JPS6464676A - Water retaining mask - Google Patents
Water retaining maskInfo
- Publication number
- JPS6464676A JPS6464676A JP62221280A JP22128087A JPS6464676A JP S6464676 A JPS6464676 A JP S6464676A JP 62221280 A JP62221280 A JP 62221280A JP 22128087 A JP22128087 A JP 22128087A JP S6464676 A JPS6464676 A JP S6464676A
- Authority
- JP
- Japan
- Prior art keywords
- water
- water absorptive
- highly
- resin
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Respiratory Apparatuses And Protective Means (AREA)
Abstract
PURPOSE: To prevent the drying of the nose, mouth, etc., in a sauna room by constituting at least part of a water retaining mask of a sheet material formed by disposing a highly water absorptive material between two heat sealable sheets having water permeability and air permeability. CONSTITUTION: This water retaining mask is at least partly composed of the sheet material formed by disposing the highly water absorptive material between the two heat sealable sheets having the water permeability and the air permeability. The highly water absorptive material constituting the water retaining mask consists of a water absorptive resin. This highly water absorptive material is preferably a water absorptive resin obtd. by polymn. of a water-soluble ethylenic unsatd. monomer or the water absorptive resin composite thereof. The water absorptive resin composite is obtd. by impregnating a fibrous base body or spongy base body with the ethylenic unsatd. monomer to form a water absorptive polymer in the form of an aq. soln. or applying this soln. on these base bodies, then polymerizing the nucleus aq. ethylenic unsatd. monomer. The sections to be provided with the highly water absorptive material and the mat. of the highly water absorptive material to be used are arbitrarily determined. When the granular or massive water absorptive resin is used, the resin is previously and preferably fixed so as not to exist unevenly in the mask.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62221280A JPS6464676A (en) | 1987-09-04 | 1987-09-04 | Water retaining mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62221280A JPS6464676A (en) | 1987-09-04 | 1987-09-04 | Water retaining mask |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6464676A true JPS6464676A (en) | 1989-03-10 |
Family
ID=16764308
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62221280A Pending JPS6464676A (en) | 1987-09-04 | 1987-09-04 | Water retaining mask |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6464676A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3024060U (en) * | 1995-03-16 | 1996-05-17 | 宇都宮 佐喜子 | Humidifying gauze mask with water tank |
| JPH081266U (en) * | 1992-12-03 | 1996-08-13 | 民子 草薙 | Humidifying mask |
| WO2001045797A1 (en) * | 1999-12-22 | 2001-06-28 | Seo Jung Eun | Compact multipurpose dustproof mask |
| JP2003093527A (en) * | 2001-09-21 | 2003-04-02 | Uni Charm Corp | Double mask |
-
1987
- 1987-09-04 JP JP62221280A patent/JPS6464676A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH081266U (en) * | 1992-12-03 | 1996-08-13 | 民子 草薙 | Humidifying mask |
| JP3024060U (en) * | 1995-03-16 | 1996-05-17 | 宇都宮 佐喜子 | Humidifying gauze mask with water tank |
| WO2001045797A1 (en) * | 1999-12-22 | 2001-06-28 | Seo Jung Eun | Compact multipurpose dustproof mask |
| JP2003093527A (en) * | 2001-09-21 | 2003-04-02 | Uni Charm Corp | Double mask |
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