JPS6423864U - - Google Patents
Info
- Publication number
- JPS6423864U JPS6423864U JP11829187U JP11829187U JPS6423864U JP S6423864 U JPS6423864 U JP S6423864U JP 11829187 U JP11829187 U JP 11829187U JP 11829187 U JP11829187 U JP 11829187U JP S6423864 U JPS6423864 U JP S6423864U
- Authority
- JP
- Japan
- Prior art keywords
- sample surface
- exhaust chamber
- preliminary exhaust
- sample
- beam irradiation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010894 electron beam technology Methods 0.000 claims description 2
- 230000001678 irradiating effect Effects 0.000 claims 1
- 238000005211 surface analysis Methods 0.000 claims 1
- 239000013078 crystal Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
Landscapes
- Electron Sources, Ion Sources (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Description
図は本考案の一実施例の構成図である。
Ｂ……本体装置、１……電子銃、２……コンデ
ンサレンズ、ｄ……偏向レンズ、３……対物レン
ズ、Ｅ……電子銃から照射される電子ビーム、Ｓ
……試料、４……試料ホルダー、５……試料ステ
ージ、６……ステージ駆動部、Ｒ……Ｘ線、７…
…分光結晶、８……スリツト、９……Ｘ線検出器
、１０……真空装置、１１……凹面鏡、１２……
凸面鏡、１３……４５度ミラー、１４……窓、１
５……レンズ、Ｍ……顕微鏡光学系、１６……予
備排気室、１７……ゲートバルブ、１８……ステ
ージ、１９……ビーム照射装置、２０……試料交
換棒、２１……蓋、２２……リークバルブ、ＲＰ
……ロータリポンプ、２３……開口。
The figure is a configuration diagram of an embodiment of the present invention. B... Main unit, 1... Electron gun, 2... Condenser lens, d... Deflection lens, 3... Objective lens, E... Electron beam irradiated from the electron gun, S
...Sample, 4...Sample holder, 5...Sample stage, 6...Stage drive unit, R...X-ray, 7...
... Spectroscopic crystal, 8 ... Slit, 9 ... X-ray detector, 10 ... Vacuum device, 11 ... Concave mirror, 12 ...
Convex mirror, 13...45 degree mirror, 14...Window, 1
5... Lens, M... Microscope optical system, 16... Pre-exhaust chamber, 17... Gate valve, 18... Stage, 19... Beam irradiation device, 20... Sample exchange rod, 21... Lid, 22 ...Leak valve, RP
...Rotary pump, 23...opening.
Claims (1)
予備排気室に試料面を照射する電子ビーム照射手
段を設けたことを特徴とする試料面分析装置。 In a sample surface analyzer equipped with a preliminary exhaust chamber,
A sample surface analysis device characterized in that a preliminary exhaust chamber is provided with an electron beam irradiation means for irradiating the sample surface.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11829187U JPH0548358Y2 (en) | 1987-07-31 | 1987-07-31 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11829187U JPH0548358Y2 (en) | 1987-07-31 | 1987-07-31 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6423864U true JPS6423864U (en) | 1989-02-08 |
| JPH0548358Y2 JPH0548358Y2 (en) | 1993-12-24 |
Family
ID=31362516
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11829187U Expired - Lifetime JPH0548358Y2 (en) | 1987-07-31 | 1987-07-31 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0548358Y2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0943174A (en) * | 1995-07-28 | 1997-02-14 | Jeol Ltd | Surface analyzer equipped with plasma etching device |
| JP2016031928A (en) * | 2014-07-29 | 2016-03-07 | ライカ ミクロジュステーメ ゲーエムベーハー | Operation container for cryomicroscopy |
| WO2018020649A1 (en) * | 2016-07-29 | 2018-02-01 | 株式会社日立ハイテクノロジーズ | Charged particle radiation device |
-
1987
- 1987-07-31 JP JP11829187U patent/JPH0548358Y2/ja not_active Expired - Lifetime
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0943174A (en) * | 1995-07-28 | 1997-02-14 | Jeol Ltd | Surface analyzer equipped with plasma etching device |
| JP2016031928A (en) * | 2014-07-29 | 2016-03-07 | ライカ ミクロジュステーメ ゲーエムベーハー | Operation container for cryomicroscopy |
| US10144010B2 (en) | 2014-07-29 | 2018-12-04 | Leica Mikrosysteme Gmbh | Manipulation holder for cryomicroscopy |
| WO2018020649A1 (en) * | 2016-07-29 | 2018-02-01 | 株式会社日立ハイテクノロジーズ | Charged particle radiation device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0548358Y2 (en) | 1993-12-24 |
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