JPS64541A - Silver halide photographic sensitive material containing oxonol dyestuff - Google Patents

Silver halide photographic sensitive material containing oxonol dyestuff

Info

Publication number
JPS64541A
JPS64541A JP6777688A JP6777688A JPS64541A JP S64541 A JPS64541 A JP S64541A JP 6777688 A JP6777688 A JP 6777688A JP 6777688 A JP6777688 A JP 6777688A JP S64541 A JPS64541 A JP S64541A
Authority
JP
Japan
Prior art keywords
dyestuff
titled material
group
silver halide
material containing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6777688A
Other languages
English (en)
Other versions
JPH01541A (ja
Inventor
Nobuaki Kagawa
Tamotsu Kojima
Yasuhiko Kawashima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP6777688A priority Critical patent/JPS64541A/ja
Publication of JPH01541A publication Critical patent/JPH01541A/ja
Publication of JPS64541A publication Critical patent/JPS64541A/ja
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/76Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/825Photosensitive materials characterised by the base or auxiliary layers characterised by antireflection means or visible-light filtering means, e.g. antihalation
    • G03C1/83Organic dyestuffs therefor
    • G03C1/832Methine or polymethine dyes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
JP6777688A 1987-03-20 1988-03-22 Silver halide photographic sensitive material containing oxonol dyestuff Pending JPS64541A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6777688A JPS64541A (en) 1987-03-20 1988-03-22 Silver halide photographic sensitive material containing oxonol dyestuff

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP62-66276 1987-03-20
JP6627687 1987-03-20
JP6777688A JPS64541A (en) 1987-03-20 1988-03-22 Silver halide photographic sensitive material containing oxonol dyestuff

Publications (2)

Publication Number Publication Date
JPH01541A JPH01541A (ja) 1989-01-05
JPS64541A true JPS64541A (en) 1989-01-05

Family

ID=26407459

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6777688A Pending JPS64541A (en) 1987-03-20 1988-03-22 Silver halide photographic sensitive material containing oxonol dyestuff

Country Status (1)

Country Link
JP (1) JPS64541A (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013129674A1 (ja) * 2012-03-01 2013-09-06 学校法人兵庫医科大学 新規ベンズイミダゾール誘導体及びその用途
US20170123313A1 (en) * 2015-10-31 2017-05-04 Rohm And Haas Electronic Materials Llc Thermal acid generators and photoresist pattern trimming compositions and methods

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013129674A1 (ja) * 2012-03-01 2013-09-06 学校法人兵庫医科大学 新規ベンズイミダゾール誘導体及びその用途
US9212169B2 (en) 2012-03-01 2015-12-15 Hyogo College Of Medicine Benzimidazole derivative and use thereof
US20170123313A1 (en) * 2015-10-31 2017-05-04 Rohm And Haas Electronic Materials Llc Thermal acid generators and photoresist pattern trimming compositions and methods
US10241407B2 (en) * 2015-10-31 2019-03-26 Rohm And Haas Electronic Materials Llc Thermal acid generators and photoresist pattern trimming compositions and methods

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