JPS638763Y2 - - Google Patents
Info
- Publication number
- JPS638763Y2 JPS638763Y2 JP1984071418U JP7141884U JPS638763Y2 JP S638763 Y2 JPS638763 Y2 JP S638763Y2 JP 1984071418 U JP1984071418 U JP 1984071418U JP 7141884 U JP7141884 U JP 7141884U JP S638763 Y2 JPS638763 Y2 JP S638763Y2
- Authority
- JP
- Japan
- Prior art keywords
- etching
- aluminum foil
- mask
- electrodes
- current
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000005530 etching Methods 0.000 claims description 34
- 239000011888 foil Substances 0.000 claims description 32
- 239000003990 capacitor Substances 0.000 claims description 5
- -1 polypropylene Polymers 0.000 claims description 4
- MIZLGWKEZAPEFJ-UHFFFAOYSA-N 1,1,2-trifluoroethene Chemical compound FC=C(F)F MIZLGWKEZAPEFJ-UHFFFAOYSA-N 0.000 claims description 3
- BQCIDUSAKPWEOX-UHFFFAOYSA-N 1,1-Difluoroethene Chemical compound FC(F)=C BQCIDUSAKPWEOX-UHFFFAOYSA-N 0.000 claims description 2
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 claims description 2
- 239000004698 Polyethylene Substances 0.000 claims description 2
- 239000004743 Polypropylene Substances 0.000 claims description 2
- 229920000573 polyethylene Polymers 0.000 claims description 2
- 229920001155 polypropylene Polymers 0.000 claims description 2
- CHDVXKLFZBWKEN-UHFFFAOYSA-N C=C.F.F.F.Cl Chemical compound C=C.F.F.F.Cl CHDVXKLFZBWKEN-UHFFFAOYSA-N 0.000 claims 1
- CZLCUHVUCRTZML-UHFFFAOYSA-N CC=C.F.F.F.F.F.F.F.F.F.F Chemical compound CC=C.F.F.F.F.F.F.F.F.F.F CZLCUHVUCRTZML-UHFFFAOYSA-N 0.000 claims 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 25
- 229910052782 aluminium Inorganic materials 0.000 description 25
- 230000000694 effects Effects 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 239000002253 acid Substances 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- UUAGAQFQZIEFAH-UHFFFAOYSA-N chlorotrifluoroethylene Chemical group FC(F)=C(F)Cl UUAGAQFQZIEFAH-UHFFFAOYSA-N 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
Landscapes
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
Description
【考案の詳細な説明】
本考案は交流を使用した電解コンデンサ用電極
箔のエツチング装置に関し、特に電極構造を改善
することによつてアルミ箔の幅方向におけるエツ
チング倍率のバラツキを小さくすることを目的と
したものである。[Detailed description of the invention] This invention relates to an etching device for electrode foil for electrolytic capacitors using alternating current, and the purpose of this invention is to reduce the variation in etching magnification in the width direction of aluminum foil by improving the electrode structure. That is.
従来、電解コンデンサ用アルミ箔に交流を印加
してエツチングする場合の電極構造は、走行する
アルミ箔の両面にそれぞれ配された一対の電極に
走行するアルミ箔の両側端部を通過させる溝を設
けたマスクを取付けていた。該マスクは耐酸性樹
脂板などを加工したものを用い、このマスクの溝
の中を通過したアルミ箔の両側端部はエツチング
されていないことが望ましい。これは後工程で行
う幅方向の裁断時におけるアルミ箔強度を保つた
めである。しかしながら、両電極間に饋電された
電流は両電極に取付けたマスク間のわずかな間隙
や、エツチング時にアルミ箔と電極間に発生する
相当量のガスの激しい上昇によつて、エツチング
状態が受ける悪影響を避けるために前記マスクに
設けたガスを逃すための穴を通して対極電極に流
れる。この漏れた電極は両電極間に位置するアル
ミ箔には全く作用しないので電流値のバラツキを
生じ、よつてエツチング倍率にバラツキを生じて
いた。このようなエツチング倍率のバラツキは
500mm幅アルミ箔を幅方向に10mm単位に静電容量
を測定したときの最高/最低値が1.15〜1.20とな
る欠点を有していた。 Conventionally, when etching aluminum foil for electrolytic capacitors by applying alternating current, the electrode structure was such that a pair of electrodes were placed on both sides of the running aluminum foil, and grooves were formed to allow both ends of the running aluminum foil to pass through. He was wearing a mask. The mask is preferably made of a processed acid-resistant resin plate, and both ends of the aluminum foil passed through the grooves of the mask are preferably not etched. This is to maintain the strength of the aluminum foil when cutting in the width direction in a subsequent process. However, the current fed between the two electrodes is affected by the etching condition due to the small gap between the masks attached to the two electrodes and the rapid rise of a considerable amount of gas generated between the aluminum foil and the electrode during etching. The gas flows to the counter electrode through holes provided in the mask for gas escape to avoid adverse effects. Since this leaked electrode does not act at all on the aluminum foil located between the two electrodes, it causes variations in the current value, and thus causes variations in the etching magnification. This kind of variation in etching magnification is
When measuring the capacitance of a 500 mm wide aluminum foil in 10 mm increments in the width direction, the maximum/minimum value was 1.15 to 1.20.
