JPS644500B2 - - Google Patents
Info
- Publication number
- JPS644500B2 JPS644500B2 JP13104081A JP13104081A JPS644500B2 JP S644500 B2 JPS644500 B2 JP S644500B2 JP 13104081 A JP13104081 A JP 13104081A JP 13104081 A JP13104081 A JP 13104081A JP S644500 B2 JPS644500 B2 JP S644500B2
- Authority
- JP
- Japan
- Prior art keywords
- halide
- compound
- trialkoxybenzyl
- hydrogen
- formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 claims description 12
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical group Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 12
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 claims description 10
- 238000006243 chemical reaction Methods 0.000 claims description 10
- 150000004820 halides Chemical class 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 9
- 239000002253 acid Substances 0.000 claims description 7
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims description 6
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 5
- CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical compound Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 claims description 4
- 239000002904 solvent Substances 0.000 claims description 4
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 claims description 3
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 claims description 3
- MGNZXYYWBUKAII-UHFFFAOYSA-N cyclohexa-1,3-diene Chemical class C1CC=CC=C1 MGNZXYYWBUKAII-UHFFFAOYSA-N 0.000 claims description 3
- 150000008282 halocarbons Chemical class 0.000 claims description 3
- 229910000039 hydrogen halide Inorganic materials 0.000 claims description 3
- 239000012433 hydrogen halide Substances 0.000 claims description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims description 3
- 125000000217 alkyl group Chemical group 0.000 claims description 2
- 150000004292 cyclic ethers Chemical group 0.000 claims description 2
- 125000005843 halogen group Chemical group 0.000 claims description 2
- 229910000042 hydrogen bromide Inorganic materials 0.000 claims description 2
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 claims description 2
- 229910000041 hydrogen chloride Inorganic materials 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 description 19
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 9
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- -1 methanol and ethanol Chemical class 0.000 description 8
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 8
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 239000012043 crude product Substances 0.000 description 4
- 229910052697 platinum Inorganic materials 0.000 description 4
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- 238000005868 electrolysis reaction Methods 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 239000003115 supporting electrolyte Substances 0.000 description 3
- KTIXOQCHPJCHEA-UHFFFAOYSA-N 1,3,5,6,6-pentamethoxy-3-methylcyclohexa-1,4-diene Chemical compound COC1=CC(C)(OC)C=C(OC)C1(OC)OC KTIXOQCHPJCHEA-UHFFFAOYSA-N 0.000 description 2
- KCIZTNZGSBSSRM-UHFFFAOYSA-N 3,4,5-Trimethoxytoluene Chemical compound COC1=CC(C)=CC(OC)=C1OC KCIZTNZGSBSSRM-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- YADSGOSSYOOKMP-UHFFFAOYSA-N dioxolead Chemical compound O=[Pb]=O YADSGOSSYOOKMP-UHFFFAOYSA-N 0.000 description 2
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 239000011259 mixed solution Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- VDZOOKBUILJEDG-UHFFFAOYSA-M tetrabutylammonium hydroxide Chemical compound [OH-].CCCC[N+](CCCC)(CCCC)CCCC VDZOOKBUILJEDG-UHFFFAOYSA-M 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- VQSGYAPECYJBPG-UHFFFAOYSA-N 1,2,3-triethoxy-5-methylbenzene Chemical compound CCOC1=CC(C)=CC(OCC)=C1OCC VQSGYAPECYJBPG-UHFFFAOYSA-N 0.000 description 1
