreads and the magnetic field weakens, so that the perpendicularly magnetized film 2 does not become magnetized. When reproducing data, the conductor coil 45 is generated due to a magnetic flux change inside the magnetic pole when the magnetization reversal portion of the perpendicularly magnetized film 2 passes through the main magnetic pole 42.
The induced voltage at both ends is used as a reproduction signal.
第５図は上記の垂直磁気ヘツドの製造方法を示
すための説明図である。イ〜ニは各段製造段階に
おける垂直磁気ヘツドの断面図、ホ〜チはこの各
断面図イ〜ニにそれぞれ対応する平面図（ただし
保護膜層部分は省略）である。まず第５図イ，ホ
に示すように、基板５１に例えば単結晶シリコン
を使用し、異方性アルカリエツチングにて突起部
５２を形成し、その上から突起部５２の端面６０
を含む部分にパーマロイ（Fe−Ni）薄膜などで
第１の磁極層５３を形成する。次に第５図ロ，ヘ
に示すように、CuまたはAlなどで導体コイル部
５４を薄膜形成し、この導体コイル部５４をその
取り出し端子部分を除いて覆うようにAl2O3，
SiO2またはハードキユアレジストなどの非磁性
電気絶縁性物質を用いて保護膜層５５を形成す
る。次に第５図ハ，トに示すように、パーマロイ
（Fe−Ni）などの薄膜で第２の磁極層５６を前記
コイル部５４をまたぐ形で形成し、前記第１の磁
極層５３との間に磁気的閉ループを形成する。さ
らにその上から全体を覆うようにSiO2，Al2O3な
どの非磁性・電気絶縁性の硬質材料で保護膜層５
６を形成する。最後に第５図ニ，チに示すよう
に、表面を基板５１の下面に平行に、突起部５２
の端面が露出するまで（第５図ハのＢ線の深さま
で）研摩するとヘツド面５８上に磁極間スペース
５９が現われる。磁極間スペース５９の幅ｇは突
起部５２の幅によつて殆んど決まつてしまうの
で、第５図イ，ホの段階で所定の寸法に突起部５
２を形成しておけばよい。 FIG. 5 is an explanatory diagram showing a method of manufacturing the above-mentioned perpendicular magnetic head. A to D are cross-sectional views of the perpendicular magnetic head at each manufacturing stage, and H to H are plan views corresponding to the cross-sectional views A to D, respectively (however, the protective film layer portion is omitted). First, as shown in FIGS. 5A and 5E, a substrate 51 made of, for example, single-crystal silicon is used, and a protrusion 52 is formed by anisotropic alkali etching.
A first magnetic pole layer 53 is formed of a permalloy (Fe-Ni) thin film or the like in the portion including the . Next, as shown in FIGS. 5B and 5F, a conductor coil portion 54 is formed as a thin film of Cu or Al, and Al 2 O 3 ,
A protective film layer 55 is formed using a non-magnetic electrically insulating material such as SiO 2 or hard cure resist. Next, as shown in FIG. A magnetic closed loop is formed between them. Furthermore, a protective film layer 5 is formed from a non-magnetic and electrically insulating hard material such as SiO 2 or Al 2 O 3 to cover the entire surface.
form 6. Finally, as shown in FIG.
When the magnetic head is polished until the end face is exposed (to the depth of line B in FIG. 5C), an interpole space 59 appears on the head surface 58. Since the width g of the space 59 between the magnetic poles is almost determined by the width of the protrusion 52, the protrusion 5 is adjusted to a predetermined dimension at the steps A and E in FIG.
2 should be formed.
このような製造方法では磁極、コイル部などを
ヘツド面側に形成するので、磁極部、コイル部形
成とスライダ加工とが切断前の大きな基板の段階
（第３図イ）で行なえることになり、大幅な製造
工数の削減につながる。 In this manufacturing method, the magnetic poles, coil parts, etc. are formed on the head surface side, so the magnetic pole parts and coil parts can be formed and the slider processing can be performed at the stage of large substrates before cutting (Figure 3 A). , leading to a significant reduction in manufacturing man-hours.
また、磁極間スペースは基板上の突起部の幅で
決まるため精度よく形成することができる。 Further, since the space between the magnetic poles is determined by the width of the protrusion on the substrate, it can be formed with high precision.
また主磁極幅は突起部の傾斜角θ、主磁極膜厚
ｔが決まればＷ＝ｔ／sinθで自動的に決まるため
高精度化が可能である。 Further, the width of the main magnetic pole is automatically determined as W=t/sin θ once the inclination angle θ of the protrusion and the thickness t of the main magnetic pole are determined, so high accuracy is possible.
