JPS642037A - Photosensitive composition - Google Patents
Photosensitive compositionInfo
- Publication number
- JPS642037A JPS642037A JP15665287A JP15665287A JPS642037A JP S642037 A JPS642037 A JP S642037A JP 15665287 A JP15665287 A JP 15665287A JP 15665287 A JP15665287 A JP 15665287A JP S642037 A JPS642037 A JP S642037A
- Authority
- JP
- Japan
- Prior art keywords
- formula
- group
- titled composition
- polymer
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000203 mixture Substances 0.000 title abstract 5
- 229920000642 polymer Polymers 0.000 abstract 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 2
- 125000000623 heterocyclic group Chemical group 0.000 abstract 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract 1
- 239000004642 Polyimide Substances 0.000 abstract 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 abstract 1
- 229910001873 dinitrogen Inorganic materials 0.000 abstract 1
- 239000003999 initiator Substances 0.000 abstract 1
- 238000010030 laminating Methods 0.000 abstract 1
- 238000000059 patterning Methods 0.000 abstract 1
- 229920001721 polyimide Polymers 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0387—Polyamides or polyimides
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15665287A JPS642037A (en) | 1987-06-25 | 1987-06-25 | Photosensitive composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15665287A JPS642037A (en) | 1987-06-25 | 1987-06-25 | Photosensitive composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH012037A JPH012037A (ja) | 1989-01-06 |
| JPS642037A true JPS642037A (en) | 1989-01-06 |
Family
ID=15632336
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15665287A Pending JPS642037A (en) | 1987-06-25 | 1987-06-25 | Photosensitive composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS642037A (ja) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7030170B2 (en) | 2001-11-22 | 2006-04-18 | Mitsui Chemicals, Inc. | Photosensitive resin composition, dry film, and workpiece using the same |
| JP2008015060A (ja) * | 2006-07-04 | 2008-01-24 | Asahi Kasei Electronics Co Ltd | 感光性ポリアミド酸エステル組成物 |
| JP2022062795A (ja) * | 2020-10-09 | 2022-04-21 | 東洋インキScホールディングス株式会社 | 電子材料 |
-
1987
- 1987-06-25 JP JP15665287A patent/JPS642037A/ja active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7030170B2 (en) | 2001-11-22 | 2006-04-18 | Mitsui Chemicals, Inc. | Photosensitive resin composition, dry film, and workpiece using the same |
| JP2008015060A (ja) * | 2006-07-04 | 2008-01-24 | Asahi Kasei Electronics Co Ltd | 感光性ポリアミド酸エステル組成物 |
| JP2022062795A (ja) * | 2020-10-09 | 2022-04-21 | 東洋インキScホールディングス株式会社 | 電子材料 |
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