JPS6413217A - Magnetic recording medium and its production - Google Patents
Magnetic recording medium and its productionInfo
- Publication number
- JPS6413217A JPS6413217A JP16829487A JP16829487A JPS6413217A JP S6413217 A JPS6413217 A JP S6413217A JP 16829487 A JP16829487 A JP 16829487A JP 16829487 A JP16829487 A JP 16829487A JP S6413217 A JPS6413217 A JP S6413217A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- alumina
- magnetic
- 50angstrom
- recording medium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Magnetic Record Carriers (AREA)
Abstract
PURPOSE:To obtain a magnetic recording medium having excellent corrosion resistance by specifying the film thicknesses of an Al layer and alumina layer to respectively specific values in the case of providing the Al layer on a thin magnetic metallic film then obtaining the alumina layer by subjecting the surface of the Al layer to a plasma treatment in a steam and oxygen atmosphere. CONSTITUTION:A magnetic Co-Ni layer 2 is laminated on a nonmagnetic substrate 1 and the Al layer 3 is further formed on this magnetic layer 2. The alumina layer 4 is formed on the surface of the Al layer 3. The thickness of this alumina layer is adjusted to >=50Angstrom . After the Al layer 3 is provided, the surface of the Al layer 3 is subjected to the plasma treatment in the steam and oxygen atmosphere which is so executed as to confine the film thickness of the Al layer 3 to >=50Angstrom and <=1,000Angstrom , more preferably to >=50Angstrom and <=300Angstrom . The magnetic layer is thus sufficiently protected by the protective layer consisting of the alumina and the corrosion resistance is improved.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16829487A JPS6413217A (en) | 1987-07-06 | 1987-07-06 | Magnetic recording medium and its production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16829487A JPS6413217A (en) | 1987-07-06 | 1987-07-06 | Magnetic recording medium and its production |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6413217A true JPS6413217A (en) | 1989-01-18 |
Family
ID=15865345
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16829487A Pending JPS6413217A (en) | 1987-07-06 | 1987-07-06 | Magnetic recording medium and its production |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6413217A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5759973A (en) * | 1996-09-06 | 1998-06-02 | Olin Microelectronic Chemicals, Inc. | Photoresist stripping and cleaning compositions |
| US5780406A (en) * | 1996-09-06 | 1998-07-14 | Honda; Kenji | Non-corrosive cleaning composition for removing plasma etching residues |
| US5817610A (en) * | 1996-09-06 | 1998-10-06 | Olin Microelectronic Chemicals, Inc. | Non-corrosive cleaning composition for removing plasma etching residues |
| US6030932A (en) * | 1996-09-06 | 2000-02-29 | Olin Microelectronic Chemicals | Cleaning composition and method for removing residues |
| WO2007084663A3 (en) * | 2006-01-18 | 2007-10-11 | Du Pont | Process for forming a metallized sheet |
-
1987
- 1987-07-06 JP JP16829487A patent/JPS6413217A/en active Pending
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5759973A (en) * | 1996-09-06 | 1998-06-02 | Olin Microelectronic Chemicals, Inc. | Photoresist stripping and cleaning compositions |
| US5780406A (en) * | 1996-09-06 | 1998-07-14 | Honda; Kenji | Non-corrosive cleaning composition for removing plasma etching residues |
| US5817610A (en) * | 1996-09-06 | 1998-10-06 | Olin Microelectronic Chemicals, Inc. | Non-corrosive cleaning composition for removing plasma etching residues |
| US6020292A (en) * | 1996-09-06 | 2000-02-01 | Olin Microelectronic Chemicals, Inc. | Non-corrosive cleaning composition for removing plasma etching residues |
| US6030932A (en) * | 1996-09-06 | 2000-02-29 | Olin Microelectronic Chemicals | Cleaning composition and method for removing residues |
| US6191086B1 (en) | 1996-09-06 | 2001-02-20 | Arch Specialty Chemicals, Inc. | Cleaning composition and method for removing residues |
| WO2007084663A3 (en) * | 2006-01-18 | 2007-10-11 | Du Pont | Process for forming a metallized sheet |
| AU2007207458B2 (en) * | 2006-01-18 | 2011-05-12 | E. I. Du Pont De Nemours And Company | Process for forming a metallized sheet |
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