また主磁極、補助磁極とも高透磁率軟磁性膜を
使用するため、高周波特性に優れている。（従来
のこのタイプのヘツドでは補助磁極に高周波特性
の劣る、バルクのフエライトなどを用いていた。）
第６図は本発明に係る垂直磁気ヘツド装置の他
の実施例を示すものでイは平面図（ただし保護膜
層は省略）ロはイの研摩前の製造段階におけるＣ
−Ｃ線断面図である。製造方法は、まず導体コイ
ル下側層６１を形成し、次に磁極層６２を形成
し、さらに導体コイル上側層６３を形成し、最後
に保護膜層６４を形成した後、Ｄ線の深さまで研
摩して磁極間スペース６５を得る。このような導
体コイルをジグザグ型にした構成の磁気ヘツド装
置は、導体コイルが短かくて済むので直流抵抗が
小さく、発熱も少なくなるという長所を有する。 Furthermore, since high magnetic permeability soft magnetic films are used for both the main magnetic pole and the auxiliary magnetic pole, it has excellent high frequency characteristics. (Conventional heads of this type have used bulk ferrite, etc., which has poor high frequency characteristics, for the auxiliary magnetic pole.) Figure 6 shows another embodiment of the perpendicular magnetic head device according to the present invention. Figure (however, the protective film layer is omitted) B is C at the manufacturing stage before polishing of A
-C line sectional view. The manufacturing method is to first form a conductor coil lower layer 61, then to form a magnetic pole layer 62, further to form a conductor coil upper layer 63, and finally to form a protective film layer 64, and then to the depth of the D line. The space 65 between the magnetic poles is obtained by polishing. A magnetic head device having such a configuration in which the conductor coil has a zigzag shape has the advantage that the conductor coil can be short, resulting in low direct current resistance and less heat generation.
第７図は本発明に係る磁気ヘツド装置の他の実
施例の製造方法および構成を示すための平面図
で、基板上に他の部材を付着することにより突起
部７１を構成したものである。例えばガラスを印
刷・焼成することにより形成できる。Ｅは研摩線
である。 FIG. 7 is a plan view showing the manufacturing method and structure of another embodiment of the magnetic head device according to the present invention, in which a protrusion 71 is formed by attaching other members to the substrate. For example, it can be formed by printing and firing glass. E is a polishing line.
なお第１の実施例（第４，５図）で述べた特
長、利点は第６図および第７図の実施例にも同様
にあてはまる。 The features and advantages described in the first embodiment (FIGS. 4 and 5) also apply to the embodiments shown in FIGS. 6 and 7.
なお上記の実施例では浮動式磁気ヘツドの場合
を示したが、これに限らずフロツピーデイスクや
磁気テープ装置のヘツドなどに用いることもでき
る。 In the above embodiment, a floating magnetic head is shown, but the present invention is not limited to this, and the present invention can also be used in a floppy disk, a magnetic tape device head, or the like.
以上述べたように本発明によれば、量産性が優
れ、かつ構成の単純な垂直磁気ヘツド装置を容易
に実現できる。
As described above, according to the present invention, it is possible to easily realize a perpendicular magnetic head device with excellent mass productivity and a simple configuration.
第１図および第２図は垂直磁気ヘツド装置の従
来例を示す原理説明図、第３図は第２図の垂直磁
気ヘツドの製造方法を示す説明図、第４図は本発
明に係る垂直磁気ヘツド装置の第１の実施例を示
す構成断面図、第５図は第４図の垂直磁気ヘツド
装置の製造方法を示すための説明図、第６図およ
び第７図は本発明の他の実施例を示す図である。
４０，５１…基板、４１，５２，７１…突起
部、４２…第１の薄膜磁極、４３…第２の薄膜磁
極、４４，６０…端面、４５，５４，６１，６３
…導体コイル部、４７，５８…ヘツド面、５３，
５６，６２…磁極層、５７…保護膜層、５９，６
５…磁極間スペース。
1 and 2 are principle explanatory diagrams showing a conventional example of a perpendicular magnetic head device, FIG. 3 is an explanatory diagram showing a manufacturing method of the perpendicular magnetic head shown in FIG. 2, and FIG. FIG. 5 is an explanatory diagram showing a method of manufacturing the perpendicular magnetic head device of FIG. 4, and FIGS. 6 and 7 are diagrams showing other embodiments of the present invention. It is a figure which shows an example. 40, 51... Substrate, 41, 52, 71... Projection, 42... First thin film magnetic pole, 43... Second thin film magnetic pole, 44, 60... End surface, 45, 54, 61, 63
...Conductor coil portion, 47, 58...Head surface, 53,
56, 62...Magnetic pole layer, 57...Protective film layer, 59,6
5...Space between magnetic poles.