- HMUNWXXNJPVALC-UHFFFAOYSA-N 1-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]-2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)C(CN1CC2=C(CC1)NN=N2)=O HMUNWXXNJPVALC-UHFFFAOYSA-N 0.000 description 1
- OPRMQYRVKPBTOH-UHFFFAOYSA-N 1-[bromo(dimethoxy)methyl]-2-methoxybenzene Chemical compound COC1=CC=CC=C1C(Br)(OC)OC OPRMQYRVKPBTOH-UHFFFAOYSA-N 0.000 description 1
- MLMZXUVFISSGDH-UHFFFAOYSA-N 5-(chloromethyl)-1,2,3-triethoxybenzene Chemical compound CCOC1=CC(CCl)=CC(OCC)=C1OCC MLMZXUVFISSGDH-UHFFFAOYSA-N 0.000 description 1
- XXRUQNNAKXZSOS-UHFFFAOYSA-N 5-(chloromethyl)-1,2,3-trimethoxybenzene Chemical compound COC1=CC(CCl)=CC(OC)=C1OC XXRUQNNAKXZSOS-UHFFFAOYSA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 1
- 239000004280 Sodium formate Substances 0.000 description 1
- 150000007933 aliphatic carboxylic acids Chemical class 0.000 description 1
- 229910001515 alkali metal fluoride Inorganic materials 0.000 description 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000004440 column chromatography Methods 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910000043 hydrogen iodide Inorganic materials 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 239000011698 potassium fluoride Substances 0.000 description 1
- 235000003270 potassium fluoride Nutrition 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 239000011775 sodium fluoride Substances 0.000 description 1
- 235000013024 sodium fluoride Nutrition 0.000 description 1
- HLBBKKJFGFRGMU-UHFFFAOYSA-M sodium formate Chemical compound [Na+].[O-]C=O HLBBKKJFGFRGMU-UHFFFAOYSA-M 0.000 description 1
- 235000019254 sodium formate Nutrition 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 150000005622 tetraalkylammonium hydroxides Chemical class 0.000 description 1
- LPSKDVINWQNWFE-UHFFFAOYSA-M tetrapropylazanium;hydroxide Chemical compound [OH-].CCC[N+](CCC)(CCC)CCC LPSKDVINWQNWFE-UHFFFAOYSA-M 0.000 description 1
Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Description
【発明の詳細な説明】
本発明は3,4,5−トリアルコキシベンジル
ハライドの新規な製造法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a novel method for producing 3,4,5-trialkoxybenzyl halides.
3,4,5−トリアルコキシベンジルハライド
は例えばテリペリムのような医薬品を合成するた
め原料として有用な化合物である。従来3,4,
5−トリアルコキシベンジルハライドの製造法と
しては、例えばラジカル触媒の存在下3,4,5
−トリアルコキシトルエンに紫外線を照射してハ
ロゲンを加熱反応させる方法が知られている。し
かしながらこの方法によれば、高価なラジカル触
媒、紫外線照射装置等を必要とし、また好ましく
ない副反応が併起し収率も約40〜50%程度と低
く、工業的には不利な方法である。 3,4,5-Trialkoxybenzyl halide is a compound useful as a raw material for synthesizing pharmaceuticals such as teliperim. Conventional 3, 4,
As a method for producing 5-trialkoxybenzyl halide, for example, 3,4,5
- A method is known in which trialkoxytoluene is irradiated with ultraviolet rays to cause halogen to undergo a heating reaction. However, this method requires expensive radical catalysts, ultraviolet irradiation equipment, etc., undesirable side reactions also occur, and the yield is low at about 40-50%, making it an industrially disadvantageous method. .
本発明は3,4,5−トリアルコキシベンジル
ハライドを工業的に有利に製造し得る方法を提供
するものであつて、一般式
〔式中R1及びR2は同一又は異なつて低級アルキ
ル基を示す〕
で表わされるシクロヘキサジエン誘導体とハロゲ
ン化水素もしくはハロゲン化水素酸とを溶媒中で
反応させて一般式
〔式中Xはハロゲン原子を示す。R1は前記に同
じ。〕
で表わされる3,4,5−トリアルコキシベンジ
ルハライドを得ることを特徴とする3,4,5−
トリアルコキシベンジルハライドの製造法に係
る。 The present invention provides an industrially advantageous method for producing 3,4,5-trialkoxybenzyl halide, which has the general formula [In the formula, R 1 and R 2 are the same or different and represent a lower alkyl group] A cyclohexadiene derivative represented by the following is reacted with hydrogen halide or hydrohalic acid in a solvent to obtain the general formula [In the formula, X represents a halogen atom. R 1 is the same as above. ] A 3,4,5-trialkoxybenzyl halide represented by
Relates to a method for producing trialkoxybenzyl halide.