本考案は上記の点に鑑みてなされたもので、ア
ルミ箔の幅方向のエツチング倍率バラツキを縮小
することを目的とするものである。 The present invention has been developed in view of the above points, and its purpose is to reduce the variation in etching magnification in the width direction of aluminum foil.
以下実施例により図面を参照しながら説明す
る。第1図に示すようにアルミ箔1は交流電源に
接続された電極2,3,4の中の電極2,3間に
設けたマスク5に両側端部を挿入して走行し、底
部ローラー6に達して反転し、前記電極3,4間
に設けたマスク7に挟まれて走行する。なお8は
エツチング液、9はエツチング槽である。前記マ
スク5,7はエツチング槽9の内壁に取着され、
たとえば3弗化エチレンの如き絶縁性、耐熱性、
耐酸性に優れ、かつ柔軟性のある薄いシートを折
曲げて作成したもので、その平面は第2図に示す
如くなる。したがつてアルミ箔1は第2図から明
らかなように柔軟性のあるマスク5,7の中に挟
まれ密着して走行するので、該マスク5,7に挟
まれた両側端部はエツチングされず、また交流電
源に接続された電極2,3間および3,4間で電
流の漏れはなく中間を走行するアルミ箔に作用
し、対極電極へ流れることはほとんどない。した
がつて饋電された電流はエツチングに有効に利用
できる特徴を有する。さらにアルミ箔1は走行中
に蛇行する場合もあるが、本考案になるエツチン
グ装置の場合には柔軟性のあるシートを使用して
いるためアルミ箔1の蛇行にも追随するので、ア
ルミ箔1がマスク5,7から離れることはなく、
したがつて饋電された電流が漏れることはない。
このようなエツチング装置を用いてアルミ箔をエ
ツチングしたときの結果について以下述べる。第
1図および第2図に示したエツチング装置に厚さ
90μm×幅500mmのアルミ箔を、Hcl 20wt/v%
+H2SO4 2wt/v%水溶液(液温35℃)からな
るエツチング液中で電流密度10A/dm2、電気量
6000C/dm2の条件により走行させ交流エツチン
グを行なつたのち洗浄し乾燥する。このエツチド
箔を幅方向の両側端10mmずつ除去して480mmとし、
これを48等分した10mm幅について長さ50mmの試料
を48枚採取し、該試料をイジピン酸アンモニウム
5wt/v%水溶液(液温60℃)中で電流密度
2A/dm2で49Vまで上昇させ、以降電圧を一定
に20min間電流を降下させたときに得た各試料の
静電容量を第3図に示した。なお第3図の試料の
配列はエツチングされたときの位置のとおりにし
てある。またこれに対応する従来例の同様の結果
を第4図に示した。この従来例はマスクの溝を1
mmとし、該溝の中を通過させた厚さ90μm×幅
500mmのアルミ箔の両側端10mmずつを除去したも
のである。この結果から明らかなように本考案に
なる装置を使用し柔軟性のマスク5,7の中にア
ルミ箔が挟み込まれた場合には蝕電された電流は
漏れることなくアルミ箔1のエツチングに使用さ
れるので幅方向における静電容量のバラツキは最
大/最小で4.1%である。これに対し第4図の結
果は両側端が極端に低く、そのバラツキは最大/
最小で25.9%であり、この両端を除いた場合でも
8.5%と本発明の2倍のバラツキを有する。この
従来例ではマスクの溝を1mmとしたものであるか
ら厚さ90μmのアルミ箔を通過させてもマスクの
溝との間に隙間(エツチング液は存在するが)が
あり、饋電された電流が前記隙間を通して漏れる
のでこの両側端が極端に低下するものと思われ
る。しかし、この両側端10mmずつ計20mm幅は面積
で4.2%に相当し、またこの20mmを除去しても本
発明の2倍のバラツキを有するものであり、本考
案になるエツチング装置の顕著な効果を示してい
る。 Examples will be described below with reference to the drawings. As shown in FIG. 1, the aluminum foil 1 is run with both ends inserted into the mask 5 provided between the electrodes 2, 3, 4 connected to an AC power source, and the bottom roller 6 When it reaches this point, it turns around and runs while being sandwiched between the mask 7 provided between the electrodes 3 and 4. Note that 8 is an etching solution and 9 is an etching tank. The masks 5 and 7 are attached to the inner wall of the etching tank 9,
For example, insulation and heat resistance such as trifluoroethylene,
It is made by bending a thin sheet with excellent acid resistance and flexibility, and its plane is as shown in Figure 2. Therefore, as is clear from FIG. 2, the aluminum foil 1 is sandwiched between the flexible masks 5 and 7 and travels in close contact with them, so that both ends sandwiched between the masks 5 and 7 are etched. Furthermore, there is no leakage of current between the electrodes 2 and 3 and between the electrodes 3 and 4 connected to the AC power source, and the current acts on the aluminum foil running in between, and almost never flows to the counter electrode. Therefore, the supplied current has characteristics that can be effectively used for etching. Furthermore, the aluminum foil 1 may meander while running, but since the etching device of the present invention uses a flexible sheet, it follows the meandering of the aluminum foil 1. never leaves Masks 5 and 7,
