JPS6410548A - Gas phase ion source - Google Patents
Gas phase ion sourceInfo
- Publication number
- JPS6410548A JPS6410548A JP62166555A JP16655587A JPS6410548A JP S6410548 A JPS6410548 A JP S6410548A JP 62166555 A JP62166555 A JP 62166555A JP 16655587 A JP16655587 A JP 16655587A JP S6410548 A JPS6410548 A JP S6410548A
- Authority
- JP
- Japan
- Prior art keywords
- emitter
- voltage
- electric field
- electrode
- acceleration
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005684 electric field Effects 0.000 abstract 5
- 230000001133 acceleration Effects 0.000 abstract 3
- 230000008020 evaporation Effects 0.000 abstract 3
- 238000001704 evaporation Methods 0.000 abstract 3
- 239000007789 gas Substances 0.000 abstract 2
- 239000001307 helium Substances 0.000 abstract 2
- 229910052734 helium Inorganic materials 0.000 abstract 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 abstract 2
- 238000010884 ion-beam technique Methods 0.000 abstract 1
- 150000002500 ions Chemical class 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/08—Ion sources
- H01J2237/0802—Field ionization sources
- H01J2237/0807—Gas field ion sources [GFIS]
Landscapes
- Electron Sources, Ion Sources (AREA)
Abstract
PURPOSE:To make the diameter of the ionized part smaller by composing to generate an electric field evaporation on the surface of an emitter by superposing the pulse voltage to a drawn-out voltage, between the emitter and a drawing-out electrode. CONSTITUTION:As well as applying an acceleration voltage to an emitter 8 from an acceleration power supply 1, a drawing-out voltage from a drawing-out power supply 13 is applied between the emitter 8 and a drawing-out electrode 9. At the same time, a pulse voltage is applied from a pulse voltage generating circuit 14 to the emitter 8 superposing on the drawing-out voltage making into the same polarity as the drawing-out electrode. As a result, only the part of the highest electric field at the tip of the emitter chip generates an electric field evaporation. Owing to the electric field evaporation, the diameter of the first layer of the tip of the emitter chip is made smaller gradually. In such a condition, by introducing helium gas around the emitter chip, the helium gas is ionized by a strong electric field between the emitter and the electrode 9. The ions generated by the ionization is drawn out by the drawing-out voltage, and at the same time, accelerated by the acceleration voltage. The accelerated ion beams are focused by a lens extremely minutely.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62166555A JPS6410548A (en) | 1987-07-03 | 1987-07-03 | Gas phase ion source |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62166555A JPS6410548A (en) | 1987-07-03 | 1987-07-03 | Gas phase ion source |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6410548A true JPS6410548A (en) | 1989-01-13 |
Family
ID=15833432
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62166555A Pending JPS6410548A (en) | 1987-07-03 | 1987-07-03 | Gas phase ion source |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6410548A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012138360A (en) * | 2005-12-02 | 2012-07-19 | Arisu Corporation:Kk | Ion sources, system and method |
-
1987
- 1987-07-03 JP JP62166555A patent/JPS6410548A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012138360A (en) * | 2005-12-02 | 2012-07-19 | Arisu Corporation:Kk | Ion sources, system and method |
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