本発明の方法は3,4,5−トリアルコキシベ
ンジルハライドの工業的生産に極めて有利な方法
である。即ち本発明によれば穏和な条件下特殊な
試薬を使用することなく簡易な操作で目的化合物
を得ることができる。しかも目的化合物の収率は
約90%以上という高収率であり、また簡便な操作
により反応混合物から目的化合物を高純度に単離
精製することができる。 The method of the present invention is extremely advantageous for the industrial production of 3,4,5-trialkoxybenzyl halide. That is, according to the present invention, the target compound can be obtained by simple operations under mild conditions and without using special reagents. Furthermore, the yield of the target compound is as high as about 90% or more, and the target compound can be isolated and purified from the reaction mixture to a high degree of purity by simple operations.
本発明において出発原料として用いられる一般
式()で表わされるシクロヘキサジエン誘導体
は新規化合物であり、例えば
〔式中R1は前記に同じ。〕で表わされる3,4,
5−トリアルコキシトルエンを溶媒中、中性ない
しアルカリ性支持電解質の存在下電解することに
より90%以上の高収率で製造し得る。 The cyclohexadiene derivative represented by the general formula () used as a starting material in the present invention is a new compound, for example [In the formula, R 1 is the same as above. ] 3, 4,
It can be produced with a high yield of 90% or more by electrolyzing 5-trialkoxytoluene in a solvent in the presence of a neutral to alkaline supporting electrolyte.
一般式()で表わされる3,4,5−トリア
ルコキシトルエンは入手容易な公知化合物であ
り、例えば3,4,5−トリメトキシトルエン、
3,4,5−トリエトキシトルエン等を挙げるこ
とが出来る。上記電解反応に用いる有機溶媒とし
てはメタノール、エタノール等の低級アルコール
が挙げられるが、その使用量は化合物()1モ
ルに対して500ml〜15の範囲で用いるのが好ま
しく、約5〜10の使用量で用いるのが特に好ま
しい。支持電解質として用いられる化合物はアル
カリ金属水酸化物として水酸化ナトリウム、水酸
化カリウム、水酸化リチウム等、アルカリ金属と
してはナトリウム、カリウム等、テトラアルキル
アンモニウム水酸化物としてはテトラメチルアン
モニウムハイドロオキサイド、テトラエチルアン
モニウムハイドロオキサイド、テトラプロピルア
ンモニウムハイドロオキサイド、テトラブチルア
ンモニウムハイドロオキサイド等、脂肪族カルボ
ン酸のアルカリ金属塩としてはギ酸ナトリウム、
酢酸ナトリウム等、アルカリ金属フツ化物として
はフツ化ナトリウム、フツ化カリウム等が挙げら
れる。その使用量は化合物()1モルに対して
約0.01〜1モルの範囲で用いるのが好ましく、特
に0.1〜0.5モルの範囲で使用するのがより好まし
い。電極材料としては陽極にはチタン、白金、炭
素、二酸化鉛、ニツケル、鉄、ステンレス鋼等
を、陰極には白金、炭素、チタン、ニツケル、
鉄、ステンレス鋼等を用いることが好ましい。ま
た電解に最も重要である電流密度は約1〜200m
A/cm2の範囲で行われるが、好ましくは約5〜
100mA/cm2の範囲である。さらに印加電圧は支
持電解質の添加量によつて大きく影響を受ける
が、該電解反応に於ては約1.5〜15Vの範囲で良
く、約2〜5Vの範囲で行うのがより好ましい。
電解温度は約−10〜50℃の範囲で良いが、約10〜
30℃で行うのが好ましい。 3,4,5-trialkoxytoluene represented by the general formula () is a known compound that is easily available, such as 3,4,5-trimethoxytoluene,
Examples include 3,4,5-triethoxytoluene. Examples of the organic solvent used in the above electrolytic reaction include lower alcohols such as methanol and ethanol, but the amount used is preferably in the range of 500 ml to 15 ml per 1 mole of compound (), and approximately 5 to 10 ml is used per mole of compound (). Particular preference is given to using amounts. Compounds used as supporting electrolytes include alkali metal hydroxides such as sodium hydroxide, potassium hydroxide, and lithium hydroxide; alkali metals such as sodium and potassium; and tetraalkylammonium hydroxides such as tetramethylammonium hydroxide and tetraethyl. Alkali metal salts of aliphatic carboxylic acids such as ammonium hydroxide, tetrapropylammonium hydroxide, and tetrabutylammonium hydroxide include sodium formate,
