JPS59197568A - スパツタリング用セラミツクスタ−ゲツト - Google Patents

スパツタリング用セラミツクスタ−ゲツト

Info

Publication number
JPS59197568A
JPS59197568A JP58070387A JP7038783A JPS59197568A JP S59197568 A JPS59197568 A JP S59197568A JP 58070387 A JP58070387 A JP 58070387A JP 7038783 A JP7038783 A JP 7038783A JP S59197568 A JPS59197568 A JP S59197568A
Authority
JP
Japan
Prior art keywords
target
sputtering
groove
grooves
ceramic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58070387A
Other languages
English (en)
Japanese (ja)
Other versions
JPS636626B2 (2
Inventor
Yosuke Fujita
洋介 藤田
Jun Kuwata
純 桑田
Masahiro Nishikawa
雅博 西川
Takao Toda
任田　隆夫
Tomizo Matsuoka
富造 松岡
Atsushi Abe
阿部　惇
Koji Nitta
新田　恒治
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP58070387A priority Critical patent/JPS59197568A/ja
Publication of JPS59197568A publication Critical patent/JPS59197568A/ja
Publication of JPS636626B2 publication Critical patent/JPS636626B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP58070387A 1983-04-21 1983-04-21 スパツタリング用セラミツクスタ−ゲツト Granted JPS59197568A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58070387A JPS59197568A (ja) 1983-04-21 1983-04-21 スパツタリング用セラミツクスタ−ゲツト

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58070387A JPS59197568A (ja) 1983-04-21 1983-04-21 スパツタリング用セラミツクスタ−ゲツト

Publications (2)

Publication Number Publication Date
JPS59197568A true JPS59197568A (ja) 1984-11-09
JPS636626B2 JPS636626B2 (2) 1988-02-10

Family

ID=13429977

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58070387A Granted JPS59197568A (ja) 1983-04-21 1983-04-21 スパツタリング用セラミツクスタ−ゲツト

Country Status (1)

Country Link
JP (1) JPS59197568A (2)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63255356A (ja) * 1987-04-10 1988-10-21 Canon Electronics Inc 薄膜形成方法
EP1116800A4 (en) * 1999-07-15 2004-09-08 Nikko Materials Co Ltd sputtering Target
JP2008255479A (ja) * 2007-03-09 2008-10-23 Mitsubishi Materials Corp 蒸着材

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63255356A (ja) * 1987-04-10 1988-10-21 Canon Electronics Inc 薄膜形成方法
EP1116800A4 (en) * 1999-07-15 2004-09-08 Nikko Materials Co Ltd sputtering Target
JP2008255479A (ja) * 2007-03-09 2008-10-23 Mitsubishi Materials Corp 蒸着材

Also Published As

Publication number Publication date
JPS636626B2 (2) 1988-02-10

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