JPS6454700A - High frequency power source output monitor circuit for plasma treatment device - Google Patents

High frequency power source output monitor circuit for plasma treatment device

Info

Publication number
JPS6454700A
JPS6454700A JP62209255A JP20925587A JPS6454700A JP S6454700 A JPS6454700 A JP S6454700A JP 62209255 A JP62209255 A JP 62209255A JP 20925587 A JP20925587 A JP 20925587A JP S6454700 A JPS6454700 A JP S6454700A
Authority
JP
Japan
Prior art keywords
high frequency
voltage
current
power source
treatment device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62209255A
Other languages
Japanese (ja)
Inventor
Hiroshi Yano
Shozo Noda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP62209255A priority Critical patent/JPS6454700A/en
Publication of JPS6454700A publication Critical patent/JPS6454700A/en
Pending legal-status Critical Current

Links

Landscapes

  • Plasma Technology (AREA)
  • Control Of Voltage And Current In General (AREA)

Abstract

PURPOSE:To obtain an effective power value independently of frequencies by multiplying separated current and voltage with each other. CONSTITUTION:A high frequency signal of a plasma exciting frequency introduced to a terminal 4 is made a current (a) through an amplifier 5, an output circuit 6, and a coil 7 and also made a voltage (b) through a coil 8. The current (a) is branched and supplied to a multiplication circuit 9 and a rectifier circuit 10. The voltage (b) is similarly supplied to the multiplication circuit 9 and a rectifier circuit 11. The current (a) and the voltage (b) are multiplied with each other on real time in the multiplication circuit 9, smoothed, and sent as an effective power signal to a terminal 13. A high frequency output is applied from a terminal 18 to an electrode located in a process chamber.
JP62209255A 1987-08-25 1987-08-25 High frequency power source output monitor circuit for plasma treatment device Pending JPS6454700A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62209255A JPS6454700A (en) 1987-08-25 1987-08-25 High frequency power source output monitor circuit for plasma treatment device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62209255A JPS6454700A (en) 1987-08-25 1987-08-25 High frequency power source output monitor circuit for plasma treatment device

Publications (1)

Publication Number Publication Date
JPS6454700A true JPS6454700A (en) 1989-03-02

Family

ID=16569927

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62209255A Pending JPS6454700A (en) 1987-08-25 1987-08-25 High frequency power source output monitor circuit for plasma treatment device

Country Status (1)

Country Link
JP (1) JPS6454700A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5784743A (en) * 1980-11-18 1982-05-27 Fujitsu Ltd Plasma cvd method and apparatus therefor

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5784743A (en) * 1980-11-18 1982-05-27 Fujitsu Ltd Plasma cvd method and apparatus therefor

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