Examples of alkali metal fluorides such as sodium acetate include sodium fluoride and potassium fluoride. The amount used is preferably in the range of about 0.01 to 1 mol, particularly preferably in the range of 0.1 to 0.5 mol, per 1 mol of compound (). Electrode materials include titanium, platinum, carbon, lead dioxide, nickel, iron, stainless steel, etc. for the anode, and platinum, carbon, titanium, nickel, etc. for the cathode.
It is preferable to use iron, stainless steel, etc. Also, the current density, which is most important for electrolysis, is approximately 1 to 200 m
It is carried out in the range of A/ cm2 , preferably about 5 to
It is in the range of 100mA/ cm2 . Further, the applied voltage is greatly influenced by the amount of supporting electrolyte added, but in the electrolytic reaction, it may be in the range of about 1.5 to 15V, and more preferably in the range of about 2 to 5V.
The electrolysis temperature should be in the range of about -10 to 50℃, but it should be about 10 to 50℃.
Preferably it is carried out at 30°C.
本発明において用いられるハロゲン化水素又は
ハロゲン化水素酸としては公知のものを広く使用
できる。ハロゲン化水素としては例えば塩化水
素、臭化水素、沃化水素等を例示でき、またハロ
ゲン化水素酸としては例えば塩酸、臭化水素酸、
沃化水素酸等を例示できる。これらのハロゲン化
水素又はハロゲン化水素酸は−酸式()の化合
物の製造原料であると共に、それ自体触媒として
も作用する。それ故ハロゲン化水素又はハロゲン
化水素酸は一般式()の化合物に対して少なく
とも等モル量、好ましくは等モル〜2倍モル量用
いるのがよい。 A wide variety of known hydrogen halides or hydrohalic acids can be used in the present invention. Examples of hydrogen halides include hydrogen chloride, hydrogen bromide, and hydrogen iodide, and examples of hydrohalic acids include hydrochloric acid, hydrobromic acid,
Examples include hydriodic acid. These hydrogen halides or hydrohalic acids are raw materials for producing the compound of the -acid formula (), and also act as catalysts themselves. Therefore, hydrogen halide or hydrohalic acid is preferably used in at least an equimolar amount, preferably an equimolar to 2 times the molar amount of the compound of general formula ().
本発明において用いられる溶媒としては出発原
料及び目的化合物に対して不活性な溶媒であれば
特に限定されないが、例えばエチルエーテル、テ
トラヒドロフラン、ジオキサン等のエーテル類、
塩化メチレン、クロロホルム、四塩化炭素等のハ
ロゲン化炭化水素類、メタノール、エタノール等
のアルコール類、ベンゼン、トルエン等の芳香族
炭化水素類等を挙げることが出来る。特にテトラ
ヒドロフラン、ジオキサン等の環状エーテル類、
塩化メチレン、クロロホルム、四塩化炭素等のハ
ロゲン化炭化水素類が好ましい。 The solvent used in the present invention is not particularly limited as long as it is inert to the starting materials and target compound, but examples include ethers such as ethyl ether, tetrahydrofuran, and dioxane;
Examples include halogenated hydrocarbons such as methylene chloride, chloroform, and carbon tetrachloride, alcohols such as methanol and ethanol, and aromatic hydrocarbons such as benzene and toluene. Especially cyclic ethers such as tetrahydrofuran and dioxane,
Preferred are halogenated hydrocarbons such as methylene chloride, chloroform, and carbon tetrachloride.
