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Priority to JP22105783ApriorityCriticalpatent/JPS60112802A/ja
Publication of JPS60112802ApublicationCriticalpatent/JPS60112802A/ja
Publication of JPS6365201B2publicationCriticalpatent/JPS6365201B2/ja
Photosensitive resin composition, and photosensitive element, resist pattern formation method and printed circuit board production method each utilizing same
Composition de résine photosensible et élément photosensible l'utilisant, procédé de formation d'un motif de réserve et procédé de fabrication d'une carte de circuits imprimés