JPS6426362U - - Google Patents

Info

Publication number
JPS6426362U
JPS6426362U JP11971187U JP11971187U JPS6426362U JP S6426362 U JPS6426362 U JP S6426362U JP 11971187 U JP11971187 U JP 11971187U JP 11971187 U JP11971187 U JP 11971187U JP S6426362 U JPS6426362 U JP S6426362U
Authority
JP
Japan
Prior art keywords
shutter
target
moving means
film
shutter film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11971187U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP11971187U priority Critical patent/JPS6426362U/ja
Publication of JPS6426362U publication Critical patent/JPS6426362U/ja
Pending legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Physical Vapour Deposition (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案のシヤツター装置の縦断側面図
、第2図は一部を切欠いた斜視図、第3図、第4
図は従来のシヤツター装置の概略正面図および側
面図である。 11……電極ロール、12……シヤツター膜、
13……ワイヤー、14……ガイド軸、15……
ガイド軸、16……巻取軸、17……巻取軸、1
8……フレーム、19……ターゲツト取付フレー
ム、20……ターゲツト、21……モータ、22
……モータ、23……遮蔽板。
Fig. 1 is a vertical sectional side view of the shutter device of the present invention, Fig. 2 is a partially cutaway perspective view, Figs.
The figures are a schematic front view and side view of a conventional shutter device. 11... Electrode roll, 12... Shutter film,
13... wire, 14... guide shaft, 15...
Guide shaft, 16... Winding shaft, 17... Winding shaft, 1
8...Frame, 19...Target mounting frame, 20...Target, 21...Motor, 22
... Motor, 23 ... Shielding plate.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] スパツタリングおよびスパツタエツチング等を
行う真空処理装置におけるシヤツター装置であつ
て、前記シヤツター装置は基板とターゲツトの間
に設けられ遮蔽部に合わせた大きさに形成された
シヤツター膜と、シヤツター膜を左右に移動させ
る移動手段とを具備しており、且つ前記移動手段
は前記シヤツター膜の左右両側縁に固定されたワ
イヤーの他端をターゲツトの左右に配設した巻取
軸に固定し、巻取軸の回転によつてシヤツター膜
をターゲツト上面を遮蔽又は開放できるようにし
たことを特徴とする真空処理装置におけるシヤツ
ター装置。
A shutter device in a vacuum processing apparatus that performs sputtering, sputter etching, etc., the shutter device is provided between a substrate and a target, and has a shutter film formed to a size that matches the shielding portion, and a shutter film that is placed on the left and right sides. and a moving means for moving the target, and the moving means fixes the other end of the wire fixed to the left and right edges of the shutter film to a winding shaft disposed on the left and right sides of the target, and the moving means fixes the other end of the wire fixed to the left and right edges of the shutter film to 1. A shutter device for a vacuum processing apparatus, characterized in that a shutter film can cover or open an upper surface of a target by rotation.
JP11971187U 1987-08-04 1987-08-04 Pending JPS6426362U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11971187U JPS6426362U (en) 1987-08-04 1987-08-04

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11971187U JPS6426362U (en) 1987-08-04 1987-08-04

Publications (1)

Publication Number Publication Date
JPS6426362U true JPS6426362U (en) 1989-02-14

Family

ID=31365179

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11971187U Pending JPS6426362U (en) 1987-08-04 1987-08-04

Country Status (1)

Country Link
JP (1) JPS6426362U (en)

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