JPS6468942A - Mechanism for positioning semiconductor substrate - Google Patents

Mechanism for positioning semiconductor substrate

Info

Publication number
JPS6468942A
JPS6468942A JP62225913A JP22591387A JPS6468942A JP S6468942 A JPS6468942 A JP S6468942A JP 62225913 A JP62225913 A JP 62225913A JP 22591387 A JP22591387 A JP 22591387A JP S6468942 A JPS6468942 A JP S6468942A
Authority
JP
Japan
Prior art keywords
semiconductor substrate
straight line
driving means
rotation driving
processing system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62225913A
Other languages
Japanese (ja)
Inventor
Hiroshi Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP62225913A priority Critical patent/JPS6468942A/en
Publication of JPS6468942A publication Critical patent/JPS6468942A/en
Pending legal-status Critical Current

Links

Landscapes

  • Details Of Measuring And Other Instruments (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

PURPOSE:To obtain a semiconductor substrate without the occurrence of defocusing, by rotating a rotation driving means, which rotates the semiconductor substrate, with a straight line, which is perpendicular to the rotary axis, as the center. CONSTITUTION:A first straight line 7 is included in the main plane of a semiconductor substrate 1. A second straight line 8 is perpendicular to the first straight line. A first rotation driving means 9 rotates the semiconductor 1 with the straight line 7 as the center. A second rotation driving means 10 rotates the rotation driving means 9 as the straight line 8 as the center. A processing system driving shaft 13a drives the substrate 1 in parallel with an axis 5. The atittude of the main plane of the semiconductor substrate 1 is changed with the rotation driving means 9 and the rotation driving means 10. Thus the distances between distance detecting points 14a, 14b and 14c and the processing system are made uniform. Thereafter, the focal point of exposure is aligned with the main plane of the semiconductor substrate 1 with the processing system driving shaft 13a based on any of the distance values between the detecting points 14a, 14b and 14c and the processing system.
JP62225913A 1987-09-09 1987-09-09 Mechanism for positioning semiconductor substrate Pending JPS6468942A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62225913A JPS6468942A (en) 1987-09-09 1987-09-09 Mechanism for positioning semiconductor substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62225913A JPS6468942A (en) 1987-09-09 1987-09-09 Mechanism for positioning semiconductor substrate

Publications (1)

Publication Number Publication Date
JPS6468942A true JPS6468942A (en) 1989-03-15

Family

ID=16836848

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62225913A Pending JPS6468942A (en) 1987-09-09 1987-09-09 Mechanism for positioning semiconductor substrate

Country Status (1)

Country Link
JP (1) JPS6468942A (en)

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