JPS641455U - - Google Patents
Info
- Publication number
- JPS641455U JPS641455U JP9568087U JP9568087U JPS641455U JP S641455 U JPS641455 U JP S641455U JP 9568087 U JP9568087 U JP 9568087U JP 9568087 U JP9568087 U JP 9568087U JP S641455 U JPS641455 U JP S641455U
- Authority
- JP
- Japan
- Prior art keywords
- ion source
- plasma generation
- generation vessel
- outside
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010884 ion-beam technique Methods 0.000 description 1
Landscapes
- Electron Sources, Ion Sources (AREA)
Description
第１図は、この考案の一実施例に係るイオン源
のプラズマ生成容器回りを拡大して部分的に示す
概略断面図である。第２図は、第１図の線―
に沿う断面図である。第３図は、従来のイオン源
の一例を示す概略断面図である。第４図は、第３
図の線―に沿う拡大断面図である。第５図は
、アダプタ回りを部分的に示す拡大断面図である
。
２…プラズマ生成容器、２ａ〜２ｄ…穴、４…
フイラメント、１４…イオンビーム、１８…ガス
導入管。
FIG. 1 is an enlarged schematic cross-sectional view partially showing the vicinity of a plasma generation container of an ion source according to an embodiment of the present invention. Figure 2 shows the line in Figure 1 -
FIG. FIG. 3 is a schematic cross-sectional view showing an example of a conventional ion source. Figure 4 shows the third
FIG. 2 is an enlarged cross-sectional view taken along line - in the figure. FIG. 5 is an enlarged sectional view partially showing the area around the adapter. 2... Plasma generation container, 2a to 2d... Hole, 4...
Filament, 14...Ion beam, 18...Gas introduction tube.
Claims (1)
よう構成したイオン源において、プラズマ生成容
器の側壁内に、当該プラズマ生成容器の内外に通
じる穴であつてしかも内外が直接見通せない穴を
設け、当該穴に、イオン源ガスを導入するための
ガス導入管を接続していることを特徴とするイオ
ン源。 In an ion source configured to introduce an ion source gas into a plasma generation vessel, a hole is provided in the side wall of the plasma generation vessel that communicates with the inside and outside of the plasma generation vessel, but through which the inside and outside cannot be directly seen; An ion source characterized in that a gas introduction pipe for introducing an ion source gas is connected to the ion source.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9568087U JPS641455U (en) | 1987-06-22 | 1987-06-22 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9568087U JPS641455U (en) | 1987-06-22 | 1987-06-22 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS641455U true JPS641455U (en) | 1989-01-06 |
Family
ID=30960501
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9568087U Pending JPS641455U (en) | 1987-06-22 | 1987-06-22 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS641455U (en) |
-
1987
- 1987-06-22 JP JP9568087U patent/JPS641455U/ja active Pending