JPS6430828U - - Google Patents
Info
- Publication number
- JPS6430828U JPS6430828U JP12713787U JP12713787U JPS6430828U JP S6430828 U JPS6430828 U JP S6430828U JP 12713787 U JP12713787 U JP 12713787U JP 12713787 U JP12713787 U JP 12713787U JP S6430828 U JPS6430828 U JP S6430828U
- Authority
- JP
- Japan
- Prior art keywords
- processed
- pressing member
- processing apparatus
- exposure processing
- thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010894 electron beam technology Methods 0.000 claims 1
- 230000002093 peripheral effect Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 3
Landscapes
- Electron Beam Exposure (AREA)
Description
第１図は本考案装置における被処理体と押え部
材、厚み計との位置関係を示す斜視図、第２図は
制御系を示すブロツク図、第３図は被処理体の変
形と誤差との関係を示す説明図、第４図は従来装
置により検出した被処理体の変形による高さ分布
図である。
１……被処理体、２……ステージ、３……偏向
電極、４……押え部材、４ａ，４ｂ……袖部、５
，６……厚み計。なお、図中、同一符号は同一、
又は相当部分を示す。
Fig. 1 is a perspective view showing the positional relationship between the object to be processed, the holding member, and the thickness gauge in the device of the present invention, Fig. 2 is a block diagram showing the control system, and Fig. 3 shows the relationship between deformation and error of the object to be processed. An explanatory diagram showing the relationship, FIG. 4 is a height distribution diagram due to deformation of the object to be processed detected by the conventional apparatus. DESCRIPTION OF SYMBOLS 1...Object to be processed, 2...Stage, 3...Deflection electrode, 4...Press member, 4a, 4b...Sleeve portion, 5
, 6...thickness gauge. In addition, in the figure, the same reference numerals are the same,
or a corresponding portion.
Claims (1)
対する電子ビームの投射位置を制御するようにし
た露光処理装置において、前記被処理体の辺縁部
を台上に押圧する押圧部材と、該押圧部材に装着
され、押圧部材が被処理体上に置かれたとき、被
処理体の厚みを検出する厚み計とを具備すること
を特徴とする露光処理装置。 An exposure processing apparatus that controls the projection position of an electron beam on an object to be processed mounted on a table by adjusting a polarizing electrode, comprising: a pressing member that presses a peripheral portion of the object to be processed onto the table; An exposure processing apparatus characterized by comprising a thickness meter attached to a pressing member and detecting the thickness of the object to be processed when the pressing member is placed on the object to be processed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12713787U JPS6430828U (en) | 1987-08-20 | 1987-08-20 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12713787U JPS6430828U (en) | 1987-08-20 | 1987-08-20 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6430828U true JPS6430828U (en) | 1989-02-27 |
Family
ID=31379289
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12713787U Pending JPS6430828U (en) | 1987-08-20 | 1987-08-20 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6430828U (en) |
-
1987
- 1987-08-20 JP JP12713787U patent/JPS6430828U/ja active Pending