JPS64273A - Microwave plasma cvd device - Google Patents
Microwave plasma cvd deviceInfo
- Publication number
- JPS64273A JPS64273A JP62153505A JP15350587A JPS64273A JP S64273 A JPS64273 A JP S64273A JP 62153505 A JP62153505 A JP 62153505A JP 15350587 A JP15350587 A JP 15350587A JP S64273 A JPS64273 A JP S64273A
- Authority
- JP
- Japan
- Prior art keywords
- microwave
- film forming
- inlet part
- inner diameter
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording-members for original recording by exposure, e.g. to light, to heat or to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical Vapour Deposition (AREA)
- Light Receiving Elements (AREA)
- Photoreceptors In Electrophotography (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62153505A JPS64273A (en) | 1987-06-22 | 1987-06-22 | Microwave plasma cvd device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62153505A JPS64273A (en) | 1987-06-22 | 1987-06-22 | Microwave plasma cvd device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01273A JPH01273A (ja) | 1989-01-05 |
| JPS64273A true JPS64273A (en) | 1989-01-05 |
Family
ID=15564018
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62153505A Pending JPS64273A (en) | 1987-06-22 | 1987-06-22 | Microwave plasma cvd device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS64273A (ja) |
-
1987
- 1987-06-22 JP JP62153505A patent/JPS64273A/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS56155535A (en) | Film forming device utilizing plasma | |
| JPS64272A (en) | Microwave plasma cvd device | |
| JPS64273A (en) | Microwave plasma cvd device | |
| US5296784A (en) | Apparatus for the production of glow discharge | |
| MY125722A (en) | Superconducting magnet device for crystal pulling device | |
| JPS5433668A (en) | Plasma deposition unit | |
| JPS5529505A (en) | Treatment of inner surface of plastic tube | |
| JPS5710937A (en) | Plasma gaseous phase growth device | |
| JPS57211539A (en) | Nuclear magnetic resonance device | |
| JPS53126867A (en) | Cvd apparatus | |
| JPS6444019A (en) | Dry etching apparatus | |
| JPS5420971A (en) | Vapor phase growing device | |
| JPS64270A (en) | Microwave plasma cvd device | |
| JPS57121234A (en) | Plasma processing and device thereof | |
| JPS6451626A (en) | Hydrogenating method to silicon thin-film transistor | |
| Kirillova et al. | Acceleration of Relaxation of Non-Equilibrium Depletion on a Real Silicon Surface in Strong Electrical Fields | |
| CN116752125A (zh) | 一种用于玻璃瓶内壁镀膜的无机硅镀膜装置 | |
| JPS5673428A (en) | Method of forming film | |
| JPS6456869A (en) | Thin film forming device | |
| JPS6473716A (en) | Plasma device | |
| GILGENBACH | ECRH studies on Tokamak plasmas(electron cyclotron heating and gyrotron pulse length)[Final Report, 17 Sep. 1979- 30 Sep. 1980] | |
| JPS5745224A (en) | Manufacture of deposited film | |
| White | Ion Plating on Elongated Member | |
| JPS53125971A (en) | Plasma apparatus | |
| BOBROV et al. | End zone of a frame-type channel with an inhomogeneous flow(current and potential fields in plasma) |