JPS641232A - Method of measuring pattern overlay accuracy - Google Patents

Method of measuring pattern overlay accuracy

Info

Publication number
JPS641232A
JPS641232A JP62157295A JP15729587A JPS641232A JP S641232 A JPS641232 A JP S641232A JP 62157295 A JP62157295 A JP 62157295A JP 15729587 A JP15729587 A JP 15729587A JP S641232 A JPS641232 A JP S641232A
Authority
JP
Japan
Prior art keywords
film
mark
alignment
overlay accuracy
measuring pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62157295A
Other languages
Japanese (ja)
Other versions
JPH011232A (en
Inventor
Wataru Wakamiya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP62157295A priority Critical patent/JPS641232A/en
Publication of JPH011232A publication Critical patent/JPH011232A/en
Publication of JPS641232A publication Critical patent/JPS641232A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)

Abstract

PURPOSE: To prevent an error by forming a first alignment mark in first step, then covering the top with a film which transmits an irradiated beam used at the time of alignment, and flattening the top of the film.
CONSTITUTION: An alignment mark 2a formed in a recess shape in first step on a semiconductor substrate 1 is covered with a thin film 6 of a material which transmits an alignment light, and the film is so selected that the upper face becomes flat in response to a mark step. Then, an alignment mark 5 is formed on a resist film 5 formed in second step. The marks 2a, 5 are scanned by a laser light, scattered light from the step of the mark is detected to accurately measure the overlay deviation.
COPYRIGHT: (C)1989,JPO&Japio
JP62157295A 1987-06-23 1987-06-23 Method of measuring pattern overlay accuracy Pending JPS641232A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62157295A JPS641232A (en) 1987-06-23 1987-06-23 Method of measuring pattern overlay accuracy

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62157295A JPS641232A (en) 1987-06-23 1987-06-23 Method of measuring pattern overlay accuracy

Publications (2)

Publication Number Publication Date
JPH011232A JPH011232A (en) 1989-01-05
JPS641232A true JPS641232A (en) 1989-01-05

Family

ID=15646539

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62157295A Pending JPS641232A (en) 1987-06-23 1987-06-23 Method of measuring pattern overlay accuracy

Country Status (1)

Country Link
JP (1) JPS641232A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5622796A (en) * 1991-12-18 1997-04-22 Sgs-Thomson Microelectronics S.R.L. Process for producing metrological structures particularly for direct measurement of errors introduced by alignment systems

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5622796A (en) * 1991-12-18 1997-04-22 Sgs-Thomson Microelectronics S.R.L. Process for producing metrological structures particularly for direct measurement of errors introduced by alignment systems
US5985494A (en) * 1991-12-18 1999-11-16 Sgs-Thomson Microelectronics S.R.L. Metrological structures particularly for direct measurement of errors introduced by alignment systems

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