JPS6430142A - Microwave ion source - Google Patents
Microwave ion sourceInfo
- Publication number
- JPS6430142A JPS6430142A JP62185383A JP18538387A JPS6430142A JP S6430142 A JPS6430142 A JP S6430142A JP 62185383 A JP62185383 A JP 62185383A JP 18538387 A JP18538387 A JP 18538387A JP S6430142 A JPS6430142 A JP S6430142A
- Authority
- JP
- Japan
- Prior art keywords
- microwave introduction
- window parts
- introduction window
- plasma generation
- microwave
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Plasma Technology (AREA)
- Electrodes Of Semiconductors (AREA)
- Electron Sources, Ion Sources (AREA)
- Drying Of Semiconductors (AREA)
Abstract
PURPOSE:To prevent a microwave introduction part from being damaged by disposing a plurality of microwave introduction window parts and a microwave introduction port holding part at the microwave introduction part in a cavity part for plasma generation. CONSTITUTION:A plurality of microwave introduction window parts 122a, 122a' and a microwave introduction port holding part 123 are disposed at a microwave introduction part 122 in a cavity part for plasma generation 1. Recessed parts are formed in respective spaces between the microwave introduction window parts 122a and 122a'. The microwave introduction port holding part 123 is provided with a screening matter at a position where the microwave introduction window parts 122a, 122a' are screened against high-speed reverse electrons which flow in the reverse direction from an ion drawing electrode. Also the part 123 functions to introduce microwaves and plasma to a central position of the cavity part for plasma generation 1. Hence the high-speed reverse electrons can be prevented from impinging on the microwave introduction window parts, and so the microwave introduction window parts can be prevented from being damaged.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62185383A JP2597485B2 (en) | 1987-07-27 | 1987-07-27 | Microwave ion source |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62185383A JP2597485B2 (en) | 1987-07-27 | 1987-07-27 | Microwave ion source |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6430142A true JPS6430142A (en) | 1989-02-01 |
| JP2597485B2 JP2597485B2 (en) | 1997-04-09 |
Family
ID=16169846
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62185383A Expired - Lifetime JP2597485B2 (en) | 1987-07-27 | 1987-07-27 | Microwave ion source |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2597485B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013246940A (en) * | 2012-05-24 | 2013-12-09 | Sumitomo Heavy Ind Ltd | Microwave ion source and protective member |
| JP2016091617A (en) * | 2014-10-30 | 2016-05-23 | 株式会社片桐エンジニアリング | Plasma processing device |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62108441A (en) * | 1985-11-07 | 1987-05-19 | Hitachi Ltd | microwave plasma source |
| JPS6338585A (en) * | 1986-08-01 | 1988-02-19 | Hitachi Ltd | plasma equipment |
-
1987
- 1987-07-27 JP JP62185383A patent/JP2597485B2/en not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62108441A (en) * | 1985-11-07 | 1987-05-19 | Hitachi Ltd | microwave plasma source |
| JPS6338585A (en) * | 1986-08-01 | 1988-02-19 | Hitachi Ltd | plasma equipment |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013246940A (en) * | 2012-05-24 | 2013-12-09 | Sumitomo Heavy Ind Ltd | Microwave ion source and protective member |
| JP2016091617A (en) * | 2014-10-30 | 2016-05-23 | 株式会社片桐エンジニアリング | Plasma processing device |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2597485B2 (en) | 1997-04-09 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term | ||
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20080109 Year of fee payment: 11 |