JPS6445841U - - Google Patents
Info
- Publication number
- JPS6445841U JPS6445841U JP1987139388U JP13938887U JPS6445841U JP S6445841 U JPS6445841 U JP S6445841U JP 1987139388 U JP1987139388 U JP 1987139388U JP 13938887 U JP13938887 U JP 13938887U JP S6445841 U JPS6445841 U JP S6445841U
- Authority
- JP
- Japan
- Prior art keywords
- mask pattern
- pattern surface
- photomask
- hole penetrating
- groove
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000000149 penetrating effect Effects 0.000 claims 2
- 238000000034 method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Description
第１図は本考案に係るフオトマスクの平面図、
第２図は第１図をＡ―Ａ線に沿つて切断した図、
第３図は本考案に係るフオトマスクを利用するコ
ンタクト露光時の半導体ウエーハの密着露光工程
を示す断面図、第４図は本考案に係るフオトマス
クの他の実施例を示す断面図、第５図は従来のフ
オトマスクの平面図、第６図ａ〜ｃは従来の工程
を示す断面図である。
１：マスクパターン面、３：溝、４：フオトマ
スク、８：貫通孔。
FIG. 1 is a plan view of a photomask according to the present invention;
Figure 2 is a diagram of Figure 1 cut along line A-A.
FIG. 3 is a cross-sectional view showing the contact exposure process of a semiconductor wafer during contact exposure using the photomask according to the present invention, FIG. 4 is a cross-sectional view showing another embodiment of the photomask according to the present invention, and FIG. A plan view of a conventional photomask, and FIGS. 6a to 6c are cross-sectional views showing the conventional process. 1: mask pattern surface, 3: groove, 4: photomask, 8: through hole.
Claims (1)
ーン面から内部に向け形成する溝、このマスクパ
ターン面から相対向する他面にかけて貫通する孔
部ならびにこの溝底部から前記他面を貫通する孔
からなる郡から選定する一種以上を前記マスクパ
ターン面に単数以上設置することを特徴とするフ
オトマスク。 A group consisting of a groove formed inward from the mask pattern surface of a photomask formed in a substantially plate shape, a hole penetrating from the mask pattern surface to the other opposing surface, and a hole penetrating the other surface from the groove bottom. A photomask characterized in that one or more selected types are placed on the mask pattern surface.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987139388U JPS6445841U (en) | 1987-09-14 | 1987-09-14 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987139388U JPS6445841U (en) | 1987-09-14 | 1987-09-14 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6445841U true JPS6445841U (en) | 1989-03-20 |
Family
ID=31402599
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1987139388U Pending JPS6445841U (en) | 1987-09-14 | 1987-09-14 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6445841U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003110389A (en) * | 2001-09-28 | 2003-04-11 | Kinseki Ltd | Photo mask |
-
1987
- 1987-09-14 JP JP1987139388U patent/JPS6445841U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003110389A (en) * | 2001-09-28 | 2003-04-11 | Kinseki Ltd | Photo mask |