JPS6425414A - Electron beam exposure system - Google Patents

Electron beam exposure system

Info

Publication number
JPS6425414A
JPS6425414A JP62181962A JP18196287A JPS6425414A JP S6425414 A JPS6425414 A JP S6425414A JP 62181962 A JP62181962 A JP 62181962A JP 18196287 A JP18196287 A JP 18196287A JP S6425414 A JPS6425414 A JP S6425414A
Authority
JP
Japan
Prior art keywords
stage
exposure
electron beam
sample
field
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62181962A
Other languages
Japanese (ja)
Inventor
Katsuyuki Arii
Hiroshi Yasuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP62181962A priority Critical patent/JPS6425414A/en
Publication of JPS6425414A publication Critical patent/JPS6425414A/en
Pending legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To provide an electron beam exposure system which improves a throughput by composing a configuration where a drive mechanism allows a stage to perform a linear movement in one direction and also a plane for placing samples of the stage to perform a rotational motion by a constant angle as a rotating plane. CONSTITUTION:A sample is placed on a stage 14 and its sample on the stage 14 is exposed to an electron beam during its stopping. After exposure for one field has been carried out in this way, the stage 14 is rotated by a motor 15, for example, at an angle of only 1 deg. in the direction of A and in the same manner exposure for one field is performed. Similarly when its exposure for 360 fields in all is carried out, the stage 14 is moved at a constant distance in the right direction by a Y axis motor 20 and then exposure for one field and the rotation of the stage 14 at the angle of 1 deg. are alternately repeated in succession. As a result, concentric electron beam scanning locuses are drawn on the sample 21 in the direction of the arrow in the order shown by (1), (2), (3), and (4).
JP62181962A 1987-07-21 1987-07-21 Electron beam exposure system Pending JPS6425414A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62181962A JPS6425414A (en) 1987-07-21 1987-07-21 Electron beam exposure system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62181962A JPS6425414A (en) 1987-07-21 1987-07-21 Electron beam exposure system

Publications (1)

Publication Number Publication Date
JPS6425414A true JPS6425414A (en) 1989-01-27

Family

ID=16109911

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62181962A Pending JPS6425414A (en) 1987-07-21 1987-07-21 Electron beam exposure system

Country Status (1)

Country Link
JP (1) JPS6425414A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0196656A (en) * 1987-10-09 1989-04-14 Omron Tateisi Electron Co Charged beam exposure system

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0196656A (en) * 1987-10-09 1989-04-14 Omron Tateisi Electron Co Charged beam exposure system

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