Therefore, the fed current will not leak.
The results of etching aluminum foil using such an etching device will be described below. The etching equipment shown in Figures 1 and 2
Aluminum foil of 90μm x width 500mm, Hcl 20wt/v%
+H 2 SO 4 2wt/v% aqueous solution (liquid temperature 35°C) in an etching solution with a current density of 10A/dm 2 and a quantity of electricity.
It is run under conditions of 6000C/dm 2 to perform alternating current etching, then washed and dried. Remove this etched foil by 10mm from both ends in the width direction to make it 480mm.
This was divided into 48 equal parts, 48 samples with a length of 50 mm were collected from a width of 10 mm, and these samples were
Current density in 5wt/v% aqueous solution (liquid temperature 60℃)
Figure 3 shows the capacitance of each sample obtained when the voltage was increased to 49 V at 2 A/dm 2 and then the current was decreased for 20 minutes while keeping the voltage constant. The arrangement of the samples in FIG. 3 is the same as the position when etched. Further, similar results of a conventional example corresponding to this are shown in FIG. In this conventional example, the groove of the mask is
mm, thickness 90μm x width passed through the groove
This is a 500mm aluminum foil with 10mm removed from each side. As is clear from these results, when aluminum foil is sandwiched between flexible masks 5 and 7 using the device of the present invention, the corrosive current is used to etch the aluminum foil 1 without leaking. Therefore, the maximum/minimum variation in capacitance in the width direction is 4.1%. On the other hand, the results in Figure 4 are extremely low at both ends, and the variation is maximum/
The minimum is 25.9%, and even when excluding both ends
The variation is 8.5%, which is twice as large as that of the present invention. In this conventional example, the grooves of the mask are 1 mm, so even if a 90 μm thick aluminum foil is passed through, there is a gap between the grooves of the mask (although the etching solution is present), and the fed current leaks through the gap, so both ends are thought to be extremely low. However, this total width of 20 mm with 10 mm on each side corresponds to 4.2% of the area, and even if these 20 mm are removed, there will be twice as much variation as in the present invention, and the remarkable effect of the etching apparatus according to the present invention is It shows.
以上述べたように本考案になる電解コンデンサ
用電極箔のエツチング装置では柔軟性を有するマ
スク間にアルミ箔を挟み込んで走行させるため、
饋電された電流の漏れがないので幅方向のエツチ
ング倍率のバラツキが小さく、かつ柔軟性を有す
るマスクを使用しているので、アルミ箔が蛇行し
てもマスクが追随しマスクとアルミ箔との間に隙
間を生じない長所を有するものである。 As mentioned above, in the etching device for electrode foil for electrolytic capacitors according to the present invention, the aluminum foil is sandwiched between flexible masks and run.
