JPS6413541A - Positive type photoresist composition - Google Patents

Positive type photoresist composition

Info

Publication number
JPS6413541A
JPS6413541A JP17046787A JP17046787A JPS6413541A JP S6413541 A JPS6413541 A JP S6413541A JP 17046787 A JP17046787 A JP 17046787A JP 17046787 A JP17046787 A JP 17046787A JP S6413541 A JPS6413541 A JP S6413541A
Authority
JP
Japan
Prior art keywords
positive type
type photoresist
resin
compsn
regulated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17046787A
Other languages
English (en)
Inventor
Nobuaki Matsuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP17046787A priority Critical patent/JPS6413541A/ja
Publication of JPS6413541A publication Critical patent/JPS6413541A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
JP17046787A 1987-07-08 1987-07-08 Positive type photoresist composition Pending JPS6413541A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17046787A JPS6413541A (en) 1987-07-08 1987-07-08 Positive type photoresist composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17046787A JPS6413541A (en) 1987-07-08 1987-07-08 Positive type photoresist composition

Publications (1)

Publication Number Publication Date
JPS6413541A true JPS6413541A (en) 1989-01-18

Family

ID=15905482

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17046787A Pending JPS6413541A (en) 1987-07-08 1987-07-08 Positive type photoresist composition

Country Status (1)

Country Link
JP (1) JPS6413541A (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02282745A (ja) * 1989-04-25 1990-11-20 Toray Ind Inc ポジ型フォトレジスト組成物および該組成物を使用した微細パターンの形成方法
JPH05249664A (ja) * 1992-03-04 1993-09-28 Fuji Photo Film Co Ltd ポジ型感光性組成物

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02282745A (ja) * 1989-04-25 1990-11-20 Toray Ind Inc ポジ型フォトレジスト組成物および該組成物を使用した微細パターンの形成方法
JPH05249664A (ja) * 1992-03-04 1993-09-28 Fuji Photo Film Co Ltd ポジ型感光性組成物

Similar Documents

Publication Publication Date Title
EP0894622A3 (en) Positive-working photosensitive composition for use with infrared laser
JPS6476047A (en) Photosensitive resin composition
HK8787A (en) Positive-type photoresist compositions
DE3888420D1 (de) Positiv-Fotoresist-Zusammensetzungen.
KR890016724A (ko) 용융상태에서 광학 이방성을 나타내는 폴리에스테르 수지와 그 조성물
JPS564144A (en) Photosensitive composition
JPS55129341A (en) Photosensitive covering composition
JPS6413541A (en) Positive type photoresist composition
JPS53131835A (en) Reflecting objective lens
JPS6477572A (en) Recording material
JPS6411259A (en) Positive type photoresist composition
JPS642034A (en) Photoresist composition
JPS6432256A (en) Photosensitive composition
EP0295626A3 (en) Photosensitive composition
JPS5614232A (en) Negative type resist resin
JPS6452139A (en) Photosensitive composition
JPS6417049A (en) Positive type photoresist composition
JPS5538524A (en) Toner composition for electrophotography
JPS6450044A (en) Resin composition having sensibility for radiant rays
KR920020275A (ko) 방사선 감수성 화합물의 제조방법 및 양성 레지스트 조성물
JPS575742A (en) Light diffusing acrylic resin sheet material
JPS55783A (en) Photosensitive resin composition
JPS57122430A (en) Positive type resist material with dry etching resistance
JPS6446747A (en) Photoresist composition
JPS56162753A (en) Electrophotographic toner