JPS6413541A - Positive type photoresist composition - Google Patents
Positive type photoresist compositionInfo
- Publication number
- JPS6413541A JPS6413541A JP17046787A JP17046787A JPS6413541A JP S6413541 A JPS6413541 A JP S6413541A JP 17046787 A JP17046787 A JP 17046787A JP 17046787 A JP17046787 A JP 17046787A JP S6413541 A JPS6413541 A JP S6413541A
- Authority
- JP
- Japan
- Prior art keywords
- positive type
- type photoresist
- resin
- compsn
- regulated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920002120 photoresistant polymer Polymers 0.000 title abstract 3
- 229920005989 resin Polymers 0.000 abstract 4
- 239000011347 resin Substances 0.000 abstract 4
- 150000002148 esters Chemical class 0.000 abstract 2
- 229920003986 novolac Polymers 0.000 abstract 2
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 abstract 2
- 230000001105 regulatory effect Effects 0.000 abstract 2
- 230000035945 sensitivity Effects 0.000 abstract 2
- 230000004304 visual acuity Effects 0.000 abstract 2
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 abstract 1
- 238000002156 mixing Methods 0.000 abstract 1
- 230000003287 optical effect Effects 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
- G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
Abstract
PURPOSE:To obtain a positive type photoresist compsn. having high resolving power and high sensitivity and hardly producing scum by blending specified alkali-soluble novolak resin with a fixed quantity or less of a 1,2-quinonediazido compd. CONSTITUTION:When a positive type photoresist compsn. is composed of alkali- soluble novolak resin and a 1,2-quinonediazido compd., the ratio between m- cresol and p-cresol components in the resin is regulated to 55/45-70/30 and the weight average mol.wt. of the resin to 4,000-20,000. Optical density per 1mum resist film at 404nm wavelength is regulated to <=0.50. The 1,2- quinonediazido compd. used may be 1,2-benzoquinonediazido-4-sulfonic ester or 1,2-naphthoquinonediazido-4-sulfonic ester. The resolving power and sensitivity of the compsn. are increased, scum is hardly produced and superior developability is obtd.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17046787A JPS6413541A (en) | 1987-07-08 | 1987-07-08 | Positive type photoresist composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17046787A JPS6413541A (en) | 1987-07-08 | 1987-07-08 | Positive type photoresist composition |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6413541A true JPS6413541A (en) | 1989-01-18 |
Family
ID=15905482
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17046787A Pending JPS6413541A (en) | 1987-07-08 | 1987-07-08 | Positive type photoresist composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6413541A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02282745A (en) * | 1989-04-25 | 1990-11-20 | Toray Ind Inc | Positive type photoresist composition and fine pattern forming method using the same composition |
| JPH05249664A (en) * | 1992-03-04 | 1993-09-28 | Fuji Photo Film Co Ltd | Positive type photosensitive composition |
-
1987
- 1987-07-08 JP JP17046787A patent/JPS6413541A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02282745A (en) * | 1989-04-25 | 1990-11-20 | Toray Ind Inc | Positive type photoresist composition and fine pattern forming method using the same composition |
| JPH05249664A (en) * | 1992-03-04 | 1993-09-28 | Fuji Photo Film Co Ltd | Positive type photosensitive composition |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP0894622A3 (en) | Positive-working photosensitive composition for use with infrared laser | |
| JPS6476047A (en) | Photosensitive resin composition | |
| HK8787A (en) | Positive-type photoresist compositions | |
| DE3888420D1 (en) | Positive photoresist compositions. | |
| KR890016724A (en) | Polyester resin and composition thereof showing optical anisotropy in molten state | |
| JPS564144A (en) | Photosensitive composition | |
| JPS55129341A (en) | Photosensitive covering composition | |
| JPS6413541A (en) | Positive type photoresist composition | |
| JPS53131835A (en) | Reflecting objective lens | |
| JPS6477572A (en) | Recording material | |
| JPS6411259A (en) | Positive type photoresist composition | |
| JPS642034A (en) | Photoresist composition | |
| JPS6432256A (en) | Photosensitive composition | |
| EP0295626A3 (en) | Photosensitive composition | |
| JPS5614232A (en) | Negative type resist resin | |
| JPS6452139A (en) | Photosensitive composition | |
| JPS6417049A (en) | Positive type photoresist composition | |
| JPS5538524A (en) | Toner composition for electrophotography | |
| JPS6450044A (en) | Resin composition having sensibility for radiant rays | |
| KR920020275A (en) | Method for preparing radiation sensitive compound and positive resist composition | |
| JPS575742A (en) | Light diffusing acrylic resin sheet material | |
| JPS55783A (en) | Photosensitive resin composition | |
| JPS57122430A (en) | Positive type resist material with dry etching resistance | |
| JPS6446747A (en) | Photoresist composition | |
| JPS56162753A (en) | Electrophotographic toner |