JPS6431420A - Photoresist dropping nozzle - Google Patents

Photoresist dropping nozzle

Info

Publication number
JPS6431420A
JPS6431420A JP62188176A JP18817687A JPS6431420A JP S6431420 A JPS6431420 A JP S6431420A JP 62188176 A JP62188176 A JP 62188176A JP 18817687 A JP18817687 A JP 18817687A JP S6431420 A JPS6431420 A JP S6431420A
Authority
JP
Japan
Prior art keywords
photoresist
drip
nozzle
holes
dropped
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62188176A
Other languages
Japanese (ja)
Inventor
Toshiro Itani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP62188176A priority Critical patent/JPS6431420A/en
Publication of JPS6431420A publication Critical patent/JPS6431420A/en
Pending legal-status Critical Current

Links

Landscapes

  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To lessen the drip amount and suppress the evaporation of a volatile solvent into the air, by reducing its drip time and then improve the uniformity of a photoresist film thickness, by composing a nozzle so that more than two dropping holes are arranged at least. CONSTITUTION:Photoresist 101 is dropped from the tip 3 of a nozzle to a wafer through a filter 2. In such a case, a plurality of drip holes 102 are arranged at the tip 3 of the nozzle and photoresist 101 is dropped to spread over the whole water through a plurality of the drip holes 102. As a result, the drip amount of photoresist can be curtailed in comparison with that of the conventional nozzles for dropping photoresist and also its drip time is reduced. Then this nozzle may suppress the evaporation of a volatile solvent in photoresist into the air and not only makes photoresist film thicknesses uniform but also forms fine patterns which exhibit an excellent reproducible property.
JP62188176A 1987-07-27 1987-07-27 Photoresist dropping nozzle Pending JPS6431420A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62188176A JPS6431420A (en) 1987-07-27 1987-07-27 Photoresist dropping nozzle

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62188176A JPS6431420A (en) 1987-07-27 1987-07-27 Photoresist dropping nozzle

Publications (1)

Publication Number Publication Date
JPS6431420A true JPS6431420A (en) 1989-02-01

Family

ID=16219095

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62188176A Pending JPS6431420A (en) 1987-07-27 1987-07-27 Photoresist dropping nozzle

Country Status (1)

Country Link
JP (1) JPS6431420A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0641869U (en) * 1992-06-30 1994-06-03 株式会社シーテック Liquid application nozzle
KR20030073928A (en) * 2002-03-14 2003-09-19 삼성전자주식회사 Apparatus for forming etching prevention film with spray type and method for patterning thin film using the same
JP2011049002A (en) * 2009-08-26 2011-03-10 Casio Computer Co Ltd Coating device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0641869U (en) * 1992-06-30 1994-06-03 株式会社シーテック Liquid application nozzle
KR20030073928A (en) * 2002-03-14 2003-09-19 삼성전자주식회사 Apparatus for forming etching prevention film with spray type and method for patterning thin film using the same
JP2011049002A (en) * 2009-08-26 2011-03-10 Casio Computer Co Ltd Coating device
US8464653B2 (en) 2009-08-26 2013-06-18 Casio Computer Co., Ltd. Application device and method of producing application layer using same

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