JPS6367742B2 - - Google Patents

Info

Publication number
JPS6367742B2
JPS6367742B2 JP56080761A JP8076181A JPS6367742B2 JP S6367742 B2 JPS6367742 B2 JP S6367742B2 JP 56080761 A JP56080761 A JP 56080761A JP 8076181 A JP8076181 A JP 8076181A JP S6367742 B2 JPS6367742 B2 JP S6367742B2
Authority
JP
Japan
Prior art keywords
electron beam
beam source
cone
light
cathode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56080761A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57196461A (en
Inventor
Tomoaki Sakai
Akihira Fujinami
Takehisa Yashiro
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP56080761A priority Critical patent/JPS57196461A/ja
Publication of JPS57196461A publication Critical patent/JPS57196461A/ja
Publication of JPS6367742B2 publication Critical patent/JPS6367742B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Electron Beam Exposure (AREA)
JP56080761A 1981-05-29 1981-05-29 Electron-ray source for pattern formation Granted JPS57196461A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56080761A JPS57196461A (en) 1981-05-29 1981-05-29 Electron-ray source for pattern formation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56080761A JPS57196461A (en) 1981-05-29 1981-05-29 Electron-ray source for pattern formation

Publications (2)

Publication Number Publication Date
JPS57196461A JPS57196461A (en) 1982-12-02
JPS6367742B2 true JPS6367742B2 (de) 1988-12-27

Family

ID=13727394

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56080761A Granted JPS57196461A (en) 1981-05-29 1981-05-29 Electron-ray source for pattern formation

Country Status (1)

Country Link
JP (1) JPS57196461A (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07111944B2 (ja) * 1987-04-28 1995-11-29 キヤノン株式会社 荷電ビ−ム装置
JP2595882B2 (ja) * 1993-11-29 1997-04-02 日本電気株式会社 電子線露光装置
JP2615411B2 (ja) * 1993-12-27 1997-05-28 工業技術院長 多重電子ビーム照射装置および照射方法
JP5590485B2 (ja) * 2010-03-02 2014-09-17 国立大学法人東北大学 光スイッチング電子源及びそれを用いた電子線描画装置

Also Published As

Publication number Publication date
JPS57196461A (en) 1982-12-02

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