Since there is no leakage of the fed current, there is little variation in the etching magnification in the width direction, and since a flexible mask is used, even if the aluminum foil meanderes, the mask will follow and the contact between the mask and the aluminum foil will be reduced. This has the advantage of not creating any gaps between them.
なお前記実施例において柔軟性のあるマスクと
して3弗化エチレンを使用した場合について述べ
たが、たとえば3弗化塩化エチレン、弗化ビニリ
デン、塩化ビニリデン、4弗化6弗化プロピレ
ン、ポリプロピレン、ポリエチレンを使用しても
同様の効果を得ることができる。 In the above example, the case where trifluoroethylene was used as a flexible mask was described, but for example, trifluorochloroethylene, vinylidene fluoride, vinylidene chloride, tetrafluorohexafluoropropylene, polypropylene, polyethylene could be used. Similar effects can be obtained by using
第1図は本考案になるエツチング装置を示す一
部断面斜視図、第2図は第1図に示したエツチン
グ装置の一部平面図、第3図は本考案になるエツ
チング装置を使用して得たエツチング箔の幅方向
のバラツキを示す曲線図、第4図は従来例になる
エツチング装置を使用して得たエツチング箔の幅
方向のバラツキを示す曲線図である。
1……アルミ箔、2,3,4……電極、5,7
……マスク、6……底部ローラー、8……エツチ
ング液、9……エツチング槽。
Fig. 1 is a partial cross-sectional perspective view showing the etching apparatus of the present invention, Fig. 2 is a partial plan view of the etching apparatus shown in Fig. 1, and Fig. 3 is a partial cross-sectional view of the etching apparatus of the present invention. FIG. 4 is a curve diagram showing variations in the width direction of the etching foil obtained using the conventional etching apparatus. FIG. 1... Aluminum foil, 2, 3, 4... Electrode, 5, 7
...Mask, 6...Bottom roller, 8...Etching liquid, 9...Etching tank.
Claims (1)
液を有するエツチング槽と、該エツチング槽内
壁に取着し、前記電極間を走行する電極箔の両
側端を挟む柔軟性を有する薄いシートを折曲げ
たマスクとを具備した電解コンデンサ用電極箔
のエツチング装置。 (2) マスクが3弗化エチレン、3弗化塩化エチレ
ン、弗化ビニリデン、塩化ビニリデン、4弗化
6弗化プロピレン、ポリプロピレン、ポリエチ
レンからなることを特徴とする実用新案登録請
求の範囲第(1)項記載の電解コンデンサ用電極箔
のエツチング装置。[Claims for Utility Model Registration] (1) An etching tank having electrodes and an etching solution connected to an AC power supply, and a flexible film attached to the inner wall of the etching tank and sandwiching both ends of the electrode foil running between the electrodes. 1. An etching device for electrode foil for electrolytic capacitors, which is equipped with a mask made by folding a thin sheet with a high temperature. (2) Utility model registration claim No. (1) characterized in that the mask is made of ethylene trifluoride, ethylene trifluoride chloride, vinylidene fluoride, vinylidene chloride, propylene tetrafluoride hexafluoride, polypropylene, and polyethylene. The etching device for electrode foil for electrolytic capacitors as described in item ).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1984071418U JPS60181377U (en) | 1984-05-15 | 1984-05-15 | Etching device for electrode foil for electrolytic capacitors |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1984071418U JPS60181377U (en) | 1984-05-15 | 1984-05-15 | Etching device for electrode foil for electrolytic capacitors |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60181377U JPS60181377U (en) | 1985-12-02 |
| JPS638763Y2 true JPS638763Y2 (en) | 1988-03-16 |
Family
ID=30608892
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1984071418U Granted JPS60181377U (en) | 1984-05-15 | 1984-05-15 | Etching device for electrode foil for electrolytic capacitors |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60181377U (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2010131290A1 (en) * | 2009-05-12 | 2010-11-18 | 日本軽金属株式会社 | Manufacturing method for an aluminum electrode plate for electrolytic capacitor and manufacturing apparatus therefor |
-
1984
- 1984-05-15 JP JP1984071418U patent/JPS60181377U/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60181377U (en) | 1985-12-02 |
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