本発明では反応の形態としては均一反応系でも
不均一反応系でもよい。反応温度は通常0〜100
℃程度である。 In the present invention, the form of the reaction may be either a homogeneous reaction system or a heterogeneous reaction system. Reaction temperature is usually 0-100
It is about ℃.
斯くして得られる一般式()の化合物は通常
公知の方法例えば濃縮、抽出、蒸留、再結晶、カ
ラムクロマトグラフイー等により精製することが
できる。 The compound of general formula () thus obtained can be purified by commonly known methods such as concentration, extraction, distillation, recrystallization, column chromatography, etc.
以下参考例、実施例によつて本発明を説明す
る。 The present invention will be explained below with reference to reference examples and examples.
参考例
3,4,5−トリメトキシトルエン182mg、水
酸化ナトリウム20mgをメタノール10mlに溶解させ
た液に、3cm2の電極面積をもつ陽極:白金、陰
極:白金の電極を浸し室温下撹拌しながら30mA
の定電流で3F/モル迄電解を行う。このときの
端子電圧は3.5〜3.7Vである。通電後、反応液を
減圧下で濃縮する。残渣をジクロルメタンで抽出
し、抽出液を減圧下で濃縮することにより粗生成
物を255mg回収した。この粗生成物をアルミナカ
ラム(ベンゼン:酢酸エチル=10:1)で精製す
ることにより、1,3,5,6,6−ペンタメト
キシ−3−メチル−1,4−シクロヘキサジエン
を224mg白色結晶として得た。この得量は理論収
率の92%であつた。この化合物はNMRによつて
確認を行つた。Reference example Anode: platinum, cathode: platinum electrodes with an electrode area of 3 cm 2 were immersed in a solution of 182 mg of 3,4,5-trimethoxytoluene and 20 mg of sodium hydroxide dissolved in 10 ml of methanol, and the electrodes were immersed with stirring at room temperature. 30mA
Electrolysis is carried out at a constant current of up to 3F/mole. The terminal voltage at this time is 3.5 to 3.7V. After electricity is applied, the reaction solution is concentrated under reduced pressure. The residue was extracted with dichloromethane, and the extract was concentrated under reduced pressure to recover 255 mg of a crude product. By purifying this crude product with an alumina column (benzene: ethyl acetate = 10:1), 224 mg of 1,3,5,6,6-pentamethoxy-3-methyl-1,4-cyclohexadiene was obtained as white crystals. obtained as. This amount was 92% of the theoretical yield. This compound was confirmed by NMR.
