JPS6431420A - Photoresist dropping nozzle - Google Patents
Photoresist dropping nozzleInfo
- Publication number
- JPS6431420A JPS6431420A JP62188176A JP18817687A JPS6431420A JP S6431420 A JPS6431420 A JP S6431420A JP 62188176 A JP62188176 A JP 62188176A JP 18817687 A JP18817687 A JP 18817687A JP S6431420 A JPS6431420 A JP S6431420A
- Authority
- JP
- Japan
- Prior art keywords
- photoresist
- drip
- nozzle
- holes
- dropped
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Coating Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62188176A JPS6431420A (en) | 1987-07-27 | 1987-07-27 | Photoresist dropping nozzle |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62188176A JPS6431420A (en) | 1987-07-27 | 1987-07-27 | Photoresist dropping nozzle |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6431420A true JPS6431420A (en) | 1989-02-01 |
Family
ID=16219095
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62188176A Pending JPS6431420A (en) | 1987-07-27 | 1987-07-27 | Photoresist dropping nozzle |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6431420A (ja) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0641869U (ja) * | 1992-06-30 | 1994-06-03 | 株式会社シーテック | 液体塗布用ノズル |
| KR20030073928A (ko) * | 2002-03-14 | 2003-09-19 | 삼성전자주식회사 | 분사 방식 식각 저지 박막 형성 장치, 이를 이용한 박막패터닝 방법 |
| JP2011049002A (ja) * | 2009-08-26 | 2011-03-10 | Casio Computer Co Ltd | 塗布装置 |
-
1987
- 1987-07-27 JP JP62188176A patent/JPS6431420A/ja active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0641869U (ja) * | 1992-06-30 | 1994-06-03 | 株式会社シーテック | 液体塗布用ノズル |
| KR20030073928A (ko) * | 2002-03-14 | 2003-09-19 | 삼성전자주식회사 | 분사 방식 식각 저지 박막 형성 장치, 이를 이용한 박막패터닝 방법 |
| JP2011049002A (ja) * | 2009-08-26 | 2011-03-10 | Casio Computer Co Ltd | 塗布装置 |
| US8464653B2 (en) | 2009-08-26 | 2013-06-18 | Casio Computer Co., Ltd. | Application device and method of producing application layer using same |
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