JPS636626B2 - - Google Patents
Info
- Publication number
- JPS636626B2 JPS636626B2 JP58070387A JP7038783A JPS636626B2 JP S636626 B2 JPS636626 B2 JP S636626B2 JP 58070387 A JP58070387 A JP 58070387A JP 7038783 A JP7038783 A JP 7038783A JP S636626 B2 JPS636626 B2 JP S636626B2
- Authority
- JP
- Japan
- Prior art keywords
- target
- sputtering
- groove
- ceramic
- grooves
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Physical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58070387A JPS59197568A (ja) | 1983-04-21 | 1983-04-21 | スパツタリング用セラミツクスタ−ゲツト |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58070387A JPS59197568A (ja) | 1983-04-21 | 1983-04-21 | スパツタリング用セラミツクスタ−ゲツト |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59197568A JPS59197568A (ja) | 1984-11-09 |
| JPS636626B2 true JPS636626B2 (2) | 1988-02-10 |
Family
ID=13429977
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58070387A Granted JPS59197568A (ja) | 1983-04-21 | 1983-04-21 | スパツタリング用セラミツクスタ−ゲツト |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59197568A (2) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2624963B2 (ja) * | 1987-04-10 | 1997-06-25 | キヤノン電子株式会社 | 薄膜形成方法 |
| JP3628554B2 (ja) * | 1999-07-15 | 2005-03-16 | 株式会社日鉱マテリアルズ | スパッタリングターゲット |
| JP5029431B2 (ja) * | 2007-03-09 | 2012-09-19 | 三菱マテリアル株式会社 | 蒸着材及び該蒸着材を用いて蒸着膜を形成する方法 |
-
1983
- 1983-04-21 JP JP58070387A patent/JPS59197568A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59197568A (ja) | 1984-11-09 |
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