JPS6444934A - Radiation sensitive resin composition - Google Patents

Radiation sensitive resin composition

Info

Publication number
JPS6444934A
JPS6444934A JP20181487A JP20181487A JPS6444934A JP S6444934 A JPS6444934 A JP S6444934A JP 20181487 A JP20181487 A JP 20181487A JP 20181487 A JP20181487 A JP 20181487A JP S6444934 A JPS6444934 A JP S6444934A
Authority
JP
Japan
Prior art keywords
resin
radiation sensitive
hydroxy styrene
sensitive resin
solvent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP20181487A
Other languages
Japanese (ja)
Inventor
Yoshiyuki Harita
Mitsunobu Koshiba
Kazumi Hanawa
Keiichi Yamada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Priority to JP20181487A priority Critical patent/JPS6444934A/en
Publication of JPS6444934A publication Critical patent/JPS6444934A/en
Pending legal-status Critical Current

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  • Compositions Of Macromolecular Compounds (AREA)

Abstract

PURPOSE:To obtain the high resolution and residual film ratio of the titled composition by dissolving the radiation sensitive resin composition in a solvent, and said resin is formed by condensing 1,2-quinone diazide sulfonyl halide with a hydroxystyrene resin, and is specified the total amount of a residual basic condensing catalyst and its neutralization product. CONSTITUTION:The titled composition is formed by dissolving the radiation sensitive resin in the solvent, and said resin is specified the total amount of the residual basic condensating solvent and its neutralization product to <=200ppm. The hydroxy styrene resin is exemplified by preferably a hydroxy styrene polymer, alpha-methyl-p-hydroxy styrene polymer and alpha-methyl-m-hydroxy styrene polymer, etc. Thus, the resist with the high resolution and residual film ratio is obtd.
JP20181487A 1987-08-14 1987-08-14 Radiation sensitive resin composition Pending JPS6444934A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20181487A JPS6444934A (en) 1987-08-14 1987-08-14 Radiation sensitive resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20181487A JPS6444934A (en) 1987-08-14 1987-08-14 Radiation sensitive resin composition

Publications (1)

Publication Number Publication Date
JPS6444934A true JPS6444934A (en) 1989-02-17

Family

ID=16447348

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20181487A Pending JPS6444934A (en) 1987-08-14 1987-08-14 Radiation sensitive resin composition

Country Status (1)

Country Link
JP (1) JPS6444934A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5302488A (en) * 1991-02-28 1994-04-12 Hoechst Aktiengesellschaft Radiation-sensitive polymers containing naphthoquinone-2-diazide-4-sulfonyl groups and their use in a positive working recording material

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50141404A (en) * 1974-04-30 1975-11-13
JPS6027593A (en) * 1983-07-26 1985-02-12 Mitsui Toatsu Chem Inc Resin composition for laser optical recording/reading medium

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50141404A (en) * 1974-04-30 1975-11-13
JPS6027593A (en) * 1983-07-26 1985-02-12 Mitsui Toatsu Chem Inc Resin composition for laser optical recording/reading medium

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5302488A (en) * 1991-02-28 1994-04-12 Hoechst Aktiengesellschaft Radiation-sensitive polymers containing naphthoquinone-2-diazide-4-sulfonyl groups and their use in a positive working recording material

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