Claims (1)
ヘツド面における磁極間スペースを形成する突起
部と、この突起部を介して対向し前記ヘツド面に
おいて磁極端面を形成するとともに前記突起部端
面以外の部分で互いに結合する第１および第２の
薄膜磁極部と、前記突起部端面以外の部分にもう
けられ、前記第１および第２の薄膜磁極部の少く
ともいずれか一方と鎖交する導体コイル部とを有
し、前記磁極端面の幅は前記第２の薄膜磁極部が
前記突起部形状と膜厚で磁極幅が決まる前記第１
の薄膜磁極部よりも大きいことを特徴とする垂直
磁気ヘツド装置。 ２ ヘツド面上に薄膜磁気ヘツドをもうける垂直
磁気ヘツドの製造方法において、基板上に突起部
を形成し、この突起部端面を含む部分に磁極層を
形成し、前記突起部端面以外の部分で前記磁極層
と鎖交するように導体コイル部を形成し、その上
に保護膜層を形成した後前記突起部端面より下の
深さまで表面を除去して前記ヘツド面を形成する
とともに前記ヘツド面上に所定の幅の第１、第２
磁極端面と磁極間スペースを形成するようにした
ことを特徴とする垂直磁気ヘツドの製造方法。[Scope of Claims] 1. A substrate, a protrusion formed on the substrate and whose end surface forms a space between magnetic poles on the head surface, and a protrusion that faces across the protrusion and forms a magnetic pole end surface on the head surface. first and second thin-film magnetic pole portions that are coupled to each other at a portion other than the end surface of the protrusion; and at least one of the first and second thin-film magnetic pole portions that are provided on a portion other than the end surface of the protrusion. The width of the magnetic pole end face is determined by the second thin film magnetic pole part and the first thin film magnetic pole part, the magnetic pole width of which is determined by the protrusion shape and film thickness.
A perpendicular magnetic head device characterized in that it is larger than the thin film magnetic pole part of. 2. In a method of manufacturing a perpendicular magnetic head in which a thin film magnetic head is provided on a head surface, a protrusion is formed on a substrate, a magnetic pole layer is formed on a portion including the end surface of the protrusion, and a magnetic pole layer is formed on a portion other than the end surface of the protrusion. A conductor coil portion is formed so as to interlink with the magnetic pole layer, and a protective film layer is formed on the conductor coil portion, and then the surface is removed to a depth below the end surface of the protrusion to form the head surface. with a predetermined width.
A method for manufacturing a perpendicular magnetic head, characterized in that a space is formed between the magnetic pole end face and the magnetic pole.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23105083A JPS60124014A (en) | 1983-12-07 | 1983-12-07 | Vertical magnetic head device and its production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23105083A JPS60124014A (en) | 1983-12-07 | 1983-12-07 | Vertical magnetic head device and its production |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60124014A JPS60124014A (en) | 1985-07-02 |
| JPS6362804B2 true JPS6362804B2 (en) | 1988-12-05 |
Family
ID=16917496
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP23105083A Granted JPS60124014A (en) | 1983-12-07 | 1983-12-07 | Vertical magnetic head device and its production |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60124014A (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2001022407A1 (en) * | 1999-09-20 | 2001-03-29 | Seagate Technology, Llc | Magnetic recording head including background magnetic field generator |
| US6876519B1 (en) | 1999-09-20 | 2005-04-05 | Seagate Technology Llc | Magnetic recording head including background magnetic field generator |
| US6646827B1 (en) | 2000-01-10 | 2003-11-11 | Seagate Technology Llc | Perpendicular magnetic recording head with write pole which reduces flux antenna effect |
| US6717770B1 (en) | 2000-03-24 | 2004-04-06 | Seagate Technology Llc | Recording head for applying a magnetic field perpendicular to the magnetizations within magnetic storage media |
| US6798615B1 (en) | 2000-03-24 | 2004-09-28 | Seagate Technology Llc | Perpendicular recording head with return poles which reduce flux antenna effect |
-
1983
- 1983-12-07 JP JP23105083A patent/JPS60124014A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60124014A (en) | 1985-07-02 |
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