JPS6410067U - - Google Patents
Info
- Publication number
- JPS6410067U JPS6410067U JP10374387U JP10374387U JPS6410067U JP S6410067 U JPS6410067 U JP S6410067U JP 10374387 U JP10374387 U JP 10374387U JP 10374387 U JP10374387 U JP 10374387U JP S6410067 U JPS6410067 U JP S6410067U
- Authority
- JP
- Japan
- Prior art keywords
- treated
- space
- phosphate treatment
- liquid tank
- treatment liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910019142 PO4 Inorganic materials 0.000 claims description 7
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims description 7
- 239000010452 phosphate Substances 0.000 claims description 7
- 239000007788 liquid Substances 0.000 claims description 5
- 238000005192 partition Methods 0.000 claims description 5
- 238000007654 immersion Methods 0.000 claims 3
- 239000000463 material Substances 0.000 claims 3
- 239000007921 spray Substances 0.000 claims 3
- 238000007599 discharging Methods 0.000 claims 1
- 239000003595 mist Substances 0.000 claims 1
- 238000005507 spraying Methods 0.000 description 1
Landscapes
- Chemical Treatment Of Metals (AREA)
Description
第１図は本考案に係るリン酸塩処理装置を略示
的に示した側断面図、第２図は第１図の−線
に沿う拡大断面図である。
１……ブース、２……処理槽、３……リン酸塩
処理液、４……天井、５……レール、５ａ……コ
ンベア、６……被処理物、７……入槽側、８……
出槽側、９……スプレー手段、１０……仕切板、
１０ａ……間隙、１１，１２……ダクト、１３…
…タンク、１４……ダンパー。
FIG. 1 is a side sectional view schematically showing a phosphate treatment apparatus according to the present invention, and FIG. 2 is an enlarged sectional view taken along the line - in FIG. 1... Booth, 2... Treatment tank, 3... Phosphate treatment liquid, 4... Ceiling, 5... Rail, 5a... Conveyor, 6... Item to be treated, 7... Tank entry side, 8 ……
Output tank side, 9... spraying means, 10... partition plate,
10a... Gap, 11, 12... Duct, 13...
... Tank, 14... Damper.
Claims (1)
スで構成され、そのブースにリン酸塩処理液槽が
設けられ、該処理液槽底部を前記被処理物が平行
移動するようにコンベアが設けられた浸漬式リン
酸塩処理装置において、前記リン酸塩処理液槽の
天井部分をその処理液槽の底部の形状に沿つて低
く形成することでブース空間を狭くし、被処理物
出槽部空間にのみスプレー手段を設け、該スプレ
ー手段によるミストが入槽前の被処理物に影響を
及ぼさないように、前記スプレー空間と被処理物
入槽空間とを仕切る仕切板を前記天井部分から吊
垂状態に設け、該仕切板はコンベア又はハンガー
が通過可能な空隙を有することを特徴とする浸漬
式リン酸塩処理装置。 (2) 仕切板で仕切られた入槽側空間に排気ダク
トを設けたことを特徴とする前記１項記載の浸漬
式リン酸塩処理装置。[Claims for Utility Model Registration] (1) Consisting of a booth in which the objects to be treated can be taken in and out by a conveyor, the booth is provided with a phosphate treatment liquid tank, and the object to be treated is parallel to the bottom of the treatment liquid tank. In an immersion type phosphate treatment equipment equipped with a moving conveyor, the booth space is narrowed by forming the ceiling of the phosphate treatment liquid tank low to follow the shape of the bottom of the treatment liquid tank. , a partition that provides a spray means only in the space for discharging the material to be treated, and partitions the spray space from the space for entering the material to be treated so that the mist produced by the spray means does not affect the material to be treated before entering the tank; An immersion type phosphate treatment apparatus characterized in that a plate is provided in a suspended state from the ceiling portion, and the partition plate has a gap through which a conveyor or a hanger can pass. (2) The immersion type phosphate treatment apparatus according to item 1 above, characterized in that an exhaust duct is provided in the tank entry side space partitioned by a partition plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10374387U JPH0414453Y2 (en) | 1987-07-06 | 1987-07-06 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10374387U JPH0414453Y2 (en) | 1987-07-06 | 1987-07-06 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6410067U true JPS6410067U (en) | 1989-01-19 |
| JPH0414453Y2 JPH0414453Y2 (en) | 1992-03-31 |
Family
ID=31334846
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10374387U Expired JPH0414453Y2 (en) | 1987-07-06 | 1987-07-06 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0414453Y2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01219174A (en) * | 1988-02-26 | 1989-09-01 | Kemikooto:Kk | Continuous dip treatment of metal with liquid chemical |
-
1987
- 1987-07-06 JP JP10374387U patent/JPH0414453Y2/ja not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01219174A (en) * | 1988-02-26 | 1989-09-01 | Kemikooto:Kk | Continuous dip treatment of metal with liquid chemical |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0414453Y2 (en) | 1992-03-31 |
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