NMR(CDCl3)
δ1.44(s、3H、CH3C)
3.13(s、3H、CH3O)
3.18(s、3H、CH3O)
3.30(s、3H、CH3O)
3.68(s、6H、CH3O−C=)
4.98(s、2H、HC=)
実施例 1
1,3,5,6,6−ペンタメトキシ−3−メ
チル−1,4−シクロヘキサジエン244mgとクロ
ロホルム2mlの混合溶液に濃塩酸200mgを加え、
室温で1時間撹拌する。反応後有機層を分離、炭
酸水素ナトリウム水溶液で洗浄し、減圧下で濃縮
する。油状の粗生成物が210mg回収される。この
粗生成物をシリカゲルカラム(ベンゼン:ヘキサ
ン:酢酸エチル=10:10:1)で精製することに
より、3,4,5−トリメトキシベンジルクロラ
イド203.5mg得た。この得量は理論収率の94%に
相当する。この化合物はNMRによつて確認を行
つた。NMR (CDCl 3 ) δ1.44 (s, 3H, CH 3 C) 3.13 (s, 3H, CH 3 O) 3.18 (s, 3H, CH 3 O) 3.30 (s, 3H, CH 3 O) 3.68 (s , 6H, CH 3 O-C=) 4.98 (s, 2H, HC=) Example 1 244 mg of 1,3,5,6,6-pentamethoxy-3-methyl-1,4-cyclohexadiene and 2 ml of chloroform Add 200mg of concentrated hydrochloric acid to the mixed solution,
Stir for 1 hour at room temperature. After the reaction, the organic layer is separated, washed with an aqueous sodium bicarbonate solution, and concentrated under reduced pressure. 210 mg of oily crude product is recovered. This crude product was purified with a silica gel column (benzene:hexane:ethyl acetate=10:10:1) to obtain 203.5 mg of 3,4,5-trimethoxybenzyl chloride. This amount corresponds to 94% of the theoretical yield. This compound was confirmed by NMR.
NMR(CDCl3)
δ3.83(s、3H、OCH3)
3.86(s、6H、OCH3)
4.51(s、2H、−CH2−)
6.56(s、2H、H−Ar)
実施例 2
実施例1において濃塩酸の代りに47%臭化水素
酸を用い、他は同様な処理を行つて3,4,5−
トリメトキシベンジルブロマイド235mg得た。こ
の得量は理論収率の90%に相当する。この化合物
はNMRによつて確認を行つた。NMR (CDCl 3 ) δ3.83 (s, 3H, OCH 3 ) 3.86 (s, 6H, OCH 3 ) 4.51 (s, 2H, -CH 2 -) 6.56 (s, 2H, H-Ar) Example 2 Implementation 3,4,5-
235 mg of trimethoxybenzyl bromide was obtained. This amount corresponds to 90% of the theoretical yield. This compound was confirmed by NMR.
NMR(CDCl3)
δ3.84(s、3H、OCH3)
3.86(s、6H、OCH3)
4.36(s、2H、−CH2−)
6.60(s、2H、H−Ar)
実施例 3
1,3,5,6,6−ペンタエトキシ−3−メ
チル−1,4−シクロヘキサジエン314mgとクロ
ロホルム2mlの混合溶液に濃塩酸200mgを加え、
実施例1と同様な操作で、3,4,5−トリエト
キシベンジルクロライド240mg得た。この得量は
理論収率の93%に相当する。この化合物はNMR
によつて確認を行つた。NMR (CDCl 3 ) δ3.84 (s, 3H, OCH 3 ) 3.86 (s, 6H, OCH 3 ) 4.36 (s, 2H, -CH 2 -) 6.60 (s, 2H, H-Ar) Example 3 1 , 200 mg of concentrated hydrochloric acid was added to a mixed solution of 314 mg of 3,5,6,6-pentaethoxy-3-methyl-1,4-cyclohexadiene and 2 ml of chloroform.
In the same manner as in Example 1, 240 mg of 3,4,5-triethoxybenzyl chloride was obtained. This amount corresponds to 93% of the theoretical yield. This compound is NMR
Confirmation was carried out by
NMR(CDCl3)
δ1.32(t、9H、CH3)
4.00(q、2H、−CH2O−)
4.03(q、4H、−CH2O−)
4.50(s、2H、−CH2Cl)
6.55(s、2H、H−Ar)
実施例 4
実施例3において、濃塩酸の代りに47%臭化水
素酸を用い、他は同様な処理を行つて3,4,5
−トリエトキシベンジルプロマイド276mg得た。
この得量は理論収率の91.5%に相当する。この化
合物はNMRによつて確認を行つた。NMR (CDCl 3 ) δ1.32 (t, 9H, CH 3 ) 4.00 (q, 2H, −CH 2 O−) 4.03 (q, 4H, −CH 2 O−) 4.50 (s, 2H, −CH 2 Cl ) 6.55 (s, 2H, H-Ar) Example 4 In Example 3, 47% hydrobromic acid was used instead of concentrated hydrochloric acid, and the same treatment was performed except for 3, 4, 5.
