JPS6414958A - Solid-state image pickup element - Google Patents

Solid-state image pickup element

Info

Publication number
JPS6414958A
JPS6414958A JP62171499A JP17149987A JPS6414958A JP S6414958 A JPS6414958 A JP S6414958A JP 62171499 A JP62171499 A JP 62171499A JP 17149987 A JP17149987 A JP 17149987A JP S6414958 A JPS6414958 A JP S6414958A
Authority
JP
Japan
Prior art keywords
impurity region
region
signal charge
longer
readout
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62171499A
Other languages
Japanese (ja)
Other versions
JP2723520B2 (en
Inventor
Keiji Toriyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP62171499A priority Critical patent/JP2723520B2/en
Publication of JPS6414958A publication Critical patent/JPS6414958A/en
Application granted granted Critical
Publication of JP2723520B2 publication Critical patent/JP2723520B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Solid State Image Pick-Up Elements (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)

Abstract

PURPOSE:To prevent generation of potential barrier which prevents read operation of signal charge in the section where the conductive region becomes narrow in the side of readout electrode by allowing the signal readout electrode to become longer than the length corresponding to the depth of junction between the second region and first semiconductor layer and to protrude over the second region. CONSTITUTION:The part Y protruding over the impurity region 4 of photodiode of electrode 6 of signal charge readout means is set longer then the length X corresponding to the junction depth of such impurity region. Thereby, since the interval between the end of impurity layer 7 of reverse conductivity type formed on the photodiode surface and the end of impurity region 4 can be set wider than the width corresponding to thickness of such impurity region 4 in the ion implantation process using the signal charge readout electrode 6 as the mask, the width of such impurity region is no longer narrowed at the end of such impurity region. Therefore, the potential barrier which has prevented readout operation of signal charge, which has been a problem in an existing solid-state image pickup element using a buried photodiode as the photodetecting element is no longer generated.
JP62171499A 1987-07-08 1987-07-08 Solid-state imaging device Expired - Lifetime JP2723520B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62171499A JP2723520B2 (en) 1987-07-08 1987-07-08 Solid-state imaging device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62171499A JP2723520B2 (en) 1987-07-08 1987-07-08 Solid-state imaging device

Publications (2)

Publication Number Publication Date
JPS6414958A true JPS6414958A (en) 1989-01-19
JP2723520B2 JP2723520B2 (en) 1998-03-09

Family

ID=15924232

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62171499A Expired - Lifetime JP2723520B2 (en) 1987-07-08 1987-07-08 Solid-state imaging device

Country Status (1)

Country Link
JP (1) JP2723520B2 (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11233749A (en) * 1997-11-14 1999-08-27 Motorola Inc Semiconductor image sensor and method thereof
JP2001044405A (en) * 1999-06-28 2001-02-16 Hyundai Electronics Ind Co Ltd Image sensor and method of manufacturing the same
JP2005039219A (en) * 2004-06-04 2005-02-10 Canon Inc Solid-state imaging device
US6878977B1 (en) 1999-02-25 2005-04-12 Canon Kabushiki Kaisha Photoelectric conversion device, and image sensor and image input system making use of the same
JP2008252123A (en) * 2008-06-18 2008-10-16 Canon Inc Solid-state imaging device
EP2287917A2 (en) 1999-02-25 2011-02-23 Canon Kabushiki Kaisha Light-receiving element and photoelectric conversion device
US8138528B2 (en) 1998-03-19 2012-03-20 Canon Kabushiki Kaisha Solid state image pickup device and manufacturing method therefor

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11233749A (en) * 1997-11-14 1999-08-27 Motorola Inc Semiconductor image sensor and method thereof
JP2014060450A (en) * 1997-11-14 2014-04-03 Intellectual Ventures Second Llc Semiconductor image sensor
US8138528B2 (en) 1998-03-19 2012-03-20 Canon Kabushiki Kaisha Solid state image pickup device and manufacturing method therefor
US6878977B1 (en) 1999-02-25 2005-04-12 Canon Kabushiki Kaisha Photoelectric conversion device, and image sensor and image input system making use of the same
EP2287917A2 (en) 1999-02-25 2011-02-23 Canon Kabushiki Kaisha Light-receiving element and photoelectric conversion device
JP2001044405A (en) * 1999-06-28 2001-02-16 Hyundai Electronics Ind Co Ltd Image sensor and method of manufacturing the same
JP2005039219A (en) * 2004-06-04 2005-02-10 Canon Inc Solid-state imaging device
JP2008252123A (en) * 2008-06-18 2008-10-16 Canon Inc Solid-state imaging device

Also Published As

Publication number Publication date
JP2723520B2 (en) 1998-03-09

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