JPS6420619A - Electron beam aligner - Google Patents

Electron beam aligner

Info

Publication number
JPS6420619A
JPS6420619A JP62176463A JP17646387A JPS6420619A JP S6420619 A JPS6420619 A JP S6420619A JP 62176463 A JP62176463 A JP 62176463A JP 17646387 A JP17646387 A JP 17646387A JP S6420619 A JPS6420619 A JP S6420619A
Authority
JP
Japan
Prior art keywords
tubes
data
electron beam
computers
stage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62176463A
Other languages
Japanese (ja)
Inventor
Bunro Komatsu
Katsuya Okumura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP62176463A priority Critical patent/JPS6420619A/en
Publication of JPS6420619A publication Critical patent/JPS6420619A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To improve throughputs in the number of body tubes by composing an electron beam aligner of means for independently driving a plurality of movable body tubes, a memory for storing data patterns to be formed for the respective tubes, and means for producing the patterns from the memory and simultaneously driving corresponding movable mirrors. CONSTITUTION:Computers 41-43 adjust the parameters of sharing body tubes 1-3 and calibrate them by a marker, not shown, provided on a stage 90, and finely adjust the pitches of the tubes 1-3. Then, a computer 44 controls the movement of the stage 90 on the basis of coordinates input from laser length measuring systems 70, 71, 75, 76 when an alignment is started, and transfers the obtained data to the computers 41-43. Then, it reads out the coordinates data and pattern layout information stored in local memories 51-53, and controls the tubes 1-3 by pattern data converters 31-33.
JP62176463A 1987-07-15 1987-07-15 Electron beam aligner Pending JPS6420619A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62176463A JPS6420619A (en) 1987-07-15 1987-07-15 Electron beam aligner

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62176463A JPS6420619A (en) 1987-07-15 1987-07-15 Electron beam aligner

Publications (1)

Publication Number Publication Date
JPS6420619A true JPS6420619A (en) 1989-01-24

Family

ID=16014129

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62176463A Pending JPS6420619A (en) 1987-07-15 1987-07-15 Electron beam aligner

Country Status (1)

Country Link
JP (1) JPS6420619A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5528048A (en) * 1994-03-15 1996-06-18 Fujitsu Limited Charged particle beam exposure system and method
US5895924A (en) * 1995-04-06 1999-04-20 Fujitsu Limited Charged particle beam exposure method and apparatus
WO2002084719A1 (en) * 2001-04-09 2002-10-24 Advantest Corporation Electron beam exposing device and exposure method
JP2008153169A (en) * 2006-12-20 2008-07-03 Yamaha Corp Panel operating element structure of electronic equipment
US8246633B2 (en) 2008-02-01 2012-08-21 Terumo Kabushiki Kaisha Medical manipulator and medical robot system

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60208829A (en) * 1984-04-02 1985-10-21 Canon Inc Position detecting unit
JPS60262419A (en) * 1984-06-08 1985-12-25 Matsushita Electric Ind Co Ltd Pattern forming device and production of semiconductor device utilizing the same
JPS6292434A (en) * 1985-10-18 1987-04-27 Mitsubishi Electric Corp Electron beam exposing apparatus
JPS6298724A (en) * 1985-10-25 1987-05-08 Hitachi Ltd Electron beam patterning device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60208829A (en) * 1984-04-02 1985-10-21 Canon Inc Position detecting unit
JPS60262419A (en) * 1984-06-08 1985-12-25 Matsushita Electric Ind Co Ltd Pattern forming device and production of semiconductor device utilizing the same
JPS6292434A (en) * 1985-10-18 1987-04-27 Mitsubishi Electric Corp Electron beam exposing apparatus
JPS6298724A (en) * 1985-10-25 1987-05-08 Hitachi Ltd Electron beam patterning device

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5528048A (en) * 1994-03-15 1996-06-18 Fujitsu Limited Charged particle beam exposure system and method
US5614725A (en) * 1994-03-15 1997-03-25 Fujitsu Limited Charged particle beam exposure system and method
US5920077A (en) * 1994-03-15 1999-07-06 Fujitsu Limited Charged particle beam exposure system
US5977548A (en) * 1994-03-15 1999-11-02 Fujitsu Limited Charged particle beam exposure system and method
US6118129A (en) * 1994-03-15 2000-09-12 Fujitsu Limited Method and system for exposing an exposure pattern on an object by a charged particle beam which is shaped into a plurality of beam elements
US6486479B1 (en) 1994-03-15 2002-11-26 Fujitsu Limited Charged particle beam exposure system and method
US6646275B2 (en) 1994-03-15 2003-11-11 Fujitsu Limited Charged particle beam exposure system and method
US5895924A (en) * 1995-04-06 1999-04-20 Fujitsu Limited Charged particle beam exposure method and apparatus
WO2002084719A1 (en) * 2001-04-09 2002-10-24 Advantest Corporation Electron beam exposing device and exposure method
JP2008153169A (en) * 2006-12-20 2008-07-03 Yamaha Corp Panel operating element structure of electronic equipment
US8246633B2 (en) 2008-02-01 2012-08-21 Terumo Kabushiki Kaisha Medical manipulator and medical robot system

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