-276 mg of triethoxybenzyl bromide was obtained.
This amount corresponds to 91.5% of the theoretical yield. This compound was confirmed by NMR.
NMR(CDCl3) δ1.30(t、9H、CH3) 3.99(q、2H、−CH2O−) 4.01(q、4H、−CH2O−) 4.34(s、2H、−CH2Br) 6.58(s、2H、H−Ar)NMR (CDCl 3 ) δ1.30 (t, 9H, CH 3 ) 3.99 (q, 2H, −CH 2 O−) 4.01 (q, 4H, −CH 2 O−) 4.34 (s, 2H, −CH 2 Br ) 6.58 (s, 2H, H-Ar)
Claims (1)
ル基を示す。〕 で表わされるシクロヘキサジエン誘導体とハロゲ
ン化水素もしくはハロゲン化水素酸とを溶媒中で
反応させて一般式 〔式中Xはハロゲン原子を示す。R1は前記に同
じ。〕 で表わされる3,4,5−トリアルコキシベンジ
ルハライドを得ることを特徴とする3,4,5−
トリアルコキシベンジルハライドの製造法。 2 溶媒がテトラヒドロフラン、ジオキサンなど
の環状エーテル類、塩化メチレン、クロロホル
ム、四塩化炭素などのハロゲン化炭化水素類であ
る特許請求の範囲第1項記載の方法。 3 ハロゲン化水素が塩化水素又は臭化水素であ
る特許請求の範囲第1項又は第2項に記載の方
法。 4 ハロゲン化水素酸が塩酸又は臭化水素酸であ
る特許請求の範囲第1項又は第2項に記載の方
法。 5 0〜100℃にて反応を行う特許請求の範囲第
1項乃至第4項のいずれかに記載の方法。[Claims] 1. General formula [In the formula, R 1 and R 2 are the same or different and represent a lower alkyl group. ] A cyclohexadiene derivative represented by the general formula [In the formula, X represents a halogen atom. R 1 is the same as above. ] A 3,4,5-trialkoxybenzyl halide represented by
Method for producing trialkoxybenzyl halide. 2. The method according to claim 1, wherein the solvent is a cyclic ether such as tetrahydrofuran or dioxane, or a halogenated hydrocarbon such as methylene chloride, chloroform, or carbon tetrachloride. 3. The method according to claim 1 or 2, wherein the hydrogen halide is hydrogen chloride or hydrogen bromide. 4. The method according to claim 1 or 2, wherein the hydrohalic acid is hydrochloric acid or hydrobromic acid. 5. The method according to any one of claims 1 to 4, wherein the reaction is carried out at 0 to 100°C.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13104081A JPS5832839A (en) | 1981-08-20 | 1981-08-20 | Preparation of 3,4,5-trialkoxybenzyl halide |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13104081A JPS5832839A (en) | 1981-08-20 | 1981-08-20 | Preparation of 3,4,5-trialkoxybenzyl halide |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5832839A JPS5832839A (en) | 1983-02-25 |
| JPS644500B2 true JPS644500B2 (en) | 1989-01-25 |
Family
ID=15048611
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13104081A Granted JPS5832839A (en) | 1981-08-20 | 1981-08-20 | Preparation of 3,4,5-trialkoxybenzyl halide |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5832839A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN119798049B (en) * | 2024-12-31 | 2025-11-11 | 万华化学集团股份有限公司 | Electrolytic byproduct conversion method based on-line oxidation aromatization |
-
1981
- 1981-08-20 JP JP13104081A patent/JPS5832839A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5832839A (en) | 1983-02-25 |
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